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1. 发明申请

WO2005089130A3 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2005089130A3
公开(公告)日：2005-09-29
申请号：PCT/US2005/007056
申请日：2005-03-03
申请人： CYMER, INC. , AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
IPC分类号： H01J35/20
摘要： An EUV light source apparatus (20) comprises a pulse laser (22) providing laser pulses (55) at a selected pulse repetition rate focused at a desired target ignition site (28); a target formation system (92) providing discrete targets (94); a target steering system (350) intermediate the target formation system (92) and the ignition site (28); a target tracking system (42) providing information about movement of the target (94) between the target formation system (92) and the target steering system (350); an electrostatic plasma containment apparatus (314) providing an electric plasma confinement field (316) at or near the ignition site (28) at the time of ignition; a vessel (30) having an intermediate wall (282) for passing EUV light; and a magnetic plasma confinement mechanism (329) creating a magnetic field (320) in the vicinity of the ignition site (28).

2. 发明申请

WO2002069461A1 LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER 审中-公开
标题翻译：具有压电驱动器的激光波长控制单元
公开(公告)号：WO2002069461A1
公开(公告)日：2002-09-06
申请号：PCT/US2002/004623
申请日：2002-02-15
申请人： CYMER, INC. , SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
发明人： SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
IPC分类号： H01S3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser (34) with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system (104) and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide fast feedback control based on wavelength measurements, fast vibration control, active damping using the load cell and an active damping module (320), and transient inversion using feed forward algorithms based on historical burst data.
摘要翻译：具有快速波长校正的放电激光器（34）。快速波长校正设备包括至少一个压电驱动器和快速波长测量系统（104）和快速反馈响应时间。在优选实施例中，提供设备以在从大约1到5毫秒的中间时间和几微秒的非常快的时间帧上在几毫秒的慢时间帧上控制波长。优选的技术包括相对较慢的步进电机和非常快的压电驱动器的组合，用于使用调谐镜来调谐激光波长。非常快的波长控制与压电驱动器组合地设置有压电测力传感器。优选实施例提供基于波长测量，快速振动控制，使用负载传感器的主动阻尼和主动阻尼模块（320）的快速反馈控制，以及使用基于历史突发数据的前馈算法的瞬态反转。

3. 发明申请

WO2012050685A1 METHOD FOR LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS 审中-公开
标题翻译：在EUV非输出期间的LPP驱动激光输出的方法
公开(公告)号：WO2012050685A1
公开(公告)日：2012-04-19
申请号：PCT/US2011/050565
申请日：2011-09-06
申请人： CYMER, INC. , PARTLO, William, N. , SANDSTROM, Richard, L. , BROWN, Daniel, J.w. , FOMENKOV, Igor, V.
发明人： PARTLO, William, N. , SANDSTROM, Richard, L. , BROWN, Daniel, J.w. , FOMENKOV, Igor, V.
IPC分类号： A61N5/06
CPC分类号： G21K5/00 , G03F7/70033 , H01S3/117 , H01S3/2232 , H01S3/2308 , H05G2/008
摘要： A device is disclosed, herein which may comprise a droplet generator producing droplets of target material; a sensor providing an. intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the. intercept time signal; a. laser source responsive to a trigger signal to produce a laser pulse-; and a system controlling said delay circuit to provide a. trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light -pulse which is not focused on a droplet.
摘要翻译：本文公开了一种装置，其可以包括产生目标材料的液滴的液滴发生器; 传感器提供。当液滴到达预选位置时截获时间信号; 与所述传感器耦合的延迟电路，所述延迟电路产生从所述传感器延迟的触发信号。拦截时间信号; 一个。激光源响应于触发信号以产生激光脉冲; 以及控制所述延迟电路以提供a的系统。触发信号从截取时间延迟第一延迟时间，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生不聚焦在液滴上的光脉冲。

