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1. 发明申请

WO2006127886A3 SYSTEMS AND METHODS FOR IMPLEMENTING AN INTERACTION BETWEEN A LASER SHAPED AS A LINE BEAM AND A FILM DEPOSITED ON A SUBSTRATE 审中-公开
标题翻译：用于实现作为线束形成的激光与衬底上沉积的膜之间的相互作用的系统和方法
公开(公告)号：WO2006127886A3
公开(公告)日：2009-04-16
申请号：PCT/US2006020215
申请日：2006-05-25
申请人： CYMER INC , ZEISS IND MESSTECHNIK GMBH , DAS PALASH P , HOFFMANN THOMAS , SANDSTROM RICHARD L , BOUCKY OTTO , STUMPP ERNST , MATZKOVITS BERTHOLD , HOELL MICHAEL , WALTHER JOERG , BRENNER KURT , GRUPP GUENTER
发明人： DAS PALASH P , HOFFMANN THOMAS , SANDSTROM RICHARD L , BOUCKY OTTO , STUMPP ERNST , MATZKOVITS BERTHOLD , HOELL MICHAEL , WALTHER JOERG , BRENNER KURT , GRUPP GUENTER
IPC分类号： G01B11/14
CPC分类号： B23K26/03 , B23K26/0006 , B23K26/0066 , B23K26/032 , B23K26/04 , B23K26/043 , B23K26/0622 , B23K26/0665 , B23K26/0738 , B23K26/083 , B23K37/0408 , B23K37/047 , B23K2201/18 , B23K2201/38 , B23K2203/56 , C30B13/22 , C30B29/06 , G01B21/00 , G03F7/70383 , G03F7/70583 , H01L27/1296
摘要： Systems and methods are disclosed for focusing a beam for an interaction with a film deposited on a substrate wherein the focused beam defines a short axis and a long axis. In one aspect, the system may include a detecting system to analyze light reflected from the film on an image plane to determine whether the beam is focused in the short axis at the film. In still another aspect, a system may be provided for positioning a film (having an imperfect, non-planar surface) for interaction with a shaped line beam.
摘要翻译：公开的系统和方法用于聚焦用于与沉积在基板上的膜相互作用的光束，其中聚焦光束限定短轴和长轴。在一个方面，系统可以包括检测系统，以分析在图像平面上从胶片反射的光，以确定光束是否在胶片的短轴中聚焦。在另一方面，可以提供一种用于定位用于与成形线束相互作用的胶片（具有不完美的非平面表面）的系统。

2. 发明申请

WO9908156A8 LASER-ILLUMINATED STEPPER OR SCANNER WITH ENERGY SENSOR FEEDBACK 审中-公开
标题翻译：带有能量传感器反馈的激光照明的步进或扫描仪
公开(公告)号：WO9908156A8
公开(公告)日：1999-05-14
申请号：PCT/US9815974
申请日：1998-07-31
申请人： CYMER INC , SANDSTROM RICHARD L , DAS PALASH P , FOMENKOV IGOR V , BESAUCELE HERVE A , OZARSKI ROBERT G
发明人： SANDSTROM RICHARD L , DAS PALASH P , FOMENKOV IGOR V , BESAUCELE HERVE A , OZARSKI ROBERT G
IPC分类号： G03F7/20 , G03F7/22 , H01L21/027 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/104 , H01S3/134 , H01S3/225 , G03B27/42 , G03B27/54 , G03B27/60 , G03B27/72 , H01S3/10 , H01S3/18
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： A laser-illuminated wafer-exposing system such as a stepper (20) or scanner having a first light intensity detector (44) located within the exposing system near a mask (36) and second light intensity detector (46) located near the output of the laser (12). A feedback control system (14) controls the output of the laser based on signals detected by at least one of the detectors. The feedback control system includes a processor programmed with an algorithm which is used to control the laser discharge voltage in order to provide light pulses having desired intensity at the mask with the laser operating in a burst mode. The algorithm utilizes at least the following parameters; a previously measured pulse energy, a calculated energy error, a calculated dose error, a value for the rate of change of pulse energy with voltage, and at least one reference voltage. In a preferred embodiment the algorithm uses the pulse energy measured with the light intensity detector located near the mark to provide the feedback control and uses the light intensity detector at the output of the laser to assure that the output of the laser is maintained within a predetermined range.
摘要翻译：诸如步进器（20）或扫描器的激光照明晶片曝光系统具有位于曝光系统内靠近掩模（36）的第一光强度检测器（44）和位于靠近掩模（36）的输出处的第二光强度检测器激光器（12）。反馈控制系统（14）基于由至少一个检测器检测到的信号来控制激光器的输出。反馈控制系统包括用算法编程的处理器，该算法用于控制激光放电电压，以便在激光器以突发模式工作时在掩模上提供具有期望强度的光脉冲。该算法至少使用以下参数; 先前测量的脉冲能量，计算的能量误差，计算的剂量误差，脉冲能量随电压的变化率的值以及至少一个参考电压。在优选实施例中，算法使用位于标记附近的光强度检测器测量的脉冲能量来提供反馈控制，并使用激光器输出端处的光强度检测器来确保激光器的输出保持在预定的范围。

