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21. 发明申请

WO2006105101A2 GAS DISCHARGE LASER OUTPUT LIGHT BEAM PARAMETER CONTROL 审中-公开
标题翻译：气体放电激光输出光束参数控制
公开(公告)号：WO2006105101A2
公开(公告)日：2006-10-05
申请号：PCT/US2006011305
申请日：2006-03-27
申请人： CYMER INC , BESAUCELE HERVE A , FOMENKOV IGOR V , PARTLO WILLIAM N , TRINTICHOUK FEDOR , TON-THAT HAO
发明人： BESAUCELE HERVE A , FOMENKOV IGOR V , PARTLO WILLIAM N , TRINTICHOUK FEDOR , TON-THAT HAO
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/038 , H01S3/097 , H01S3/09702 , H01S3/134
摘要： A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loop; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.
摘要翻译：公开了一种窄气体放电激光系统和操作方法，其可以包括：振荡器腔; 激光室，包括容纳激光介质气体的腔室; 至少一个峰值电容器电连接到所述腔室壳体和一对电极中的第一电极; 所述一对电极中的第二个连接到所述至少一个峰值电容器的相对端子; 连接到所述腔室壳体的电流返回路径; 一个端子，电极中的第一个，激光介质气体，第二个电极，电流返回路径和第二端子，形成具有特定头电流感应环路特有的电感的磁头电流感应环路; 光谱质量调谐机构包括用于改变特定头电流电感回路的特定头电流感应环电感值的机构。

22. 发明申请

WO9837601A3 AERODYNAMIC CHAMBER DESIGN FOR HIGH PULSE REPETITION RATE EXCIMER LASERS 审中-公开
标题翻译：高脉冲重复速率激光器的空气动力室设计
公开(公告)号：WO9837601A3
公开(公告)日：1998-11-19
申请号：PCT/US9802041
申请日：1998-02-04
申请人： CYMER INC , MORTON RICHARD G , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： MORTON RICHARD G , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： H01S3/097 , H01S3/036 , H01S3/225 , H01S
CPC分类号： H01S3/036 , H01S3/225
摘要： An excimer laser (100) chamber capable of arc-free operation at repetitive pulse rates of 1 kHz or greater is provided. The chamber balances the electrode design criteria required to produce a well-defined discharge channel with the flow design criteria required to achieve high clearing rates at comparatively high blower efficiency. A ceramic insulator (118) located on either side of the cathode (108)/pre-ionizer (130) assembly enhances the flow of gas through the discharge region by reducing the turbulence in the electrode region. A series of specifically designed flow vanes further enhances the gas flow.

23. 发明申请

WO2010059210A2 SYSTEMS AND METHODS FOR DRIVE LASER BEAM DELIVERY IN AN EUV LIGHT SOURCE 审中-公开
标题翻译：用于在EUV光源中驱动激光束传送的系统和方法
公开(公告)号：WO2010059210A2
公开(公告)日：2010-05-27
申请号：PCT/US2009006186
申请日：2009-11-19
申请人： CYMER INC , PARTLO WILLIAM N , FOMENKOV IGOR V , PAXON JASON A
发明人： PARTLO WILLIAM N , FOMENKOV IGOR V , PAXON JASON A
IPC分类号： G21K5/00 , H05H1/24
CPC分类号： H05G2/003 , H01S3/005 , H01S3/2391 , H05G2/008
摘要： An EUV light source device is described herein which may comprise a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis; a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma; a first reflector having a focal point, the first reflector positioned with the focal point on the linear axis, the first reflector receiving laser light along the beam path; and a second reflector receiving laser light reflected by the first reflector and directing the laser light toward the irradiation site.
摘要翻译：本文描述了一种EUV光源装置，其可以包括沿着光束路径传播的激光束，所述光束路径的至少一部分沿线性轴线对准; 用于在照射部位与激光束相互作用以产生EUV发光等离子体的材料; 具有焦点的第一反射器，所述第一反射器的焦点位于所述线性轴线上，所述第一反射器沿着所述光束路径接收激光; 以及第二反射器，其接收由所述第一反射器反射并且将所述激光引向所述照射部位的激光。

