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1. 发明申请

WO2009117048A2 SYSTEM AND METHODS FOR TARGET MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：用于激光产生的等离子体EUV光源中目标材料输送的系统和方法
公开(公告)号：WO2009117048A2
公开(公告)日：2009-09-24
申请号：PCT/US2009/000994
申请日：2009-02-17
申请人： CYMER, INC. , VASCHENKO, Georgiy, O. , BYKANOV, Alexander, N. , BOWERING, Norbert, R. , BRANDT, David, C. , ERSHOV, Alexander, I. , SIMMONS, Rodney, D. , KHODYKIN, Oleh, V. , FOMENKOV, Igor, V.
发明人： VASCHENKO, Georgiy, O. , BYKANOV, Alexander, N. , BOWERING, Norbert, R. , BRANDT, David, C. , ERSHOV, Alexander, I. , SIMMONS, Rodney, D. , KHODYKIN, Oleh, V. , FOMENKOV, Igor, V.
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：这里公开的设备可以包括EUV反射光学元件，该EUV反射光学元件具有限定旋转轴线和圆形外围的旋转表面。光学器件可以被定位成相对于水平面以非零角度倾斜轴线，并且在外围投影界定水平面中的区域的情况下建立水平面中的外围的垂直投影。该装置可以进一步包括输送目标材料的系统，该系统具有目标材料释放点，该目标材料释放点位于水平平面中并且位于该区域之外并且由周边投影和生成用于照射目标材料以产生激光束的激光束 EUV排放。

2. 发明申请

WO2003087867A2 EXTREME ULTRAVIOLET LIGHT SOURCE 审中-公开
标题翻译：极光紫外线光源
公开(公告)号：WO2003087867A2
公开(公告)日：2003-10-23
申请号：PCT/US2003/011139
申请日：2003-04-09
申请人： CYMER, INC. , MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
发明人： MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
IPC分类号： G01S
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high-energy photon source. Very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译：在真空室中产生可靠的高重复率生产线相容的高能光子源，其中包含具有期望的极紫外（EUV）波长范围内的发射线的原子元素的热等离子体。 EUV光源单元直接集成到诸如步进机之类的光刻单元中。集成部件可以包括评论者，以及如（120）所示的固态脉冲功率单元和真空容器的压缩头。支撑设备位于支撑设备柜（122）中，粗抽真空泵和高压水泵位于第三柜（124）中。脉冲功率单元提供电脉冲，其具有足够的能量和电势，足以在连续的基础上以超过5瓦的速率在中间焦点产生EUV光，并且在突发的基础上超过20瓦。

3. 发明申请

WO2009117048A3 SYSTEM AND METHODS FOR TARGET MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源的目标物质输送系统与方法
公开(公告)号：WO2009117048A3
公开(公告)日：2009-12-30
申请号：PCT/US2009000994
申请日：2009-02-17
申请人： CYMER INC , VASCHENKO GEORGIY O , BYKANOV ALEXANDER N , BOWERING NORBERT R , BRANDT DAVID C , ERSHOV ALEXANDER I , SIMMONS RODNEY D , KHODYKIN OLEH V , FOMENKOV IGOR V
发明人： VASCHENKO GEORGIY O , BYKANOV ALEXANDER N , BOWERING NORBERT R , BRANDT DAVID C , ERSHOV ALEXANDER I , SIMMONS RODNEY D , KHODYKIN OLEH V , FOMENKOV IGOR V
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。

4. 发明申请

WO2007053334A3 EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源
公开(公告)号：WO2007053334A3
公开(公告)日：2009-04-30
申请号：PCT/US2006041102
申请日：2006-10-20
申请人： CYMER INC , BOWERING NORBERT R , HANSSON BJORN A M , SIMMONS RODNEY D
发明人： BOWERING NORBERT R , HANSSON BJORN A M , SIMMONS RODNEY D
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/006
摘要： An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced EUV light focused to a focus point; a first EUV exit sleeve comprising a terminal end comprising an opening facing the exit opening; a first exit sleeve chamber housing the first exit sleeve and having an EUV light exit opening; a gas supply mechanism supplying gas under a pressure higher than the pressure within the plasma production chamber to the first exit sleeve chamber. The first exit sleeve may be tapered toward the terminal end opening, and may, e.g., be conical in shape comprising a narrowed end at the terminal end.
摘要翻译：公开了一种EUV光源及其操作方法，其可以包括：EUV等离子体生成室，其包括室壁，该室壁包括用于使产生的EUV光聚焦到聚焦点的通过的出口; 第一EUV出口套筒，其包括终端，所述终端包括面向所述出口的开口; 第一出口套筒室，其容纳所述第一出口套筒并具有EUV光出口; 气体供给机构，其在高于等离子体生成室内的压力的压力下向第一出口套筒室供给气体。第一出口套筒可以朝向终端开口渐缩，并且可以例如是在终端处包括窄端的圆锥形形状。

