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1. 发明申请

WO02103740A2 FOCUSING LENS FOR ELECTRON EMITTER 审中-公开
标题翻译：聚焦镜头用于电子发射器
公开(公告)号：WO02103740A2
公开(公告)日：2002-12-27
申请号：PCT/US0218474
申请日：2002-06-10
申请人： HEWLETT PACKARD CO
发明人： BENNING PAUL J , KNIGHT WILLIAM R , REGAN MICHAEL J
IPC分类号： G11C11/21 , G11B9/00 , G11B9/10 , G11C11/23 , H01J1/52 , H01J3/02 , H01J3/18 , H01J19/38 , H01J19/40 , H01J21/10 , H01J29/06 , H01J29/62 , H01J31/12
CPC分类号： B82Y10/00 , G11B9/10 , G11B9/14 , G11B9/1418 , G11C11/23 , H01J3/022
摘要： An electron lens is used for focusing electrons from a cathode (10) to an anode (30). The lens includes a first conductive layer (36) with a first opening (38) at a first distance (48) from the cathode (10). The first conductive layer (36) is held at a first voltage. The lens also includes a second conductive layer (32) with a second opening (34) at a second distance (46) from the first conductive layer (36) and a third distance (24) from the anode (30). The second conductive layer (32) is held at a second voltage substantially equal to the voltage of the anode (30). The first (38) and second (34) openings are chosen based on the first voltage, the second voltage, the first distance (48), the second distance (46) and the third distance (24). The opening focuses the electrons emitted from the cathode (10) onto the anode (30) to a spot size preferably less than 40 nanometers. The force created between the cathode (10) and anode (30) is minimized by the structure of the lens.
摘要翻译：电子透镜用于将电子从阴极（10）聚焦到阳极（30）。透镜包括第一导电层（36），其具有距离阴极（10）第一距离（48）的第一开口（38）。第一导电层（36）保持在第一电压。透镜还包括第二导电层（32），其具有与第一导电层（36）相距第二距离（46）的第二开口（34）和距离阳极（30）的第三距离（24）。第二导电层（32）保持在基本上等于阳极（30）的电压的第二电压。基于第一电压，第二电压，第一距离（48），第二距离（46）和第三距离（24）来选择第一（38）和第二（34）开口。开口将从阴极（10）发射的电子聚焦到阳极（30）上，其光斑尺寸优选小于40纳米。通过透镜的结构，在阴极（10）和阳极（30）之间产生的力最小化。

2. 发明申请

WO2014159645A1 LIGHT EMITTING PLASMA LIGHTING APPARATUS INCLUDING RF SHIELDING 审中-公开
标题翻译：发光等离子体照明设备，包括射频屏蔽
公开(公告)号：WO2014159645A1
公开(公告)日：2014-10-02
申请号：PCT/US2014/024571
申请日：2014-03-12
申请人： STRAY LIGHT OPTICAL TECHNOLOGIES
发明人： REA, Gerald , DRAKE, Robert, A.
IPC分类号： H01J65/04 , H01J1/52
CPC分类号： H01J65/042 , H01J61/10
摘要： A light emitting plasma lighting apparatus may include at least one conductive RF shielding baffle located in a reflector housing between an emitter and a window. The at least one RF shielding baffle may include a planar body portion aligned generally perpendicular to an outer surface of the plasma bulb to minimize interference with light emitted from the plasma bulb. The at least one RF shielding baffle is grounded to absorb a portion of an RF field emitted by the emitter. A light emitting plasma emitter may include a conductive RF shielding plate coupled to a body portion of the emitter and positioned over the bottom surface of a puck which supports a plasma bulb. The RF shielding plate may be formed to include an aperture to expose the plasma bulb. The RF shielding plate is grounded to absorb a portion of a RF field emitted by puck.
摘要翻译：发光等离子体照明装置可以包括位于发射器和窗口之间的反射器壳体中的至少一个导电RF屏蔽挡板。所述至少一个RF屏蔽挡板可以包括大致垂直于等离子体灯泡的外表面排列的平面主体部分，以最小化对从等离子体灯泡发射的光的干扰。至少一个RF屏蔽挡板被接地以吸收由发射器发射的RF场的一部分。发光等离子体发射器可以包括耦合到发射器的主体部分并且定位在支撑等离子体灯泡的圆盘的底表面上的导电RF屏蔽板。 RF屏蔽板可以形成为包括露出等离子体灯泡的孔。 RF屏蔽板接地以吸收由圆盘发射的RF场的一部分。

