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1. 发明申请

WO2017127182A1 SYSTEM, METHOD AND APPARATUS FOR TARGET MATERIAL DEBRIS CLEANING OF EUV VESSEL AND EUV COLLECTOR 审中-公开
标题翻译：用于EUV容器和EUV收集器的目标材料碎屑清洁的系统，方法和设备
公开(公告)号：WO2017127182A1
公开(公告)日：2017-07-27
申请号：PCT/US2016/066412
申请日：2016-12-13
申请人： ASML NETHERLANDS B.V.
发明人： BAEK, Jonghoon , ABRAHAM, Mathew Cheeran , EVANS, David Robert , GAZZA, Jack Michael
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00 , B08B6/00
CPC分类号： H05G2/005 , G02B19/0095 , G02B27/0006 , G03F7/70033 , G03F7/70175 , G03F7/70925 , G03F7/70933 , H05G2/008
摘要： A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.
摘要翻译：在产生EUV光的同时移除目标材料碎片沉积物的系统和方法包括在EUV容器中原位产生氢自由基，靠近目标材料碎片沉积物并挥发目标材料碎片沉积物并吹扫来自EUV容器的挥发性目标材料碎屑沉积物在EUV容器中不需要含氧物质。

2. 发明申请

WO2017023950A2 CONTROLLED FLUID FLOW FOR CLEANING AN OPTICAL ELEMENT 审中-公开
标题翻译：用于清洁光学元件的控制流体流
公开(公告)号：WO2017023950A2
公开(公告)日：2017-02-09
申请号：PCT/US2016/045200
申请日：2016-08-02
申请人： ASML NETHERLANDS B.V.
发明人： DE DEA, Silvia , XIA, Chunguang , WILSON, Gregory, James , VERHOFF, Brandon, Wilson
IPC分类号： G03F7/20
CPC分类号： B08B5/02 , G01F1/00 , G03F7/70925 , G03F7/70933
摘要： A fluid is directed toward a surface of an optical element based on a first flow pattern, the surface of the optica! element including debris and the fluid directed based on the first flow pattern moving at least some of the debris to a first stagnation region at the surface of ths opficai eiement; and the fluid is directed toward the optical element based on a second flow pattern, the fluid directed based on the second flow pattern moving at least some of the debris to a second stagnation region on the surface of the optical element, the second stagnation region and the first stagnation region being different locations at the surface of the optical element. Directing the fluid toward the surface of the optical element based on the second flow pattern removes at least some of the debris from the first stagnation region.
摘要翻译：基于第一流动模式将流体指向光学元件的表面，光学元件的表面包括碎屑和基于第一流动图案引导的流体将至少一些碎片移动到第一流动区域的第一停滞区域; 并且基于第二流动图案将流体引向光学元件，基于第二流动图案指向的流体将至少一些碎片移动到光学元件的表面上的第二停滞区域，第二停滞区域和第一停滞区域是在光学元件的表面处不同的位置。基于第二流动模式将流体引导到光学元件的表面去除了来自第一停滞区域的至少一些碎屑。

3. 发明申请

WO2016083039A1 ENCODER, POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：编码器，位置测量系统和平面设备
公开(公告)号：WO2016083039A1
公开(公告)日：2016-06-02
申请号：PCT/EP2015/074515
申请日：2015-10-22
申请人： ASML NETHERLANDS B.V.
发明人： PRIL, Wouter, Onno , BAARTMAN, Jan, Peter , KOOIKER, Allard, Eelco , COSIJNS, Suzanne, Johanna, Antonetta, Geertruda , TONG-MINH, Bryan
IPC分类号： G01D5/38 , G03F7/20
CPC分类号： G01D5/38 , G01B9/02 , G01B11/02 , G03F7/70725 , G03F7/70775 , G03F7/70933
摘要： An encoder comprises an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second radiation beam. The optical component is arranged to combine the first radiation beam and the second radiation beam. The enclosing device is arranged to propagate the first radiation beam along a first path. The first path is between the first surface portion and the optical component. The enclosing device is arranged to propagate the second radiation beam along a second path. The second path is between the second surface portion and the optical component. The enclosing device is arranged to enclose a space, so as to isolate the first path and the second path from the ambient environment.
摘要翻译：编码器包括光学部件和具有第一表面部分和第二表面部分的封闭装置。第一表面部分布置成从环境环境接收第一辐射束。第二表面部分布置成从周围环境接收第二辐射束。光学部件布置成组合第一辐射束和第二辐射束。封闭装置布置成沿着第一路径传播第一辐射束。第一路径在第一表面部分和光学部件之间。包围装置被布置成沿着第二路径传播第二辐射束。第二路径在第二表面部分和光学部件之间。封闭装置被布置成包围空间，以便将第一路径和第二路径与周围环境隔离。

