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1. 发明申请

WO2014170093A3 RADIATION COLLECTOR, COOLING SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：辐射收集器，冷却系统和光刻设备
公开(公告)号：WO2014170093A3
公开(公告)日：2015-01-22
申请号：PCT/EP2014055870
申请日：2014-03-24
申请人： ASML NETHERLANDS BV
发明人： VANDERHALLEN IVO , STRUYCKEN ALEXANDER , FRANKEN JOHANNES
IPC分类号： G03F7/20
CPC分类号： G02B19/0023 , G02B5/09 , G02B5/10 , G02B7/1815 , G02B19/009 , G02B27/0006 , G03F7/70033 , G03F7/70175 , G03F7/70575 , G03F7/70891 , G03F7/7095
摘要： A radiation collector (141) comprising a plurality of reflective surfaces (400-405), wherein each of the plurality of reflective surfaces is coincident with part of one of a plurality of ellipsoids (40-45), wherein the plurality of ellipsoids have in common a first focus (12) and a second focus (16), each of the plurality of reflective surfaces coincident with a different one of the plurality of ellipsoids, wherein the plurality of reflective surfaces are configured to receive radiation originating from the first focus (12) and reflect the radiation to the second focus (16). An apparatus (820) shown in figure 11 comprising a cooling system (832) and a reflector (831), wherein the cooling system is configured to cool the reflector, the cooling system comprising: a porous structure (823) situated in thermal contact with the reflector, wherein the porous structure is configured to receive a coolant in a liquid phase state; a condenser (825) configured to receive coolant from (826) the porous structure in a vapour phase state, condense the coolant thereby causing the coolant to undergo a phase change to a liquid phase state and output the condensed coolant in the liquid phase state for entry (827) into the porous structure.
摘要翻译：一种辐射收集器（141），包括多个反射表面（400-405），其中所述多个反射表面中的每一个与多个椭圆体（40-45）中的一个的一部分重合，其中所述多个椭圆体共同的第一焦点（12）和第二焦点（16），所述多个反射表面中的每一个与所述多个椭圆体中的不同的一个重合，其中所述多个反射表面被配置为接收源自所述第一焦点的辐射 12）并将辐射反射到第二焦点（16）。图11所示的装置（820）包括冷却系统（832）和反射器（831），其中所述冷却系统构造成冷却所述反射器，所述冷却系统包括：多孔结构（823），其与所述反射器，其中所述多孔结构被构造成接收处于液相状态的冷却剂; 冷凝器（825），被配置为以气相状态从（826）多孔结构接收冷却剂，冷凝冷却剂，从而使冷却剂经历相变至液相状态，并输出处于液相状态的冷凝的冷却剂进入（827）进入多孔结构。

2. 发明申请

WO2014170093A2 RADIATION COLLECTOR, RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：辐射收集器，辐射源和光刻设备
公开(公告)号：WO2014170093A2
公开(公告)日：2014-10-23
申请号：PCT/EP2014/055870
申请日：2014-03-24
申请人： ASML NETHERLANDS B.V.
发明人： VANDERHALLEN, Ivo , STRUYCKEN, Alexander , FRANKEN, Johannes
IPC分类号： G03F7/20
CPC分类号： G02B19/0023 , G02B5/09 , G02B5/10 , G02B7/1815 , G02B19/009 , G02B27/0006 , G03F7/70033 , G03F7/70175 , G03F7/70575 , G03F7/70891 , G03F7/7095
摘要： A radiation collector comprising a plurality of reflective surfaces, wherein each of the plurality of reflective surfaces is coincident with part of one of a plurality of ellipsoids, wherein the plurality of ellipsoids have in common a first focus and a second focus, each of the plurality of reflective surfaces coincident with a different one of the plurality of ellipsoids, wherein the plurality of reflective surfaces are configured to receive radiation originating from the first focus and reflect the radiation to the second focus.
摘要翻译：一种辐射收集器，包括多个反射表面，其中所述多个反射表面中的每一个与多个椭圆体中的一个反射表面的一部分重合，其中所述多个椭圆体具有共同的第一焦点和第二焦点，所述反射表面与所述多个椭圆体中的不同的椭圆体重合，其中所述多个反射表面被配置为接收源自所述第一焦点的辐射并将所述辐射反射到所述第二焦点。

