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1. 发明申请

WO2011029151A1 PROTECTIVE COATING COMPOSITION 审中-公开
标题翻译：保护涂料组合物
公开(公告)号：WO2011029151A1
公开(公告)日：2011-03-17
申请号：PCT/AU2010/001177
申请日：2010-09-10
申请人： CTE PTY LTD , SWINDELLS, Darren James , SCHEIRS, John , CRANSTON, Robin William , DEAN, Francis Gregory , FULLSTON, Damian , PRINS, Martin Willem
发明人： SWINDELLS, Darren James , SCHEIRS, John , CRANSTON, Robin William , DEAN, Francis Gregory , FULLSTON, Damian , PRINS, Martin Willem
IPC分类号： C08L83/04 , C08K3/00 , C08K3/04 , C08K3/14 , C08K3/34 , C09K21/14
CPC分类号： C08L83/04 , C08G77/02 , C08G77/04 , C08L83/02 , C09D5/185 , C09D183/02 , C09D183/04 , Y10T428/24355 , Y10T442/20 , Y10T442/2902 , C08L83/00
摘要： A coating composition resistant to heat, flame and molten metal when applied as coating to a substrate. The composition includes an elastomeric binder and a particulate filler dispersed in the binder. The filler comprises particles of high aspect ratio in two dimensions relative to a third that co-operate when in a coating to provide a barrier within the binder. Also disclosed are an assembly comprising a substrate with a coating thereon, a fabric assembly resistant to spills and splashes of molten metal and a flame resistant building product.
摘要翻译：当作为涂层涂覆在基材上时，耐热，火焰和熔融金属的涂料组合物。组合物包括弹性体粘合剂和分散在粘合剂中的颗粒填料。填料包括相对于第三层的高纵横比的颗粒，其在涂层中进行协作以在粘合剂内提供阻挡层。还公开了一种组件，其包括其上具有涂层的基底，能够抵抗溢出物和熔融金属溅出的织物组合物和耐火建筑产品。

2. 发明申请

WO2009023111A1 CONTINUITY ADDITIVES AND THEIR USE IN POLYMERIZATION PROCESSES 审中-公开
标题翻译：连续添加剂及其在聚合工艺中的应用
公开(公告)号：WO2009023111A1
公开(公告)日：2009-02-19
申请号：PCT/US2008/009435
申请日：2008-08-06
申请人： UNIVATION TECHNOLOGIES, LLC , STAKEM, Francis, Gregory , AGAPIOU, Agapios, K. , HUSSEIN, F., David
发明人： STAKEM, Francis, Gregory , AGAPIOU, Agapios, K. , HUSSEIN, F., David
IPC分类号： C08F2/00 , C08F2/34 , C08F210/16
CPC分类号： C08F6/003 , C08F210/16 , C08F2410/02 , C08F2/005 , C08F2/34 , C08F210/14 , C08F2500/12
摘要： A continuity additive according to one general approach includes a substance having an ability to reduce, prevent, or mitigate at least one of fouling, sheeting, and static level of a material present in a polymerization reactor system when added to the reactor system in an effective amount, with the proviso that the substance is not a polysulfone polymer, a polymeric polyamine, or an oil-soluble sulfonic acid; and a scavenger contacted with the substance, optionally, the scavenger neutralizing water coming in contact therewith. Additional continuity additives, methods of making continuity additives, and use of continuity additives are also presented.
摘要翻译：根据一般方法的连续性添加剂包括具有降低，防止或减轻聚合反应器系统中存在的材料的污垢，片材和静态水平中的至少一种的能力的物质，当加入到反应器系统中时，量，条件是该物质不是聚砜聚合物，聚合多胺或油溶性磺酸; 和与该物质接触的清除剂，任选地，与其接触的清除剂中和水。还提出了附加的连续性添加剂，制备连续性添加剂的方法和连续性添加剂的使用。