4. 发明申请

WO2007053335A2 LASER SYSTEM 审中-公开
标题翻译：激光系统
公开(公告)号：WO2007053335A2
公开(公告)日：2007-05-10
申请号：PCT/US2006/041107
申请日：2006-10-20
申请人： CYMER, INC. , ERSHOV, Alexander, I. , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V. , BERGSTEDT, Robert, A. , SANDSTROM, Richard, L. , LALOVIC, Ivan
发明人： ERSHOV, Alexander, I. , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V. , BERGSTEDT, Robert, A. , SANDSTROM, Richard, L. , LALOVIC, Ivan
IPC分类号： G11C8/00
CPC分类号： H01S3/225 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/03 , H01S3/034 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/105 , H01S3/2251 , H01S3/2333
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage wherein the output of the seed laser oscillator passes through the amplifying gain medium of the ring power amplification stage at least two times per loop.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括：激光输出光束脉冲，其可以包括环形功率放大级，其中种子激光振荡器的输出通过环形功率放大级的放大增益介质至少每循环两次。

5. 发明申请

WO2003021728A2 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：非常窄带，两个室，高倍率气体放电激光系统
公开(公告)号：WO2003021728A2
公开(公告)日：2003-03-13
申请号：PCT/US2002/027925
申请日：2002-08-28
申请人： CYMER, INC. (a Nevada corporation) , KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
IPC分类号： H01S
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配备有具有非常快的调谐镜的线窄化封装，能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长，精度低于0.2μm。

6. 发明申请

WO2003021727A3 LINE SELECTED F¿2? TWO CHAMBER LASER SYSTEM 审中-公开
公开(公告)号：WO2003021727A3
公开(公告)日：2003-03-13
申请号：PCT/US2002/026394
申请日：2002-08-19
申请人： CYMER, INC, , KNOWLES, David, S. , BROWN, Daniel, J., W. , SANDSTROM, Richard, L. , RYLOV, German, E. , ONKELS, Eckehard, D. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , NESS, Richard, M. , SMITH, Scot, T. , HULBURD, William, G.
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , SANDSTROM, Richard, L. , RYLOV, German, E. , ONKELS, Eckehard, D. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , NESS, Richard, M. , SMITH, Scot, T. , HULBURD, William, G.
IPC分类号： H01S3/11
摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The masters oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength an a pulse to pulse basis at repetition rates of 4,000 Hz or greater to precision of less that 0.2 pm.

7. 发明申请

WO2003021727A2 LINE SELECTED F2 TWO CHAMBER LASER SYSTEM 审中-公开
标题翻译：线选择F2两室激光系统
公开(公告)号：WO2003021727A2
公开(公告)日：2003-03-13
申请号：PCT/US2002/026394
申请日：2002-08-19
申请人： CYMER, INC, , KNOWLES, David, S. , BROWN, Daniel, J., W. , SANDSTROM, Richard, L. , RYLOV, German, E. , ONKELS, Eckehard, D. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , NESS, Richard, M. , SMITH, Scot, T. , HULBURD, William, G.
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , SANDSTROM, Richard, L. , RYLOV, German, E. , ONKELS, Eckehard, D. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , NESS, Richard, M. , SMITH, Scot, T. , HULBURD, William, G.
IPC分类号： H01S
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F 2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F 2 spectral line.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门设计用作集成电路光刻的光源的F2激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配有一个线选择包，用于选择最强的F2谱线。

8. 发明申请

WO2010117858A1 SYSTEM, METHOD AND APPARATUS FOR DROPLET CATCHER FOR PREVENTION OF BACKSPLASH IN A EUV GENERATION CHAMBER 审中-公开
标题翻译：用于防止在EUV生成室中发生反冲洗的刮水器的系统，方法和装置
公开(公告)号：WO2010117858A1
公开(公告)日：2010-10-14
申请号：PCT/US2010/029436
申请日：2010-03-31
申请人： CYMER, INC. , VASCHENKO, Georgiy, O. , PARTLO, William, N. , FOMENKOV, Igor, V. , SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , BRANDT, David, C. , MILLER, Joshua, J.
发明人： VASCHENKO, Georgiy, O. , PARTLO, William, N. , FOMENKOV, Igor, V. , SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , BRANDT, David, C. , MILLER, Joshua, J.
IPC分类号： G01J3/10
CPC分类号： H05G2/005 , G03F7/70033 , G21K5/00 , H05G2/003 , H05G2/006
摘要： A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to output a plurality of droplets along a target material path and a first catch including a first open end substantially aligned to the target material path and at least one internal surface oriented toward a second end of the first catch, the second end being opposite from the first open end.
摘要翻译：一种在包括收集反射镜的极紫外光室中产生极紫外光的系统和方法，具有液滴出口的液滴产生系统，该液滴产生系统沿着目标材料路径排列以输出多个液滴;以及第一捕集器，其基本上包括第一开口端与目标材料路径对准并且至少一个内表面朝向第一卡扣的第二端定向，第二端与第一开口端相对。