24. 发明申请

WO2005104313A3 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 审中-公开
标题翻译：气体放电激光室改进
公开(公告)号：WO2005104313A3
公开(公告)日：2007-02-01
申请号：PCT/US2005007168
申请日：2005-03-03
申请人： CYMER INC , PARTLO WILLIAM N , AMADA YOSHIHO , CARMICHAEL JAMES A , DYER TIMOTHY S , GILLESPIE WALTER D , MOOSMAN BRYAN G , RETTIG CURTIS L , STRATE BRIAN D , STEIGER THOMAS D , TRINTCHOUK FEDOR B , UJAZDOWSKI RICHARD C
发明人： PARTLO WILLIAM N , AMADA YOSHIHO , CARMICHAEL JAMES A , DYER TIMOTHY S , GILLESPIE WALTER D , MOOSMAN BRYAN G , RETTIG CURTIS L , STRATE BRIAN D , STEIGER THOMAS D , TRINTCHOUK FEDOR B , UJAZDOWSKI RICHARD C
IPC分类号： H01S3/22 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/225
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.
摘要翻译：如果公开的方法和装置，其可以包括高功率高重复率气体放电激光UV光源，其可以包括：气体放电室，其包括包括垂直壁和相邻底壁的内壁; 气体循环风扇，其产生邻近内部垂直壁和相邻底壁的气体流动路径; 室内除尘器定位了低气流区域，其可以沿着内壁并且可以包括至少一个网状筛网，例如多个网状筛网，其可以包括至少两个不同的规格网状筛网。除尘器可以沿着室的底部内壁和/或内壁的垂直部分延伸。除尘器可以包括具有第一量规的第一网状筛网; 第二网状筛，其具有小于第一量规的第二规格; 并且第二网状屏幕在第一网状筛网和内壁之间。腔室可以包括在腔室的垂直内壁和底壁中的至少一个中的多个集尘凹部，其可以从包括一部分凹部和多部分凹部的组中选择，该组包括两个凹部相对于彼此成角度的部分。除尘器可以包括定位在主绝缘体的一部分和室的内壁之间的压力阱。该腔室可包括气体循环风扇，其包括具有风扇切断装置的横流风扇，其可包括涡流控制口袋。所述腔室可以包括预除垢机构，其包括在所述预分离管内的细长开口内包含接地棒的预除菌槽，所述前置离子槽可以包括柔顺构件，自动预除电切断机构，预电离起始控制机构和/或聚焦元件。腔室可以包括细长的挡板，该挡板可以包括多个金字塔形结构，包括不同数量的通常为锥体的元件，并且以不同数量的大致金字塔形元件组成并且沿纵向轴线并且横向于纵向轴线定向。腔内的声共振也可以通过将人造钳工器引入激光放电的定时中，从而在脉冲串内从脉冲到脉冲随机地或以重复模式改变脉冲间周期。

25. 发明申请

WO03096497A8 HIGH POWER DEEP ULTRAVIOLET LASER WITH LONG LIFE OPTICS 审中-公开
标题翻译：高功率深紫外线激光与长寿命光学
公开(公告)号：WO03096497A8
公开(公告)日：2004-12-29
申请号：PCT/US0312819
申请日：2003-04-23
申请人： CYMER INC , YAGER THOMAS A , PARTLO WILLIAM N , SANDSTROM RICHARD L , PAN XIAOJIANG , MELCHIOR JOHN T , ALGOTS JOHN M , BALL MATTHEW , ERSHOV ALEXANDER I , FLEUROV VLADIMIR , GILLESPIE WALTER D , GLATZEL HOLGER K , LUBLIN LEONARD , MARSH ELIZABETH , MORTON RICHARD G , UJAZDOWKI RICHARD C , WARKENTIN DAVID J , WEBB R KYLE
发明人： YAGER THOMAS A , PARTLO WILLIAM N , SANDSTROM RICHARD L , PAN XIAOJIANG , MELCHIOR JOHN T , ALGOTS JOHN M , BALL MATTHEW , ERSHOV ALEXANDER I , FLEUROV VLADIMIR , GILLESPIE WALTER D , GLATZEL HOLGER K , LUBLIN LEONARD , MARSH ELIZABETH , MORTON RICHARD G , UJAZDOWKI RICHARD C , WARKENTIN DAVID J , WEBB R KYLE
IPC分类号： H01S3/034 , G03F7/20 , H01S3/00 , H01S3/225 , H01S3/22
CPC分类号： G03F7/7055 , H01S3/005 , H01S3/225
摘要： The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems (Fig. 1B) producing a high repetition rate high power output beam (38). The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics (4260) (422)(424)(426) located in high pulse intensity sections (10)(26) of the output beam (14C) of prototype laser systems. Embodiments include an enclosed (4) and purged beam path (14C) with beam pointing control (40A) (40B)(6) for beam delivery of billions of output laser pulses (38). Optical components and modules described herein are capable of controlling ultraviolet laser output pulses (14A) with wavelength less than 200nm with average output pulse intensities greater than 1.75x10 Watts/cm and with peak intensity or greater 3.5x10 Watts/cm for many billions of pulses (14A) as compared to prior art components and modules which failed after only a few minutes in these pulse intensities.
摘要翻译：本发明提供了用于产生高重复率高功率输出光束（38）的模块化高重复率紫外线气体放电激光系统（图1B）的长寿命光学器件。本发明包括由原始激光系统的输出光束（14C）的高脉冲强度部分（10）（26）中的CaF2光学器件（4260）（422）（424）（426）发现的由申请人发现的表面损伤问题的解决方案。实施例包括具有用于束输送数十亿个输出激光脉冲（38）的光束指向控制（40A）（40B）（6））的封闭（4）和净化光束路径（14C）。本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲（14A），平均输出脉冲强度大于1.75×10 6瓦/ cm 2，峰值强度或更大的3.5×10 6 与现有技术的元件和模块相比，在这些脉冲强度仅在几分钟之后就失败了，数十亿脉冲（14A）的功率>瓦特/平方厘米（2）。

