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1. 发明申请

WO2007097855A2 ACTIVE SPECTRAL CONTROL OF DUV LIGHT SOURCE 审中-公开
标题翻译： DUV光源的主动光谱控制
公开(公告)号：WO2007097855A2
公开(公告)日：2007-08-30
申请号：PCT/US2007001667
申请日：2007-01-22
申请人： CYMER INC , DUNSTAN WAYNE J , JACQUES ROBERT N , RAO RAJASEKHAR M , TRINTCHOUK FEDOR B
发明人： DUNSTAN WAYNE J , JACQUES ROBERT N , RAO RAJASEKHAR M , TRINTCHOUK FEDOR B
IPC分类号： H01S3/13
CPC分类号： H01S3/13 , G03F7/70575 , H01S3/134 , H01S3/136
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output light pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.
摘要翻译：根据所公开主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出光脉冲带宽的带宽测量模块由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。

2. 发明申请

WO2011126992A1 METHOD AND APPARATUS FOR CONTROLLING LIGHT BANDWIDTH 审中-公开
标题翻译：控制光束带宽的方法和装置
公开(公告)号：WO2011126992A1
公开(公告)日：2011-10-13
申请号：PCT/US2011/031116
申请日：2011-04-04
申请人： CYMER, INC. , O'BRIEN, Kevin, M. , TRINTCHOUK, Fedor, B.
发明人： O'BRIEN, Kevin, M. , TRINTCHOUK, Fedor, B.
IPC分类号： H01S3/10
CPC分类号： H01S3/2308 , H01S3/134 , H01S3/225
摘要： An apparatus includes a light source that produces a light beam, a bandwidth measurement system, a plurality of bandwidth actuation systems, and a control system. Each bandwidth actuation system includes one or more bandwidth actuators and each bandwidth actuation system is connected to an optical feature that is optically coupled to the produced light beam and operable to modify the connected optical feature to select a bandwidth within a bandwidth range of the produced light beam. The control system is connected to the bandwidth measurement system and to the plurality of bandwidth actuation systems. The control system is configured to switch between activating and operating a first bandwidth actuation system and activating and operating a second bandwidth actuation system independently and separately of activating and operating the first bandwidth actuation system based on a provided bandwidth measurement and a selected target bandwidth.
摘要翻译：一种装置包括产生光束的光源，带宽测量系统，多个带宽致动系统和控制系统。每个带宽致动系统包括一个或多个带宽致动器，并且每个带宽致动系统连接到光学特征，该光学特征光学地耦合到所产生的光束并且可操作以修改所连接的光学特征，以在所产生的光的带宽范围内选择带宽光束。控制系统连接到带宽测量系统和多个带宽致动系统。控制系统被配置为在激活和操作第一带宽致动系统之间切换，并且基于所提供的带宽测量和所选择的目标带宽，独立且独立地激活和操作第一带宽致动系统来激活和操作第二带宽致动系统。

3. 发明申请

WO2005104313A3 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 审中-公开
标题翻译：气体放电激光室改进
公开(公告)号：WO2005104313A3
公开(公告)日：2007-02-01
申请号：PCT/US2005007168
申请日：2005-03-03
申请人： CYMER INC , PARTLO WILLIAM N , AMADA YOSHIHO , CARMICHAEL JAMES A , DYER TIMOTHY S , GILLESPIE WALTER D , MOOSMAN BRYAN G , RETTIG CURTIS L , STRATE BRIAN D , STEIGER THOMAS D , TRINTCHOUK FEDOR B , UJAZDOWSKI RICHARD C
发明人： PARTLO WILLIAM N , AMADA YOSHIHO , CARMICHAEL JAMES A , DYER TIMOTHY S , GILLESPIE WALTER D , MOOSMAN BRYAN G , RETTIG CURTIS L , STRATE BRIAN D , STEIGER THOMAS D , TRINTCHOUK FEDOR B , UJAZDOWSKI RICHARD C
IPC分类号： H01S3/22 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/225
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.
摘要翻译：如果公开的方法和装置，其可以包括高功率高重复率气体放电激光UV光源，其可以包括：气体放电室，其包括包括垂直壁和相邻底壁的内壁; 气体循环风扇，其产生邻近内部垂直壁和相邻底壁的气体流动路径; 室内除尘器定位了低气流区域，其可以沿着内壁并且可以包括至少一个网状筛网，例如多个网状筛网，其可以包括至少两个不同的规格网状筛网。除尘器可以沿着室的底部内壁和/或内壁的垂直部分延伸。除尘器可以包括具有第一量规的第一网状筛网; 第二网状筛，其具有小于第一量规的第二规格; 并且第二网状屏幕在第一网状筛网和内壁之间。腔室可以包括在腔室的垂直内壁和底壁中的至少一个中的多个集尘凹部，其可以从包括一部分凹部和多部分凹部的组中选择，该组包括两个凹部相对于彼此成角度的部分。除尘器可以包括定位在主绝缘体的一部分和室的内壁之间的压力阱。该腔室可包括气体循环风扇，其包括具有风扇切断装置的横流风扇，其可包括涡流控制口袋。所述腔室可以包括预除垢机构，其包括在所述预分离管内的细长开口内包含接地棒的预除菌槽，所述前置离子槽可以包括柔顺构件，自动预除电切断机构，预电离起始控制机构和/或聚焦元件。腔室可以包括细长的挡板，该挡板可以包括多个金字塔形结构，包括不同数量的通常为锥体的元件，并且以不同数量的大致金字塔形元件组成并且沿纵向轴线并且横向于纵向轴线定向。腔内的声共振也可以通过将人造钳工器引入激光放电的定时中，从而在脉冲串内从脉冲到脉冲随机地或以重复模式改变脉冲间周期。