3. 发明申请

WO2013083335A3 RADIATION SOURCE 审中-公开
标题翻译：辐射源
公开(公告)号：WO2013083335A3
公开(公告)日：2013-09-06
申请号：PCT/EP2012071688
申请日：2012-11-02
申请人： ASML NETHERLANDS BV
发明人： HOOGKAMP JAN , JANSEN BASTIAAN , WIJCKMANS MAURICE
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/7085 , H01J37/32339 , H01J2237/04 , H01J2237/327 , H05G2/005 , H05G2/008
摘要： A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of fuel droplets along a trajectory (140) towards a plasma formation location (212). The radiation source is configured to receive a first amount of radiation (205) such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location. The first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation (132). The radiation source further comprises an alignment detector having a first sensor arrangement (122) and a second sensor arrangement (134). The first sensor arrangement is configured to measure a property of a third amount of radiation (205a) that is indicative of a focus position of the first amount of radiation. The second sensor arrangement is configured to measure a property of a fourth amount of radiation (138), the fourth amount of radiation being a portion of the first amount of radiation that is reflected by the fuel droplet upon which the first amount of radiation is incident.
摘要翻译：适合于向光刻设备的照明器提供辐射束的辐射源（SO）。辐射源包括被配置为沿着轨迹（140）引导燃料液滴流朝向等离子体形成位置（212）的喷嘴（128）。辐射源被配置为接收第一量的辐射（205），使得在使用中，第一量的辐射入射在等离子体形成位置处的燃料液滴上。第一量的辐射将能量传递到燃料液滴以产生发射第二量的辐射的辐射产生等离子体（132）。辐射源还包括具有第一传感器装置（122）和第二传感器装置（134）的对准检测器。第一传感器装置被配置为测量指示第一辐射量的焦点位置的第三量的辐射（205a）的性质。第二传感器装置被配置成测量第四量的辐射（138）的性质，第四辐射量是被第一辐射量入射的燃料液滴反射的第一辐射量的一部分。

4. 发明申请

WO2011113591A3 OPTICAL COLLECTOR FOR COLLECTING EXTREME ULTRAVIOLET RADIATION, METHOD FOR OPERATING SUCH AN OPTICAL COLLECTOR, AND EUV SOURCE WITH SUCH A COLLECTOR 审中-公开
标题翻译：用于收集极端紫外线辐射的光学收集器，用于操作这种光学收集器的方法以及具有这种收集器的EUV源
公开(公告)号：WO2011113591A3
公开(公告)日：2011-12-01
申请号：PCT/EP2011001305
申请日：2011-03-16
申请人： ETH ZUERICH , DIETERICH FRANZ , ABHARI REZA , GIOVANNINI ANDREA , AGA VIPLUV
发明人： DIETERICH FRANZ , ABHARI REZA , GIOVANNINI ANDREA , AGA VIPLUV
IPC分类号： G03F7/20 , G02B5/10 , G02B7/18
CPC分类号： G03F7/70891 , B82Y10/00 , G03F7/70175 , G21K1/06 , G21K2201/061 , G21K2201/065
摘要： An optical collector (15) for collecting extreme ultraviolet radiation or EUV light generated at a central EUV production site comprises a reflective shell (25). To cope with the thermal loading of the collector and thereby avoid deformations, the reflective shell (25) preferably is mounted on and supported by a support structure (24), such that a cooling channel (29) is established between the back side of the reflective shell (25) and the support structure (24), the thickness of the reflective shell (25) is substantially reduced, such that the convective heat transfer between the back side of the reflective shell (25) and a cooling medium (26) flowing through the cooling channel (29) dominates the process of removing heat from the reflective shell (25) with respect to heat conduction, and a cooling circuit (33) is connected to the cooling channel (29) to supply a cooling medium (26) to the cooling channel (29) with a controlled coolant pressure and/or mass flow.
摘要翻译：用于收集在中央EUV生产现场产生的极紫外辐射或EUV光的光学收集器（15）包括反射壳（25）。为了应对集热器的热负荷并由此避免变形，反射壳体（25）优选地安装在支撑结构（24）上并由支撑结构（24）支撑，使得冷却通道（29）建立在支撑结构（25）和所述支撑结构（24）之间的厚度，所述反射壳体（25）的厚度基本上减小，使得所述反射壳体（25）的背侧和冷却介质（26）之间的对流传热，流过冷却通道29的过程支配着从反射壳25去除热量相对于热传导的过程，并且冷却回路33与冷却通道29连接以供应冷却介质26 ）以受控的冷却剂压力和/或质量流量流到冷却通道（29）。