3. 发明申请

WO2005060055A3 GAS DISCHARGE LASER LIGHT SOURCE BEAM DELIVERY UNIT 审中-公开
标题翻译：气体放电激光光源光束输送单元
公开(公告)号：WO2005060055A3
公开(公告)日：2006-03-02
申请号：PCT/US2004042472
申请日：2004-12-15
申请人： CYMER INC , DAS PALASH P , AHMED KURSHID , FRANCIS GREGORY , GLATZEL HOLGER , LUKASHEV ALEXEI , TYLER JEREOMY D , WEBB R KYLE
发明人： DAS PALASH P , AHMED KURSHID , FRANCIS GREGORY , GLATZEL HOLGER , LUKASHEV ALEXEI , TYLER JEREOMY D , WEBB R KYLE
IPC分类号： G03F7/20 , H01S20060101 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23 , H01S3/09
CPC分类号： B23K26/12 , B23K26/128 , B23K26/705 , G01J1/04 , G01J1/0418 , G01J1/4257 , G01J2001/0285 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A beam delivery unit and method of delivering a laser beam from a gas discharge laser systems comprise: a beam delivery enclosure; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. A beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery path. The BDU may have at least two enclosure isolation mechanisms comprising a first and second enclosure isolation mechanism on a first and second side of the enclosure from the at least one optic module; the BDU may have at least two enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.
摘要翻译：从气体放电激光系统输送激光束的光束传送单元和方法包括：光束传送罩; 可操作地连接到射束输送罩的清洗机构; 壳体内的原位光束参数监视和调节机构，包括可伸缩光束重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。包含在外壳内的光束衰减器单元可调节地安装在外壳内，用于定位在光束输送路径内。 BDU可以具有至少两个机壳隔离机构，其包括第一和第二机壳隔离机构，所述第一和第二机壳隔离机构在所述外壳的所述至少一个光学模块的第一和第二侧上; BDU可以具有至少两个外壳隔离机构，其包括具有金属对金属座位机构和锁定销组件的挡板阀。可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。可以提供外部运动学对准工具。公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

4. 发明申请

WO2003100826A3 LITHOGRAPHY LASER WITH BEAM DELIVERY AND BEAM POINTING CONTROL 审中-公开
公开(公告)号：WO2003100826A3
公开(公告)日：2003-12-04
申请号：PCT/US2003/014387
申请日：2003-05-05
申请人： CYMER, INC. , WEBB, R, Kyle , DAS, Palash P. , GIOVANARDI, Marco , FRANCIS, Gregory , DORN, Huckleberry B. , ERLANDSEN, Kyle P. , NELSON, John W. , SANDSTROM, Richard L. , ERSHOV, Alexander I.
发明人： DAS, Palash P. , GIOVANARDI, Marco , FRANCIS, Gregory , DORN, Huckleberry B. , ERLANDSEN, Kyle P. , NELSON, John W. , SANDSTROM, Richard L. , ERSHOV, Alexander I.
IPC分类号： H01S3/22
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source (Fig. 1) with a beam delivery to a production line machine (2). The system includes an enclosed (4) and purged beam path (14C) with a beam pointing control (40A) (40B) (6) for delivery of the laser beam to a desired location such as the entrance port of the production line machine (2). In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers (8)(10) are provided, one of which is a part of a master oscillator (8) producing a very narrow band seed beam (14A), which is amplified in the second discharge chamber (10). This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.

5. 发明申请

WO0213006A8 MULTIFUNCTION DISPLAY DESIGN TOOL 审中-公开
标题翻译：多功能显示设计工具
公开(公告)号：WO0213006A8
公开(公告)日：2002-08-29
申请号：PCT/US0123397
申请日：2001-07-24
申请人： FRANCIS GREGORY S , RASH CLARENCE E , REARDON MATTHEW J
发明人： FRANCIS GREGORY S , RASH CLARENCE E , REARDON MATTHEW J
IPC分类号： G06F9/44
CPC分类号： G06F9/4443
摘要： A method that includes but is not limited to accepting user input specifying a geometrical arrangement of two or more buttons on one or more displayed pages; accepting user input labeling at least two of the two or more buttons on the one or more displayed pages; accepting user input defining at least one interaction between the labeled at least two buttons; accepting user input specifying at least one constraint cost for the defined at least one interaction; and assigning the labels of the at least two buttons among the two or more buttons on one or more displayed pages such that the at least one constraint cost is substantially optimized. In addition to the foregoing, other method embodiments are described in the claims, drawings, and text forming a part of the present application. In one or more various embodiments, related systems include but are not limited to circuitry and/or programming for effecting the foregoing-described method embodiments; the circuitry and/or programming can be virtually any combination of hardware, software, and/or firmware configured to effect the foregoing-described method embodiments depending upon the design choices of the system designer.
摘要翻译：一种方法，包括但不限于接受指定一个或多个显示页面上的两个或更多个按钮的几何布置的用户输入; 接受用户输入标记所述一个或多个显示页面上的所述两个或更多个按钮中的至少两个按钮; 接受定义标记的至少两个按钮之间的至少一个交互的用户输入; 接受指定用于所定义的至少一个交互的至少一个约束成本的用户输入; 以及在一个或多个显示的页面上的两个或更多个按钮中分配至少两个按钮的标签，使得至少一个约束成本基本上被优化。除前述之外，形成本申请的一部分的权利要求，附图和文本中描述了其他方法实施例。在一个或多个各种实施例中，相关系统包括但不限于用于实现前述方法实施例的电路和/或编程; 取决于系统设计者的设计选择，电路和/或编程实际上可以是被配置为实现上述方法实施例的硬件，软件和/或固件的任何组合。

