专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2008130474A1 EXTENDABLE ELECTRODE FOR GAS DISCHARGE LASER 审中-公开
标题翻译：用于气体放电激光器的可扩展电极
公开(公告)号：WO2008130474A1
公开(公告)日：2008-10-30
申请号：PCT/US2008/003890
申请日：2008-03-25
申请人： CYMER, INC. (a Nevada Corporation) , SANDSTROM, Richard, L. , CHUNG, Tae, H. , UJAZDOWSKI, Richard, C.
发明人： SANDSTROM, Richard, L. , CHUNG, Tae, H. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/097
CPC分类号： H01S3/038 , H01S3/0381 , H01S3/09705 , H01S3/0971 , H01S3/225 , H01S3/2366
摘要： Disclosed herein are systems and methods for extending one or both of the discharge electrodes in a transverse discharge gas laser chamber in which one or both the electrodes are subject to a dimensional change due to erosion. Electrode extension can be performed to increase the chamber life, increase laser performance over the life of the chamber, or both. Operationally, the inter-electrode spacing may be adjusted to maintain a specific target gap distance between the electrodes or to optimize a specific parameter of the laser output beam such as bandwidth, pulse-to-pulse energy stability, beam size, etc.
摘要翻译：本文公开了用于在横向放电气体激光室中延伸一个或两个放电电极的系统和方法，其中一个或两个电极由于侵蚀而经受尺寸变化。可以执行电极延伸以增加室的寿命，在室的寿命或两者都增加激光器性能。可操作地，可以调整电极间间隔以维持电极之间的特定目标间隙距离或者优化激光输出光束的特定参数，例如带宽，脉冲到脉冲能量稳定性，光束尺寸等。

2. 发明申请

WO2006093687A1 METHOD AND APPARATUS FOR EUV LIGHT SOURCE TARGET MATERIAL HANDLING 审中-公开
标题翻译： EUV光源目标材料处理方法与装置
公开(公告)号：WO2006093687A1
公开(公告)日：2006-09-08
申请号：PCT/US2006/005541
申请日：2006-02-17
申请人： CYMER, INC. , ALGOTS, John, Martin , HEMBERG, Oscar , CHUNG, Tae, H.
发明人： ALGOTS, John, Martin , HEMBERG, Oscar , CHUNG, Tae, H.
IPC分类号： H01J35/20 , G21K5/10
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An EUV light source plasma source material handling system and method is disclosed which may comprise a droplet generator having droplet generator plasma source material reservoir (212) in fluid communication with a droplet formation capillary and maintained within a selected range of temperatures sufficient to keep the plasma source material in a liquid form; a plasma source material supply system having a supply reservoir (214) in fluid communication with the droplet generator plasma source material reservoir and holding at least a replenishing amount of plasma source material in liquid form for transfer to the droplet generator plasma source material reservoir, while the droplet generator is on line; a transfer mechanism (210) transferring liquid plasma source material from the supply reservoir to the droplet generator plasma source material reservoir, while the droplet generator is on line. The supply reservoir may comprise a solid form of the plasma source material used to periodically form from a portion of the material in solid form the material in liquid form.
摘要翻译：公开了一种EUV光源等离子体源材料处理系统和方法，其可以包括具有与液滴形成毛细管流体连通的液滴发生器等离子体源材料储存器（212）的液滴发生器，并保持在足以保持等离子体的温度的选定范围内液体形式的原料; 等离子体源材料供应系统，其具有与液滴发生器等离子体源材料储存器流体连通的供给储存器（214），并且至少保持液体形式的补充量的等离子体源材料以转移到液滴发生器等离子体源材料储存器，同时液滴发生器在线; 当液滴发生器在线时，传送机构（210）将液体等离子体源材料从供应储存器传送到液滴发生器等离子体源材料储存器。供应储存器可以包括固体形式的等离子体源材料，其用于从液体形式的固体形式的固体形式的一部分周期性地形成。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式