5. 发明申请

WO2011114887A1 極端紫外光光源装置における照度分布検出方法および集光光学手段の位置調整方法审中-公开
标题翻译：极光紫外光源装置中的辐射分布检测方法和用于光聚焦光学装置的位置调整方法
公开(公告)号：WO2011114887A1
公开(公告)日：2011-09-22
申请号：PCT/JP2011/054757
申请日：2011-03-02
申请人：ウシオ電機株式会社 , 山谷大樹
发明人：山谷　大樹
IPC分类号： H01L21/027 , G03F7/20 , H05G2/00
CPC分类号： G03F7/7085 , G03F7/70033 , G03F7/70175 , G03F7/70308 , H05G2/001 , H05G2/005
摘要：　極端紫外光光源装置の中間集光点以降における照度分布特性が悪化したことをリアルタイムで検知すると共に、悪化した照度分布を修正できるようにすること。　ＥＵＶ光源装置において、中間集光点ｆに集光しないＥＵＶ光を検知する円筒形状の検知手段２０を設ける。中間集光点ｆに集光するＥＵＶ光は、検知手段２０の開口２０ａを通過するので、露光処理中あっても中間集光点ｆに集光しないＥＵＶ光を検知することができる。中間集光点ｆに集光されないＥＵＶ光の照度分布は、集光点ｆに集光して露光機内に入射するＥＵＶ光の照度分布と相関しているので、上記検知手段２０により得られたＥＵＶ光の照度分布の悪化から、集光点ｆに集光するＥＵＶ光の照度分布の悪化を知ることができる。また、上記ＥＵＶ光の照度分布が良くなるように、集光鏡６を移動させることにより、露光機内に入射するＥＵＶ光の照度分布を改善することができる。
摘要翻译：公开了一种极紫外（EUV）光源装置，其在EUV光源装置中的中央焦点处或超越后，当辐照度分布特性恶化时能够实时检测，并且可以校正恶化的辐照度分布。在EUV光源装置中，安装圆柱形检测装置（20），用于检测不聚焦在中间焦点（f）上的EUV光束。聚焦在中间焦点（f）上的EUV光束通过检测装置（20）的开口（20a），因此即使在曝光处理期间也可以检测到不聚焦在中心焦点（f）上的EUV光束。不聚焦在中心焦点（f）的EUV光束的照射分布与聚焦在焦点（f）上并进入曝光机的EUV光束的照射分布相关; 因此，通过上述检测装置（20）获得的EUV波束的照射分布的恶化，可以知道聚焦在焦点（f）上的EUV波束的照射分布的恶化。此外，通过移动聚光镜（6）可以改善进入曝光机的EUV光束的照射分布，从而改善上述EUV光束的照射分布。

