专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2017142705A1 GAS OPTIMIZATION IN A GAS DISCHARGE LIGHT SOURCE 审中-公开
标题翻译：气体放散光源的气体优化
公开(公告)号：WO2017142705A1
公开(公告)日：2017-08-24
申请号：PCT/US2017/015889
申请日：2017-01-31
申请人： CYMER, LLC
发明人： AGGARWAL, Tanuj
IPC分类号： H01S3/11 , H01S3/23 , H01S3/036 , H01S3/225
CPC分类号： H01S3/134 , H01S3/036 , H01S3/0385 , H01S3/08009 , H01S3/08036 , H01S3/09705 , H01S3/0971 , H01S3/104 , H01S3/1305 , H01S3/225 , H01S3/2308 , H01S3/2366
摘要： One or more operating characteristics of a light source are adjusted by estimating a plurality of extreme values of operating parameters of the light source while operating the light source under a set of extreme test conditions. For each extreme test condition, a group of pulses of energy is supplied to a first gas discharge chamber of the light source while operating the first gas discharge chamber under the extreme test condition to produce a first pulsed amplified light beam; a group of pulses of energy is supplied to a second gas discharge chamber of the light source while operating the second «as discharge chamber under the extreme test condition to produce a second pulsed amplified light beam. An extreme value of an operating parameter for the extreme test condition is measured to thereby estimate the extreme value of the operating parameter.
摘要翻译：通过在一组极端测试条件下操作光源的同时估计光源的操作参数的多个极值来调整光源的一个或多个操作特性。对于每种极端测试条件，在极端测试条件下操作第一气体放电室的同时，将一组能量脉冲提供给光源的第一气体放电室，以产生第一脉冲放大光束; 一组能量脉冲被提供给光源的第二气体放电室，同时在极端测试条件下操作第二放电室作为放电室以产生第二脉冲放大光束。测量极端测试条件的运行参数的极值，从而估计运行参数的极值。

2. 发明申请

WO2013101609A1 MULTIPLE PHASE-LOCKED LOOPS FOR HIGH-POWER RF-POWER COMBINERS 审中-公开
标题翻译：用于大功率射频功率组合器的多相相位锁
公开(公告)号：WO2013101609A1
公开(公告)日：2013-07-04
申请号：PCT/US2012/070737
申请日：2012-12-19
申请人： COHERENT, INC.
发明人： SCHMELZER, David, P. , ROBOTHAM, W., Shef. Jr. , HAUER, Frederick, W. , FONTANELLA, Joel
IPC分类号： H01S3/097 , H01S3/0975 , H03B1/02 , H03L7/10 , H03L7/08 , H03L7/22 , H03L7/23
CPC分类号： H01S3/09702 , H01S3/09705 , H01S3/0975 , H03F3/602 , H03L7/099 , H03L7/0991 , H03L7/0994 , H03L7/23
摘要： An RF power-supply (30) for driving a carbon dioxide CO 2 gas- discharge laser (28) includes a plurality of power-oscillators (32) phase-locked to a common reference oscillator (11). Outputs of the phase-locked power-oscillators (32) are combined by a power combiner (18) for delivery, via an impedance matching network (22), to discharge-electrodes (24, 26) of the laser (28). In one example the power-oscillators are analog power-oscillators. In another example, the power-oscillators are digital power-oscillators.
摘要翻译：用于驱动二氧化碳CO 2气体放电激光器（28）的RF电源（30）包括多个与公共参考振荡器（11）锁相的功率振荡器（32）。锁相功率振荡器（32）的输出由功率组合器（18）组合，用于经由阻抗匹配网络（22）传送到激光器（28）的放电电极（24,26）。在一个示例中，功率振荡器是模拟功率振荡器。在另一个例子中，功率振荡器是数字功率振荡器。

