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1. 发明申请

WO2006076261A2 METHOD AND APPARATUS FOR CONTROLLING THE OUTPUT OF A GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：用于控制气体放电激光系统输出的方法和装置
公开(公告)号：WO2006076261A2
公开(公告)日：2006-07-20
申请号：PCT/US2006/000603
申请日：2006-01-09
申请人： CYMER, INC. , RULE, John, A. , ZAMBON, Paolo , WATSON, Tom, A. , MESINA, Omez, S. , ZHENG, Weijie
发明人： RULE, John, A. , ZAMBON, Paolo , WATSON, Tom, A. , MESINA, Omez, S. , ZHENG, Weijie
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/097 , H01S3/10069 , H01S3/104 , H01S3/1306 , H01S3/134 , H01S3/225 , H01S3/2258 , H01S3/2308 , H01S3/2366
摘要： The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine.
摘要翻译：本发明涉及一种氟气放电激光器系统，并且当气体放电激光器工作并且消耗氟时，控制补充氟气。

2. 发明申请

WO2003096492A2 AUTOMATIC GAS CONTROL SYSTEM FOR A GAS DISCHARGE LASER 审中-公开
标题翻译：气体放电激光自动气体控制系统
公开(公告)号：WO2003096492A2
公开(公告)日：2003-11-20
申请号：PCT/US2003/013939
申请日：2003-05-05
申请人： CYMER, INC. , RULE, John, A. , HOFMANN, Thomas , MORTON, Richard, G. , BROWN, Daniel, J., W. , FLEUROV, Vladimir, B. , TRINTCHOUK, Fedor , ISHIHARA, Toshihiko , ERSHOV, Alexander, I. , WITTAK, Christian, J.
发明人： RULE, John, A. , HOFMANN, Thomas , MORTON, Richard, G. , BROWN, Daniel, J., W. , FLEUROV, Vladimir, B. , TRINTCHOUK, Fedor , ISHIHARA, Toshihiko , ERSHOV, Alexander, I. , WITTAK, Christian, J.
IPC分类号： H01S
CPC分类号： H01S3/225 , G03F7/70025 , H01S3/036 , H01S3/041 , H01S3/08009 , H01S3/09702 , H01S3/2258 , H01S3/2333
摘要： An automatic F 2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F 2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F 2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F 2 controls for a two-chamber MOPA laser system.
摘要翻译：自动F2激光气体控制，用于模块化高重复率紫外线气体放电激光器。激光气体控制包括技术，监视器和处理器（604），用于在激光系统（4）的使用寿命期间监测F2消耗速率。这些消耗速率由编程有算法的处理器（604）使用以确定在输送范围内保持激光束质量所需的F2注射。优选实施例包括用于双室MOPA激光系统（5）的F2控制。

3. 发明申请

WO01098012A2 FOUR KHz GAS DISCHARGE LASER 审中-公开
标题翻译：四吉兹气体放电激光
公开(公告)号：WO01098012A2
公开(公告)日：2001-12-27
申请号：PCT/US2001/016985
申请日：2001-05-23
IPC分类号： H01S3/134 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , B23H
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以约4,000Hz的脉冲速率产生高质量的脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的限度内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

4. 发明申请

WO01024327A1 VERY NARROW BAND INJECTION SEEDED F2 LITHOGRAPHY LASER 审中-公开
标题翻译：非常窄带注射种子F2光刻激光
公开(公告)号：WO01024327A1
公开(公告)日：2001-04-05
申请号：PCT/US2000/025807
申请日：2000-09-19
IPC分类号： G03F7/20 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/102 , H01S3/139 , H01S3/223 , H01S3/225 , H01S3/23 , H01S3/10
CPC分类号： H01S3/10092 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/0385 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/139 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2308 , H01S3/2325 , H01S3/2333 , H01S3/2366
摘要： A turnable injection seeded very narrow band F2 lithography laser. The laser (60) combines modular design features of prior art long life reliable lithography lasers with special techniques to produce a seed beam (LNP15) operated in a first gain medium which beam (102) is used to stimulate narrow bnd lasing in a second gain medium to produce a very narrow band laser useful for integrated circuit lithography. In a preferred embodiment, two tunable etalon output couplers (164A, 164B) are used to narrow band an F2 laser and the output of the seed laser is amplified in an F2 amplifier.
摘要翻译：可转动注射种子非常窄的F2光刻激光。激光器（60）将现有技术的长寿命可靠光刻激光器的模块化设计特征与特殊技术相结合，以产生在第一增益介质中操作的种束（LNP15），其中该波束（102）用于在第二增益中刺激窄bnd激光以产生用于集成电路光刻的非常窄带激光器。在优选实施例中，使用两个可调标准器输出耦合器（164A，164B）来缩小F2激光器的频率，并且种子激光器的输出在F2放大器中被放大。

