专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2005089130A3 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2005089130A3
公开(公告)日：2005-09-29
申请号：PCT/US2005/007056
申请日：2005-03-03
申请人： CYMER, INC. , AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
IPC分类号： H01J35/20
摘要： An EUV light source apparatus (20) comprises a pulse laser (22) providing laser pulses (55) at a selected pulse repetition rate focused at a desired target ignition site (28); a target formation system (92) providing discrete targets (94); a target steering system (350) intermediate the target formation system (92) and the ignition site (28); a target tracking system (42) providing information about movement of the target (94) between the target formation system (92) and the target steering system (350); an electrostatic plasma containment apparatus (314) providing an electric plasma confinement field (316) at or near the ignition site (28) at the time of ignition; a vessel (30) having an intermediate wall (282) for passing EUV light; and a magnetic plasma confinement mechanism (329) creating a magnetic field (320) in the vicinity of the ignition site (28).

2. 发明申请

WO2005091879A3 EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2005091879A3
公开(公告)日：2005-10-06
申请号：PCT/US2005/005935
申请日：2005-02-24
申请人： CYMER, INC. , PARTLO, William, N. , BOWERING, Norbert, R. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , OLIVER, I., Roger , VIATELLA, John , JACQUES, Robert, N.
发明人： PARTLO, William, N. , BOWERING, Norbert, R. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , OLIVER, I., Roger , VIATELLA, John , JACQUES, Robert, N.
IPC分类号： H01J35/20
摘要： A laser produced plasma extreme ultraviolet light source control system (10) includes a target delivery system (80) for delivering plasma initiation targets (20), an EUV light collection optic (40), a target tracking and feedback system (150), at least one imaging device (60, 62) for providing an image of a target stream track (92); a stream track error detector (120, 122) for detecting an error in the position of the target stream track (92) in at least one axis perpendicular to the target stream track (92).

3. 发明申请

WO2002069461A1 LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER 审中-公开
标题翻译：具有压电驱动器的激光波长控制单元
公开(公告)号：WO2002069461A1
公开(公告)日：2002-09-06
申请号：PCT/US2002/004623
申请日：2002-02-15
申请人： CYMER, INC. , SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
发明人： SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
IPC分类号： H01S3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser (34) with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system (104) and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide fast feedback control based on wavelength measurements, fast vibration control, active damping using the load cell and an active damping module (320), and transient inversion using feed forward algorithms based on historical burst data.
摘要翻译：具有快速波长校正的放电激光器（34）。快速波长校正设备包括至少一个压电驱动器和快速波长测量系统（104）和快速反馈响应时间。在优选实施例中，提供设备以在从大约1到5毫秒的中间时间和几微秒的非常快的时间帧上在几毫秒的慢时间帧上控制波长。优选的技术包括相对较慢的步进电机和非常快的压电驱动器的组合，用于使用调谐镜来调谐激光波长。非常快的波长控制与压电驱动器组合地设置有压电测力传感器。优选实施例提供基于波长测量，快速振动控制，使用负载传感器的主动阻尼和主动阻尼模块（320）的快速反馈控制，以及使用基于历史突发数据的前馈算法的瞬态反转。

4. 发明申请

WO2005089131A2 LPP EUV LIGHT SOURCE 审中-公开
标题翻译： LPP EUV光源
公开(公告)号：WO2005089131A2
公开(公告)日：2005-09-29
申请号：PCT/US2005/007063
申请日：2005-03-03
申请人： CYMER, INC. , PARTLO, William, N. , BROWN, Daniel, J., W. , FOMENKOV, Igor, V. , BOWERING, Norbert, R. , RETTIG, Curtis, L. , MACFARLANE, Joseph, J. , ERSHOV, Alexander, I. , HANSSON, Bjorn, A., M.
发明人： PARTLO, William, N. , BROWN, Daniel, J., W. , FOMENKOV, Igor, V. , BOWERING, Norbert, R. , RETTIG, Curtis, L. , MACFARLANE, Joseph, J. , ERSHOV, Alexander, I. , HANSSON, Bjorn, A., M.
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H01S3/0085 , H01S3/0092 , H01S3/1611 , H01S3/1653 , H01S3/2255 , H01S3/2325 , H01S3/2375 , H01S3/2383 , H05G2/005 , H05G2/008
摘要： An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation .pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.
摘要翻译：描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低临界密度，从而在由波长限定的等离子体区域内的等离子体内发生吸收的等离子体照射脉冲与初始靶照射部位充分分离，以实现发射材料的压缩，并且可以压缩发射区域。激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