6. 发明申请

WO2008012111B1 MULTI-REFLECTION OPTICAL SYSTEMS AND THEIR FABRICATION 审中-公开
标题翻译：多反射光学系统及其制造
公开(公告)号：WO2008012111B1
公开(公告)日：2008-03-20
申请号：PCT/EP2007006736
申请日：2007-07-30
申请人： MEDIA LARIO SRL , ZOCCHI FABIO , BENEDETTI ENRICO
发明人： ZOCCHI FABIO , BENEDETTI ENRICO
IPC分类号： G03F7/20 , G02B17/00
CPC分类号： G03F7/70233 , B82Y10/00 , G02B17/06 , G03F7/70166 , G03F7/70175 , G21K1/06 , G21K2201/064
摘要： A reflective optical system, in which radiation from a radiation source (e.g. laser produced plasma, or source at infinity) is directed to an image focus or intermediate focus, comprising: one or more mirrors (symmetric about the optical axis), the or each mirror having at least first and second reflective surfaces whereby, in use, radiation from the source undergoes successive grazing incidence reflections in an optical path at said first and second reflective surfaces; and wherein said at least first and second reflective surfaces are formed such that the angles of incidence of said successive grazing incidence reflections at said first and second reflective surfaces are substantially equal. A formula for the preferred geometry of the reflective surface is disclosed. The or each mirror may be formed as an electroformed monolithic component, wherein the first and second reflective surfaces are each provided on a respective one of two contiguous sections of the mirror. The reflective optical system may be embodied in a collector optical system for EUV lithography, or in an EUV or X-ray telescope or imaging optical system.
摘要翻译：反射光学系统，其中来自辐射源（例如，激光产生的等离子体或无限远的源）的辐射被引导到图像焦点或中间焦点，包括：一个或多个反射镜（关于光轴对称），或者每个反射镜具有至少第一和第二反射表面，由此在使用中，来自源的辐射在所述第一和第二反射表面处的光路中经历连续的掠入射反射; 并且其中所述至少第一和第二反射表面形成为使得在所述第一和第二反射表面处的所述连续掠入射反射的入射角基本相等。公开了用于反射表面的优选几何形状的公式。该或每个反射镜可以形成为电铸单块部件，其中第一和第二反射表面各自设置在反射镜的两个相邻部分中的相应的一个上。反射光学系统可以体现在用于EUV光刻的收集器光学系统中，或者在EUV或X射线望远镜或成像光学系统中。

7. 发明申请

WO2007148968A2 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND RADIATION COLLECTOR 审中-公开
标题翻译：光刻设备，器件制造方法和放射收集器
公开(公告)号：WO2007148968A2
公开(公告)日：2007-12-27
申请号：PCT/NL2007/050295
申请日：2007-06-19
申请人： ASML NETHERLANDS B.V. , BOX, Wilhelmus, Josephus , VOORMA, Harm-Jan , FRIJNS, Olav, Waldemar, Vladimir , LIMPENS, Maurice, Piërre, Marie, Arthur
发明人： BOX, Wilhelmus, Josephus , VOORMA, Harm-Jan , FRIJNS, Olav, Waldemar, Vladimir , LIMPENS, Maurice, Piërre, Marie, Arthur
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , F24S10/90 , F24S23/70 , F24S40/50 , G02B7/1815 , G03F7/70175
摘要： A collector is disclosed that is constructed to receive radiation from a radiation source and to transmit radiation to an illumination system, the collector comprising a reflective element which is internally provided with a fluid channel.
摘要翻译：公开了一种收集器，其被构造为接收来自辐射源的辐射并将辐射传输到照明系统，该收集器包括内部设置有流体通道的反射元件。

8. 发明申请

WO2007051537A3 HIGH POWER EUV LAMP SYSTEM 审中-公开
标题翻译：高功率EUV灯系统
公开(公告)号：WO2007051537A3
公开(公告)日：2007-07-19
申请号：PCT/EP2006010187
申请日：2006-10-23
申请人： UNIV DUBLIN , O'REILLY FERGAL , HAYDEN PATRICK , O'SULLIVAN GERARD , DUNNE PADRAIG
发明人： O'REILLY FERGAL , HAYDEN PATRICK , O'SULLIVAN GERARD , DUNNE PADRAIG
IPC分类号： G21K1/06 , G02B5/10 , G03F7/20
CPC分类号： G03F7/70958 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G21K1/06 , H05G2/003 , H05G2/005
摘要： A system for providing extreme ultraviolet (EUV) radiation comprises a laser source arranged to produce a laser beam (12) having a focus; and a carrier (15) movable relative to the laser source for carrying a surface material, the surface material when carried by the carrier providing a renewable target edge (14). The focussed beam is arranged to impinge on the target edge to produce an EUV radiation emitting plasma (18). The system is cooperable with a mirror (28) for harnessing the EUV radiation by reflecting EUV radiation impinging thereon. The mirror comprises a substantially aspheric surface (32) and means for supplying a reflecting liquid (34) to at least partially coat the aspheric surface, the mirror being rotatable to centrifugally confine the liquid to the aspheric surface.
摘要翻译：用于提供极紫外（EUV）辐射的系统包括布置成产生具有焦点的激光束（12）的激光源; 以及相对于激光源可移动以承载表面材料的载体（15），所述表面材料在所述载体承载时提供可再生的目标边缘（14）。聚焦光束被布置成撞击目标边缘以产生EUV辐射发射等离子体（18）。该系统与用于通过反射入射在其上的EUV辐射来利用EUV辐射的反射镜（28）配合。反射镜包括基本非球面（32）和用于供应反射液体（34）以至少部分地涂覆非球面表面的装置，所述反射镜可旋转以将液体离心地限制在非球面上。