26. 发明申请

WO2004012308A3 CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER 审中-公开
标题翻译：两台气体放电激光器的控制系统
公开(公告)号：WO2004012308A3
公开(公告)日：2004-07-15
申请号：PCT/US0324146
申请日：2003-07-30
申请人： CYMER INC , FALLON JOHN P , RULE JOHN A , JACQUES ROBERT N , LIPCON JACOB P , SANDSTROM RICHARD L , PARTLO WILLIAM N , ERSHOV ALEXANDER I , ISHIHARA TOSHIHIKO , MEISNER JOHN , NESS RICHARD M , MELCHER PAUL C
发明人： FALLON JOHN P , RULE JOHN A , JACQUES ROBERT N , LIPCON JACOB P , SANDSTROM RICHARD L , PARTLO WILLIAM N , ERSHOV ALEXANDER I , ISHIHARA TOSHIHIKO , MEISNER JOHN , NESS RICHARD M , MELCHER PAUL C
IPC分类号： H01S20060101 , H01S3/036 , H01S3/134 , H01S3/22 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2333 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线的控制系统。在优选实施例中，激光器是具有主振荡器（10）的生产线机器，其产生非常窄的带子种子束，其在第二放电室中被放大（12）。特别适用于双室气体放电激光系统的新型控制特征包括（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F2注射控制与新的学习算法。

27. 发明申请

WO2006060359A3 HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM BANDWIDTH MANAGEMENT 审中-公开
标题翻译：高功率高脉冲重复率气体放电激光系统带宽管理
公开(公告)号：WO2006060359A3
公开(公告)日：2009-04-16
申请号：PCT/US2005043055
申请日：2005-11-28
申请人： CYMER INC , SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , ALGOTS J MARTIN , TRINTCHOUK FEDOR
发明人： SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , ALGOTS J MARTIN , TRINTCHOUK FEDOR
IPC分类号： G02B5/04 , H01S3/08
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/08059 , H01S3/097 , H01S3/1055
摘要： A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner. The first manner may modify a first measure of bandwidth and the second manner may modify a second measure of bandwidth such that the ratio of the first measure to the second measure substantially changes. The first measure may be a spectrum width at a selected percentage of the spectrum peak value (FWX%M) and the second measure may be width within which some selected percentage of the spectral intensity is contained (EX%). The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second in a second dimension generally orthogonal to the first dimension. The laser system may comprise a beam path insert comprising a material having an different index of refraction and an index of refraction thermal gradient opposite from that of a neighboring optical element. The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second a second dimension generally parallel to the first dimension. An optical beam twisting element in the lasing cavity may optically twist the laser light pulse beam to present a twisted wavefront to the dispersive center wavelength selection optic. Bending may change the curvature and wavelength selection, e.g., in a burst may create two center wavelength peaks to select FWX%M and EX% independently.
摘要翻译：公开了一种用于窄带DUV大功率高重复率气体放电激光器的脉冲串产生输出激光脉冲束脉冲的线窄化装置和方法，其可以包括包含在线窄模块内的分散中心波长选择光学器件，选择用于每个脉冲的至少一个中心波长至少部分地由包含分散波长选择光学色散表面上的各个脉冲的激光束的入射角确定; 第一分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且以第一方式改变所述分散表面的曲率; 以及第二分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且以第二方式改变所述色散表面的曲率。第一种方式可以修改第一带宽度量，并且第二种方式可以修改第二带宽度量，使得第一测量与第二测量的比率基本上改变。第一测量可以是频谱峰值（FWX％M）的选定百分比处的频谱宽度，第二测量可以是包含光谱强度的某些选定百分比（EX％）的宽度。第一分散光学弯曲机构可以在第一维度上改变分散表面的曲率，而第二维度可以大致垂直于第一维度改变。激光系统可以包括光束路径插入件，其包括具有不同折射率的材料和与相邻光学元件的折射率相反的折射热梯度。第一分散光学弯曲机构可以改变分散表面在第一尺寸中的曲率，而第二分散光学弯曲机构的第二尺寸大体上平行于第一尺寸。激光腔中的光束加捻元件可以光学地扭转激光脉冲光束，以将扭曲的波前呈现到分散中心波长选择光学器件。弯曲可以改变曲率和波长选择，例如，在脉冲串中可以产生两个中心波长峰值，以独立地选择FWX％M和EX％。