5. 发明申请

WO2004081503A2 DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：排放生产等离子体光源
公开(公告)号：WO2004081503A2
公开(公告)日：2004-09-23
申请号：PCT/US2004/006551
申请日：2004-03-03
申请人： CYMER, INC. , PARTLO, William, N. , BLUMENSTOCK, Gerry, M. , BOWERING, Norbert , BRUZZONE, Kent, A. , COBB, Dennis, W. , DYER, Timothy, S. , DUNLOP, John , FOMENKOV, Igor, V. , HYSHAM, James, Christopher , OLIVER, Roger, I. , PALENSCHAT, Frederick, A. , PAN, Xiaojiang, J. , RETTIG, Curtis, L. , SIMMONS, Rodney, S. , WALKER, John , WEBB, Kyle, R. , HOFMANN, Thomas
发明人： PARTLO, William, N. , BLUMENSTOCK, Gerry, M. , BOWERING, Norbert , BRUZZONE, Kent, A. , COBB, Dennis, W. , DYER, Timothy, S. , DUNLOP, John , FOMENKOV, Igor, V. , HYSHAM, James, Christopher , OLIVER, Roger, I. , PALENSCHAT, Frederick, A. , PAN, Xiaojiang, J. , RETTIG, Curtis, L. , SIMMONS, Rodney, S. , WALKER, John , WEBB, Kyle, R. , HOFMANN, Thomas
IPC分类号： G01J
CPC分类号： H01S3/005 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70908 , G03F7/70916 , H01S3/225 , H05G2/003 , H05G2/005 , H05H1/06
摘要： An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO 2 . The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.
摘要翻译：公开了一种DPP EUV源，其可以包括使用从离开等离子体的碎片产生金属卤化物的金属卤素气体的碎片减缓装置。 EUV源可以具有碎片屏蔽，其可以包括多个曲线屏蔽构件，其具有通过与焦点对准的光通道连接的内表面和外表面，该屏蔽构件可以与它们之间的开放空间交替，并且可以具有形成在一个旋转轴上的圆圈和另一个轴上的椭圆。电极可以被供给放电脉冲，该放电脉冲在放电的轴向耗尽阶段期间产生适度的电流，并且在放电的径向压缩阶段期间发生峰值。光源可以包括涡轮分子泵，其具有连接到发电室的入口，并且可操作以比来自该室的缓冲气体优先地泵送更多的源气体。源可以包括调谐的导电电极，包括：掺杂在第一区域中以至少选择电导率的差分掺杂陶瓷材料，并且在第二区域中至少选择导热性。第一区域可以在电极结构的外表面处或附近，并且陶瓷材料可以是SiC或氧化铝，并且掺杂剂是BN或包括SiO或TiO 2的金属氧化物。源可以包括可移动电极组件安装件，其可操作以将电极组件安装座从更换位置移动到操作位置，可移动安装件在波纹管上。源可以具有可操作地连接到收集器的温度控制机构，并且可操作地调节相应壳体部件的温度，以保持温度相关几何形状优化来自相应外壳部件的入射反射的扫掠角，或机械定位器壳成员。壳可能会被电压偏置。可以使用离焦激光辐射来制造碎片屏蔽。阳极可以用限定两个冷却剂通道或限定通道的多孔金属的中空内部冷却。碎片屏蔽可以由连接到安装环或轮毂的多个大的，中间的和小的翅片形成，或者彼此具有提供均匀分离和强化并且不阻挡任何显着量的光的互锁突起。

6. 发明申请

WO2008105989A2 LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源
公开(公告)号：WO2008105989A2
公开(公告)日：2008-09-04
申请号：PCT/US2008/001349
申请日：2008-02-01
申请人： CYMER, INC. , BYKANOV, Alexander, N. , BOWERING, Norbert, R. , FOMENKOV, Igor, V. , BRANDT, David, C. , ERSHOV, Alexander, I , KHODYKIN, Oleh, V. , PARTLO, William, N.
发明人： BYKANOV, Alexander, N. , BOWERING, Norbert, R. , FOMENKOV, Igor, V. , BRANDT, David, C. , ERSHOV, Alexander, I , KHODYKIN, Oleh, V. , PARTLO, William, N.
IPC分类号： H05H1/24
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic, hi one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
摘要翻译：公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。该装置还可以包括一个光学元件，例如多个远离现场距离的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，以在离子到达光学器件之前将离子能量降低到预选值以下。在一个实施方案中，气体可以包含氢气，并且在特定实施方案中，气体可以包含大于50体积％的氢气。

