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1. 发明申请

WO2004081503A3 DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：排放生产等离子体光源
公开(公告)号：WO2004081503A3
公开(公告)日：2005-10-06
申请号：PCT/US2004006551
申请日：2004-03-03
申请人： CYMER INC , PARTLO WILLIAM N , BLUMENSTOCK GERRY M , BOWERING NORBERT , BRUZZONE KENT A , COBB DENNIS W , DYER TIMOTHY S , DUNLOP JOHN , FOMENKOV IGOR V , HYSHAM JAMES CHRISTOPHER , OLIVER ROGER I , PALENSCHAT FREDERICK A , PAN XIAOJIANG J , RETTIG CURTIS L , SIMMONS RODNEY S , WALKER JOHN , WEBB KYLE R , HOFMANN THOMAS , KHODYKIN OLEH
发明人： PARTLO WILLIAM N , BLUMENSTOCK GERRY M , BOWERING NORBERT , BRUZZONE KENT A , COBB DENNIS W , DYER TIMOTHY S , DUNLOP JOHN , FOMENKOV IGOR V , HYSHAM JAMES CHRISTOPHER , OLIVER ROGER I , PALENSCHAT FREDERICK A , PAN XIAOJIANG J , RETTIG CURTIS L , SIMMONS RODNEY S , WALKER JOHN , WEBB KYLE R , HOFMANN THOMAS , KHODYKIN OLEH
IPC分类号： G01J20060101 , G03F7/20 , H01J1/52 , H01S3/00 , H01S3/225 , H05G2/00 , H05H1/06
CPC分类号： H01S3/005 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70908 , G03F7/70916 , H01S3/225 , H05G2/003 , H05G2/005 , H05H1/06
摘要： An EUV source (20) includes a debris mitigation apparatus (60) employing a metal halogen gas producing a metal halide from debris exiting the plasma, a debris shield (36) having a plurality of curvilinear shield members (102) having inner and outer surface connected by light passages (104) and electrodes (28,88) for providing a discharged plasma (32) in a chamber (22).
摘要翻译： EUV源（20）包括使用从离开等离子体的碎屑产生金属卤化物的金属卤素气体的碎片减缓装置（60），具有多个曲线形屏蔽构件（102）的碎片屏蔽（36），其具有内表面和外表面通过光通道（104）和用于在腔室（22）中提供排出的等离子体（32））的电极（28,88）连接。

2. 发明申请

WO03023910A3 HIGH REP-RATE LASER WITH IMPROVED ELECTRODES 审中-公开
标题翻译：具有改进电极的高倍率激光
公开(公告)号：WO03023910A3
公开(公告)日：2003-05-30
申请号：PCT/US0228463
申请日：2002-09-06
申请人： CYMER INC , MORTON RICHARD G , DYER TIMOTHY S , STEIGER THOMAS D , UJAZDOWSKI RICHARD C , WATSON TOM A , MOOSMAN BRYAN , IVASCHENKO ALEX P , GILLESPIE WALTER D , RETTIG CURTIS L
发明人： MORTON RICHARD G , DYER TIMOTHY S , STEIGER THOMAS D , UJAZDOWSKI RICHARD C , WATSON TOM A , MOOSMAN BRYAN , IVASCHENKO ALEX P , GILLESPIE WALTER D , RETTIG CURTIS L
IPC分类号： C22C9/04 , H01S3/036 , H01S3/038 , H01S3/225 , H01S3/22 , H01S3/223
CPC分类号： H01S3/038 , H01S3/036 , H01S3/0381 , H01S3/0388 , H01S3/09702 , H01S3/225
摘要： The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the elctrodes is comprised of a first material having a relatively low anode erosion rate and a second anode material having a relatively higher anode erosion rate. The first anode material (42) is positioned at a desired anode discharge region of the electrode. The second anode material (40) is located adjacent to the first anode material (42) along at least two long sides of the first material (42). During operation of the laser erosion occurs on both materials but the higher erosion rate of the second material (40) assures that any tendency of the discharge to spread onto the second material (40) will quickly erode away the second material (40) enough to stop the spread of the discharge. In a preferred embodiment the anode is as described above and the cathode is also a two-material electrode with the first material at the discharge region being C26000 brass and the second material being C36000 brass. A pulse power system provides electrical pulses at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges.
摘要翻译：本发明提供了一种气体放电激光器，其具有至少一个长寿命的细长电极，用于在含氟激光气体中产生至少120亿个高压放电。在优选实施方案中，至少一个电极由具有相对低的阳极侵蚀速率的第一材料和具有相对较高的阳极侵蚀速率的第二阳极材料构成。第一阳极材料（42）位于电极的期望的阳极放电区域。第二阳极材料（40）沿着第一材料（42）的至少两个长边位于第一阳极材料（42）附近。在两种材料的激光冲蚀操作过程中，第二材料（40）的侵蚀速率都较高，确保放电扩散到第二材料（40）上的任何趋势都将迅速地将第二材料（40）剥离成足够的停止放电的传播。在优选实施例中，阳极如上所述，阴极也是双材料电极，其中第一材料在放电区域为C26000黄铜，第二材料为C36000黄铜。脉冲功率系统以至少1KHz的速率提供电脉冲。鼓风机以至少5m / s的速度在电极之间循环激光气体，并且提供热交换器以去除由鼓风机和排出物产生的热量。