9. 发明申请

WO2005109104A2 OPTICAL COMPONENT HAVING AN IMPROVED THERMAL BEHAVIOR 审中-公开
标题翻译：具有改进的热行为的光学部件
公开(公告)号：WO2005109104A2
公开(公告)日：2005-11-17
申请号：PCT/EP2005004861
申请日：2005-05-04
申请人： EGLE WILHELM , ZEISS CARL LASER OPTICS GMBH , HAFNER WOLFGANG , ANDERL WILLI , BINGEL ULRICH , MUENZ HOLGER , NEIDHARDT THOMAS
发明人： EGLE WILHELM , HAFNER WOLFGANG , ANDERL WILLI , BINGEL ULRICH , MUENZ HOLGER , NEIDHARDT THOMAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70175 , G03F7/70858
摘要： An optical component is suggested, comprising at least one optically effective optical element which heats up when irradiated with light, and at least one holding element for the at least one optical element for holding the at least one optical element in a carrier structure, wherein the at least one optical element is connected to the at least one holding element in heat conducting fashion, and wherein the at least one holding element is at least partially provided with an active cooling system for carrying off heat from the at least one optical element.
摘要翻译：提出了一种光学部件，其包括至少一个在用光照射时加热的光学有效光学元件，以及至少一个用于至少一个光学元件的保持元件，用于将至少一个光学元件保持在载体结构中，其中至少一个光学元件以导热方式连接到所述至少一个保持元件，并且其中所述至少一个保持元件至少部分地设置有用于从所述至少一个光学元件传递热量的主动冷却系统。

10. 发明申请

WO2005091879A2 EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源
公开(公告)号：WO2005091879A2
公开(公告)日：2005-10-06
申请号：PCT/US2005005935
申请日：2005-02-24
申请人： CYMER INC , PARTLO WILLIAM N , BOWERING NORBERT R , ERSHOV ALEXANDER I , FOMENKOV IGOR V , OLIVER I ROGER , VIATELLA JOHN , JACQUES ROBERT N
发明人： PARTLO WILLIAM N , BOWERING NORBERT R , ERSHOV ALEXANDER I , FOMENKOV IGOR V , OLIVER I ROGER , VIATELLA JOHN , JACQUES ROBERT N
IPC分类号： G03F7/20 , G21K1/06 , H01J35/20 , H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.
摘要翻译：公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集光学元件具有限定期望的等离子体起始位置的焦点，包括：目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中，所述目标流轨迹来自所述目标流轨迹的成像速度摄像机太慢，不能成像形成被作为目标流轨迹成像的目标流的各个等离子体形成目标; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流轨道检测在大致垂直于目标流轨迹的至少一个轴上的目标流轨迹位置的误差。至少一个目标交叉检测器可以瞄准目标轨道并且检测等离子体形成目标通过目标轨道中的选定点的通过。驱动激光触发机构利用目标交叉检测器的输出来确定驱动激光触发的定时，以便驱动激光输出脉冲在等离子体引发目标处沿着目标轨道在一般最接近的等离子体起始位置处相交接近所需的等离子体引发位点。等离子体起始检测器可以瞄准目标轨道并且检测针对相应目标的等离子体起始位置沿着目标轨迹的位置。中间焦点照明器可以照亮形成在中间焦点处的孔，以对至少一个成像装置中的孔进行成像。所述至少一个成像装置可以是至少两个成像装置，每个成像装置基于对所述中间焦点的图像的图像的分析，提供与所述目标轨道与所述中间焦点的图像的垂直中心线轴线分离相关的误差信号所述至少两个成像装置。目标传送反馈和控制系统可以包括目标传送单元; 目标传送位移控制机构至少在对应于从第一成像装置中的图像的分析导出的第一位移误差信号的轴上移动目标传送机构，并且至少在与由第二位移误差信号对第二成像装置中的图像进行分析。

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