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1. 发明申请

WO2004012308A3 CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER 审中-公开
标题翻译：两台气体放电激光器的控制系统
公开(公告)号：WO2004012308A3
公开(公告)日：2004-07-15
申请号：PCT/US0324146
申请日：2003-07-30
申请人： CYMER INC , FALLON JOHN P , RULE JOHN A , JACQUES ROBERT N , LIPCON JACOB P , SANDSTROM RICHARD L , PARTLO WILLIAM N , ERSHOV ALEXANDER I , ISHIHARA TOSHIHIKO , MEISNER JOHN , NESS RICHARD M , MELCHER PAUL C
发明人： FALLON JOHN P , RULE JOHN A , JACQUES ROBERT N , LIPCON JACOB P , SANDSTROM RICHARD L , PARTLO WILLIAM N , ERSHOV ALEXANDER I , ISHIHARA TOSHIHIKO , MEISNER JOHN , NESS RICHARD M , MELCHER PAUL C
IPC分类号： H01S20060101 , H01S3/036 , H01S3/134 , H01S3/22 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2333 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线的控制系统。在优选实施例中，激光器是具有主振荡器（10）的生产线机器，其产生非常窄的带子种子束，其在第二放电室中被放大（12）。特别适用于双室气体放电激光系统的新型控制特征包括（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F2注射控制与新的学习算法。

2. 发明申请

WO0111733A9 HIGH PULSE RATE PULSE POWER SYSTEM WITH FAST RISE TIME AND LOW LEAKAGE CURRENT 审中-公开
标题翻译：具有快速上升时间和低漏电流的高脉冲速率脉冲电源系统
公开(公告)号：WO0111733A9
公开(公告)日：2002-09-06
申请号：PCT/US0020266
申请日：2000-07-25
申请人： CYMER INC , PARTLO WILLIAM N , NESS RICHARD M , ROTHWEIL DANIEL A , MELCHER PAUL C , SMITH BRETT D , BIRX DEBORAH L EM
发明人： PARTLO WILLIAM N , BIRX DANIEL L DI , NESS RICHARD M , ROTHWEIL DANIEL A , MELCHER PAUL C , SMITH BRETT D
IPC分类号： G03F7/20 , H01S3/097 , H01S3/225 , H02M3/00 , H02M9/04 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A high pulse rate pulse power source (20) for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source (20) includes a pulse generating circuit (50) including a charging capacitor (42), a solid state switch (46) and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer (56) increases peak voltage to at least 12,000 volts. A very fast regulated power supply (20) is provided for charging the charging capacitor (42) in less than 400 microseconds and a pulse control system including a programmed processor (102) controls the charging of the charging capacitor (42) to an accuracy of less than about one percent at a rate of at least 2000 charges per second.
摘要翻译：用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源（20）。源极（20）包括包括充电电容器（42），固态开关（46）和限流电感器的脉冲发生电路（50）。在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩，并且升压脉冲变压器（56）将峰值电压增加到至少12000伏特。提供了一种非常快速的调节电源（20），用于在小于400微秒内为充电电容器（42）充电，以及包括编程处理器（102）的脉冲控制系统，其将充电电容器（42）的充电控制到不到百分之一，每秒至少要2000次。

3. 发明申请

WO0198012A3 FOUR KHz GAS DISCHARGE LASER 审中-公开
标题翻译：四吉兹气体放电激光
公开(公告)号：WO0198012A3
公开(公告)日：2002-05-16
申请号：PCT/US0116985
申请日：2001-05-23
申请人： CYMER INC , NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
发明人： NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
IPC分类号： H01S3/134 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以约4,000Hz的脉冲速率产生高质量的脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的限度内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