3. 发明申请

WO2005089131A2 LPP EUV LIGHT SOURCE 审中-公开
标题翻译： LPP EUV光源
公开(公告)号：WO2005089131A2
公开(公告)日：2005-09-29
申请号：PCT/US2005/007063
申请日：2005-03-03
申请人： CYMER, INC. , PARTLO, William, N. , BROWN, Daniel, J., W. , FOMENKOV, Igor, V. , BOWERING, Norbert, R. , RETTIG, Curtis, L. , MACFARLANE, Joseph, J. , ERSHOV, Alexander, I. , HANSSON, Bjorn, A., M.
发明人： PARTLO, William, N. , BROWN, Daniel, J., W. , FOMENKOV, Igor, V. , BOWERING, Norbert, R. , RETTIG, Curtis, L. , MACFARLANE, Joseph, J. , ERSHOV, Alexander, I. , HANSSON, Bjorn, A., M.
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H01S3/0085 , H01S3/0092 , H01S3/1611 , H01S3/1653 , H01S3/2255 , H01S3/2325 , H01S3/2375 , H01S3/2383 , H05G2/005 , H05G2/008
摘要： An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation .pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.
摘要翻译：描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低临界密度，从而在由波长限定的等离子体区域内的等离子体内发生吸收的等离子体照射脉冲与初始靶照射部位充分分离，以实现发射材料的压缩，并且可以压缩发射区域。激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

4. 发明申请

WO2002093703A1 IMPROVED FAN FOR GAS DISCHARGE LASER 审中-公开
标题翻译：改进的风扇排放激光
公开(公告)号：WO2002093703A1
公开(公告)日：2002-11-21
申请号：PCT/US2002/012417
申请日：2002-04-18
申请人： CYMER, INC. , PARTLO, William, N. , RETTIG, Curtis, L.
发明人： PARTLO, William, N. , RETTIG, Curtis, L.
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , F04D29/283 , F04D29/666 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An electric discharge laser apparatus having a laser chamber containing a laser gas and two longitudinal electrodes defining a discharge region for producing electrical discharges, and a tangential fan for circulating the laser gas. The fan has blade members and hub members (12) configured to minimize adverse effects of reflections of electric discharge generated shock waves back to the discharge region simultaneously with a subsequent discharge.
摘要翻译：一种具有包含激光气体的激光室和限定用于产生放电的放电区域的两个纵向电极的放电激光装置和用于循环激光气体的切向风扇。风扇具有叶片构件和轮毂构件（12），其构造成使放电产生的冲击波的反射的不利影响最小化，以随后的放电同时返回到放电区域。