3. 发明申请

WO2008130474A1 EXTENDABLE ELECTRODE FOR GAS DISCHARGE LASER 审中-公开
标题翻译：用于气体放电激光器的可扩展电极
公开(公告)号：WO2008130474A1
公开(公告)日：2008-10-30
申请号：PCT/US2008/003890
申请日：2008-03-25
申请人： CYMER, INC. (a Nevada Corporation) , SANDSTROM, Richard, L. , CHUNG, Tae, H. , UJAZDOWSKI, Richard, C.
发明人： SANDSTROM, Richard, L. , CHUNG, Tae, H. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/097
CPC分类号： H01S3/038 , H01S3/0381 , H01S3/09705 , H01S3/0971 , H01S3/225 , H01S3/2366
摘要： Disclosed herein are systems and methods for extending one or both of the discharge electrodes in a transverse discharge gas laser chamber in which one or both the electrodes are subject to a dimensional change due to erosion. Electrode extension can be performed to increase the chamber life, increase laser performance over the life of the chamber, or both. Operationally, the inter-electrode spacing may be adjusted to maintain a specific target gap distance between the electrodes or to optimize a specific parameter of the laser output beam such as bandwidth, pulse-to-pulse energy stability, beam size, etc.
摘要翻译：本文公开了用于在横向放电气体激光室中延伸一个或两个放电电极的系统和方法，其中一个或两个电极由于侵蚀而经受尺寸变化。可以执行电极延伸以增加室的寿命，在室的寿命或两者都增加激光器性能。可操作地，可以调整电极间间隔以维持电极之间的特定目标间隙距离或者优化激光输出光束的特定参数，例如带宽，脉冲到脉冲能量稳定性，光束尺寸等。

4. 发明申请

WO0184678A9 STABILIZATION TECHNIQUE FOR HIGH REPETITION RATE GAS DISCHARGE LASERS 审中-公开
标题翻译：用于高重复率气体放电激光器的稳定技术
公开(公告)号：WO0184678A9
公开(公告)日：2002-02-28
申请号：PCT/IB0101635
申请日：2001-04-18
申请人： LAMBDA PHYSIK AG
发明人： BRAGIN IGOR , BERGER VADIM , KLEINSCHMIDT JUERGEN
IPC分类号： H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/225 , H01S3/00
CPC分类号： H01S3/0971 , H01S3/09705 , H01S3/0975 , H01S3/225
摘要： Method and system for providing statilization techniques for high repetition rate gas discharge lasers with active loads provided in the discharge circuitry design which may include a resistance provided in the discharge circuitry.
摘要翻译：用于提供具有在放电电路设计中提供的有源负载的高重复率气体放电激光器的统计技术的方法和系统，其可以包括在放电电路中提供的电阻。

5. 发明申请

WO01024327A1 VERY NARROW BAND INJECTION SEEDED F2 LITHOGRAPHY LASER 审中-公开
标题翻译：非常窄带注射种子F2光刻激光
公开(公告)号：WO01024327A1
公开(公告)日：2001-04-05
申请号：PCT/US2000/025807
申请日：2000-09-19
IPC分类号： G03F7/20 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/102 , H01S3/139 , H01S3/223 , H01S3/225 , H01S3/23 , H01S3/10
CPC分类号： H01S3/10092 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/0385 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/139 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2308 , H01S3/2325 , H01S3/2333 , H01S3/2366
摘要： A turnable injection seeded very narrow band F2 lithography laser. The laser (60) combines modular design features of prior art long life reliable lithography lasers with special techniques to produce a seed beam (LNP15) operated in a first gain medium which beam (102) is used to stimulate narrow bnd lasing in a second gain medium to produce a very narrow band laser useful for integrated circuit lithography. In a preferred embodiment, two tunable etalon output couplers (164A, 164B) are used to narrow band an F2 laser and the output of the seed laser is amplified in an F2 amplifier.
摘要翻译：可转动注射种子非常窄的F2光刻激光。激光器（60）将现有技术的长寿命可靠光刻激光器的模块化设计特征与特殊技术相结合，以产生在第一增益介质中操作的种束（LNP15），其中该波束（102）用于在第二增益中刺激窄bnd激光以产生用于集成电路光刻的非常窄带激光器。在优选实施例中，使用两个可调标准器输出耦合器（164A，164B）来缩小F2激光器的频率，并且种子激光器的输出在F2放大器中被放大。