4. 发明申请

WO2005001853A3 METHOD AND APPARATUS FOR COOLING MAGNETIC CIRCUIT ELEMENTS 审中-公开
标题翻译：用于冷却磁电元件的方法和装置
公开(公告)号：WO2005001853A3
公开(公告)日：2005-11-24
申请号：PCT/US2004018941
申请日：2004-06-14
申请人： CYMER INC , NESS RICHARD M , PARTLO WILLIAM N , MELCHER PAUL C , FERGUSON GEORGE X , SAETHRE ROBERT B
发明人： NESS RICHARD M , PARTLO WILLIAM N , MELCHER PAUL C , FERGUSON GEORGE X , SAETHRE ROBERT B
IPC分类号： H01F3/00 , H01F27/10 , H01S3/097 , H01F27/08 , G21C7/00
CPC分类号： H01F27/266 , H01F27/025 , H01F27/10 , H01S3/097
摘要： An apparatus and method for providing cooling to a magnetic circuit element having a magnetic core disposed around a centrally located core support member (200) having at least one core support member wall (210) is disclosed which may comprise a core support coolant inlet (282); a core support coolant outlet (283); a plurality of interconnected coolant flow passages (270) contained within the core support member wall and inter connected an arranged to pass coolant from one coolant flow passage to the next within the core support member wall along a coolant flow path within at least a substantial portion of the core support member wall from the core support coolant inlet to the core support coolant outlet. The apparatus may also comprise each core support coolant flow passage is in fluid communication with a fluid communication plenum at each end of each respective core support coolant flow passage, with each respective fluid communication plenum forming an outlet plenum for at least a first one of the respective core support coolant flow passages and an inlet plenum for at least a second one of the respective core support coolant flow passages along the coolant flow path from the core support coolant inlet to the core support coolant outlet.
摘要翻译：公开了一种用于向具有设置在具有至少一个芯支撑构件壁（210）的中心定位的芯支撑构件（200）周围的磁芯的磁路元件提供冷却的装置和方法，其可以包括芯支撑冷却剂入口（282 ）; 芯支撑冷却剂出口（283）; 多个互连的冷却剂流动通道（270），其容纳在所述芯支撑构件壁内并且相互连接，所述多个相互连接的冷却剂流动通道（270）被布置成沿着至少大部分内的冷却剂流动路径将冷却剂从一个冷却剂流动通道传递到所述芯支撑构件壁的芯支撑构件壁从芯支撑冷却剂入口到芯支撑冷却剂出口。该装置还可以包括每个芯支撑冷却剂流动通道与每个相应的芯支撑冷却剂流动通道的每个端部处的流体连通通气室流体连通，每个相应的流体连通增压室形成出口压力室，用于至少第一个相应的芯支撑冷却剂流动通道和用于沿着从芯支撑冷却剂入口到芯支撑冷却剂出口的冷却剂流动路径的相应的芯支撑冷却剂流动通道中的至少第二个的入口气室。

5. 发明申请

WO0198012A9 FOUR KHz GAS DISCHARGE LASER 审中-公开
标题翻译： 4千赫气体放电激光器
公开(公告)号：WO0198012A9
公开(公告)日：2002-06-13
申请号：PCT/US0116985
申请日：2001-05-23
申请人： CYMER INC , NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
发明人： NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
IPC分类号： H01S3/134 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供了一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以大约4,000Hz的脉冲速率产生高质量脉冲激光束。一个优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。改进的波长计配有专用软件，可监测输出光束参数，并控制非常快速的PZT驱动调谐镜和脉冲功率充电电压，以将波长和脉冲能量保持在期望的限制范围内。在一个优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间清除来自放电区域的放电碎片。

