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    • 1. 发明申请
    • PACKAGE-CULLING CONVEYOR SYSTEM AND METHOD
    • 包装式输送机系统及方法
    • WO2011112449A3
    • 2011-10-27
    • PCT/US2011027185
    • 2011-03-04
    • LAITRAM LLCFOURNEY MATTHEW LWARGO STEPHEN GPRESSLER ERIC MDUNLOP JOHN M
    • FOURNEY MATTHEW LWARGO STEPHEN GPRESSLER ERIC MDUNLOP JOHN M
    • B65G47/71B07C1/10B65G17/24
    • B65G47/28B07B13/05B07C1/12B65G15/30B65G17/24B65G47/68B65G47/71B65G59/02
    • A package -culling conveyor system and a method for culling flat packages from a bulk flow of flat and non-flat packages. The conveyor system includes a tilted conveyor belt (24) conveying flat packages while non-flat packages tumble off its lower side. A high - friction conveying surface or a raised barrier along the length of the conveying surface of the tilted conveyor belt (24) holds flat packages on the tilted belt. The separated packages are more fully culled in a conveyor comprising a roller conveyor belt (36) with belt rollers (38) rotated in a direction to push packages sidewise toward a culling element that extends along the belt's length. Culling elements include powered rollers (55) or vertical walls forming side guards. The culling elements block the non-flat packages from exiting off the side of the belt so that they are conveyed off the end of the belt separate from the flat packages.
    • 包装 - 包装输送机系统以及从扁平和非扁平包装的大量流中剔除扁平包装的方法。 输送机系统包括倾斜的输送带(24),其输送扁平包装,而非扁平包装从其下侧翻转。 沿着倾斜传送带(24)的输送表面的长度的高摩擦输送表面或升高的阻挡层在倾斜的带上保持平坦的包装。 分离的包装在包括辊式输送带(36)的输送机中更全面地被拣选,带式辊子(38)沿着沿着带长度方向朝向沿着带长度延伸的剔除元件的侧向推动包装的方向旋转。 剔除元件包括动力辊(55)或形成侧挡板的垂直壁。 剔除元件阻止非扁平包装从带的侧面离开,使得它们从平坦包装件分离的带的端部输送。
    • 7. 发明申请
    • DUV LIGHT SOURCE OPTICAL ELEMENT IMPROVEMENTS
    • DUV光源光学元件的改进
    • WO2005104311A2
    • 2005-11-03
    • PCT/US2005/006932
    • 2005-03-04
    • CYMER, INC.SANDSTROM, Richard L.ALGOTS, J. MartinBROWN, Joshua C.CYBULSKY, Raymond F.DUNLOP, JohnHOWEY, James K.MORTON, Richard G.PAN, Xiaojiang J.PARTLO, William N.PUTRIS, Firas F.WATSON, Tom A.YAGER, Thomas A.
    • SANDSTROM, Richard L.ALGOTS, J. MartinBROWN, Joshua C.CYBULSKY, Raymond F.DUNLOP, JohnHOWEY, James K.MORTON, Richard G.PAN, Xiaojiang J.PARTLO, William N.PUTRIS, Firas F.WATSON, Tom A.YAGER, Thomas A.
    • H01S3/22
    • H01S3/02G01J1/429G01J9/02G03F7/70025G03F7/70575G03F7/70933H01S3/0057H01S3/0071H01S3/036H01S3/038H01S3/0385H01S3/0401H01S3/041H01S3/08009H01S3/08036H01S3/0812H01S3/097H01S3/0971H01S3/0975H01S3/1024H01S3/104H01S3/105H01S3/1055H01S3/1305H01S3/134H01S3/139H01S3/22H01S3/2207H01S3/223H01S3/225H01S3/2251H01S3/2256H01S3/2258H01S3/2333H01S3/2366
    • A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed which may comprise a fast moving angularly positionable tuning mirror comprising: a mirror mounting frame comprising a first material and a relatively flat mounting surface area; a reflective optic comprising a second material having a coefficient of thermal expansion different from that of the first material of the mounting frame; at least two attachment points of attachment between the mounting frame and the reflective optic on the mounting frame surface; and, at least one flexure mount formed in the mounting frame that is flexible in a flexure axis corresponding to a longitudinal axis of thermal expansion of the mounting frame and the reflective optic, positioned at one of the at least two points of attachment. The flexure mount may comprise: a flexure body formed from the material of the mirror mounting frame and separated from the material of the mirror mounting frame to allow relative movement between the flexure and the mirror mounting frame; at least one flexure arm formed from the material of the mirror mounting frame and attached at one end to the mirror mounting frame and at the other end to the flexure. The apparatus and method may further comprise a flexure force mechanism made of the second material or a third material having a coefficient of thermal expansion that is essentially the same as that of the second material; the flexure force mechanism comprising an elongated rod; a flexure force mechanism slot generally aligned with the flexure axis and sized to snuggly fit the flexure force mechanism between a slot wall at one end of the flexure force mechanism slot and the flexure body at the other end of the flexure force mechanism slot. The force mechanism may pre-stress the flexure. The mirror may be a grating. The grating may have a metallic reflective surface and a protective coating over the reflective coating comprising a dense glassy material that is essentially non-porous to undesired contaminants exposure of which to the reflective coating is desired to be prevented, which may comprise an amorphous silica, a doped amorphous silica, which may be halide doped and the halide may be fluorine. The grating may be actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge.
