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1. 发明申请

WO2020041656A1 LASER CUTTER AND SAFE POWER SYSTEM THEREFOR 审中-公开
公开(公告)号：WO2020041656A1
公开(公告)日：2020-02-27
申请号：PCT/US2019/047820
申请日：2019-08-23
申请人： ROBERT BOSCH GMBH , HERMAN, Gregory, A. , COOPER, James, Randall , BERNARDI, Walter , PADGET, Bradley, D. , NESS, Richard, M. , WHEELER, Emory
发明人： HERMAN, Gregory, A. , COOPER, James, Randall , BERNARDI, Walter , PADGET, Bradley, D. , NESS, Richard, M. , WHEELER, Emory
IPC分类号： B23K26/38 , B23K26/70
摘要： A laser cutter and safe power system therefor are disclosed. The power system of the laser cutter includes a resistive device arranged in a return line and configured to prevent anomalous tripping of a GFCI device by significantly minimizing electrical noise transmitted through the GFCI device when the laser cutter is operated in certain modes, such as a pulsing mode. The resistive device includes end caps that form a shroud around the connection between a return wire and the contact at each end of the resistive device. A main control board for a high voltage subsystem of the power system includes two isolated and independent enable signals, which are provided to different controllers on the main control board such that the different controllers can independently and redundantly respond to an unsafe condition.

2. 发明申请

WO2005001853A2 METHOD AND APPARATUS FOR COOLING MAGNETIC CIRCUIT ELEMENTS 审中-公开
标题翻译：用于冷却磁电元件的方法和装置
公开(公告)号：WO2005001853A2
公开(公告)日：2005-01-06
申请号：PCT/US2004/018941
申请日：2004-06-14
申请人： CYMER, INC. , NESS, Richard, M. , PARTLO, William, N. , MELCHER, Paul, C. , FERGUSON, George, X. , SAETHRE, Robert, B.
发明人： NESS, Richard, M. , PARTLO, William, N. , MELCHER, Paul, C. , FERGUSON, George, X. , SAETHRE, Robert, B.
IPC分类号： H01F
CPC分类号： H01F27/266 , H01F27/025 , H01F27/10 , H01S3/097
摘要： An apparatus and method for providing cooling to a magnetic circuit element having a magnetic core disposed around a centrally located core support member having at least one core support member wall is disclosed which may comprise a core support coolant inlet; a core support coolant outlet; a plurality of interconnected coolant flow passages contained within the core support member wall and interconnected and arranged to pass coolant from one coolant flow passage to the next within the core support member wall along a coolant flow path within at least a substantial portion of the core support member wall from the core support coolant inlet to the core support coolant outlet. The apparatus may also comprise each core support coolant flow passage is in fluid communication with a fluid communication plenum at each end of each respective core support coolant flow passage, with each respective fluid communication plenum forming an outlet plenum for at least a first one of the respective core support coolant flow passages and an inlet plenum for at least a second one of the respective core support coolant flow passages along the coolant flow path from the core support coolant inlet to the core support coolant outlet. The core support member may comprise a flange extending from the core support member, the flange having an inner dimension and an outer dimension, which may also comprise a plurality of interconnected flange coolant flow passages extending alternatively toward the inner dimension and away from the outer dimension and then toward the outer dimension and away from the inner dimension, between the core support coolant inlet and the core support coolant outlet. The core and core support may be contained in a housing which may comprise a housing wall; a housing coolant inlet; a housing coolant outlet; and a plurality of interconnected housing coolant flow passages contained within the housing wall and interconnected and arranged to pass coolant from one coolant flow passage to the next within the housing wall along a coolant flow path within at least a substantial portion of the housing wall from the housing coolant inlet to the housing coolant outlet. The housing and core support may forma a part of at least a portion of an electrical current flow path forming two turns around the magnetic core. In another aspect of the invention buswork may be coated with a thin film of electrically conductive material.
摘要翻译：公开了一种用于向具有设置在具有至少一个芯支撑构件壁的中心定位的芯支撑构件周围的磁芯的磁路元件提供冷却的装置和方法，其可包括芯支撑冷却剂入口; 核心支撑冷却液出口; 多个互连的冷却剂流动通道，其容纳在所述芯部支撑构件壁内并且互连并且布置成沿着所述芯部支撑件的至少大部分内的冷却剂流动路径将冷却剂从一个冷却剂流动通道传递到所述芯部支撑构件壁内的下一个构件壁从芯部支撑冷却剂入口到芯部支撑冷却剂出口。该装置还可以包括每个芯支撑冷却剂流动通道与每个相应的芯支撑冷却剂流动通道的每个端部处的流体连通通气室流体连通，每个相应的流体连通增压室形成出口压力室，用于至少第一个相应的芯支撑冷却剂流动通道和用于沿着从芯支撑冷却剂入口到芯支撑冷却剂出口的冷却剂流动路径的相应的芯支撑冷却剂流动通道中的至少第二个的入口气室。芯支撑构件可以包括从芯支撑构件延伸的凸缘，凸缘具有内部尺寸和外部尺寸，该凸缘还可以包括多个互连的凸缘冷却剂流动通道，所述凸缘冷却剂流动通道相对于内部尺寸交替地延伸并远离外部尺寸然后朝向外部尺寸并远离内部尺寸，在核心支撑冷却剂入口和芯部支撑冷却剂出口之间。芯和芯支撑件可以包含在可以包括壳体壁的壳体中; 壳体冷却剂入口; 外壳冷却液出口; 以及多个互连的壳体冷却剂流动通道，其容纳在所述壳体壁内并且被互连并且布置成将冷却剂沿着沿着所述壳体壁的至少大部分内的冷却剂流动路径从所述壳体壁在所述壳体壁内向下流动将冷却剂入口容纳到壳体冷却剂出口。壳体和芯部支撑件可以形成绕磁芯形成两圈的电流流路的至少一部分的一部分。在本发明的另一方面，母线可以涂覆有导电材料的薄膜。