6. 发明申请

WO0213006A3 MULTIFUNCTION DISPLAY DESIGN TOOL 审中-公开
标题翻译：多功能显示设计工具
公开(公告)号：WO0213006A3
公开(公告)日：2007-11-15
申请号：PCT/US0123397
申请日：2001-07-24
申请人： FRANCIS GREGORY S , RASH CLARENCE E , REARDON MATTHEW J
发明人： FRANCIS GREGORY S , RASH CLARENCE E , REARDON MATTHEW J
IPC分类号： G06F9/44
CPC分类号： G06F9/4443
摘要： A method that includes but is not limited to accepting user input specifying a geometrical arrangement of two or more buttons on one or more displayed pages; accepting user input labeling at least two of the two or more buttons on the one or more displayed pages; accepting user input defining at least one interaction between the labeled at least two buttons; accepting user input specifying at least one constraint cost for the defined at least one interaction; and assigning the labels of the at least two buttons among the two or more buttons on one or more displayed pages such that the at least one constraint cost is substantially optimized. In addition to the foregoing, other method embodiments are described in the claims, drawings, and text forming a part of the present application. In one or more various embodiments, related systems include but are not limited to circuitry and/or programming for effecting the foregoing-described method embodiments; the circuitry and/or programming can be virtually any combination of hardware, software, and/or firmware configured to effect the foregoing-described method embodiments depending upon the design choices of the system designer.
摘要翻译：一种方法，包括但不限于接受指定一个或多个显示页面上的两个或多个按钮的几何排列的用户输入; 在一个或多个显示的页面上接受用户输入标签中的两个或更多个按钮中的至少两个; 接受定义所述标记的至少两个按钮之间的至少一个交互的用户输入; 接受用于指定所述至少一个交互的至少一个约束成本的用户输入; 以及在所述两个或更多个按钮中的所述两个或更多个按钮中分配所述至少两个按钮的标签，使得所述至少一个约束成本基本上被优化。除了上述之外，其他方法实施例在形成本申请的一部分的权利要求，附图和文本中被描述。在一个或多个各种实施例中，相关系统包括但不限于用于实现前述方法实施例的电路和/或编程; 根据系统设计者的设计选择，电路和/或编程实际上可以是被配置为实现上述方法实施例的硬件，软件和/或固件的任何组合。

7. 发明申请

WO2005060055A2 GAS DISCHARGE LASER LIGHT SOURCE BEAM DELIVERY UNIT 审中-公开
标题翻译：气体放电激光光源光束输送单元
公开(公告)号：WO2005060055A2
公开(公告)日：2005-06-30
申请号：PCT/US2004/042472
申请日：2004-12-15
申请人： CYMER, INC. , DAS, Palash, P. , AHMED, Kurshid , FRANCIS, Gregory , GLATZEL, Holger , LUKASHEV, Alexei , TYLER, Jereomy, D. , WEBB, R., Kyle
发明人： DAS, Palash, P. , AHMED, Kurshid , FRANCIS, Gregory , GLATZEL, Holger , LUKASHEV, Alexei , TYLER, Jereomy, D. , WEBB, R., Kyle
IPC分类号： H01S
CPC分类号： B23K26/12 , B23K26/128 , B23K26/705 , G01J1/04 , G01J1/0418 , G01J1/4257 , G01J2001/0285 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery path from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery path. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.
摘要翻译：公开了一种光束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法，其可以包括：限定输出激光束脉冲束传送从气体放电激光器的输出到使用包含在输出激光脉冲光束中的光的工作装置的输入的路径; 可操作地连接到射束输送罩的清洗机构; 壳体内的原位光束参数监视和调节机构，包括可伸缩光束重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在可调节地安装在外壳内的外壳内的光束衰减器单元，用于定位在光束输送路径内。 BDU可以具有至少两个机壳隔离机构，该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构，所述第二外壳隔离机构与所述至少一个光学模块每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。可以提供外部运动学对准工具。公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