3. 发明申请

WO0159889A9 BANDWIDTH CONTROL TECHNIQUE FOR A LASER 审中-公开
标题翻译：激光的带宽控制技术
公开(公告)号：WO0159889A9
公开(公告)日：2002-10-17
申请号：PCT/US0101787
申请日：2001-01-18
申请人： CYMER INC , FOMENKOV IGOR V , KROYAN ARMEN , BUCK JESSE D , DAS PALASH P , SANDSTROM RICHARD L , ERIE FREDERICK G , ALGOTS JOHN M , PADMABANDU GAMARALALAGE G
发明人： FOMENKOV IGOR V , KROYAN ARMEN , BUCK JESSE D , DAS PALASH P , SANDSTROM RICHARD L , ERIE FREDERICK G , ALGOTS JOHN M , PADMABANDU GAMARALALAGE G
IPC分类号： H01S3/139 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/097 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/22 , H01S3/225 , H01S3/08
CPC分类号： G03F7/70041 , G03F7/70575 , H01S3/105 , H01S3/1055
摘要： A technique for bandwidth control of an electric discharge laser (2A). Line narrowing equipment is provided having at least one piezoelectric drive (14B1 - 14B5) and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirrors (14C1 - 14C5) are dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in the wavelength values to produce a desired effective bandwidth of series of laser pulses.
摘要翻译：一种用于放电激光器（2A）的带宽控制的技术。提供了具有至少一个压电驱动器（14B1-14.455）和快速带宽检测装置以及时间响应小于约1.0毫秒的带宽控制的线窄设备。在优选实施例中，波长调谐镜（14C1-14C5）在非常窄的转角范围内以每秒超过500次抖动的抖动速率抖动，以使波长值中的抖动产生期望的有效带宽的一系列激光脉冲。

4. 发明申请

WO03100826A8 LITHOGRAPHY LASER WITH BEAM DELIVERY AND BEAM POINTING CONTROL 审中-公开
标题翻译：光束传输和光束控制的光刻激光器
公开(公告)号：WO03100826A8
公开(公告)日：2004-11-25
申请号：PCT/US0314387
申请日：2003-05-05
申请人： CYMER INC , DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
发明人： DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
IPC分类号： H01L21/027 , G02B26/08 , G02B27/09 , G03F7/20 , H01L20060101 , H01L21/00 , H01S3/00 , H01S3/034 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/0971 , H01S3/10 , H01S3/13 , H01S3/134 , H01S3/136 , H01S3/137 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/7055 , G02B26/0816 , G02B27/0972 , G03F7/70025 , G03F7/70041 , G03F7/70058 , H01S3/005 , H01S3/0057 , H01S3/036 , H01S3/041 , H01S3/0971 , H01S3/136 , H01S3/137 , H01S3/225 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source (Fig. 1) with a beam delivery to a production line machine (2). The system includes an enclosed (4) and purged beam path (14C) with a beam pointing control (40A) (40B) (6) for delivery of the laser beam to a desired location such as the entrance port of the production line machine (2). In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers (8)(10) are provided, one of which is a part of a master oscillator (8) producing a very narrow band seed beam (14A), which is amplified in the second discharge chamber (10). This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译：本发明提供了一种模块化的高重复频率紫外线气体放电激光光源（图1），光束传输到生产线机器（2）。该系统包括具有光束指向控制器（40A）（40B）（6）的封闭（4）和清洗光束路径（14C），用于将激光束传送到期望位置，例如生产线机器的入口 2）。在优选实施例中，生产线机器是光刻机器（2），并且提供两个单独的放电室（8）（10），其中一个是主振荡器（8）的一部分，产生非常窄带的种子束在第二放电室（10）中被放大。该MOPA系统的输出脉冲能量大约是可比较的单腔激光系统的两倍，大大改善了光束质量。