4. 发明申请

WO2016070189A1 APPARATUS AND METHODS FOR OPTICS PROTECTION FROM DEBRIS IN PLASMA-BASED LIGHT SOURCE 审中-公开
标题翻译：用于基于等离子体光源的DEBRIS的光学保护的装置和方法
公开(公告)号：WO2016070189A1
公开(公告)日：2016-05-06
申请号：PCT/US2015/058650
申请日：2015-11-02
申请人： KLA-TENCOR CORPORATION
发明人： KURITSYN, Alexey , LIU, Ye , KHODYKIN, Oleg , KANOUFF, Michael, P.
IPC分类号： H05H1/00 , H01J17/30
CPC分类号： G03F7/70033 , G03F7/70916 , G03F7/70933
摘要： Disclosed are methods and apparatus for generating an illumination beam. In one embodiment, the apparatus includes a vacuum chamber configured to hold a target material, an optical element positioned within the vacuum chamber or within a wall of such vacuum chamber, and an illumination source system for generating at least one excitation source that is focused on the target in the vacuum chamber for generating a plasma in the vacuum chamber so as to produce illumination radiation. The apparatus further includes a debris protection system for flowing gas out of a plurality of nozzles and away from the optical element at a velocity towards the plasma so as to prevent debris from reaching such optical element.
摘要翻译：公开了用于产生照明光束的方法和装置。在一个实施例中，该设备包括被配置为保持目标材料的真空室，定位在真空室内的光学元件或者在该真空室的壁内的真空室，以及用于产生至少一个激发源的照明源系统真空室中的目标，用于在真空室中产生等离子体，以产生照射辐射。该装置还包括用于使气体从多个喷嘴流出并以等离子体的速度远离光学元件的碎屑保护系统，以防止碎片到达这种光学元件。