3. 发明申请

WO2003087867A2 EXTREME ULTRAVIOLET LIGHT SOURCE 审中-公开
标题翻译：极光紫外线光源
公开(公告)号：WO2003087867A2
公开(公告)日：2003-10-23
申请号：PCT/US2003/011139
申请日：2003-04-09
申请人： CYMER, INC. , MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
发明人： MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
IPC分类号： G01S
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high-energy photon source. Very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译：在真空室中产生可靠的高重复率生产线相容的高能光子源，其中包含具有期望的极紫外（EUV）波长范围内的发射线的原子元素的热等离子体。 EUV光源单元直接集成到诸如步进机之类的光刻单元中。集成部件可以包括评论者，以及如（120）所示的固态脉冲功率单元和真空容器的压缩头。支撑设备位于支撑设备柜（122）中，粗抽真空泵和高压水泵位于第三柜（124）中。脉冲功率单元提供电脉冲，其具有足够的能量和电势，足以在连续的基础上以超过5瓦的速率在中间焦点产生EUV光，并且在突发的基础上超过20瓦。

4. 发明申请

WO2002082601A1 INJECTION SEEDED F2 LASER WITH WAVELENGTH CONTROL 审中-公开
标题翻译：注射种子F2激光与波长控制
公开(公告)号：WO2002082601A1
公开(公告)日：2002-10-17
申请号：PCT/US2002/009625
申请日：2002-03-29
申请人： CYMER, INC. , SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , ONKELS, Eckehard, D. , OH, Choonghoon
发明人： SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , ONKELS, Eckehard, D. , OH, Choonghoon
IPC分类号： H01S3/22
CPC分类号： H01S3/105 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/08063 , H01S3/08068 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/10092 , H01S3/104 , H01S3/1305 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2325 , H01S3/2366
摘要： The present invention provides a narrow band laser system having two laser subsystems. The first laser subsystem (seed laser) provides a very narrow band pulsed output beam which is used to injection seed the second laser subsystem (slave osc. or power amp.) where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply (pulse power) precisely times the discharges in the two laser subsystems so that the discharges are properly synchronized. The laser gas comprises F 2 at a partial pressure less than about 1 % with a buffer gas comprised of helium, neon, or a combination thereof. Control of the center wavelength of the output beam is provided by adjusting one or more of the following parameters in the first laser subsystem: the total laser gas pressure, the relative concentration of helium or neon, F 2 partial pressure, laser gas temperature, discharge voltage and pulse energy.
摘要翻译：本发明提供一种具有两个激光子系统的窄带激光系统。第一个激光子系统（种子激光器）提供了一个非常窄的带状脉冲输出光束，用于对第二激光子系统（从属或功率放大器）进行种子注入，其中窄带脉冲种子光束被放大以产生窄带脉冲输出光束。脉冲电源（脉冲功率）精确地乘以两个激光子系统中的放电，使得放电正确同步。激光气体包含分压为小于约1％的F2，其中包含氦，氖或其组合的缓冲气体。通过调整第一激光子系统中的一个或多个以下参数来提供输出光束的中心波长的控制：总激光气体压力，氦或氖的相对浓度，F2分压，激光气体温度，放电电压和脉冲能量。