5. 发明申请

WO9919950A8 PULSE ENERGY CONTROL FOR EXCIMER LASER 审中-公开
标题翻译：激光激光的脉冲能量控制
公开(公告)号：WO9919950A8
公开(公告)日：1999-06-24
申请号：PCT/US9818138
申请日：1998-09-01
申请人： CYMER INC , SANDSTROM RICHARD L , BESAUCELE HERVE A , FOMENKOV IGOR V , DAS PALASH P
发明人： SANDSTROM RICHARD L , BESAUCELE HERVE A , FOMENKOV IGOR V , DAS PALASH P
IPC分类号： G03F7/20 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/134 , H01S3/137 , H01S3/225 , H01S3/18
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70216 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： A process for controlling pulse energy in burst of pulses produced by an excimer laser. The energy of each pulse in each burst is measured. The rate of change of pulse energy with charging voltage is determined. A pulse energy error is determined for a previous pulse of the present burst. An integrated dose error is also determined for all previous pulses in the current burst. A charging voltage for the next pulse is determined using the pulse energy error, the integrated dose error, the rate of change of energy with charging voltage and a reference voltage. In a preferred embodiment, the rate of change of energy with voltage is determined by dithering the voltage during two pulses of each burst, once lower and once higher. The reference voltage is a voltage calculated using prior voltage and energy data. In this embodiment the method of determining the reference voltage during a first portion of the pulse is different from the method used during a latter portion of the burst. During the first set of pulses, for each pulse, (40 in this embodiment) a specified voltage calculated using voltage and energy data from a corresponding pulse in a previous burst is utilized as a prediction of the voltage needed to produce a pulse energy converging on a target pulse energy. For pulses (41) and thereafter the reference voltage for each pulse is the specified voltage for the previous pulse.
摘要翻译：用于通过准分子激光器产生的脉冲脉冲串来控制脉冲能量的过程。测量每个脉冲中每个脉冲的能量。确定脉冲能量随充电电压的变化率。针对当前脉冲串的先前脉冲确定脉冲能量误差。还针对当前突发中的所有先前脉冲确定积分剂量误差。使用脉冲能量误差，积分剂量误差，带充电电压的能量变化率和参考电压来确定下一个脉冲的充电电压。在优选实施例中，通过在每个脉冲串的两个脉冲期间抖动电压来确定能量与电压的变化率，一次较低和一次更高。参考电压是使用先前的电压和能量数据计算的电压。在该实施例中，在脉冲的第一部分期间确定参考电压的方法与在脉冲串的后一部分期间使用的方法不同。在第一组脉冲期间，对于每个脉冲（在本实施例中为40）使用来自先前脉冲串中的相应脉冲的电压和能量数据计算的指定电压被用作产生脉冲能量收敛所需的电压的预测目标脉冲能量。对于脉冲（41），此后每个脉冲的参考电压是先前脉冲的指定电压。

6. 发明申请

WO9908133A2 STEPPER OR SCANNER HAVING TWO ENERGY MONITORS FOR A LASER 审中-公开
标题翻译：具有两个激光器的能量监视器的步进或扫描仪
公开(公告)号：WO9908133A2
公开(公告)日：1999-02-18
申请号：PCT/US9815544
申请日：1998-07-27
申请人： CYMER INC , DAS PALASH P , FOMENKOV IGOR V
发明人： DAS PALASH P , FOMENKOV IGOR V
IPC分类号： G03F7/20 , H01L21/027 , H01S3/225 , G02B
CPC分类号： G03F7/70358 , G03F7/70558 , H01S3/225
摘要： A first laser light intensity detector is positioned within a stepper or scanner proximate to a reticle so that attenuation due to stepper optics has already occurred prior to the laser light impinging upon the light intensity detector. Preferably, the first light intensity detector is mounted as closed to the wafer as practical. A second light intensity detector is located at the output of the laser. The light intensity detected from the outputs of the first and second light intensity detectors, in conjunction, forms part of a feedback mechanism which adjusts the light output of the laser, during wafer fabrication, so that the light intensity detected by the first light intensity detector is an optimum value.
摘要翻译：第一激光光强度检测器位于靠近光罩的步进器或扫描仪内，使得在激光照射到光强度检测器之前已经发生由步进光学器件引起的衰减。优选地，第一光强度检测器被实际地安装在晶片上。第二个光强度检测器位于激光器的输出端。从第一和第二光强度检测器的输出检测到的光强度一起形成反馈机构的一部分，该反馈机构在晶片制造期间调节激光器的光输出，使得由第一光强度检测器检测的光强度是最佳值。