5. 发明申请

WO2016058822A1 RADIATION SOURCE-COLLECTOR AND METHOD FOR MANUFACTURE 审中-公开
标题翻译：辐射源收集器及其制造方法
公开(公告)号：WO2016058822A1
公开(公告)日：2016-04-21
申请号：PCT/EP2015/072376
申请日：2015-09-29
申请人： ASML NETHERLANDS B.V.
发明人： VAN ZWOL, Pieter-Jan , KUZNETSOV, Alexey, Sergeevich , OSORIO OLIVEROS, Edgar , STEVENS, Lucas
IPC分类号： G21K1/06 , G03F7/20
CPC分类号： G21K1/062 , G03F7/70316 , G03F7/70916 , G03F7/70933 , G03F7/70958
摘要： A multilayer optics is configured for reflection of radiation having a wavelength λ, the multilayer optics comprising a multilayer stack (300) of alternating layer pairs, wherein each pair thereof comprises a first/second layer of thickness d1/d2, wherein a periodic length p=d1+d2 of each pair of alternating layers satisfies: m λ = 2 p sinΘ, wherein m = 1, 2, 3, etc. is an integer representing the order of the Bragg diffraction peak and Θ is the angle between an incident radiation and a scattering plane of the multilayer optics; a protective region (310) comprising pairs of alternating protective layers, each pair thereof comprising a first/second protective layer of thickness ds1/ds2, wherein a periodic length ps=ds1+ds2 of each pair of alternating protective layers satisfies: m λ = 2 ps sinΘ and ps = p N, wherein N is an integer equal or larger than 2. The multilayer mirror may optionally be provided with a capping layer (320). There is further disclosed an apparatus for extreme ultraviolet lithography comprising: a vacuum container comprising an optical element having an optically active surface, a gas supply system comprising a source of an anti-blistering gaseous mixture, an exhauster configured to exhaust gas in said vacuum container; wherein the gas supply system is arranged to provide the anti-blistering gaseous mixture at the optically active surface of the optical element, and wherein the anti-blistering gaseous mixture comprises an oxygen containing gas compound at a partial pressure ranging from 5e-8 to 1e-4 mbar.
摘要翻译：多层光学器件被配置用于反射具有波长λ的辐射，所述多层光学器件包括交替层对的多层堆叠（300），其中每对包括厚度为d1 / d2的第一/第二层，其中周期长度p 每对交替层的= d1 + d2满足：mλ= 2 psinθ，其中m = 1,2,3等是表示布拉格衍射峰的顺序的整数，Θ是入射辐射和多层光学器件的散射面; 包括交替保护层对的保护区域（310），每对保护层包括厚度为ds1 / ds2的第一/第二保护层，其中每对交替保护层的周期长度ps = ds1 + ds2满足：mλ= 2pssinΘ和ps = p N，其中N是等于或大于2的整数。多层反射镜可以可选地设置有覆盖层（320）。还公开了一种用于极紫外光刻的装置，包括：真空容器，其包括具有光学活性表面的光学元件，气体供应系统，其包括防起泡气体混合物源，排气器，其构造成在所述真空容器 ; 其中所述气体供应系统被布置成在所述光学元件的光学活性表面处提供所述防起泡气体混合物，并且其中所述防起泡气体混合物包含分压为5e-8至1e的含氧气体化合物 -4毫巴

6. 发明申请

WO2014052624A1 PARTICLE CONTROL NEAR RETICLE AND OPTICS USING SHOWERHEAD 审中-公开
标题翻译：使用SHOWERHEAD的附近的粒子控制和光学
公开(公告)号：WO2014052624A1
公开(公告)日：2014-04-03
申请号：PCT/US2013/061970
申请日：2013-09-26
申请人： KLA-TENCOR CORPORATION , SANDIA CORPORATION
发明人： DELGADO, Gildardo, R. , CHILESE, Frank , GARCIA, Rudy , TORCZYNSKI, John, R. , GELLER, Anthony, S. , RADER, Daniel, J. , KLEBANOFF, Leonard, E. , GALLIS, Michail, A.
IPC分类号： G01N21/33 , G01N21/15 , H01L21/66
CPC分类号： G03F7/70841 , G03F1/0092 , G03F1/84 , G03F7/70916 , G03F7/70933
摘要： A method and an apparatus to protect a reticle against particles and chemicals in an actinic EUV reticle inspection tool are presented. The method and apparatus utilizes a pair of porous metal diffusers in the form of showerheads to provide a continual flow of clean gas. The main showerhead bathes the reticle surface to be inspected in smoothly flowing, low pressure gas, isolating it from particles coming from surrounding volumes. The secondary showerhead faces away from the reticle and toward the EUV illumination and projection optics, supplying them with purge gas while at the same time creating a buffer zone that is kept free of any particle contamination originating from those optics.
摘要翻译：介绍了一种保护标线片免受光化性EUV标线检查工具中的颗粒和化学物质的方法和设备。该方法和装置利用一对淋浴喷头形式的多孔金属扩散器来提供清洁气体的连续流动。主喷头用平滑流动的低压气体将掩模版表面沐浴，将其与周围体积的颗粒隔离。二次淋浴头面向远离掩模版并朝向EUV照明和投影光学元件，为其提供吹扫气体，同时创建一个缓冲区，保持没有源自这些光学元件的任何颗粒污染。