5. 发明申请

WO2005104311A3 DUV LIGHT SOURCE OPTICAL ELEMENT IMPROVEMENTS 审中-公开
标题翻译： DUV光源光学元件的改进
公开(公告)号：WO2005104311A3
公开(公告)日：2007-03-22
申请号：PCT/US2005006932
申请日：2005-03-04
申请人： CYMER INC , SANDSTROM RICHARD L , ALGOTS J MARTIN , BROWN JOSHUA C , CYBULSKY RAYMOND F , DUNLOP JOHN , HOWEY JAMES K , MORTON RICHARD G , PAN XIAOJIANG J , PARTLO WILLIAM N , PUTRIS FIRAS F , WATSON TOM A , YAGER THOMAS A
发明人： SANDSTROM RICHARD L , ALGOTS J MARTIN , BROWN JOSHUA C , CYBULSKY RAYMOND F , DUNLOP JOHN , HOWEY JAMES K , MORTON RICHARD G , PAN XIAOJIANG J , PARTLO WILLIAM N , PUTRIS FIRAS F , WATSON TOM A , YAGER THOMAS A
IPC分类号： H01S3/22 , G01B9/02 , G01J1/42 , G01J9/02 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/10 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/02 , G01J1/429 , G01J9/02 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount framed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may prestress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto- sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
摘要翻译：公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其具有快速可角度定位的反射镜，其具有镜安装框架，具有与安装框架系数不同的系数的反射光学元件，至少一个弯曲安装座框架在柔性的安装框架中，挠性臂将挠性件连接到安装框架。该装置可以包括具有细长杆的挠曲力机构。力机构可以预应力挠曲。镜子可以是包括在基板上形成有金属层的基板的光栅，以及形成在反射金属层上的由二氧化硅形成的保护涂层。光栅可能会使用电磁感应元件或磁敏元件进行主动调谐。可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。

6. 发明申请

WO2005013441A3 CATHODES FOR FLUORINE GAS DISCHARGE LASERS 审中-公开
标题翻译：氟气排放激光灯
公开(公告)号：WO2005013441A3
公开(公告)日：2005-10-20
申请号：PCT/US2004023663
申请日：2004-07-21
申请人： CYMER INC , STEIGER THOMAS D , BROWN JOSHUA C , DUFFEY THOMAS P , GILLESPIE WALTER D , MORTON RICHARD G , DYER TIMOTHY S
发明人： STEIGER THOMAS D , BROWN JOSHUA C , DUFFEY THOMAS P , GILLESPIE WALTER D , MORTON RICHARD G , DYER TIMOTHY S
IPC分类号： H01R43/00 , H01S20060101 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/097 , H01S3/0971 , H01S3/225
CPC分类号： H01S3/038 , H01S3/036 , H01S3/0381 , H01S3/0382 , H01S3/0385 , H01S3/0388 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： A fluorine gas discharge laser electrode (70) for a gas discharge laser having a laser gas containing fluorine is disclosed which may comprise a copper and copper alloy cathode body having an upper curved region containing the discharge footprint (74) for the cathode comprising copper and a lower portion comprising a copper alloy.
摘要翻译：公开了一种用于具有含氟激光气体的气体放电激光器的氟气放电激光电极（70），该氟气气体放电激光电极（70）包括铜和铜合金阴极体，该铜和铜合金阴极体具有上部弯曲区域，该上部弯曲区域包含用于阴极的放电足迹（74）包括铜合金的下部。

7. 发明申请

WO2003023914A1 低圧軸方向励起方式Ｆ2レーザ装置审中-公开
标题翻译：低压轴向方向激励型F2激光振荡器
公开(公告)号：WO2003023914A1
公开(公告)日：2003-03-20
申请号：PCT/JP2002/006898
申请日：2002-07-08
申请人：科学技術振興事業団 , 實野孝久
发明人：實野孝久
IPC分类号： H01S3/223
CPC分类号： H01S3/223 , H01S3/036 , H01S3/09702 , H01S3/2258
摘要： An axial direction excitation type F2 laser oscillator 11 comprising a discharge tube 1 consisting of an insulating cylinder and metal electrodes 2, 3 at both ends thereof, a reflecting mirror 5 or a transmitting mirror 6 constituting a resonator outside the electrodes 2, 3. A high voltage for pulse discharge is applied to the discharge electrodes 2, 3 from a drive circuit. The total gas pressure in the discharge tube 1 is set in a range between 10 Torr. and 100 Torr., the concentration of F2 gas to the total gas is set to be in a range between 0.2% and 2.0%. The low-pressure axial direction excitation type F2 laser oscillator having small size high efficiency can be provided at a low cost.
摘要翻译：轴向激励型F2激光振荡器11包括由绝缘筒和两端的金属电极2,3组成的放电管1，在电极2,3的外部构成谐振器的反射镜5或透射镜6。用于脉冲放电的高电压从驱动电路施加到放电电极2,3。放电管1中的总气体压力设定在10托之间的范围内。和100乇，将F2气体与总气体的浓度设定在0.2％〜2.0％的范围内。可以以低成本提供具有小尺寸高效率的低压轴向激励型F2激光振荡器。