3. 发明申请

WO99028624A1 CATHODE CURRENT SHARING APPARATUS AND METHOD THEREFOR 审中-公开
标题翻译：阴极电流共享装置及其方法
公开(公告)号：WO99028624A1
公开(公告)日：1999-06-10
申请号：PCT/US1998/025589
申请日：1998-12-03
IPC分类号： F03H1/00 , H01J1/52 , H05H1/00
CPC分类号： F03H1/0075 , F03H1/0018
摘要： A method and apparatus are provided to control cathode current sharing from a plurality of cathodes (114, 115) to a thruster (12). The cathode current is biased relative to the thruster return to change the relative current in the cathodes (114, 115). The biasing changes the electric fields and thus, alters the relative electron flux from the cathodes (114, 115). This biasing technique permits a uniform current sharing between multiple cathodes (114, 115) connected to a common power source.
摘要翻译：提供了一种方法和装置，用于控制从多个阴极（114,115）到推进器（12）的阴极电流共享。阴极电流相对于推进器返回偏置以改变阴极（114,115）中的相对电流。偏置改变电场，从而改变来自阴极（114,115）的相对电子通量。该偏置技术允许在连接到公共电源的多个阴极（114,115）之间的均匀电流共享。

4. 发明申请

WO2017189234A1 VHF Z-COIL PLASMA SOURCE 审中-公开
标题翻译：甚高频Z线圈等离子源
公开(公告)号：WO2017189234A1
公开(公告)日：2017-11-02
申请号：PCT/US2017/027174
申请日：2017-04-12
申请人： RETRO-SEMI TECHNOLOGIES, LLC
发明人： KIM, Dong-Soo , JOO, Min-Su
IPC分类号： H01J1/52 , H05H1/24
CPC分类号： H01J37/3211 , H01J37/321 , H01J37/3244 , H01J2237/334 , H01L21/67069 , H01L21/68792
摘要： A VHF Z-coil semiconductor processing plasma source uses Inductively Coupled Plasma (ICP) and has a Z-shaped coil wound about a chamber in two interconnected turns. High frequency RF electric power of from 40 MHz to 120 MHz is supplied by a power source to the coil. A process gas introduced into the chamber is energized by the coil and generates plasma ions of high density suitable for semiconductor dry etching.
摘要翻译： VHF Z线圈半导体处理等离子体源使用电感耦合等离子体（ICP）并且具有绕两个互连匝围绕腔室缠绕的Z形线圈。 40MHz至120MHz的高频RF电力由电源提供给线圈。引入室内的工艺气体被线圈激励并产生适合于半导体干法蚀刻的高密度等离子体离子。

5. 发明申请

WO2005059478A2 HORIZONTAL LIQUID LEVEL MEASURING DEVICE 审中-公开
标题翻译：水平液位测量装置
公开(公告)号：WO2005059478A2
公开(公告)日：2005-06-30
申请号：PCT/US2004042128
申请日：2004-12-15
申请人： FLING WILLIAM F , FLING JOHN J
发明人： FLING WILLIAM F , FLING JOHN J
IPC分类号： G01F20060101 , G01F23/52 , G01F23/54 , H01J1/52 , H01J19/40 , G01F
CPC分类号： G01F23/543
摘要： A system for actuating an indicator in response to a depth change in a liquid that is confined to a container comprises a housing, a float constrained to vertical movement in response to changes in liquid depth in the container and an actuator arranged to move in response to vertical movement of the float. A flexible coupling is connected to the actuator and arranged to maintain the actuator in a vertical orientation in the liquid when the actuator and the housing are out of vertical alignment, and a coupler mechanism arranged to transfer movement of the actuator to the indicator.
摘要翻译：响应于限制在容器中的液体的深度变化来致动指示器的系统包括壳体，响应于容器中的液体深度的变化而被限制为垂直运动的浮子以及被布置成响应于浮动的垂直运动。挠性联轴器连接到致动器并且布置成当致动器和壳体不垂直对齐时将致动器保持在液体中的垂直定向中，以及联接器机构布置成将致动器的运动传递到指示器。