5. 发明申请

WO2006135546A3 SYSTEMS AND METHODS FOR DEFLECTING PLASMA-GENERATED IONS TO PREVENT THE IONS FROM REACHING AN INTERNAL COMPONENT OF AN EUV LIGHT SOURCE 审中-公开
标题翻译：用于去除等离子体生成的离子的系统和方法，以防止离子进入EUV光源的内部成分
公开(公告)号：WO2006135546A3
公开(公告)日：2007-03-01
申请号：PCT/US2006020224
申请日：2006-05-25
申请人： CYMER INC , RETTIG CURTIS L , HOFFMAN JERZY R , VARGAS ERNESTO L
发明人： RETTIG CURTIS L , HOFFMAN JERZY R , VARGAS ERNESTO L
IPC分类号： H01J49/40 , G02B5/00 , G03F7/20 , G21C11/00 , H01J1/50
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70983 , H05G2/001
摘要： A system for protecting an internal component (30) of an EUV light source (20) from ions (206a, 206b) generated at a plasma formation site (28) and initially directed toward the internal component (30), which includes at least one foil plate (180) interposed between die internal component (30) and die plasma formation site (28) and having a surface (208a, 208b) substantially aligned along a line extending from the plasma formation site (28) to die internal component (30); and a magnetic source (200a, 200b) for generating a magnetic field (B2) to deflect the ions (206a, 206b) into die foil plate surface (208a, 208b).
摘要翻译：一种用于保护EUV光源（20）的内部部件（30）免于在等离子体生成部位（28）处产生并且最初指向内部部件（30）的离子（206a，206b）的系统，其包括至少一个插入在管芯内部部件（30）和管芯等离子体生成部位（28）之间并且具有沿着从等离子体形成部位（28）延伸到管芯内部部件（30）的线基本上对准的表面（208a，208b）的箔片（180））; 以及用于产生磁场（B2）以将离子（206a，206b）偏转成模具箔片表面（208a，208b）的磁源（200a，200b）。

6. 发明申请

WO2005104313A3 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 审中-公开
标题翻译：气体放电激光室改进
公开(公告)号：WO2005104313A3
公开(公告)日：2007-02-01
申请号：PCT/US2005007168
申请日：2005-03-03
申请人： CYMER INC , PARTLO WILLIAM N , AMADA YOSHIHO , CARMICHAEL JAMES A , DYER TIMOTHY S , GILLESPIE WALTER D , MOOSMAN BRYAN G , RETTIG CURTIS L , STRATE BRIAN D , STEIGER THOMAS D , TRINTCHOUK FEDOR B , UJAZDOWSKI RICHARD C
发明人： PARTLO WILLIAM N , AMADA YOSHIHO , CARMICHAEL JAMES A , DYER TIMOTHY S , GILLESPIE WALTER D , MOOSMAN BRYAN G , RETTIG CURTIS L , STRATE BRIAN D , STEIGER THOMAS D , TRINTCHOUK FEDOR B , UJAZDOWSKI RICHARD C
IPC分类号： H01S3/22 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/225
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.
摘要翻译：如果公开的方法和装置，其可以包括高功率高重复率气体放电激光UV光源，其可以包括：气体放电室，其包括包括垂直壁和相邻底壁的内壁; 气体循环风扇，其产生邻近内部垂直壁和相邻底壁的气体流动路径; 室内除尘器定位了低气流区域，其可以沿着内壁并且可以包括至少一个网状筛网，例如多个网状筛网，其可以包括至少两个不同的规格网状筛网。除尘器可以沿着室的底部内壁和/或内壁的垂直部分延伸。除尘器可以包括具有第一量规的第一网状筛网; 第二网状筛，其具有小于第一量规的第二规格; 并且第二网状屏幕在第一网状筛网和内壁之间。腔室可以包括在腔室的垂直内壁和底壁中的至少一个中的多个集尘凹部，其可以从包括一部分凹部和多部分凹部的组中选择，该组包括两个凹部相对于彼此成角度的部分。除尘器可以包括定位在主绝缘体的一部分和室的内壁之间的压力阱。该腔室可包括气体循环风扇，其包括具有风扇切断装置的横流风扇，其可包括涡流控制口袋。所述腔室可以包括预除垢机构，其包括在所述预分离管内的细长开口内包含接地棒的预除菌槽，所述前置离子槽可以包括柔顺构件，自动预除电切断机构，预电离起始控制机构和/或聚焦元件。腔室可以包括细长的挡板，该挡板可以包括多个金字塔形结构，包括不同数量的通常为锥体的元件，并且以不同数量的大致金字塔形元件组成并且沿纵向轴线并且横向于纵向轴线定向。腔内的声共振也可以通过将人造钳工器引入激光放电的定时中，从而在脉冲串内从脉冲到脉冲随机地或以重复模式改变脉冲间周期。