8. 发明申请

WO2003021732A1 LASER LITHOGRAPHY LIGHT SOURCE WITH BEAM DELIVERY 审中-公开
标题翻译：激光光刻光源与光束交付
公开(公告)号：WO2003021732A1
公开(公告)日：2003-03-13
申请号：PCT/US2002/026400
申请日：2002-08-19
申请人： CYMER, INC. , KLENE, Brian, C. , DAS, Palash, P. , GROVE, Steven, L. , ERSHOV, Alexander, I. , SMITH, Scott, T. , PAN, Xiaojiang, J. , SANDSTROM, Richard, L.
发明人： KLENE, Brian, C. , DAS, Palash, P. , GROVE, Steven, L. , ERSHOV, Alexander, I. , SMITH, Scott, T. , PAN, Xiaojiang, J. , SANDSTROM, Richard, L.
IPC分类号： H01S3/22
CPC分类号： G03F7/70933 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser (4) light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band send beam which is amplified in the second discharge chamber. The MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable throughout the operating life of the lithography system, despite substantially degradation of optical components.
摘要翻译：本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光（4）光源。该系统包括用于将激光束传送到期望位置（例如生产线机器的入口）的封闭和清除的光束路径。在优选实施例中，生产线机器是光刻机（2），并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中被放大的非常窄的带发射光束。 MOPA系统能够以大大提高的光束质量将相当的单室激光器系统的输出脉冲能量大约翻倍。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。尽管光学部件基本上已经衰减，但是该优选实施例能够在光刻系统的整个工作寿命期间。

9. 发明申请

WO2003021731A1 SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：六至十赫兹或更大气体放电激光系统
公开(公告)号：WO2003021731A1
公开(公告)日：2003-03-13
申请号：PCT/US2002/026011
申请日：2002-08-16
申请人： CYMER, INC. , WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
发明人： WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
IPC分类号： H01S3/22
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,000 pulses per second. Preferred embodiments are configured as KrF, ArF and F 2 lasers used in photolithography. Improvements include a suction fan (555) in the immediate vicinity of the anode (542) to increase gas flow. The intake of the fan (555) is between the anode (542) and the insulating spacer (544B).
摘要翻译：本发明提供了能够以6,000至10,000个脉冲/秒的重复频率在生产线容量中可靠长期运行的气体放电激光系统。优选实施例被配置为用于光刻的KrF，ArF和F2激光器。改进包括在阳极（542）附近的吸入风扇（555）以增加气体流量。风扇（555）的入口位于阳极（542）和绝缘间隔物（544B）之间。

10. 发明申请

WO2002082601A1 INJECTION SEEDED F2 LASER WITH WAVELENGTH CONTROL 审中-公开
标题翻译：注射种子F2激光与波长控制
公开(公告)号：WO2002082601A1
公开(公告)日：2002-10-17
申请号：PCT/US2002/009625
申请日：2002-03-29
申请人： CYMER, INC. , SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , ONKELS, Eckehard, D. , OH, Choonghoon
发明人： SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , ONKELS, Eckehard, D. , OH, Choonghoon
IPC分类号： H01S3/22
CPC分类号： H01S3/105 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/08063 , H01S3/08068 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/10092 , H01S3/104 , H01S3/1305 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2325 , H01S3/2366
摘要： The present invention provides a narrow band laser system having two laser subsystems. The first laser subsystem (seed laser) provides a very narrow band pulsed output beam which is used to injection seed the second laser subsystem (slave osc. or power amp.) where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply (pulse power) precisely times the discharges in the two laser subsystems so that the discharges are properly synchronized. The laser gas comprises F 2 at a partial pressure less than about 1 % with a buffer gas comprised of helium, neon, or a combination thereof. Control of the center wavelength of the output beam is provided by adjusting one or more of the following parameters in the first laser subsystem: the total laser gas pressure, the relative concentration of helium or neon, F 2 partial pressure, laser gas temperature, discharge voltage and pulse energy.
摘要翻译：本发明提供一种具有两个激光子系统的窄带激光系统。第一个激光子系统（种子激光器）提供了一个非常窄的带状脉冲输出光束，用于对第二激光子系统（从属或功率放大器）进行种子注入，其中窄带脉冲种子光束被放大以产生窄带脉冲输出光束。脉冲电源（脉冲功率）精确地乘以两个激光子系统中的放电，使得放电正确同步。激光气体包含分压为小于约1％的F2，其中包含氦，氖或其组合的缓冲气体。通过调整第一激光子系统中的一个或多个以下参数来提供输出光束的中心波长的控制：总激光气体压力，氦或氖的相对浓度，F2分压，激光气体温度，放电电压和脉冲能量。

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