5. 发明申请

WO2007041232A3 6K PULSE REPETITION RATE AND ABOVE GAS DISCHARGE LASER SYSTEM SOLID STATE PULSE POWER SYSTEM IMPROVEMENTS 审中-公开
公开(公告)号：WO2007041232A3
公开(公告)日：2007-04-12
申请号：PCT/US2006/037884
申请日：2006-09-27
申请人： CYMER, INC. , HUANG, Chaofeng , MELCHER, Paul, C. , NESS, Richard, M.
发明人： HUANG, Chaofeng , MELCHER, Paul, C. , NESS, Richard, M.
IPC分类号： H01S3/22
摘要： A method and apparatus for operating a very high repetition gas discharge laser system magnetic switch pulsed power system is disclosed, which may comprise a solid state switch, a charging power supply electrically connected to one side of the solid state switch; a charging inductor electrically connected to the other side of the solid state switch; a deque circuit electrically in parallel with the solid state switch comprising a deque switch; a peaking capacitor electrically connected to the charging inductor, a peaking capacitor charging control system operative to charge the peaking capacitor by opening the deque switch and leaving the solid state switch open and then shutting the solid state switch. The solid state switch may comprise a plurality of solid state switches electrically in parallel.

6. 发明申请

WO2003049241A1 TIMING CONTROL FOR TWO-CHAMBER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：两台气体放电激光系统的时序控制
公开(公告)号：WO2003049241A1
公开(公告)日：2003-06-12
申请号：PCT/US2002/034045
申请日：2002-10-23
申请人： CYMER INC. , ERSHOV, Alexander, I. , NESS, Richard, M.
发明人： ERSHOV, Alexander, I. , NESS, Richard, M.
IPC分类号： H01S3/22
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308 , H01S3/2333 , H01S3/2366
摘要： Feedback timing control equipment and process for an injection seeded modular gas discharge laser (11). A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. The feedback timing control is programmed to permit in some circumstances discharges timed so that no significant laser energy is output from the system. Use of this technique permits burst mode operation in which the first discharge of a burst is a no-output discharge so that timing parameters for each of the two chambers can be monitored before the first laser output pulse of the burst. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber.
摘要翻译：反馈定时控制设备和注射种子模块化气体放电激光器的工艺（11）。优选的实施方案是能够以大约4,000Hz或更大的脉冲速率产生高质量脉冲激光束并且在约20至40瓦或更大的集成输出的脉冲能量为约5至10mJ或更大的系统。反馈定时控制被编程为允许在某些情况下放电定时，使得不会从系统输出显着的激光能量。使用这种技术允许突发模式操作，其中突发的第一次放电是无输出放电，使得可以在突发的第一激光输出脉冲之前监视两个室中的每一个的定时参数。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许在主振荡器中优化波长参数并优化放大室中的脉冲能量参数。

7. 发明申请

WO2002093699A1 FOUR KHz GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：四吉兹气体放电激光系统
公开(公告)号：WO2002093699A1
公开(公告)日：2002-11-21
申请号：PCT/US2002/012062
申请日：2002-04-15
申请人： CYMER, INC. , WITTAK, Christian, J. , PARTLO, William, N. , SANDSTROM, Richard, L. , MELCHER, Paul, C. , JOHNS, David, M. , SAETHRE, Robert, B. , NESS, Richard, M. , RETTIG, Curtis, L. , SHANNON, Robert, A. , UJAZDOWSKI, Richard, C. , ROKNI, Shahryar , SMITH, Scott , ANDERSON, Stuart, L. , ALGOTS, John, M. , SPANGLER, Ronald, L. , FOMENKOV, Igor , STEIGER, Thomas, D. , EMILO, Jerome, A. , TITUS, Clay, C. , IVASCHENKO, Alex, P. , ZAMBON, Paolo , PADMABANDU, Gamaralalage, G. , BRANHAM, Mark, S. , PHATAK, Sanjay , CYBULSKI, Raymond
发明人： WITTAK, Christian, J. , PARTLO, William, N. , SANDSTROM, Richard, L. , MELCHER, Paul, C. , JOHNS, David, M. , SAETHRE, Robert, B. , NESS, Richard, M. , RETTIG, Curtis, L. , SHANNON, Robert, A. , UJAZDOWSKI, Richard, C. , ROKNI, Shahryar , SMITH, Scott , ANDERSON, Stuart, L. , ALGOTS, John, M. , SPANGLER, Ronald, L. , FOMENKOV, Igor , STEIGER, Thomas, D. , EMILO, Jerome, A. , TITUS, Clay, C. , IVASCHENKO, Alex, P. , ZAMBON, Paolo , PADMABANDU, Gamaralalage, G. , BRANHAM, Mark, S. , PHATAK, Sanjay , CYBULSKI, Raymond
IPC分类号： H01S3/10
CPC分类号： G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter (4K) with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror, which is in a line narrowing module (15K) and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors (16K and 17K) drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以约4,000Hz的脉冲速率产生高质量的脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长计（4K）监视输出光束参数，并控制一个非常快的PZT驱动调光镜，它在一个线路变窄模块（15K）和脉冲功率充电电压，以保持波长和脉冲能量达到所需的极限。在优选实施例中，两个风扇马达（16K和17K）驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