6. 发明申请

WO2007041232A2 6K PULSE REPETITION RATE AND ABOVE GAS DISCHARGE LASER SYSTEM SOLID STATE PULSE POWER SYSTEM IMPROVEMENTS 审中-公开
标题翻译： 6K脉冲重复率和上述气体放电激光系统固态脉冲电源系统改进
公开(公告)号：WO2007041232A2
公开(公告)日：2007-04-12
申请号：PCT/US2006037884
申请日：2006-09-27
申请人： CYMER INC , HUANG CHAOFENG , MELCHER PAUL C , NESS RICHARD M
发明人： HUANG CHAOFENG , MELCHER PAUL C , NESS RICHARD M
IPC分类号： H01S3/22 , H01S3/03 , H01S3/097 , H01S3/223
CPC分类号： H01S3/097 , H01S3/04 , H01S3/09702 , H01S3/0975 , H01S3/225 , H03K3/57 , H03K17/127 , H03K17/567 , H03K17/6872 , H03K17/785
摘要： A method and apparatus for operating a very high repetition gas discharge laser system magnetic switch pulsed power system is disclosed, which may comprise a solid state switch, a charging power supply electrically connected to one side of the solid state switch; a charging inductor electrically connected to the other side of the solid state switch; a deque circuit electrically in parallel with the solid state switch comprising a deque switch; a peaking capacitor electrically connected to the charging inductor, a peaking capacitor charging control system operative to charge the peaking capacitor by opening the deque switch and leaving the solid state switch open and then shutting the solid state switch. The solid state switch may comprise a plurality of solid state switches electrically in parallel.
摘要翻译：公开了用于操作非常高的重复气体放电激光系统磁开关脉冲功率系统的方法和装置，其可以包括固态开关，电连接到固态开关的一侧的充电电源; 充电电感器电连接到固态开关的另一侧; 与固态开关并联电路的德克电路，其包括德克式开关; 与充电电感器电连接的峰化电容器，峰值电容器充电控制系统，其操作用于通过打开除电开关并使固态开关断开并且然后关断固态开关来对峰值电容器充电。固态开关可以并联电连接多个固态开关。

7. 发明申请

WO2006105119A3 6 KHz AND ABOVE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译： 6 KHz和以上气体放电激光系统
公开(公告)号：WO2006105119A3
公开(公告)日：2008-10-16
申请号：PCT/US2006011339
申请日：2006-03-27
申请人： CYMER INC , UJAZDOWSKI RICHARD C , NESS RICHARD M , ALGOTS J MARTIN , FLEUROV VLADIMIR B , PALENSCHAT FREDERICK A , GILLESPIE WALTER D , MOOSMAN BRYAN G , STEIGER THOMAS D , SMITH BRETT D , MCKELVY THOMAS E
发明人： UJAZDOWSKI RICHARD C , NESS RICHARD M , ALGOTS J MARTIN , FLEUROV VLADIMIR B , PALENSCHAT FREDERICK A , GILLESPIE WALTER D , MOOSMAN BRYAN G , STEIGER THOMAS D , SMITH BRETT D , MCKELVY THOMAS E
IPC分类号： H01F27/08 , H01S3/03 , H01S3/08 , H01S3/22
CPC分类号： H01S3/036 , H01F3/10 , H01F27/22 , H01F27/266 , H01F38/10 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/225 , H01S3/2308
摘要： A high pulse repetition rate gas discharge laser system pulse power system magnetic reactor may comprise a housing comprising a core containing compartment between an inner wall of the housing, an outer wall and a bottom wall of the housing; a cooling mechanism operative to withdraw heat from the at least one of the inner wall, outer wall and bottom of the housing; at least one two magnetic cores contained within the core containing compartment; a cooling fin disposed between each of the at least two magnetic cores; and a thermal conductivity enhancement mechanism intermediate at least one of each respective cooling fin and each respective core and a respective one of the inner wall, the outer wall or the bottom wall, the thermal conductivity enhancement mechanism comprising a band comprising a plurality of torsion spring or leaf spring elements.
摘要翻译：高脉冲重复率气体放电激光系统脉冲功率系统磁反应器可以包括壳体，该壳体包括在壳体的内壁，外壁和壳体的底壁之间的容纳核心的隔间; 冷却机构，用于从壳体的内壁，外壁和底部中的至少一个中提取热量; 至少一个两个磁芯包含在所述芯容纳室内; 设置在所述至少两个磁芯中的每一个之间的冷却翅片; 以及在每个相应的冷却翅片和每个相应的芯部以及内壁，外壁或底壁中的相应的一个中的至少一个的热导率增强机构，所述热导率增强机构包括包括多个扭转弹簧或板簧元件。

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