7. 发明申请

WO2005053893A3 LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM 审中-公开
标题翻译：激光薄膜聚硅氧烷退火光学系统
公开(公告)号：WO2005053893A3
公开(公告)日：2005-07-07
申请号：PCT/US2004037618
申请日：2004-11-12
申请人： CYMER INC , PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSEL , THOMAS MICHAEL
发明人： PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSEL , THOMAS MICHAEL
IPC分类号： B23K26/06 , B23K26/073 , C30B1/02 , C30B13/24 , H01L21/20 , H01S3/22 , H01S3/223 , B23K26/00
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/2026
摘要： A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 µm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam workpiece covering extent of the long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep side walls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level 2. The apparatus may also have a high average power in the laser output light pulse beam as delivered to the workpiece and a linebow correction mechanism in a short axis optical assembly. The linebow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The line width due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a linebow is correction mechanism within a field stop optical assembly correcting linebow at the field stop plane and within a workpiece projection optical assembly correcting linebow at the workpiece plane.
摘要翻译：公开了一种高能量，高重复率的工件表面加热方法和装置，其可以包括在4000Hz以上工作的脉冲XeF激光器，并在约351nm的中心波长处产生激光输出光脉冲光束; 将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20μm的光学系统，并且扩大激光输出光脉冲光束以形成长轴的光束工件覆盖范围的长轴 ; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍率来允许场停止在工件处保持足够陡峭的光束轮廓而不阻挡光束轮廓在太高的强度水平2.该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率，以及在短轴光学组件中具有弯管校正机构。弯管矫正机构可以包括多个弱交叉圆筒。该系统可以包括反折射投影系统。由激光衍射和发散引起的线宽可能小于几何限制。该系统可以投射标称XeF谱的相邻峰值，以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。系统可以包括在场停止光学组件中的弯头矫正机构，其在场停止平面处以及工件投影光学组件中在工件平面处校正弯头。

8. 发明申请

WO0019568A8 LINE NARROWING APPARATUS WITH HIGH TRANSPARENCY PRISM BEAM EXPANDER 审中-公开
标题翻译：具有高透明度光束扩展器的线性纳米装置
公开(公告)号：WO0019568A8
公开(公告)日：2000-09-14
申请号：PCT/US9921324
申请日：1999-09-13
申请人： CYMER INC , DAS PALASH P , ERSHOV ALEXANDER I , MORTON RICHARD G
发明人： DAS PALASH P , ERSHOV ALEXANDER I , MORTON RICHARD G
IPC分类号： G03F7/20 , H01S3/03 , H01S3/08 , H01S3/1055 , H01S3/137 , H01S3/225
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/08009 , H01S3/1055 , H01S3/225
摘要： A grating based line-narrowing apparatus having a prism beam expander with at least four prisms (26, 28, 30, 32). Each prism is positioned at an incidence angle between 67 and 71 degrees. A single layer coating of high refractive index, robust material, such as A1/2O/3, is applied to the hypotenuse face of each prism, providing an efficient, antireflection coating. In a preferred embodiment the incident angle of the four prisms (26, 28, 30, 32) are each at about 68.2 degrees. The laser (21) of the preferred embodiment has similar line narrowing efficiency and bandwith as that for a laser (21) with a 3 prism, ideal multi-layer anti-reflection coated beam expander. The primary benefit of the new four prism (26, 28, 30, 32) arrangement is that the prism coatings should be much less expensive and have greatly increased durability. Applicants have tested the new prisms for 30 million, 10mJ pulses in air with no noticeable degradation. No present day dielectic multi-layer stack coating could survive such exposure.
摘要翻译：一种基于光栅的线条变窄装置，具有具有至少四个棱镜（26,28,30,32）的棱镜扩束器。每个棱镜定位在67和71度之间的入射角。高折射率的单层涂层，诸如A1 / 2O / 3的坚固材料被施加到每个棱镜的斜边面，从而提供有效的抗反射涂层。在优选实施例中，四个棱镜（26,28,30,32）的入射角分别为约68.2度。优选实施例的激光器（21）具有与具有3棱镜，理想的多层抗反射涂覆光束扩展器的激光器（21）相似的线窄化效率和带宽。新的四棱镜（26,28,30,32）布置的主要优点是棱镜涂层应该便宜得多，并且耐久性大大提高。申请人已经在空气中测试了新的棱镜3000万，10mJ脉冲，没有明显的退化。没有现在的介电多层叠层涂层可以经受这样的曝光。