8. 发明申请

WO2004012308A2 CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER 审中-公开
标题翻译：两台气体放电激光器的控制系统
公开(公告)号：WO2004012308A2
公开(公告)日：2004-02-05
申请号：PCT/US2003/024146
申请日：2003-07-30
申请人： CYMER, INC. , FALLON, John, P. , RULE, John, A. , JACQUES, Robert, N. , LIPCON, Jacob, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , ERSHOV, Alexander I. , ISHIHARA, Toshihiko , MEISNER, John , NESS, Richard, M. , MELCHER, Paul, C.
发明人： FALLON, John, P. , RULE, John, A. , JACQUES, Robert, N. , LIPCON, Jacob, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , ERSHOV, Alexander I. , ISHIHARA, Toshihiko , MEISNER, John , NESS, Richard, M. , MELCHER, Paul, C.
IPC分类号： H01S
CPC分类号： H01S3/2333 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultra violet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F 2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。特别适用于双室气体放电激光系统的新型控制功能包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F2注入控制与新的学习算法。

9. 发明申请

WO2003021728A3 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开
公开(公告)号：WO2003021728A3
公开(公告)日：2003-03-13
申请号：PCT/US2002/027925
申请日：2002-08-28
申请人： CYMER, INC. , KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
IPC分类号： H01S3/11
摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4,000 Hz or greater by cleaning debris from the discharge region in less time that the approximately 0.25 milliseconds between pulses. The masters oscillation is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

10. 发明申请

WO2006105119A2 6 KHz AND ABOVE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译： 6 KHz和以上气体放电激光系统
公开(公告)号：WO2006105119A2
公开(公告)日：2006-10-05
申请号：PCT/US2006/011339
申请日：2006-03-27
申请人： CYMER, INC. , UJAZDOWSKI, Richard, C. , NESS, Richard, M. , ALGOTS, J., Martin , FLEUROV, Vladimir, B. , PALENSCHAT, Frederick, A. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , STEIGER, Thomas, D. , SMITH, Brett, D. , MCKELVY, Thomas, E.
发明人： UJAZDOWSKI, Richard, C. , NESS, Richard, M. , ALGOTS, J., Martin , FLEUROV, Vladimir, B. , PALENSCHAT, Frederick, A. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , STEIGER, Thomas, D. , SMITH, Brett, D. , MCKELVY, Thomas, E.
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/036 , H01F3/10 , H01F27/22 , H01F27/266 , H01F38/10 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/225 , H01S3/2308
摘要： A high pulse repetition rate gas discharge laser system pulse power system magnetic reactor may comprise a housing comprising a core containing compartment between an inner wall of the housing, an outer wall and a bottom wall of the housing; a cooling mechanism operative to withdraw heat from the at least one of the inner wall, outer wall and bottom of the housing; at least one two magnetic cores contained within the core containing compartment; a cooling fin disposed between each of the at least two magnetic cores; and a thermal conductivity enhancement mechanism intermediate at least one of each respective cooling fin and each respective core and a respective one of the inner wall, the outer wall or the bottom wall, the thermal conductivity enhancement mechanism comprising a band comprising a plurality of torsion spring or leaf spring elements.
摘要翻译：高脉冲重复率气体放电激光系统脉冲功率系统磁反应器可以包括壳体，该壳体包括在壳体的内壁，外壁和壳体的底壁之间的容纳核心的隔间; 冷却机构，用于从壳体的内壁，外壁和底部中的至少一个中提取热量; 至少一个两个磁芯包含在所述芯容纳室内; 设置在所述至少两个磁芯中的每一个之间的冷却翅片; 以及在每个相应的冷却翅片和每个相应的芯部以及内壁，外壁或底壁中的相应的一个中的至少一个的热导率增强机构，所述热导率增强机构包括包括多个扭转弹簧或板簧元件。

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