7. 发明申请

WO2006020080A2 SYSTEMS AND METHODS FOR REDUCING THE INFLUENCE OF PLASMA-GENERATED DEBRIS ON THE INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE 审中-公开
标题翻译：用于减少等离子体生成物对EUV光源的内部成分的影响的系统和方法
公开(公告)号：WO2006020080A2
公开(公告)日：2006-02-23
申请号：PCT/US2005/025232
申请日：2005-07-15
申请人： CYMER, INC. , ERSHOV, Alexander, I. , MARX, William, F. , BOWERING, Norbert, R. , HANSSON, Bjorn, A., M. , KHODYKIN, Oleh , FOMENKOV, Igor, V. , PARTLO, William, N.
发明人： ERSHOV, Alexander, I. , MARX, William, F. , BOWERING, Norbert, R. , HANSSON, Bjorn, A., M. , KHODYKIN, Oleh , FOMENKOV, Igor, V. , PARTLO, William, N.
IPC分类号： H01J65/04
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/7085 , G03F7/70916 , G21K1/06 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.
摘要翻译：公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

8. 发明申请

WO2012050685A1 METHOD FOR LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS 审中-公开
标题翻译：在EUV非输出期间的LPP驱动激光输出的方法
公开(公告)号：WO2012050685A1
公开(公告)日：2012-04-19
申请号：PCT/US2011/050565
申请日：2011-09-06
申请人： CYMER, INC. , PARTLO, William, N. , SANDSTROM, Richard, L. , BROWN, Daniel, J.w. , FOMENKOV, Igor, V.
发明人： PARTLO, William, N. , SANDSTROM, Richard, L. , BROWN, Daniel, J.w. , FOMENKOV, Igor, V.
IPC分类号： A61N5/06
CPC分类号： G21K5/00 , G03F7/70033 , H01S3/117 , H01S3/2232 , H01S3/2308 , H05G2/008
摘要： A device is disclosed, herein which may comprise a droplet generator producing droplets of target material; a sensor providing an. intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the. intercept time signal; a. laser source responsive to a trigger signal to produce a laser pulse-; and a system controlling said delay circuit to provide a. trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light -pulse which is not focused on a droplet.
摘要翻译：本文公开了一种装置，其可以包括产生目标材料的液滴的液滴发生器; 传感器提供。当液滴到达预选位置时截获时间信号; 与所述传感器耦合的延迟电路，所述延迟电路产生从所述传感器延迟的触发信号。拦截时间信号; 一个。激光源响应于触发信号以产生激光脉冲; 以及控制所述延迟电路以提供a的系统。触发信号从截取时间延迟第一延迟时间，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生不聚焦在液滴上的光脉冲。

9. 发明申请

WO2007053335A2 LASER SYSTEM 审中-公开
标题翻译：激光系统
公开(公告)号：WO2007053335A2
公开(公告)日：2007-05-10
申请号：PCT/US2006/041107
申请日：2006-10-20
申请人： CYMER, INC. , ERSHOV, Alexander, I. , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V. , BERGSTEDT, Robert, A. , SANDSTROM, Richard, L. , LALOVIC, Ivan
发明人： ERSHOV, Alexander, I. , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V. , BERGSTEDT, Robert, A. , SANDSTROM, Richard, L. , LALOVIC, Ivan
IPC分类号： G11C8/00
CPC分类号： H01S3/225 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/03 , H01S3/034 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/105 , H01S3/2251 , H01S3/2333
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage wherein the output of the seed laser oscillator passes through the amplifying gain medium of the ring power amplification stage at least two times per loop.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括：激光输出光束脉冲，其可以包括环形功率放大级，其中种子激光振荡器的输出通过环形功率放大级的放大增益介质至少每循环两次。

10. 发明申请

WO2003021728A2 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：非常窄带，两个室，高倍率气体放电激光系统
公开(公告)号：WO2003021728A2
公开(公告)日：2003-03-13
申请号：PCT/US2002/027925
申请日：2002-08-28
申请人： CYMER, INC. (a Nevada corporation) , KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
IPC分类号： H01S
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配备有具有非常快的调谐镜的线窄化封装，能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长，精度低于0.2μm。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式