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1. 发明申请

WO2006076261A3 METHOD AND APPARATUS FOR CONTROLLING THE OUTPUT OF A GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：用于控制气体放电激光系统输出的方法和装置
公开(公告)号：WO2006076261A3
公开(公告)日：2007-04-19
申请号：PCT/US2006000603
申请日：2006-01-09
申请人： CYMER INC , RULE JOHN A , ZAMBON PAOLO , WATSON TOM A , MESINA OMEZ S , ZHENG WEIJIE
发明人： RULE JOHN A , ZAMBON PAOLO , WATSON TOM A , MESINA OMEZ S , ZHENG WEIJIE
IPC分类号： H01S3/22 , H01S3/134 , H01S3/225 , H01S3/23
CPC分类号： H01S3/036 , H01S3/097 , H01S3/10069 , H01S3/104 , H01S3/1306 , H01S3/134 , H01S3/225 , H01S3/2258 , H01S3/2308 , H01S3/2366
摘要： The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine.
摘要翻译：本发明涉及一种氟气放电激光器系统，并且当气体放电激光器工作并且消耗氟时，控制补充氟气。

2. 发明申请

WO2006076261A2 METHOD AND APPARATUS FOR CONTROLLING THE OUTPUT OF A GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：用于控制气体放电激光系统输出的方法和装置
公开(公告)号：WO2006076261A2
公开(公告)日：2006-07-20
申请号：PCT/US2006/000603
申请日：2006-01-09
申请人： CYMER, INC. , RULE, John, A. , ZAMBON, Paolo , WATSON, Tom, A. , MESINA, Omez, S. , ZHENG, Weijie
发明人： RULE, John, A. , ZAMBON, Paolo , WATSON, Tom, A. , MESINA, Omez, S. , ZHENG, Weijie
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/097 , H01S3/10069 , H01S3/104 , H01S3/1306 , H01S3/134 , H01S3/225 , H01S3/2258 , H01S3/2308 , H01S3/2366
摘要： The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine.
摘要翻译：本发明涉及一种氟气放电激光器系统，并且当气体放电激光器工作并且消耗氟时，控制补充氟气。

3. 发明申请

WO03023910A3 HIGH REP-RATE LASER WITH IMPROVED ELECTRODES 审中-公开
标题翻译：具有改进电极的高倍率激光
公开(公告)号：WO03023910A3
公开(公告)日：2003-05-30
申请号：PCT/US0228463
申请日：2002-09-06
申请人： CYMER INC , MORTON RICHARD G , DYER TIMOTHY S , STEIGER THOMAS D , UJAZDOWSKI RICHARD C , WATSON TOM A , MOOSMAN BRYAN , IVASCHENKO ALEX P , GILLESPIE WALTER D , RETTIG CURTIS L
发明人： MORTON RICHARD G , DYER TIMOTHY S , STEIGER THOMAS D , UJAZDOWSKI RICHARD C , WATSON TOM A , MOOSMAN BRYAN , IVASCHENKO ALEX P , GILLESPIE WALTER D , RETTIG CURTIS L
IPC分类号： C22C9/04 , H01S3/036 , H01S3/038 , H01S3/225 , H01S3/22 , H01S3/223
CPC分类号： H01S3/038 , H01S3/036 , H01S3/0381 , H01S3/0388 , H01S3/09702 , H01S3/225
摘要： The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the elctrodes is comprised of a first material having a relatively low anode erosion rate and a second anode material having a relatively higher anode erosion rate. The first anode material (42) is positioned at a desired anode discharge region of the electrode. The second anode material (40) is located adjacent to the first anode material (42) along at least two long sides of the first material (42). During operation of the laser erosion occurs on both materials but the higher erosion rate of the second material (40) assures that any tendency of the discharge to spread onto the second material (40) will quickly erode away the second material (40) enough to stop the spread of the discharge. In a preferred embodiment the anode is as described above and the cathode is also a two-material electrode with the first material at the discharge region being C26000 brass and the second material being C36000 brass. A pulse power system provides electrical pulses at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges.
摘要翻译：本发明提供了一种气体放电激光器，其具有至少一个长寿命的细长电极，用于在含氟激光气体中产生至少120亿个高压放电。在优选实施方案中，至少一个电极由具有相对低的阳极侵蚀速率的第一材料和具有相对较高的阳极侵蚀速率的第二阳极材料构成。第一阳极材料（42）位于电极的期望的阳极放电区域。第二阳极材料（40）沿着第一材料（42）的至少两个长边位于第一阳极材料（42）附近。在两种材料的激光冲蚀操作过程中，第二材料（40）的侵蚀速率都较高，确保放电扩散到第二材料（40）上的任何趋势都将迅速地将第二材料（40）剥离成足够的停止放电的传播。在优选实施例中，阳极如上所述，阴极也是双材料电极，其中第一材料在放电区域为C26000黄铜，第二材料为C36000黄铜。脉冲功率系统以至少1KHz的速率提供电脉冲。鼓风机以至少5m / s的速度在电极之间循环激光气体，并且提供热交换器以去除由鼓风机和排出物产生的热量。