4. 发明申请

WO2005104313A2 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 审中-公开
标题翻译：气体放电激光室改进
公开(公告)号：WO2005104313A2
公开(公告)日：2005-11-03
申请号：PCT/US2005/007168
申请日：2005-03-03
申请人： CYMER, INC. , PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
发明人： PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.
摘要翻译：如果公开的方法和装置，其可以包括高功率高重复率气体放电激光器UV光源，其可以包括：气体放电室，其包括包括垂直壁和相邻底壁的内壁; 气体循环风扇，其产生邻近内部垂直壁和相邻底壁的气体流动路径; 室内除尘器定位低气流区域，其可以沿着内壁并且可以包括至少一个网状筛网，例如多个网状筛网，其可以包括至少两个不同的规格网状筛网。除尘器可以沿着室的底部内壁和/或内壁的垂直部分延伸。除尘器可以包括具有第一量规的第一网状筛网; 第二网眼屏幕，其具有小于第一规格的第二规格; 并且第二网状屏幕在第一网状筛网和内壁之间中间。腔室可以包括在腔室的垂直内壁和底壁中的至少一个中的多个集尘凹部，其可以从包括一部分凹部和多部分凹部的组中选择，该组包括两个相对于彼此成角度的部分。除尘器可以包括定位在主绝缘体的一部分和室的内壁之间的压力阱。该腔室可以包括气体循环风扇，其包括具有风扇切断装置的横流风扇，其可以包括涡流控制袋。所述腔室可以包括预电离机构，其包括在所述预电离管内的细长开口内包含接地棒的前置离子槽，其可以包括柔顺构件，自动预除电切断机构，预电离起始控制机构和/或聚焦元件。腔室可以包括细长的挡板，其可以包括多个金字塔结构，其包括不同数量的大体锥体元件，并且以不同数量的大体锥体元件组成并且沿纵向轴线并且横向于纵向轴线定向。通过将人工钳位器引入激光放电的定时，也可以通过在脉冲串内从脉冲到脉冲随机地或以重复模式改变脉冲周期的时间来减小腔室内的声共振。

5. 发明申请

WO2007097855A3 ACTIVE SPECTRAL CONTROL OF DUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2007097855A3
公开(公告)日：2007-08-30
申请号：PCT/US2007/001667
申请日：2007-01-22
申请人： CYMER, INC. , DUNSTAN, Wayne, J. , JACQUES, Robert, N. , RAO, Rajasekhar, M. , TRINTCHOUK, Fedor, B.
发明人： DUNSTAN, Wayne, J. , JACQUES, Robert, N. , RAO, Rajasekhar, M. , TRINTCHOUK, Fedor, B.
IPC分类号： H01L21/00
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output light pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.