7. 发明申请

WO2005104313A2 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 审中-公开
标题翻译：气体放电激光室改进
公开(公告)号：WO2005104313A2
公开(公告)日：2005-11-03
申请号：PCT/US2005/007168
申请日：2005-03-03
申请人： CYMER, INC. , PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
发明人： PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.
摘要翻译：如果公开的方法和装置，其可以包括高功率高重复率气体放电激光器UV光源，其可以包括：气体放电室，其包括包括垂直壁和相邻底壁的内壁; 气体循环风扇，其产生邻近内部垂直壁和相邻底壁的气体流动路径; 室内除尘器定位低气流区域，其可以沿着内壁并且可以包括至少一个网状筛网，例如多个网状筛网，其可以包括至少两个不同的规格网状筛网。除尘器可以沿着室的底部内壁和/或内壁的垂直部分延伸。除尘器可以包括具有第一量规的第一网状筛网; 第二网眼屏幕，其具有小于第一规格的第二规格; 并且第二网状屏幕在第一网状筛网和内壁之间中间。腔室可以包括在腔室的垂直内壁和底壁中的至少一个中的多个集尘凹部，其可以从包括一部分凹部和多部分凹部的组中选择，该组包括两个相对于彼此成角度的部分。除尘器可以包括定位在主绝缘体的一部分和室的内壁之间的压力阱。该腔室可以包括气体循环风扇，其包括具有风扇切断装置的横流风扇，其可以包括涡流控制袋。所述腔室可以包括预电离机构，其包括在所述预电离管内的细长开口内包含接地棒的前置离子槽，其可以包括柔顺构件，自动预除电切断机构，预电离起始控制机构和/或聚焦元件。腔室可以包括细长的挡板，其可以包括多个金字塔结构，其包括不同数量的大体锥体元件，并且以不同数量的大体锥体元件组成并且沿纵向轴线并且横向于纵向轴线定向。通过将人工钳位器引入激光放电的定时，也可以通过在脉冲串内从脉冲到脉冲随机地或以重复模式改变脉冲周期的时间来减小腔室内的声共振。