4. 发明申请

WO2005104311A2 DUV LIGHT SOURCE OPTICAL ELEMENT IMPROVEMENTS 审中-公开
标题翻译： DUV光源光学元件的改进
公开(公告)号：WO2005104311A2
公开(公告)日：2005-11-03
申请号：PCT/US2005/006932
申请日：2005-03-04
申请人： CYMER, INC. , SANDSTROM, Richard L. , ALGOTS, J. Martin , BROWN, Joshua C. , CYBULSKY, Raymond F. , DUNLOP, John , HOWEY, James K. , MORTON, Richard G. , PAN, Xiaojiang J. , PARTLO, William N. , PUTRIS, Firas F. , WATSON, Tom A. , YAGER, Thomas A.
发明人： SANDSTROM, Richard L. , ALGOTS, J. Martin , BROWN, Joshua C. , CYBULSKY, Raymond F. , DUNLOP, John , HOWEY, James K. , MORTON, Richard G. , PAN, Xiaojiang J. , PARTLO, William N. , PUTRIS, Firas F. , WATSON, Tom A. , YAGER, Thomas A.
IPC分类号： H01S3/22
CPC分类号： H01S3/02 , G01J1/429 , G01J9/02 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed which may comprise a fast moving angularly positionable tuning mirror comprising: a mirror mounting frame comprising a first material and a relatively flat mounting surface area; a reflective optic comprising a second material having a coefficient of thermal expansion different from that of the first material of the mounting frame; at least two attachment points of attachment between the mounting frame and the reflective optic on the mounting frame surface; and, at least one flexure mount formed in the mounting frame that is flexible in a flexure axis corresponding to a longitudinal axis of thermal expansion of the mounting frame and the reflective optic, positioned at one of the at least two points of attachment. The flexure mount may comprise: a flexure body formed from the material of the mirror mounting frame and separated from the material of the mirror mounting frame to allow relative movement between the flexure and the mirror mounting frame; at least one flexure arm formed from the material of the mirror mounting frame and attached at one end to the mirror mounting frame and at the other end to the flexure. The apparatus and method may further comprise a flexure force mechanism made of the second material or a third material having a coefficient of thermal expansion that is essentially the same as that of the second material; the flexure force mechanism comprising an elongated rod; a flexure force mechanism slot generally aligned with the flexure axis and sized to snuggly fit the flexure force mechanism between a slot wall at one end of the flexure force mechanism slot and the flexure body at the other end of the flexure force mechanism slot. The force mechanism may pre-stress the flexure. The mirror may be a grating. The grating may have a metallic reflective surface and a protective coating over the reflective coating comprising a dense glassy material that is essentially non-porous to undesired contaminants exposure of which to the reflective coating is desired to be prevented, which may comprise an amorphous silica, a doped amorphous silica, which may be halide doped and the halide may be fluorine. The grating may be actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge.
摘要翻译：公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其可以包括快速移动的可角度定位的调谐镜，其包括：反射镜安装框架，其包括第一材料和相对平坦的安装表面区域; 反射光学元件，包括具有不同于所述安装框架的第一材料的热膨胀系数的第二材料; 在安装框架和安装框架表面上的反射光学器件之间的至少两个连接附接点; 以及形成在所述安装框架中的至少一个弯曲安装座，所述至少一个弯曲安装件在弯曲轴线上柔性，所述弯曲轴线对应于所述安装框架和所述反射式光学器件的热膨胀的纵向轴线，所述热膨胀轴线位于所述至少两个连接点中的一个上。挠曲安装件可以包括：由反射镜安装框架的材料形成并且与镜面安装框架的材料分离的弯曲体，以允许挠曲件和反射镜安装框架之间的相对移动; 至少一个弯曲臂由反射镜安装框架的材料形成并且在一端附接到反射镜安装框架，另一端连接到弯曲部。该装置和方法还可以包括由第二材料制成的挠曲力机构或具有与第二材料基本上相同的热膨胀系数的第三材料; 所述挠曲力机构包括细长杆; 弯曲力机构槽通常与弯曲轴线对准并且尺寸设计成使挠曲力机构紧贴在弯曲力机构槽的一端处的狭槽壁和弯曲力机构槽的另一端处的挠曲体之间。力机构可以预应力挠曲。镜子可能是光栅。光栅可以具有金属反射表面并且在反射涂层上方具有保护涂层，该保护涂层包含致密的玻璃质材料，其基本上是无孔的，以期望防止对反射涂层的不期望的污染物暴露，其可以包含无定形二氧化硅，掺杂的无定形二氧化硅，其可以是卤化物掺杂的，并且卤化物可以是氟。可以使用电磁感应元件或磁敏元件来主动调谐光栅。反射层中金属的氧化物可以通过氢气清除来除去。