6. 发明申请

WO99060676A1 PULSED GAS LASER DEVICE 审中-公开
标题翻译：脉冲气体激光器件
公开(公告)号：WO99060676A1
公开(公告)日：1999-11-25
申请号：PCT/JP1999/002584
申请日：1999-05-18
IPC分类号： H01S3/03 , H01S3/038 , H01S3/097
CPC分类号： H01S3/09705 , H01S3/03 , H01S3/038
摘要： A pulsed gas laser device comprises a first main electrode (24), a cylindrical electrical discharge tube (21) of insulator to form a main electrical discharge path, and a second main electrode (25), which are arranged in line in this order, and medium gas is enclosed inside. A pair of mirrors (22) and (23) is arranged outside the first and second main electrodes to form an optical resonator, and a power supply (27) is provided for applying main discharge voltage between the first and second main electrodes. A cylindrical dielectric member (40) and an adjacent supplementary electrode (41) are provided near either or both of the first and second main electrodes. Means (28) for applying voltage to the supplementary electrode is provided so that plasma electrode (25a) may form inside the cylindrical dielectric member during operating.
摘要翻译：脉冲气体激光装置包括第一主电极（24），形成主放电路径的绝缘体的圆柱形放电管（21）和依次排成一行的第二主电极（25）中间气体封闭在里面。一对反射镜（22）和（23）布置在第一和第二主电极外部以形成光谐振器，并且提供电源（27）用于在第一和第二主电极之间施加主放电电压。在第一主电极和第二主电极之一或两者附近提供圆柱形电介质构件（40）和相邻辅助电极（41）。提供用于向辅助电极施加电压的装置（28），使得等离子体电极（25a）可以在操作期间在圆柱形电介质构件内形成。

7. 发明申请

WO2016094193A1 COMPENSATION FOR A DISTURBANCE IN AN OPTICAL SOURCE 审中-公开
标题翻译：补偿光源中的干扰
公开(公告)号：WO2016094193A1
公开(公告)日：2016-06-16
申请号：PCT/US2015/063802
申请日：2015-12-03
申请人： CYMER, LLC
发明人： AHLAWAT, Rahul
IPC分类号： G03F7/20
CPC分类号： H01S3/104 , H01S3/036 , H01S3/09705 , H01S3/0971 , H01S3/10069 , H01S3/1055 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2308 , H01S2301/02
摘要： A pulsed light beam emitted from an optical source is received, the pulsed light beam being associated with a temporal repetition rate; a frequency of a disturbance in the optical source is determined, the frequency being an aliased frequency that varies with the temporal repetition rate of the pulsed light beam; a correction waveform is generated based on the aliased frequency; and the disturbance in the optical source is compensated by modifying a characteristic of the pulsed light beam based on the generated correction waveform.
摘要翻译：接收从光源发射的脉冲光束，脉冲光束与时间重复率相关联; 确定光源中的干扰频率，该频率是随着脉冲光束的时间重复率而变化的混叠频率; 基于混叠频率产生校正波形; 并且通过基于所生成的校正波形修改脉冲光束的特性来补偿光源中的干扰。

8. 发明申请

WO2005060055A3 GAS DISCHARGE LASER LIGHT SOURCE BEAM DELIVERY UNIT 审中-公开
标题翻译：气体放电激光光源光束输送单元
公开(公告)号：WO2005060055A3
公开(公告)日：2006-03-02
申请号：PCT/US2004042472
申请日：2004-12-15
申请人： CYMER INC , DAS PALASH P , AHMED KURSHID , FRANCIS GREGORY , GLATZEL HOLGER , LUKASHEV ALEXEI , TYLER JEREOMY D , WEBB R KYLE
发明人： DAS PALASH P , AHMED KURSHID , FRANCIS GREGORY , GLATZEL HOLGER , LUKASHEV ALEXEI , TYLER JEREOMY D , WEBB R KYLE
IPC分类号： G03F7/20 , H01S20060101 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23 , H01S3/09
CPC分类号： B23K26/12 , B23K26/128 , B23K26/705 , G01J1/04 , G01J1/0418 , G01J1/4257 , G01J2001/0285 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A beam delivery unit and method of delivering a laser beam from a gas discharge laser systems comprise: a beam delivery enclosure; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. A beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery path. The BDU may have at least two enclosure isolation mechanisms comprising a first and second enclosure isolation mechanism on a first and second side of the enclosure from the at least one optic module; the BDU may have at least two enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.
摘要翻译：从气体放电激光系统输送激光束的光束传送单元和方法包括：光束传送罩; 可操作地连接到射束输送罩的清洗机构; 壳体内的原位光束参数监视和调节机构，包括可伸缩光束重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。包含在外壳内的光束衰减器单元可调节地安装在外壳内，用于定位在光束输送路径内。 BDU可以具有至少两个机壳隔离机构，其包括第一和第二机壳隔离机构，所述第一和第二机壳隔离机构在所述外壳的所述至少一个光学模块的第一和第二侧上; BDU可以具有至少两个外壳隔离机构，其包括具有金属对金属座位机构和锁定销组件的挡板阀。可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。可以提供外部运动学对准工具。公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