6. 发明申请

WO2021257712A2 STEPPED INDIRECTLY HEATED CATHODE WITH IMPROVED SHIELDING 审中-公开
公开(公告)号：WO2021257712A2
公开(公告)日：2021-12-23
申请号：PCT/US2021/037642
申请日：2021-06-16
申请人： AXCELIS TECHNOLOGIES, INC.
发明人： PLATOW, Wilhelm , BASSOM, Neil , SATOH, Shu , SILVERSTEIN, Paul , FARLEY, Marvin
IPC分类号： H01J37/08 , H01J1/20 , H01J27/20 , H01J27/08 , H01J1/025 , H01J1/52 , H01J2201/19 , H01J2203/04 , H01J2237/08 , H01J2237/082
摘要： An ion source for forming a plasma has a cathode with a cavity and a cathode surface defining a cathode step. A filament is disposed within the cavity, and a cathode shield has a cathode shield surface at least partially encircling the cathode surface. A cathode gap is defined between the cathode surface and the cathode shield surface, where the cathode gap defines a tortured path for limiting travel of the plasma through the gap. The cathode surface can have a stepped cylindrical surface defined by a first cathode diameter and a second cathode diameter, where the first cathode diameter and second cathode diameter differ from one another to define the cathode step. The stepped cylindrical surface can be an exterior surface or an interior surface. The first and second cathode diameters can be concentric or axially offset.

7. 发明申请

WO2009110179A1 マトリックス型冷陰極電子源装置审中-公开
标题翻译：矩阵型冷阴极电子源装置
公开(公告)号：WO2009110179A1
公开(公告)日：2009-09-11
申请号：PCT/JP2009/000686
申请日：2009-02-19
申请人：パナソニック株式会社 , 山本睦 , 古賀啓介
发明人：山本睦 , 古賀啓介
IPC分类号： H01J1/52 , H01J29/06 , H01J31/12 , H01J31/38
CPC分类号： H01J29/467 , H01J29/481 , H01J31/127 , H01J2329/4604 , H01J2329/4643
摘要：　このマトリックス型冷陰極電子源装置は、メッシュ構造体（８）に形成された貫通孔（９）の開口径を、電子源素子（４）の配列ピッチの１／Ｎ以下に構成し、メッシュ構造体（８）を電子源素子（４）の配列ピッチの１／Ｎ刻みで駆動する駆動部（７ａ，７ｂ）を備えており、電子源のサイズを小さくすることなく解像度を高くできる。
摘要翻译：矩阵型冷阴极电子源装置具有通孔（9）和驱动部（7a，7b）。通孔（9）形成为具有网状结构（8），并且构成为具有电子源元件（4）的取向间距的1 / N以下的开口直径。驱动部分（7a，7b）每隔1 / N的电子源元件（4）的取向间距驱动网格结构（8）。这使得可以在不减小电子源尺寸的情况下提高分辨率。

8. 发明申请

WO2017112937A1 ELECTRON TRANSPARENT MEMBRANE FOR COLD CATHODE DEVICES 审中-公开
标题翻译：用于冷阴极器件的电子透明膜
公开(公告)号：WO2017112937A1
公开(公告)日：2017-06-29
申请号：PCT/US2016/068532
申请日：2016-12-23
申请人： MASSACHUSETTS INSTITUTE OF TECHNOLOGY
发明人： AKINWANDE, Akintunde, I. , GUERRERA, Stephen, Angelo
IPC分类号： H01J29/94 , H01J29/86 , H01J29/62 , H01J29/64 , H01J1/304 , H01J1/52 , H01J37/12 , H01J37/147 , G21K1/087 , G21K1/093
CPC分类号： H01J37/073 , H01J1/304 , H01J1/52 , H01J29/62 , H01J29/64 , H01J29/86 , H01J29/94
摘要： According to some aspects, a cold cathode device is provided, the device comprising a substrate, a field electron emitter disposed upon the substrate and configured to emit electrons in a first direction, and a structure encapsulating the field electron emitter, thereby creating an airtight seal around the field electron emitter, at least a portion of the structure being an atomically thin membrane positioned in the first direction with respect to the field electron emitter. According to some embodiments, at least one einzel lens may be located within the structure and configured to direct electrons emitted by the field electron emitter.
摘要翻译：根据一些方面，提供了一种冷阴极器件，所述器件包括衬底，设置在所述衬底上并且被配置为在第一方向上发射电子的场电子发射器以及封装所述场的结构由此在场致电子发射体周围产生气密密封，该结构的至少一部分是相对于场致电子发射体沿第一方向定位的原子薄膜。根据一些实施例，至少一个单透镜可以位于结构内并被配置为引导由场电子发射器发射的电子。