5. 发明申请

WO2003023910A2 HIGH REP-RATE LASER WITH IMPROVED ELECTRODES 审中-公开
标题翻译：具有改进电极的高倍率激光
公开(公告)号：WO2003023910A2
公开(公告)日：2003-03-20
申请号：PCT/US2002/028463
申请日：2002-09-06
申请人： CYMER, INC. , MORTON, Richard, G. , DYER, Timothy, S. , STEIGER, Thomas, D. , UJAZDOWSKI, Richard, C. , WATSON, Tom, A. , MOOSMAN, Bryan , IVASCHENKO, Alex, P. , GILLESPIE, Walter, D , RETTIG, Curtis, L.
发明人： MORTON, Richard, G. , DYER, Timothy, S. , STEIGER, Thomas, D. , UJAZDOWSKI, Richard, C. , WATSON, Tom, A. , MOOSMAN, Bryan , IVASCHENKO, Alex, P. , GILLESPIE, Walter, D , RETTIG, Curtis, L.
IPC分类号： H01S
CPC分类号： H01S3/038 , H01S3/036 , H01S3/0381 , H01S3/0388 , H01S3/09702 , H01S3/225
摘要： The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the elctrodes is comprised of a first material having a relatively low anode erosion rate and a second anode material having a relatively higher anode erosion rate. The first anode material is positioned at a desired anode discharge region of the electrode. The second anode material is located adjacent to the first anode material along at least two long sides of the first material. During operation of the laser erosion occurs on both materials but the higher ero sion rate of the second material assures that any tendency of the discharge to spread onto the second material will quickly erode away the second material enough to stop the spread of the discharge. In a preferred embodiment the anode is as described above and the cathode is also a two-material electrode with the first material electrode with the first material at the discharge region being C26000 brass and the second material being C36000 brass. A pulse power system provides electrical pulses at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges.
摘要翻译：本发明提供了一种气体放电激光器，其具有至少一个长寿命的细长电极，用于在含氟激光气体中产生至少120亿个高压放电。在优选实施方案中，至少一个电极由具有相对低的阳极侵蚀速率的第一材料和具有相对较高的阳极侵蚀速率的第二阳极材料构成。第一阳极材料位于电极的期望的阳极放电区域。第二阳极材料沿第一材料的至少两个长边位于第一阳极材料附近。在两种材料的激光冲蚀操作过程中，第二种材料的腐蚀速度较高，确保放电扩散到第二种材料上的任何趋势将迅速消除第二种材料，从而阻止放电扩散。在优选实施例中，阳极如上所述，阴极也是具有第一材料电极的双材料电极，其中在放电区域处的第一材料为C26000黄铜，第二材料为C36000黄铜。脉冲功率系统以至少1KHz的速率提供电脉冲。鼓风机以至少5m / s的速度在电极之间循环激光气体，并且提供热交换器以去除由鼓风机和排出物产生的热量。

