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    • 6. 发明申请
    • METHOD OF PRODUCING SHORT-WAVE RADIATION FROM A GAS-DISCHARGE PLASMA AND DEVICE FOR IMPLEMENTING IT
    • 从气体放电等离子体产生短波辐射的方法及其实施装置
    • WO02007484A2
    • 2002-01-24
    • PCT/EP2001/007658
    • 2001-07-04
    • G21K1/00G21K5/00G21K5/02G21K7/00H01L21/027H05G2/00H05H1/06H05H1/24H05H1/00
    • H05G2/003H05G2/005
    • A method and apparatus produce short-wave radiation from a gas-discharge plasma, comprising pre-ionization of the gas in the discharge region between coaxial electrodes achieved through an axial aperture formed in one of the electrodes and initiation of a pinch-type discharge. In order to increase the efficiency, energy, average power and stability of the radiation of the gas-discharge plasma, pre-ionization is achieved by a flux of radiation having wavelengths from the UV to X-ray range and by a flux of accelerated electrons from the plasma of a pulsed sliding discharge initiated in a region not optically communicating with the axis of the pinch-type discharge, with a rate of growth of the discharge voltage across the region of more than 10 V/s, the fluxes of radiation and electrons being formed axially symmetrically and directed into the part of the discharge region outside the axis. In a device for implementing the method, the source of pre-ionization is disposed outside the discharge chamber and is designed in the form of an axially symmetrical system for forming a sliding discharge, said system comprising an elongated initiating electrode coated with a dielectric layer on the surface of which electrode a trigger electrode is disposed, the initiating electrode being arranged coaxially with the electrodes of the discharge chamber and formed in such a way that the dielectric layer is disposed in a region not optically communicating with the axis of the discharge chamber and one of the electrodes of the system for forming a sliding discharge being combined with one of the electrodes of the discharge chamber, a pulse generator being introduced into the device that has a rate of growth of output voltage of more than 10 V/s, the output of positive polarity of which is connected to the initiating electrode for forming the sliding discharge. A dielectric insert with an axial aperture can be introduced into the discharge chamber, on the surface of said insert there are disposed electrodes of the discharge chamber.
    • 一种用于由气体放电等离子体产生短波辐射的方法和设备,该气体放电等离子体由在通过轴向孔径获得的同轴电极之间的放电区域中的气体预电离 形成在其中一个电极中并触发撮式放电。 为了提高气体放电等离子体的效率,能量,平均功率和辐射稳定性,预电离由具有在UV辐射范围内的波长的辐射通量 来自等离子体的脉冲辉光放电的X射线和加速电子通量在与箍缩型放电的轴不光学连通的区域中触发,同时放电电压的增加 该区域大于10 11 V / s,辐射和电子流轴向对称地形成并且指向离轴放电区的离轴部分。 在用于执行该方法的装置中,预电离源位于放电室外部并被设计为轴对称系统以形成滑动放电,所述系统包括细长的触发电极 在其表面上设置有发射电极的电介质层上涂覆,发射电极与放电室的电极同轴布置并形成为使得电介质层被布置 在与放电室的轴线和系统的一个电极不光学连通的区域中,为了与放电室的一个电极形成组合的辉光放电,将脉冲发生器引入装置 其输出电压增加超过10 11 V / s,其正极性输出是 连接到跳闸电极以形成滑动放电。 具有轴向开口的绝缘插入件可以被引入到放电室中,在所述插入件的表面上设置放电室的电极。
    • 8. 发明申请
    • A SYSTEM FOR ACTIVATING A PLASMA FOCUS UNIT
    • 一个用于激活等离子体聚焦单元的系统
    • WO2008098914A1
    • 2008-08-21
    • PCT/EP2008/051646
    • 2008-02-12
    • O.C.E.M. S.P.A.FARIOLI, Marco
    • FARIOLI, Marco
    • G21B3/00H05H1/06
    • G21B3/00G21B1/21H05H1/06Y02E30/18
    • A system for activating a plasma focus unit, comprising a plurality of electric meshes, (E 1 ), (E 2 ),..., (E J ),..., (E N ),each of which comprises the plasma focus unit PF and a relative branch (R J ), derived from terminals (H), (K) of the plasma focus unit (PF). A first mesh (E 1 ) exhibits: a current switch (SW); a diode (D 1 ); and a bank of capacitors (C 1 ) able to set off a current discharge (i C ) across the plasma focus unit (PF); the remaining meshes (E 2 ),..., (E J ),..., (E N ),each exhibit: a diode (D J ); and a bank of capacitors (C J ) charged at a potential difference which is insufficient for setting off a current (i C ) discharge across the plasma focus unit (PF).