9. 发明申请

WO2013155004A3 ADVANCED DEBRIS MITIGATION OF EUV LIGHT SOURCE 审中-公开
标题翻译：紫外光源的先进碎片缓解
公开(公告)号：WO2013155004A3
公开(公告)日：2013-12-12
申请号：PCT/US2013035651
申请日：2013-04-08
申请人： KLA TENCOR CORP
发明人： UMSTADTER KARL
IPC分类号： H01J37/32 , H01J1/52 , H01J3/40
CPC分类号： G01T1/16 , B08B17/02 , G03F7/70033 , G03F7/70916 , H01J49/0031 , H05G2/003 , H05G2/008
摘要： Systems and methods for debris mitigation in an EUV light source for semiconductor processes are disclosed. Pulsed DC electric fields are applied to the path of EUV light to reject ions from the EUV path. The pulsed DC fields are triggered to coincide with the presence of debris in the EUV optical path. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：公开了用于半导体工艺的EUV光源中的碎片减轻的系统和方法。脉冲直流电场被施加到EUV光的路径以拒绝来自EUV路径的离子。脉冲直流电场被触发以与EUV光路中存在碎片一致。要强调的是，提供这个摘要是为了遵守需要摘要的规则，这将允许搜索者或其他读者快速确定技术公开的主题。提交时的理解是，它不会被用来解释或限制权利要求的范围或含义。

10. 发明申请

WO2006126133A3 CASCADE ARC RADIATION SOURCE WITH OXYGEN SCAVENGING MEANS 审中-公开
标题翻译：具有氧气扫描方式的CASCADE ARC辐射源
公开(公告)号：WO2006126133A3
公开(公告)日：2007-03-15
申请号：PCT/IB2006051499
申请日：2006-05-12
申请人： KONINKL PHILIPS ELECTRONICS NV , GEIJTENBEEK JOOP , WEERDESTEIJN PETRUS A M , VAN ESVELD HENDRIK A , DE MAAGT BENNIE J , HAVERLAG MARCO
发明人： GEIJTENBEEK JOOP , WEERDESTEIJN PETRUS A M , VAN ESVELD HENDRIK A , DE MAAGT BENNIE J , HAVERLAG MARCO
IPC分类号： H01J1/52 , H01J37/32 , H01J61/10 , H01J61/26 , H05H1/26
CPC分类号： H01J1/52 , G01N21/9501 , G01N2021/95676
摘要： The invention relates to a radiation source, comprising: an at least partially radiation-transmissive discharge vessel filled with an ionizable substance, said vessel comprising: at least one anode, at least one cathode comprising tungsten, and one or more plates positioned between said anode and cathode, said plates being electrically substantially insulated, each plate having at least one hole, aligned in such a way that a continuous path is provided between said anode and said cathode over which a discharge can take place. The invention also relates to a system for inspecting an object, comprising such a radiation source.
摘要翻译：本发明涉及一种辐射源，包括：填充有可电离物质的至少部分辐射透射的放电容器，所述容器包括：至少一个阳极，至少一个包含钨的阴极和位于所述阳极之间的一个或多个阳极和阴极，所述板基本上是绝缘的，每个板具有至少一个孔，以这样的方式排列，使得在所述阳极和所述阴极之间提供连续路径，在所述阴极上可以进行放电。本发明还涉及一种用于检查物体的系统，包括这种辐射源。

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