9. 发明申请

WO2007126693A3 CONFOCAL PULSE STRETCHER 审中-公开
标题翻译： CONFOCAL脉冲拉伸器
公开(公告)号：WO2007126693A3
公开(公告)日：2008-11-27
申请号：PCT/US2007007201
申请日：2007-03-23
申请人： CYMER INC , DAS PALASH P , HOFMANN THOMAS , LEI GANG
发明人： DAS PALASH P , HOFMANN THOMAS , LEI GANG
IPC分类号： H01S3/22
CPC分类号： H01S3/0057 , G03F7/7055 , H01S3/225
摘要： A gas discharge laser system producing a laser output pulse and a method of operating such a system is disclosed which may comprise a pulse stretcher which may comprise a laser output pulse optical delay initiating optic directing a portion of the laser output pulse along a laser system output pulse optical axis and diverting a portion of the output pulse into an optical delay having an optical delay path and which may comprise a plurality of confocal resonators in series aligned to deliver an output of the optical delay to the laser output pulse optical delay initiating optic; an optical axis alignment mechanism comprising an radial mirror positioning mechanism operable to position the output of the optical delay to the align with the portion of the laser output pulse transmitted along the optical axis of the portion of the laser system output pulse transmitted by the laser output pulse optical delay initiating optic.
摘要翻译：公开了一种产生激光输出脉冲的气体放电激光器系统和这种系统的操作方法，其可以包括脉冲展宽器，其可以包括激光输出脉冲光学延迟启动光学器件，以将激光输出脉冲的一部分沿激光系统输出脉冲光轴并将输出脉冲的一部分转移成具有光学延迟路径的光学延迟，并且可以包括串联对准的多个共焦谐振器，以将光学延迟的输出传递到激光输出脉冲光学延迟启动光学器件; 光轴对准机构，其包括径向镜定位机构，其可操作以将光学延迟的输出定位成与激光输出脉冲的沿激光输出脉冲发射的激光系统输出脉冲部分的光轴传输的部分对准脉冲光学延迟启动光学器件。

10. 发明申请

WO2005060055A3 GAS DISCHARGE LASER LIGHT SOURCE BEAM DELIVERY UNIT 审中-公开
标题翻译：气体放电激光光源光束输送单元
公开(公告)号：WO2005060055A3
公开(公告)日：2006-03-02
申请号：PCT/US2004042472
申请日：2004-12-15
申请人： CYMER INC , DAS PALASH P , AHMED KURSHID , FRANCIS GREGORY , GLATZEL HOLGER , LUKASHEV ALEXEI , TYLER JEREOMY D , WEBB R KYLE
发明人： DAS PALASH P , AHMED KURSHID , FRANCIS GREGORY , GLATZEL HOLGER , LUKASHEV ALEXEI , TYLER JEREOMY D , WEBB R KYLE
IPC分类号： G03F7/20 , H01S20060101 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23 , H01S3/09
CPC分类号： B23K26/12 , B23K26/128 , B23K26/705 , G01J1/04 , G01J1/0418 , G01J1/4257 , G01J2001/0285 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A beam delivery unit and method of delivering a laser beam from a gas discharge laser systems comprise: a beam delivery enclosure; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. A beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery path. The BDU may have at least two enclosure isolation mechanisms comprising a first and second enclosure isolation mechanism on a first and second side of the enclosure from the at least one optic module; the BDU may have at least two enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.
摘要翻译：从气体放电激光系统输送激光束的光束传送单元和方法包括：光束传送罩; 可操作地连接到射束输送罩的清洗机构; 壳体内的原位光束参数监视和调节机构，包括可伸缩光束重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。包含在外壳内的光束衰减器单元可调节地安装在外壳内，用于定位在光束输送路径内。 BDU可以具有至少两个机壳隔离机构，其包括第一和第二机壳隔离机构，所述第一和第二机壳隔离机构在所述外壳的所述至少一个光学模块的第一和第二侧上; BDU可以具有至少两个外壳隔离机构，其包括具有金属对金属座位机构和锁定销组件的挡板阀。可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。可以提供外部运动学对准工具。公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

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