7. 发明申请

WO2011162903A1 MASTER OSCILLATOR-POWER AMPLIFIER DRIVE LASER WITH PRE-PULSE FOR EUV LIGHT SOURCE 审中-公开
标题翻译：主振荡器功率放大器驱动激光器用于EUV光源的预脉冲
公开(公告)号：WO2011162903A1
公开(公告)日：2011-12-29
申请号：PCT/US2011/037793
申请日：2011-05-24
申请人： CYMER, INC. , HOU, Kai-chung , SANDSTROM, Richard, L , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V.
发明人： HOU, Kai-chung , SANDSTROM, Richard, L , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V.
IPC分类号： H01S3/00
CPC分类号： H01S3/0078 , G03F7/70033 , G03F7/70175 , G03F7/70908 , G03F7/70933 , H01S3/076 , H01S3/1055 , H01S3/117 , H01S3/2232 , H05G2/008
摘要： A device is described herein which may comprise an optical amplifier having a gain band including wavelengths λ 1 and λ 2 , with λ 1 ≠ λ 2 ; a pre-pulse seed laser having a tuning module for tuning a pre-pulse output to wavelength λ 1 ; a main pulse seed laser generating a laser output having wavelength, λ 2 ; and a beam combiner for directing the pre-pulse output and the main pulse output on a common path through the optical amplifier.
摘要翻译：本文描述了一种可以包括具有包括波长λ1和λ2的增益带的光放大器的装置，？2; 具有用于将预脉冲输出调谐到波长λ1的调谐模块的预脉冲种子激光器; 产生具有波长λ2的激光输出的主脉冲种子激光器; 以及用于将预脉冲输出和主脉冲输出引导到通过光放大器的公共路径上的光束组合器。

8. 发明申请

WO2009070013A1 A LITHOGRAPHIC APPARATUS, A PROJECTION SYSTEM AND A DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：平面设备，投影系统和设备制造方法
公开(公告)号：WO2009070013A1
公开(公告)日：2009-06-04
申请号：PCT/NL2008/050731
申请日：2008-11-18
申请人： ASML NETHERLANDS B.V. , VAN DE VIJVER, Yuri Johannes Gabriël , MOORS, Johannes Hubertus Josephina , VERSTEEG, Wendelin Johanna Maria , JONKERS, Peter Gerardus
发明人： VAN DE VIJVER, Yuri Johannes Gabriël , MOORS, Johannes Hubertus Josephina , VERSTEEG, Wendelin Johanna Maria , JONKERS, Peter Gerardus
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , G03F7/70841 , G03F7/70866 , G03F7/70883 , G03F7/70916
摘要： A lithographic apparatus (1) is disclosed that includes a projection system (7) configured to project a patterned radiation beam (9) onto a target portion of a substrate, a vacuum chamber (8) through which the patterned beam of radiation (9) is projected during use, and a purge (13, 16, 17) system configured to provide a purge gas flow in the chamber (8).
摘要翻译：公开了一种光刻设备（1），其包括投影系统（7），其配置成将图案化的辐射束（9）投影到基板的目标部分上;真空室（8），图案化的辐射束（9）并且被配置为在所述腔室（8）中提供净化气体流的吹扫（13,16,17）系统。