9. 发明申请

WO2006009905A1 LASER OUTPUT BEAM WAVEFRONT SPLITTER FOR BANDWIDTH SPECTRUM CONTROL 审中-公开
标题翻译：激光输出波束分波器用于带宽频谱控制
公开(公告)号：WO2006009905A1
公开(公告)日：2006-01-26
申请号：PCT/US2005/021585
申请日：2005-06-17
申请人： CYMER, INC. , SANDSTROM, Richard, L. , BROWN, Daniel, J., W. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , PARTLO, William, N.
发明人： SANDSTROM, Richard, L. , BROWN, Daniel, J., W. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , PARTLO, William, N.
IPC分类号： H01S3/22
CPC分类号： H01S3/0812 , G03F7/70025 , G03F7/70575 , H01S3/08059 , H01S3/097 , H01S3/1055 , H01S3/1305
摘要： An apparatus and method for providing bandwidth control in a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, is disclosed which may comprise a dispersive bandwidth selection optic (Fig. 1, character 120) selecting at least one center wavelength for each pulse determined at least in part by the angle (of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle ( Δα L)of incidence of the a laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the laser light pulse to return from the dispersive center wavelength selection optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each portion having one of at least two different selected center wavelengths. The tuning mechanism may comprise a temporal angle ( Δα L) of incidence selection element defining an angle of incidence for different temporally separated portions of the pulse to return from the dispersive bandwidth selection optic a laser beam comprising a plurality of temporally separated portions of each pulse, each temporally separated portion of each pulse having one of at least two different selected center wavelengths. The tuning mechanism may comprise a plurality of spatial incidence angle selection elements each defining an angle of incidence for a spatially separated but not temporally separated portion of the laser light pulse, and a plurality of temporal angle of incidence selection elements each defining at least a first angle of incidence for at least a first temporally separated portion of each spatially separated but not temporally separated portion of the pulse and a second angle of incidence for a second temporally separated but not spatially separated portion of each spatially separated portion of the pulse.
摘要翻译：公开了一种用于在窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统中提供带宽控制的装置和方法，其产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括色散带宽选择光学器件（图1，字符120）为每个脉冲选择至少一个中心波长，所述至少一个中心波长至少部分地由在分散波长选择光学器件上包含相应脉冲的激光束脉冲光束的入射角度确定;调谐机构，选择至少一个角度（

10. 发明申请

WO2003078940A3 HIGH RESOLUTION SPECTRAL MEASUREMENT DEVICE 审中-公开
公开(公告)号：WO2003078940A3
公开(公告)日：2003-09-25
申请号：PCT/US2003/002052
申请日：2003-01-15
申请人： CYMER, INC. , SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , SMITH, Scott, T. , BROWN, Daniel, J., W.
发明人： SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , SMITH, Scott, T. , BROWN, Daniel, J., W.
IPC分类号： G01J3/18
摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser (D) illuminates an etalon (ET). A portion of its light exiting the etalon (ET) is collected and directed into a slit (S1) positioned at a fringe pattern of the etalon (ET). Light passing through the slit (S1) is collimated and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon (ET) and the grating (GR1) are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034pm (FWHM) and about 0.091pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiode array (PDA) and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array (PDA). Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer (50), and the etalon (ET) can be scanned.

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