28. 发明申请

WO2006009852A2 OPTICAL ELEMENTS WITH PROTECTIVE UNDERCOATING 审中-公开
标题翻译：具有防护底涂层的光学元件
公开(公告)号：WO2006009852A2
公开(公告)日：2006-01-26
申请号：PCT/US2005021475
申请日：2005-06-17
申请人： CYMER INC , PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ZHANG KEVIN WEIMAN
发明人： PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ZHANG KEVIN WEIMAN
IPC分类号： B05D5/06 , B32B9/00 , G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/11 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23 , H05G2/00
CPC分类号： B82Y10/00 , G02B1/105 , G02B1/14 , G02B5/0891 , G03F7/70025 , G03F7/70033 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/03 , H01S3/0346 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/1022 , H01S3/1024 , H01S3/104 , H01S3/134 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H05G2/003
摘要： An apparatus and method are disclosed for an optical element which may comprise a main optical body comprising a crystal containing halogen atoms; a reflectivity coating for changing the reflectivity of a surface of the main body; and, an intermediate protective layer comprising a material containing free halogen atoms. The crystal may comprise an alkaline earth metal and may comprise fluorine atoms, e.g., calcium fluoride or magnesium fluoride. The intermediate protective layer may comprises a material containing free fluorine atoms, e.g., a material doped with fluorine atoms, e.g., doped fused silica. The intermediate layer comprises an amorphous portion and a polycrystalline portion. The optical element may also comprise a main optical element body; a reflectivity coating comprising a metal halide on an exterior the a surface of the main optical body; and a thin layer of protective outer coating on the reflectivity coating comprising a dense non-porous material thin enough to be transparent to the light of a selected short wavelength. The reflectivity coating may comprise a plurality of layers with at least one layer comprising a metal fluoride and the protective outer coating may comprise a layer of silicon oxyfluoride.
摘要翻译：公开了一种用于光学元件的装置和方法，该光学元件可以包括包含含有卤素原子的晶体的主光学体; 用于改变主体表面的反射率的反射涂层; 以及包含含有游离卤素原子的材料的中间保护层。晶体可以包含碱土金属并且可以包含氟原子，例如氟化钙或氟化镁。中间保护层可以包含含有游离氟原子的材料，例如掺杂有氟原子的材料，例如掺杂的熔凝硅石。中间层包含无定形部分和多晶部分。光学元件还可以包括主光学元件主体; 在主光学体的表面的外部包括金属卤化物的反射涂层; 以及在反射率涂层上的薄层保护性外涂层，其包含足够薄的致密无孔材料以对选定的短波长的光是透明的。反射率涂层可以包括多个层，其中至少一个层包含金属氟化物并且保护性外部涂层可以包含一层氟氧化硅。