6. 发明申请

WO2006060361A2 METHOD AND APPARATUS FOR GAS DISCHARGE LASER BANDWIDTH AND CENTER WAVELENGTH CONTROL 审中-公开
标题翻译：气体放电激光带宽和中心波长控制的方法和装置
公开(公告)号：WO2006060361A2
公开(公告)日：2006-06-08
申请号：PCT/US2005/043059
申请日：2005-11-28
申请人： CYMER, INC. , TRINTCHOUK, Fedor, B. , JACQUES, Robert, N.
发明人： TRINTCHOUK, Fedor, B. , JACQUES, Robert, N.
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , B82Y10/00 , G03F7/70033 , G03F7/70041 , H01S3/08072 , H01S3/097 , H01S3/10069 , H01S3/225
摘要： A gas discharge laser system bandwidth control mechanism and method of operation for controlling bandwidth in a laser output light pulse generated in the gas discharge laser system is disclosed which may comprise a bandwidth controller which may comprise an active bandwidth adjustment mechanism; a controller actively controlling the active bandwidth adjustment mechanism utilizing an algorithm implementing bandwidth thermal transient correction based upon a model of the impact of laser system operation on the wavefront of the laser light pulse being generated and line narrowed in the laser system as it is incident on the bandwidth adjustment mechanism. The controller algorithm may comprises a function of the power deposition history in at least a portion of an optical train of the gas discharge laser system, e.g., a linear function, e.g., a combination of a plurality of decay functions each comprising a respective decay time constant and a respective coefficient.
摘要翻译：公开了一种气体放电激光器系统带宽控制机构和用于控制在气体放电激光器系统中产生的激光输出光脉冲中的带宽的操作方法，其可以包括带宽控制器，其可以包括有源带宽调整机构; 控制器主动地控制有源带宽调整机制，利用实现带宽热瞬变校正的算法，该算法基于激光系统操作对激光系统中产生的激光光脉冲的波前的影响的模型，并且在激光系统中入射时产生线窄带宽调整机制。控制器算法可以包括在气体放电激光系统的光学系列的至少一部分中的功率沉积历史的功能，例如线性函数，例如多个衰减函数的组合，每个衰减函数包括相应的衰减时间常数和相应的系数。

7. 发明申请

WO2006039157A2 MULTI-CHAMBERED EXCIMER OR MOLECULAR FLUORINE GAS DISCHARGE LASER FLUORINE INJECTION CONTROL 审中-公开
标题翻译：多层离子注射器或分子荧光体排放激光器氟注射控制
公开(公告)号：WO2006039157A2
公开(公告)日：2006-04-13
申请号：PCT/US2005/033754
申请日：2005-09-19
申请人： CYMER, INC. , BESAUCELE, Herve, A. , DUNSTAN, Wayne, J. , ISHIHARA, Toshihiko , JACQUES, Robert, N. , TRINTCHOUK, Fedor, B.
发明人： BESAUCELE, Herve, A. , DUNSTAN, Wayne, J. , ISHIHARA, Toshihiko , JACQUES, Robert, N. , TRINTCHOUK, Fedor, B.
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/036 , H01S3/225 , H01S3/2316 , H01S3/2366
摘要： A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and the at least one amplifier chamber, and producing an output representative of an estimated halogen gas consumption in the at least one oscillator chamber and of the halogen gas consumption in the at least one amplifier chamber, and a halogen gas injection controller determining the amount of halogen gas injection for the at least one oscillator chamber and the at least one amplifier chamber based upon the estimated fluorine consumption outputs from the fluorine consumption estimator and a cost function comprising a plurality of weighted injection decision determinations.
摘要翻译：一种多腔准分子或分子卤素气体放电激光系统，包括至少一个振荡器室和至少一个产生振荡器的放大器室输出在至少一个功率室中放大的激光脉冲，具有氟注入控制系统和方法其中可以包括：卤素气体消耗估计器：基于至少一个振荡器之一的至少一个振荡器中的至少一个振荡器的至少一个振荡器的至少第一操作参数来估计在所述至少一个振荡器腔中的一个中消耗的卤素气体的量室和至少一个放大器室，以及所述至少一个振荡器室和所述至少一个放大器室的第二操作参数之间的差异，以及估计至少在另一个中消耗的卤素气体的量基于所述至少一个的另一个的至少第三操作参数，一个振荡器室和所述至少一个放大器室 e振荡器室和所述至少一个放大器室，并且产生代表所述至少一个振荡器室中的估计的卤素气体消耗量的输出和所述至少一个放大器室中的卤素气体消耗量，以及卤素气体注入控制器确定基于来自氟消耗估计器的估计的氟消耗量输出和包括多个加权喷射判定确定的成本函数，至少一个振荡室和至少一个放大器室的卤素气体喷射量。