    • 一种用于激活等离子体聚焦单元的系统,包括多个电网,(E 1 / N 2),(E 2 2),...,(E S ,其中每个包括源自端子的等离子体聚焦单元PF和相对分支(R SUB),相对分支(R SUB) (H),(K)等离子体聚焦单元。 第一网格(E 1> 1)表现出:电流开关(SW); 一个二极管(D 1 N); 以及能够跨越等离子体聚焦单元(PF)排出电流放电(I SUB)的一组电容器(C 1 SUB); 其余的网格(E 2 2)),,,,E E J J J J J))))::::::::::::::) 二极管(D SUB); 以及在电位差充电的电容器组(C SUB),其不足以用于排出等离子体聚焦单元(PF)上的电流(I SUB C)放电。
    • 9. 发明申请
    • AN APPARATUS FOR ACTIVATING A PLASMA FOCUS UNIT
    • 用于激活等离子体聚焦单元的装置
    • WO2008098913A1
    • 2008-08-21
    • PCT/EP2008/051645
    • 2008-02-12
    • O.C.E.M. S.P.A.BASILE, Gianluigi
    • BASILE, Gianluigi
    • H05H1/06G21B3/00
    • H05H1/06G21B1/21G21B3/00Y02E30/18
    • An apparatus for activating a plasma focus unit, comprising a first electric mesh (E 1 ), in turn comprising: the plasma focus unit (PF); a bank of capacitors (C) derived from a first tension node (A) and a second tension node (B); a switch (SW 1 ), and a diode (D1) for conducting the current (i c ) when the potential of the node (A) is greater than the potential of the node (B). The apparatus further comprises an additional electric branch (RA) connected to the bank of capacitors (C) to define an electric mesh (E 2 ), comprising: a diode (D2) for conducting the current (i c ) when the potential of the node (B) is greater than the potential of the node (A); and a current switch (SW 2 ).
    • 一种用于激活等离子体聚焦单元的装置,包括第一电网(E> 1>),其又包括:等离子体聚焦单元(PF); 源自第一张力节点(A)和第二张力节点(B)的电容器组(C); 一个开关(SW 1 SUB)和一个用于在节点(A)的电位大于电位的电位时导通电流(i)的二极管(D1) 节点(B)。 该装置还包括连接到电容器组(C)的附加电分支(RA),以限定电网(E 2>),包括:二极管(D2),用于传导电流 当节点(B)的电位大于节点(A)的电位时; 和电流开关(SW 2 2)。
    • 10. 发明申请
    • PLASMA FOCUS LIGHT SOURCE WITH ACTIVE AND BUFFER GAS CONTROL
    • 具有主动和缓冲气体控制的等离子体聚焦光源
    • WO01095362A1
    • 2001-12-13
    • PCT/US2001/018680
    • 2001-06-07
    • G21K1/00G03F7/20G21K1/06G21K5/00G21K5/02G21K5/08H01L21/027H05G2/00H05H1/06H05H1/24H01J35/20
    • H05G2/003B82Y10/00G03F7/70033G03F7/70166G03F7/70908G03F7/70916H05G2/005H05H1/06
    • A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber (10). The chamber (10) contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 pi steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at 2000 Hz or greater. Gas flows in the vacuum chamber are controlled to assure desired concentration of active gas in the discharge region and to minimize active gas concentration in the beam path downstream of the pinch region. In a preferred embodiment, active gas is injected downstream of the pinch region through a nozzle (2) and exhausted axially through an exhaust port (3) in the center of the anode. In another preferred embodiment a laserbeam generates metal vapor at a location close to but downstream of the pinch region and the vapor is exhausted axially through the anode.
    • 高能光子源。 一对等离子体夹持电极位于真空室(10)中。 室(10)包含工作气体,其包括贵重缓冲气体和选择用于提供所需光谱线的活性气体。 脉冲电源以1000Hz或更大的重复频率提供电脉冲,并且在足够高的电压下在电极之间产生电放电,以在工作气体中产生非常高温度的高密度等离子体夹持,从而在源的光谱线处提供辐射 或活性气体。 描述了第四代单元,其以氙气作为活性气体以2000Hz的重复频率产生20mJ,13.5nm脉冲到2π立体声中。 该单元包括具有对充电电容器组充电的谐振充电器的脉冲电力系统和包括用于产生2000Hz或更大的高电压电脉冲的脉冲变压器的磁性压缩电路。 控制真空室中的气体流动以确保放电区域中活性气体的期望浓度,并使夹持区域下游的光束路径中的活性气体浓度最小化。 在优选实施例中,活性气体通过喷嘴(2)在夹紧区域的下游被注入,并且通过在阳极中心的排气口(3)沿轴向排出。 在另一个优选实施例中,激光束在靠近夹紧区域的下游的位置处产生金属蒸汽,并且蒸汽轴向地通过阳极排出。