29. 发明申请

WO2008127599A3 METHOD AND APPARATUS FOR STABILIZING AND TUNING THE BANDWIDTH OF LASER LIGHT 审中-公开
标题翻译：用于稳定和调谐激光束带宽的方法和装置
公开(公告)号：WO2008127599A3
公开(公告)日：2008-12-11
申请号：PCT/US2008004598
申请日：2008-04-09
申请人： CYMER INC A NEVADA CORP , PARTLO WILLIAM N , JACQUES ROBERT N , O'BRIEN KEVIN M , ISHIHARA TOSHIHIKO
发明人： PARTLO WILLIAM N , JACQUES ROBERT N , O'BRIEN KEVIN M , ISHIHARA TOSHIHIKO
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G02B27/646 , H01S3/137 , H01S3/139 , H01S3/225 , H01S2301/02
摘要： According to aspects of an embodiment of the disclosed subject matter, method and apparatus are disclose that ma y comprise adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, without utilizing any beam magnification control, or adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for other than bandwidth control, and adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for bandwidth control based on the error signal.
摘要翻译：根据所公开的主题的实施例的方面，公开了一种方法和装置，其包括基于误差信号调整种子激光器中的气体放电与用于带宽控制的放大器激光器之间的差分定时，或用于控制另一个除了带宽之外的激光操作参数，不利用任何光束放大控制，或者基于误差信号调整种子激光器和放大器激光器中的气体放电之间的差分定时，或用于控制除带宽之外的另一个激光器操作参数同时利用除带宽控制之外的光束放大控制，并且基于误差信号调整种子激光器和放大器激光器中的气体放电之间的差分定时，或用于控制除带宽之外的另一激光器操作参数，同时利用基于误差信号的带宽控制的光束放大控制。

30. 发明申请

WO2005001853A3 METHOD AND APPARATUS FOR COOLING MAGNETIC CIRCUIT ELEMENTS 审中-公开
标题翻译：用于冷却磁电元件的方法和装置
公开(公告)号：WO2005001853A3
公开(公告)日：2005-11-24
申请号：PCT/US2004018941
申请日：2004-06-14
申请人： CYMER INC , NESS RICHARD M , PARTLO WILLIAM N , MELCHER PAUL C , FERGUSON GEORGE X , SAETHRE ROBERT B
发明人： NESS RICHARD M , PARTLO WILLIAM N , MELCHER PAUL C , FERGUSON GEORGE X , SAETHRE ROBERT B
IPC分类号： H01F3/00 , H01F27/10 , H01S3/097 , H01F27/08 , G21C7/00
CPC分类号： H01F27/266 , H01F27/025 , H01F27/10 , H01S3/097
摘要： An apparatus and method for providing cooling to a magnetic circuit element having a magnetic core disposed around a centrally located core support member (200) having at least one core support member wall (210) is disclosed which may comprise a core support coolant inlet (282); a core support coolant outlet (283); a plurality of interconnected coolant flow passages (270) contained within the core support member wall and inter connected an arranged to pass coolant from one coolant flow passage to the next within the core support member wall along a coolant flow path within at least a substantial portion of the core support member wall from the core support coolant inlet to the core support coolant outlet. The apparatus may also comprise each core support coolant flow passage is in fluid communication with a fluid communication plenum at each end of each respective core support coolant flow passage, with each respective fluid communication plenum forming an outlet plenum for at least a first one of the respective core support coolant flow passages and an inlet plenum for at least a second one of the respective core support coolant flow passages along the coolant flow path from the core support coolant inlet to the core support coolant outlet.
摘要翻译：公开了一种用于向具有设置在具有至少一个芯支撑构件壁（210）的中心定位的芯支撑构件（200）周围的磁芯的磁路元件提供冷却的装置和方法，其可以包括芯支撑冷却剂入口（282 ）; 芯支撑冷却剂出口（283）; 多个互连的冷却剂流动通道（270），其容纳在所述芯支撑构件壁内并且相互连接，所述多个相互连接的冷却剂流动通道（270）被布置成沿着至少大部分内的冷却剂流动路径将冷却剂从一个冷却剂流动通道传递到所述芯支撑构件壁的芯支撑构件壁从芯支撑冷却剂入口到芯支撑冷却剂出口。该装置还可以包括每个芯支撑冷却剂流动通道与每个相应的芯支撑冷却剂流动通道的每个端部处的流体连通通气室流体连通，每个相应的流体连通增压室形成出口压力室，用于至少第一个相应的芯支撑冷却剂流动通道和用于沿着从芯支撑冷却剂入口到芯支撑冷却剂出口的冷却剂流动路径的相应的芯支撑冷却剂流动通道中的至少第二个的入口气室。

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