8. 发明申请

WO03100826A8 LITHOGRAPHY LASER WITH BEAM DELIVERY AND BEAM POINTING CONTROL 审中-公开
标题翻译：光束传输和光束控制的光刻激光器
公开(公告)号：WO03100826A8
公开(公告)日：2004-11-25
申请号：PCT/US0314387
申请日：2003-05-05
申请人： CYMER INC , DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
发明人： DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
IPC分类号： H01L21/027 , G02B26/08 , G02B27/09 , G03F7/20 , H01L20060101 , H01L21/00 , H01S3/00 , H01S3/034 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/0971 , H01S3/10 , H01S3/13 , H01S3/134 , H01S3/136 , H01S3/137 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/7055 , G02B26/0816 , G02B27/0972 , G03F7/70025 , G03F7/70041 , G03F7/70058 , H01S3/005 , H01S3/0057 , H01S3/036 , H01S3/041 , H01S3/0971 , H01S3/136 , H01S3/137 , H01S3/225 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source (Fig. 1) with a beam delivery to a production line machine (2). The system includes an enclosed (4) and purged beam path (14C) with a beam pointing control (40A) (40B) (6) for delivery of the laser beam to a desired location such as the entrance port of the production line machine (2). In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers (8)(10) are provided, one of which is a part of a master oscillator (8) producing a very narrow band seed beam (14A), which is amplified in the second discharge chamber (10). This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译：本发明提供了一种模块化的高重复频率紫外线气体放电激光光源（图1），光束传输到生产线机器（2）。该系统包括具有光束指向控制器（40A）（40B）（6）的封闭（4）和清洗光束路径（14C），用于将激光束传送到期望位置，例如生产线机器的入口 2）。在优选实施例中，生产线机器是光刻机器（2），并且提供两个单独的放电室（8）（10），其中一个是主振荡器（8）的一部分，产生非常窄带的种子束在第二放电室（10）中被放大。该MOPA系统的输出脉冲能量大约是可比较的单腔激光系统的两倍，大大改善了光束质量。

9. 发明申请

WO2003100826A2 LITHOGRAPHY LASER WITH BEAM DELIVERY AND BEAM POINTING CONTROL 审中-公开
标题翻译：光束激光与光束输送和光束点控制
公开(公告)号：WO2003100826A2
公开(公告)日：2003-12-04
申请号：PCT/US2003/014387
申请日：2003-05-05
申请人： CYMER, INC. , WEBB, R, Kyle , DAS, Palash P. , GIOVANARDI, Marco , FRANCIS, Gregory , DORN, Huckleberry B. , ERLANDSEN, Kyle P. , NELSON, John W. , SANDSTROM, Richard L. , ERSHOV, Alexander I.
发明人： DAS, Palash P. , GIOVANARDI, Marco , FRANCIS, Gregory , DORN, Huckleberry B. , ERLANDSEN, Kyle P. , NELSON, John W. , SANDSTROM, Richard L. , ERSHOV, Alexander I.
IPC分类号： H01L
CPC分类号： G03F7/7055 , G02B26/0816 , G02B27/0972 , G03F7/70025 , G03F7/70041 , G03F7/70058 , H01S3/005 , H01S3/0057 , H01S3/036 , H01S3/041 , H01S3/0971 , H01S3/136 , H01S3/137 , H01S3/225 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. Preferred embodiments include equipment for beam attenuation, equipment for automatic feedback beam alignment and equipment for accurate optics module positioning at installation and during maintenance. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.
摘要翻译：本发明提供了一种向生产线机器输送光束的模块化高重复率紫外线气体放电激光光源。该系统包括具有光束指向控制的封闭和清除的光束路径，用于将激光束传送到期望的位置，例如生产线机器的入口。优选实施例包括用于光束衰减的设备，用于自动反馈光束对准的设备和用于在安装和维护期间精确的光学模块定位的设备。在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。

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