9. 发明申请

WO02078749A3 ATMOSPHERIC PRESSURE RF PLASMA SOURCE USING AMBIENT AIR AND COMPLEX MOLECULAR GASES 审中-公开
标题翻译：大气压RF等离子体源使用环境空气和复合分子气体
公开(公告)号：WO02078749A3
公开(公告)日：2003-04-10
申请号：PCT/US0208752
申请日：2002-03-21
申请人： UNIV CALIFORNIA
发明人： PARK JAEYOUNG , HENINS IVARS
IPC分类号： A23L3/26 , A61L2/00 , A61L2/14 , H01S3/097 , H05H1/00
CPC分类号： H01S3/097 , A23L3/26 , A61L2/0011 , A61L2/14 , H01S3/09705
摘要： An atomospheric pressure rf plasma processor (4) in which a plasma is created between two electrodes (2,8) using high frequency rf power (8), and a mixture of gases with a complex molecular gas as the majority component of the mixture of gases.
摘要翻译：大气压rf等离子体处理器（4），其中使用高频射频功率（8）在两个电极（2,8）之间产生等离子体，以及气体与复合分子气体的混合物作为混合物的大部分组分气体。

10. 发明申请

WO2002099938A1 INJECTION SEEDED F2 LASER WITH LINE SELECTION AND DISCRIMINATION 审中-公开
标题翻译：注射种子F2激光与线选择和歧视
公开(公告)号：WO2002099938A1
公开(公告)日：2002-12-12
申请号：PCT/US2002/021867
申请日：2002-04-03
申请人： CYMER, INC. , ONKELS, Eckehard, D. , SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , OH, Choonghoon
发明人： ONKELS, Eckehard, D. , SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , OH, Choonghoon
IPC分类号： H01S3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70483 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/082 , H01S3/0835 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/10092 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2325 , H01S3/2366
摘要： A narrow band F 2 laser system having two laser subsystems. The first laser subsystem is a seed laser (100) and provides a very narrow band pulsed beam at a first narrow wavelength range corresponding to a first natural emission line of the F 2 laser system. This beam is injected into the gain medium of the second laser subsystem (102) in a first direction where the beam is amplified to produce a narrow band pulsed output beam. The seed laser (100) also produces a second pulsed beam at a second wavelength range corresponding to a second natural emission line of the F 2 laser. This line is injected into the gain medium of the second laser subsystem (102) in a second direction opposite said first direction. The second beam is amplified in the gain medium of the second laser subsystem of the second laser subsystem and depletes the gain medium of gain potential at the second wavelength range. Thus, the portion of light at the second wavelength range in the output beam (124) is greatly reduced.
摘要翻译：具有两个激光子系统的窄带F2激光系统。第一激光子系统是种子激光器（100），并且在对应于F2激光系统的第一自然发射线的第一窄波长范围处提供非常窄的带状脉冲光束。该光束在第一方向上被注入到第二激光子系统（102）的增益介质中，其中该光束被放大以产生窄带脉冲输出光束。种子激光器（100）还在对应于F2激光器的第二自然发射线的第二波长范围上产生第二脉冲光束。该线在与第一方向相反的第二方向上被注入到第二激光子系统（102）的增益介质中。第二光束在第二激光子系统的第二激光子系统的增益介质中被放大，并且在第二波长范围消耗增益电位的增益介质。因此，输出光束（124）中第二波长范围内的光的部分大大减小。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式