9. 发明申请

WO2008122335A2 APPARATUS FOR MEASUREMENT OF SUBSTRATES 审中-公开
标题翻译：测量基板的装置
公开(公告)号：WO2008122335A2
公开(公告)日：2008-10-16
申请号：PCT/EP2008001817
申请日：2008-03-07
申请人： ZEISS CARL SMS GMBH , STROESSNER ULRICH , KLOSE GERD , HOF ALBRECHT , FREY MONIKA
发明人： STROESSNER ULRICH , KLOSE GERD , HOF ALBRECHT , FREY MONIKA
IPC分类号： G03F7/20 , G03F1/00
CPC分类号： G03F7/70933 , G03F1/84 , G03F7/70775 , G03F7/70875
摘要： The invention relates to an apparatus for measurement of substrates, comprising a carrier (2) for receiving the substrate to be measured; a measurement objective which images onto a detector a portion of the substrate held by the carrier (2); a measurement device by which the position of the carrier (2) is imaged onto a detector (12); a measurement device by which the position of the carrier (2) holding the substrate is determined relative to the measurement objective, with the measurement device comprising at least one laser interferometer (5) for position determination; a first flushing device which passes a first flushing medium in a laminar flow through the apparatus for generating a constant measurement atmosphere, as well as an adjustment device by which the carrier (2) can be moved relative to the measurement objective. In such an apparatus, a second flushing device is provided which passes a second flushing medium through the region of the measurement device in which the at least one laser interferometer (5) is located.
摘要翻译：本发明涉及一种用于测量衬底的设备，包括用于接收待测衬底的载体（2）测量目标，其将由载体（2）保持的基板的一部分成像到检测器上; 测量装置，通过该测量装置将载体（2）的位置成像到检测器（12）上; 测量装置，通过该测量装置，相对于测量目标确定保持基板的载体（2）的位置，测量装置包括用于位置确定的至少一个激光干涉仪（5）; 第一冲洗装置，其使层流中的第一冲洗介质通过用于产生恒定测量气氛的装置，以及调节装置，通过该调节装置，载体（2）能够相对于测量目标移动。在这种装置中，提供第二冲洗装置，其通过第二冲洗介质穿过至少一个激光干涉仪（5）所在的测量装置的区域。

10. 发明申请

WO2008037384A3 PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE SYSTEM 审中-公开
标题翻译：投影曝光方法和投影曝光系统
公开(公告)号：WO2008037384A3
公开(公告)日：2008-06-26
申请号：PCT/EP2007008145
申请日：2007-09-19
申请人： ZEISS CARL SMT AG , KALLER JULIAN , GRUNER TORALF
发明人： KALLER JULIAN , GRUNER TORALF
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , G03F7/70191 , G03F7/70575 , G03F7/70941
摘要： In a projection exposure method primary radiation having a center wavelength ? is generated and guided through an illumination system along an illumination path and through a projection system along a projection path. The center wavelength is varied within a wavelength variation range ?? having a lower limit ? MIN = ? and an upper limit ? MAX > ?. A specific absorption coefficient k(?) of at least one gaseous absorbent species selected from the group consisting of oxygen (O 2 ), ozone (O 3 ) and water vapor (H 2 O) present in at least one gas-filled space along at least one of the illumination path and the projection path varies between a minimum absorption coefficient k MIN and a maximum absorption coefficient k MAX within the wavelength variation range such that an absorption ratio (k MAX / k MIN ) exceeds 10. A concentration of the absorbent species within the gas-filled space is controlled such that an overall absorption variation effected by the absorbent species for all rays running along different ray paths towards the image field is maintained below a predetermined absorption variation threshold value.
摘要翻译：在投影曝光方法中，具有中心波长λ 沿着照明路径被产生并引导通过照明系统，并沿着投影路径通过投影系统。中心波长在波长变化范围内变化具有下限？ =？和上限？最大值？至少一种选自氧（O 2 O 3），臭氧（O 3 3）和水蒸汽（O 3））的气态吸收物质的比吸收系数k（ω）沿着照明路径和投影路径中的至少一个存在于至少一个气体填充空间中的H 2 O 2 O在最小吸收系数k MIN和最大值之间变化吸收系数k max max在波长变化范围内，使得吸收比（k max / k MIN MIN）超过10。吸收剂的浓度控制气体填充空间内的物质，使得沿着沿着不同射线路径朝向图像场行进的所有射线的吸收物质的整体吸收变化保持在预定的吸收变化阈值以下。

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