6. 发明申请

WO2005104311A3 DUV LIGHT SOURCE OPTICAL ELEMENT IMPROVEMENTS 审中-公开
标题翻译： DUV光源光学元件的改进
公开(公告)号：WO2005104311A3
公开(公告)日：2007-03-22
申请号：PCT/US2005006932
申请日：2005-03-04
申请人： CYMER INC , SANDSTROM RICHARD L , ALGOTS J MARTIN , BROWN JOSHUA C , CYBULSKY RAYMOND F , DUNLOP JOHN , HOWEY JAMES K , MORTON RICHARD G , PAN XIAOJIANG J , PARTLO WILLIAM N , PUTRIS FIRAS F , WATSON TOM A , YAGER THOMAS A
发明人： SANDSTROM RICHARD L , ALGOTS J MARTIN , BROWN JOSHUA C , CYBULSKY RAYMOND F , DUNLOP JOHN , HOWEY JAMES K , MORTON RICHARD G , PAN XIAOJIANG J , PARTLO WILLIAM N , PUTRIS FIRAS F , WATSON TOM A , YAGER THOMAS A
IPC分类号： H01S3/22 , G01B9/02 , G01J1/42 , G01J9/02 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/10 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/02 , G01J1/429 , G01J9/02 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount framed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may prestress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto- sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
摘要翻译：公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其具有快速可角度定位的反射镜，其具有镜安装框架，具有与安装框架系数不同的系数的反射光学元件，至少一个弯曲安装座框架在柔性的安装框架中，挠性臂将挠性件连接到安装框架。该装置可以包括具有细长杆的挠曲力机构。力机构可以预应力挠曲。镜子可以是包括在基板上形成有金属层的基板的光栅，以及形成在反射金属层上的由二氧化硅形成的保护涂层。光栅可能会使用电磁感应元件或磁敏元件进行主动调谐。可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。

7. 发明申请

WO2003021731A1 SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：六至十赫兹或更大气体放电激光系统
公开(公告)号：WO2003021731A1
公开(公告)日：2003-03-13
申请号：PCT/US2002/026011
申请日：2002-08-16
申请人： CYMER, INC. , WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
发明人： WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
IPC分类号： H01S3/22
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,000 pulses per second. Preferred embodiments are configured as KrF, ArF and F 2 lasers used in photolithography. Improvements include a suction fan (555) in the immediate vicinity of the anode (542) to increase gas flow. The intake of the fan (555) is between the anode (542) and the insulating spacer (544B).
摘要翻译：本发明提供了能够以6,000至10,000个脉冲/秒的重复频率在生产线容量中可靠长期运行的气体放电激光系统。优选实施例被配置为用于光刻的KrF，ArF和F2激光器。改进包括在阳极（542）附近的吸入风扇（555）以增加气体流量。风扇（555）的入口位于阳极（542）和绝缘间隔物（544B）之间。

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