8. 发明申请

WO2003023910A2 HIGH REP-RATE LASER WITH IMPROVED ELECTRODES 审中-公开
标题翻译：具有改进电极的高倍率激光
公开(公告)号：WO2003023910A2
公开(公告)日：2003-03-20
申请号：PCT/US2002/028463
申请日：2002-09-06
申请人： CYMER, INC. , MORTON, Richard, G. , DYER, Timothy, S. , STEIGER, Thomas, D. , UJAZDOWSKI, Richard, C. , WATSON, Tom, A. , MOOSMAN, Bryan , IVASCHENKO, Alex, P. , GILLESPIE, Walter, D , RETTIG, Curtis, L.
发明人： MORTON, Richard, G. , DYER, Timothy, S. , STEIGER, Thomas, D. , UJAZDOWSKI, Richard, C. , WATSON, Tom, A. , MOOSMAN, Bryan , IVASCHENKO, Alex, P. , GILLESPIE, Walter, D , RETTIG, Curtis, L.
IPC分类号： H01S
CPC分类号： H01S3/038 , H01S3/036 , H01S3/0381 , H01S3/0388 , H01S3/09702 , H01S3/225
摘要： The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the elctrodes is comprised of a first material having a relatively low anode erosion rate and a second anode material having a relatively higher anode erosion rate. The first anode material is positioned at a desired anode discharge region of the electrode. The second anode material is located adjacent to the first anode material along at least two long sides of the first material. During operation of the laser erosion occurs on both materials but the higher ero sion rate of the second material assures that any tendency of the discharge to spread onto the second material will quickly erode away the second material enough to stop the spread of the discharge. In a preferred embodiment the anode is as described above and the cathode is also a two-material electrode with the first material electrode with the first material at the discharge region being C26000 brass and the second material being C36000 brass. A pulse power system provides electrical pulses at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges.
摘要翻译：本发明提供了一种气体放电激光器，其具有至少一个长寿命的细长电极，用于在含氟激光气体中产生至少120亿个高压放电。在优选实施方案中，至少一个电极由具有相对低的阳极侵蚀速率的第一材料和具有相对较高的阳极侵蚀速率的第二阳极材料构成。第一阳极材料位于电极的期望的阳极放电区域。第二阳极材料沿第一材料的至少两个长边位于第一阳极材料附近。在两种材料的激光冲蚀操作过程中，第二种材料的腐蚀速度较高，确保放电扩散到第二种材料上的任何趋势将迅速消除第二种材料，从而阻止放电扩散。在优选实施例中，阳极如上所述，阴极也是具有第一材料电极的双材料电极，其中在放电区域处的第一材料为C26000黄铜，第二材料为C36000黄铜。脉冲功率系统以至少1KHz的速率提供电脉冲。鼓风机以至少5m / s的速度在电极之间循环激光气体，并且提供热交换器以去除由鼓风机和排出物产生的热量。

9. 发明申请

WO2002093699A1 FOUR KHz GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：四吉兹气体放电激光系统
公开(公告)号：WO2002093699A1
公开(公告)日：2002-11-21
申请号：PCT/US2002/012062
申请日：2002-04-15
申请人： CYMER, INC. , WITTAK, Christian, J. , PARTLO, William, N. , SANDSTROM, Richard, L. , MELCHER, Paul, C. , JOHNS, David, M. , SAETHRE, Robert, B. , NESS, Richard, M. , RETTIG, Curtis, L. , SHANNON, Robert, A. , UJAZDOWSKI, Richard, C. , ROKNI, Shahryar , SMITH, Scott , ANDERSON, Stuart, L. , ALGOTS, John, M. , SPANGLER, Ronald, L. , FOMENKOV, Igor , STEIGER, Thomas, D. , EMILO, Jerome, A. , TITUS, Clay, C. , IVASCHENKO, Alex, P. , ZAMBON, Paolo , PADMABANDU, Gamaralalage, G. , BRANHAM, Mark, S. , PHATAK, Sanjay , CYBULSKI, Raymond
发明人： WITTAK, Christian, J. , PARTLO, William, N. , SANDSTROM, Richard, L. , MELCHER, Paul, C. , JOHNS, David, M. , SAETHRE, Robert, B. , NESS, Richard, M. , RETTIG, Curtis, L. , SHANNON, Robert, A. , UJAZDOWSKI, Richard, C. , ROKNI, Shahryar , SMITH, Scott , ANDERSON, Stuart, L. , ALGOTS, John, M. , SPANGLER, Ronald, L. , FOMENKOV, Igor , STEIGER, Thomas, D. , EMILO, Jerome, A. , TITUS, Clay, C. , IVASCHENKO, Alex, P. , ZAMBON, Paolo , PADMABANDU, Gamaralalage, G. , BRANHAM, Mark, S. , PHATAK, Sanjay , CYBULSKI, Raymond
IPC分类号： H01S3/10
CPC分类号： G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter (4K) with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror, which is in a line narrowing module (15K) and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors (16K and 17K) drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以约4,000Hz的脉冲速率产生高质量的脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长计（4K）监视输出光束参数，并控制一个非常快的PZT驱动调光镜，它在一个线路变窄模块（15K）和脉冲功率充电电压，以保持波长和脉冲能量达到所需的极限。在优选实施例中，两个风扇马达（16K和17K）驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