    • 公开了一种高功率窄带,高重复率激光光源光学改进装置和方法,其可以包括快速移动的可角度定位的调谐镜,其包括:反射镜安装框架,其包括第一材料和相对平坦的安装表面区域; 反射光学元件,包括具有不同于所述安装框架的第一材料的热膨胀系数的第二材料; 在安装框架和安装框架表面上的反射光学器件之间的至少两个连接附接点; 以及形成在所述安装框架中的至少一个弯曲安装座,所述至少一个弯曲安装件在弯曲轴线上柔性,所述弯曲轴线对应于所述安装框架和所述反射式光学器件的热膨胀的纵向轴线,所述热膨胀轴线位于所述至少两个连接点中的一个上。 挠曲安装件可以包括:由反射镜安装框架的材料形成并且与镜面安装框架的材料分离的弯曲体,以允许挠曲件和反射镜安装框架之间的相对移动; 至少一个弯曲臂由反射镜安装框架的材料形成并且在一端附接到反射镜安装框架,另一端连接到弯曲部。 该装置和方法还可以包括由第二材料制成的挠曲力机构或具有与第二材料基本上相同的热膨胀系数的第三材料; 所述挠曲力机构包括细长杆; 弯曲力机构槽通常与弯曲轴线对准并且尺寸设计成使挠曲力机构紧贴在弯曲力机构槽的一端处的狭槽壁和弯曲力机构槽的另一端处的挠曲体之间。 力机构可以预应力挠曲。 镜子可能是光栅。 光栅可以具有金属反射表面并且在反射涂层上方具有保护涂层,该保护涂层包含致密的玻璃质材料,其基本上是无孔的,以期望防止对反射涂层的不期望的污染物暴露,其可以包含无定形二氧化硅, 掺杂的无定形二氧化硅,其可以是卤化物掺杂的,并且卤化物可以是氟。 可以使用电磁感应元件或磁敏元件来主动调谐光栅。 反射层中金属的氧化物可以通过氢气清除来除去。
    • 8. 发明申请
    • DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE
    • 排放生产等离子体光源
    • WO2004081503A2
    • 2004-09-23
    • PCT/US2004/006551
    • 2004-03-03
    • CYMER, INC.PARTLO, William, N.BLUMENSTOCK, Gerry, M.BOWERING, NorbertBRUZZONE, Kent, A.COBB, Dennis, W.DYER, Timothy, S.DUNLOP, JohnFOMENKOV, Igor, V.HYSHAM, James, ChristopherOLIVER, Roger, I.PALENSCHAT, Frederick, A.PAN, Xiaojiang, J.RETTIG, Curtis, L.SIMMONS, Rodney, S.WALKER, JohnWEBB, Kyle, R.HOFMANN, Thomas
    • PARTLO, William, N.BLUMENSTOCK, Gerry, M.BOWERING, NorbertBRUZZONE, Kent, A.COBB, Dennis, W.DYER, Timothy, S.DUNLOP, JohnFOMENKOV, Igor, V.HYSHAM, James, ChristopherOLIVER, Roger, I.PALENSCHAT, Frederick, A.PAN, Xiaojiang, J.RETTIG, Curtis, L.SIMMONS, Rodney, S.WALKER, JohnWEBB, Kyle, R.HOFMANN, Thomas
    • G01J
    • H01S3/005B82Y10/00G03F7/70033G03F7/70166G03F7/70175G03F7/70908G03F7/70916H01S3/225H05G2/003H05G2/005H05H1/06
    • An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO 2 . The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.
    • 公开了一种DPP EUV源,其可以包括使用从离开等离子体的碎片产生金属卤化物的金属卤素气体的碎片减缓装置。 EUV源可以具有碎片屏蔽,其可以包括多个曲线屏蔽构件,其具有通过与焦点对准的光通道连接的内表面和外表面,该屏蔽构件可以与它们之间的开放空间交替,并且可以具有形成 在一个旋转轴上的圆圈和另一个轴上的椭圆。 电极可以被供给放电脉冲,该放电脉冲在放电的轴向耗尽阶段期间产生适度的电流,并且在放电的径向压缩阶段期间发生峰值。 光源可以包括涡轮分子泵,其具有连接到发电室的入口,并且可操作以比来自该室的缓冲气体优先地泵送更多的源气体。 源可以包括调谐的导电电极,包括:掺杂在第一区域中以至少选择电导率的差分掺杂陶瓷材料,并且在第二区域中至少选择导热性。 第一区域可以在电极结构的外表面处或附近,并且陶瓷材料可以是SiC或氧化铝,并且掺杂剂是BN或包括SiO或TiO 2的金属氧化物。 源可以包括可移动电极组件安装件,其可操作以将电极组件安装座从更换位置移动到操作位置,可移动安装件在波纹管上。 源可以具有可操作地连接到收集器的温度控制机构,并且可操作地调节相应壳体部件的温度,以保持温度相关几何形状优化来自相应外壳部件的入射反射的扫掠角,或机械定位器 壳成员。 壳可能会被电压偏置。 可以使用离焦激光辐射来制造碎片屏蔽。 阳极可以用限定两个冷却剂通道或限定通道的多孔金属的中空内部冷却。 碎片屏蔽可以由连接到安装环或轮毂的多个大的,中间的和小的翅片形成,或者彼此具有提供均匀分离和强化并且不阻挡任何显着量的光的互锁突起。