8. 发明申请

WO2006060361A3 METHOD AND APPARATUS FOR GAS DISCHARGE LASER BANDWIDTH AND CENTER WAVELENGTH CONTROL 审中-公开
标题翻译：气体放电激光带宽和中心波长控制的方法和装置
公开(公告)号：WO2006060361A3
公开(公告)日：2009-04-16
申请号：PCT/US2005043059
申请日：2005-11-28
申请人： CYMER INC , TRINTCHOUK FEDOR B , JACQUES ROBERT N
发明人： TRINTCHOUK FEDOR B , JACQUES ROBERT N
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/1055 , B82Y10/00 , G03F7/70033 , G03F7/70041 , H01S3/08072 , H01S3/097 , H01S3/10069 , H01S3/225
摘要： A gas discharge laser system bandwidth control mechanism and method of operation for controlling bandwidth in a laser output light pulse generated in the gas discharge laser system is disclosed which may comprise a bandwidth controller which may comprise an active bandwidth adjustment mechanism; a controller actively controlling the active bandwidth adjustment mechanism utilizing an algorithm implementing bandwidth thermal transient correction based upon a model of the impact of laser system operation on the wavefront of the laser light pulse being generated and line narrowed in the laser system as it is incident on the bandwidth adjustment mechanism. The controller algorithm may comprises a function of the power deposition history in at least a portion of an optical train of the gas discharge laser system, e.g., a linear function, e.g., a combination of a plurality of decay functions each comprising a respective decay time constant and a respective coefficient.
摘要翻译：公开了一种气体放电激光器系统带宽控制机构和用于控制在气体放电激光器系统中产生的激光输出光脉冲中的带宽的操作方法，其可以包括带宽控制器，其可以包括有源带宽调整机构; 控制器主动地控制有源带宽调整机制，利用实现带宽热瞬变校正的算法，该算法基于激光系统操作对激光系统中产生的激光光脉冲的波前的影响的模型，并且在激光系统中入射时产生线窄带宽调整机制。控制器算法可以包括在气体放电激光系统的光学系列的至少一部分中的功率沉积历史的功能，例如线性函数，例如多个衰减函数的组合，每个衰减函数包括相应的衰减时间常数和相应的系数。

9. 发明申请

WO2006039157A3 MULTI-CHAMBERED EXCIMER OR MOLECULAR FLUORINE GAS DISCHARGE LASER FLUORINE INJECTION CONTROL 审中-公开
标题翻译：多层离子注射器或分子荧光体排放激光器氟注射控制
公开(公告)号：WO2006039157A3
公开(公告)日：2008-02-07
申请号：PCT/US2005033754
申请日：2005-09-19
申请人： CYMER INC , BESAUCELE HERVE A , DUNSTAN WAYNE J , ISHIHARA TOSHIHIKO , JACQUES ROBERT N , TRINTCHOUK FEDOR B
发明人： BESAUCELE HERVE A , DUNSTAN WAYNE J , ISHIHARA TOSHIHIKO , JACQUES ROBERT N , TRINTCHOUK FEDOR B
IPC分类号： H01S3/22 , H01S3/036 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/036 , H01S3/225 , H01S3/2316 , H01S3/2366
摘要： A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and the at least one amplifier chamber, and producing an output representative of an estimated halogen gas consumption in the at least one oscillator chamber and of the halogen gas consumption in the at least one amplifier chamber, and a halogen gas injection controller determining the amount of halogen gas injection for the at least one oscillator chamber and the at least one amplifier chamber based upon the estimated fluorine consumption outputs from the fluorine consumption estimator and a cost function comprising a plurality of weighted injection decision determinations.
摘要翻译：一种多室准分子或分子卤素气体放电激光系统，包括至少一个振荡器室和至少一个产生振荡器的放大器室输出在至少一个功率室中放大的激光脉冲，具有氟注入控制系统和方法公开了它们，其可以包括：卤素气体消耗估计器：基于至少一个振荡器之一的至少一个振荡器中的至少一个的至少一个振荡器的至少第一操作参数来估计在至少一个振荡器室中的一个中消耗的卤素气体的量室和所述至少一个放大器室，以及所述至少一个振荡器室和所述至少一个放大器室的第二操作参数之间的差异，以及估计至少在另一个中消耗的卤素气体的量基于所述至少一个的另一个的至少第三操作参数，一个振荡器室和所述至少一个放大器室 e振荡器室和所述至少一个放大器室，并且产生代表所述至少一个振荡器室中的估计的卤素气体消耗的值和在所述至少一个放大器室中的卤素气体消耗的输出，以及卤素气体注入控制器确定基于来自氟消耗估计器的估计的氟消耗量输出和包括多个加权喷射判定确定的成本函数，至少一个振荡室和至少一个放大器室的卤素气体注入量。

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