10. 发明申请

WO2004081503A2 DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：排放生产等离子体光源
公开(公告)号：WO2004081503A2
公开(公告)日：2004-09-23
申请号：PCT/US2004/006551
申请日：2004-03-03
申请人： CYMER, INC. , PARTLO, William, N. , BLUMENSTOCK, Gerry, M. , BOWERING, Norbert , BRUZZONE, Kent, A. , COBB, Dennis, W. , DYER, Timothy, S. , DUNLOP, John , FOMENKOV, Igor, V. , HYSHAM, James, Christopher , OLIVER, Roger, I. , PALENSCHAT, Frederick, A. , PAN, Xiaojiang, J. , RETTIG, Curtis, L. , SIMMONS, Rodney, S. , WALKER, John , WEBB, Kyle, R. , HOFMANN, Thomas
发明人： PARTLO, William, N. , BLUMENSTOCK, Gerry, M. , BOWERING, Norbert , BRUZZONE, Kent, A. , COBB, Dennis, W. , DYER, Timothy, S. , DUNLOP, John , FOMENKOV, Igor, V. , HYSHAM, James, Christopher , OLIVER, Roger, I. , PALENSCHAT, Frederick, A. , PAN, Xiaojiang, J. , RETTIG, Curtis, L. , SIMMONS, Rodney, S. , WALKER, John , WEBB, Kyle, R. , HOFMANN, Thomas
IPC分类号： G01J
CPC分类号： H01S3/005 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70908 , G03F7/70916 , H01S3/225 , H05G2/003 , H05G2/005 , H05H1/06
摘要： An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO 2 . The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.
摘要翻译：公开了一种DPP EUV源，其可以包括使用从离开等离子体的碎片产生金属卤化物的金属卤素气体的碎片减缓装置。 EUV源可以具有碎片屏蔽，其可以包括多个曲线屏蔽构件，其具有通过与焦点对准的光通道连接的内表面和外表面，该屏蔽构件可以与它们之间的开放空间交替，并且可以具有形成在一个旋转轴上的圆圈和另一个轴上的椭圆。电极可以被供给放电脉冲，该放电脉冲在放电的轴向耗尽阶段期间产生适度的电流，并且在放电的径向压缩阶段期间发生峰值。光源可以包括涡轮分子泵，其具有连接到发电室的入口，并且可操作以比来自该室的缓冲气体优先地泵送更多的源气体。源可以包括调谐的导电电极，包括：掺杂在第一区域中以至少选择电导率的差分掺杂陶瓷材料，并且在第二区域中至少选择导热性。第一区域可以在电极结构的外表面处或附近，并且陶瓷材料可以是SiC或氧化铝，并且掺杂剂是BN或包括SiO或TiO 2的金属氧化物。源可以包括可移动电极组件安装件，其可操作以将电极组件安装座从更换位置移动到操作位置，可移动安装件在波纹管上。源可以具有可操作地连接到收集器的温度控制机构，并且可操作地调节相应壳体部件的温度，以保持温度相关几何形状优化来自相应外壳部件的入射反射的扫掠角，或机械定位器壳成员。壳可能会被电压偏置。可以使用离焦激光辐射来制造碎片屏蔽。阳极可以用限定两个冷却剂通道或限定通道的多孔金属的中空内部冷却。碎片屏蔽可以由连接到安装环或轮毂的多个大的，中间的和小的翅片形成，或者彼此具有提供均匀分离和强化并且不阻挡任何显着量的光的互锁突起。

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