5. 发明申请

WO2007002748A3 LPP EUV DRIVE LASER INPUT SYSTEM 审中-公开
公开(公告)号：WO2007002748A3
公开(公告)日：2007-01-04
申请号：PCT/US2006/025171
申请日：2006-06-27
申请人： CYMER, INC. , SIMMONS, Rodney, D. , VIATELLA, John , HOFFMAN, Jerzy, R. , WEBB, R., Kyle , BYKANOV, Alexander, N. , KHODYKIN, Oleh
发明人： SIMMONS, Rodney, D. , VIATELLA, John , HOFFMAN, Jerzy, R. , WEBB, R., Kyle , BYKANOV, Alexander, N. , KHODYKIN, Oleh
IPC分类号： G21G4/02 , G21G4/04 , G01J3/10
摘要： A laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source and method of operating same is disclosed which may comprise an EUV plasma production chamber (12) having a chamber wall (14); a drive laser entrance window (16) in the chamber wall; a drive laser entrance enclosure (20) intermediate the entrance window (16) and a plasma initiation site (not shown) within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening (120) and the entrance window comprising at least one drive laser passage aperture (92). The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space (not shown). The at least one drive laser aperture passage (80) may comprise at least two drive laser aperture passages (82, 84).

6. 发明申请

WO2007053334A2 EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源
公开(公告)号：WO2007053334A2
公开(公告)日：2007-05-10
申请号：PCT/US2006/041102
申请日：2006-10-20
申请人： CYMER, INC. , BOWERING, Norbert, R. , HANSSON, Bjorn, A.m. , SIMMONS, Rodney, D.
发明人： BOWERING, Norbert, R. , HANSSON, Bjorn, A.m. , SIMMONS, Rodney, D.
IPC分类号： G21K5/04
CPC分类号： H05G2/003 , H05G2/006
摘要： An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced EUV light focused to a focus point; a first EUV exit sleeve comprising a terminal end comprising an opening facing the exit opening; a first exit sleeve chamber housing the first exit sleeve and having an EUV light exit opening; a gas supply mechanism supplying gas under a pressure higher than the pressure within the plasma production chamber to the first exit sleeve chamber. The first exit sleeve may be tapered toward the terminal end opening, and may, e.g., be conical in shape comprising a narrowed end at the terminal end.
摘要翻译：公开了一种EUV光源及其操作方法，其可以包括：EUV等离子体生成室，其包括室壁，该室壁包括用于使产生的EUV光聚焦到聚焦点的通过的出口; 第一EUV出口套筒，其包括终端，所述终端包括面向所述出口的开口; 第一出口套筒室，其容纳所述第一出口套筒并具有EUV光出口; 气体供给机构，其在高于等离子体生成室内的压力的压力下向第一出口套筒室供给气体。第一出口套筒可以朝向终端开口渐缩，并且可以例如是在终端处包括窄端的圆锥形形状。

7. 发明申请

WO2007002748A2 LPP EUV DRIVE LASER INPUT SYSTEM 审中-公开
标题翻译： LPP EUV驱动激光输入系统
公开(公告)号：WO2007002748A2
公开(公告)日：2007-01-04
申请号：PCT/US2006025171
申请日：2006-06-27
申请人： CYMER INC , SIMMONS RODNEY D , VIATELLA JOHN , HOFFMAN JERZY R , WEBB R KYLE , BYKANOV ALEXANDER N , KHODYKIN OLEH
发明人： SIMMONS RODNEY D , VIATELLA JOHN , HOFFMAN JERZY R , WEBB R KYLE , BYKANOV ALEXANDER N , KHODYKIN OLEH
IPC分类号： G21G4/00
CPC分类号： H05G2/001
摘要： A laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.
摘要翻译：公开了一种激光产生的等离子体（“LPP”）极紫外（“EUV”）光源及其操作方法，其可以包括具有室壁的EUV等离子体生产室; 在室壁中的驱动激光入口窗口; 在入口窗口中间的驱动激光入口外壳和腔室内的等离子体起始位置，并且包括入口外壳远端开口; 在远端开口和入口窗之间的至少一个孔板包括至少一个驱动激光通道孔。至少一个孔板可以包括至少两个孔板，其包括限定孔板中间空间的第一孔板和第二孔板。至少一个驱动激光孔通道可以包括至少两个驱动激光孔通道。激光通道孔可以限定足够大的开口，以使驱动激光束通过而没有衰减并且足够小以基本上减少通过入口窗的方向穿过激光通道孔的碎屑。

8. 发明申请

WO2003087867A3 EXTREME ULTRAVIOLET LIGHT SOURCE 审中-公开
公开(公告)号：WO2003087867A3
公开(公告)日：2003-10-23
申请号：PCT/US2003/011139
申请日：2003-04-09
申请人： CYMER, INC. , MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
发明人： MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
IPC分类号： G01J1/00
摘要： A reliable, high-repetition rate, production line compatible high energy photon source wherein hot plasma containing an atomic element having an emission line within a desired extreme ultraviolet (EUV) wavelength range is produced in a vacuum chamber. The EUV light source unit is integrated directly into a lithography unit such as a stepper machine. The integrated parts may include a commentator, and a compression head of a solid-state pulse power unit and a vacuum vessel all as shown at (120). Support equipment is located in a support equipment cabinet (122), and rough vacuum pumps and high-pressure water pumps are located in a third cabinet (124). The pulse power unit provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts on a continuous basis and in excess of 20 Watts on a burst basis.

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