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1. 发明申请

WO2017119946A1 GAS MIXTURE CONTROL IN A GAS DISCHARGE LIGHT SOURCE 审中-公开
标题翻译：气体放散光源中的气体混合控制
公开(公告)号：WO2017119946A1
公开(公告)日：2017-07-13
申请号：PCT/US2016/060680
申请日：2016-11-04
申请人： CYMER, LLC
发明人： AHLAWAT, Rahul , AGGARWAL, Tanuj
IPC分类号： H01S3/036 , H01S3/097 , H01S3/225
CPC分类号： H01S3/036 , H01S3/0014 , H01S3/097 , H01S3/0971 , H01S3/10069 , H01S3/104 , H01S3/225 , H01S3/2251 , H01S3/2253 , H01S3/2255 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.
摘要翻译：气体放电光源包括气体放电系统，其包括一个或多个气体放电室。气体排放系统中的每个气体排放室均填充有各自的气体混合物。对于每个气体放电室，通过激活其相关联的能量源将脉冲能量供应到相应的气体混合物，从而从气体放电室产生脉冲放大的光束。确定气体排放系统的一个或多个特性。基于确定的气体排放系统的一个或多个性质，从多种可能的方案中选择气体维护方案。选定的气体维护方案适用于气体排放系统。气体维护方案包括与将一种或多种补充气体混合物添加到气体排放系统的气体排放室有关的一个或多个参数。

2. 发明申请

WO2016094193A1 COMPENSATION FOR A DISTURBANCE IN AN OPTICAL SOURCE 审中-公开
标题翻译：补偿光源中的干扰
公开(公告)号：WO2016094193A1
公开(公告)日：2016-06-16
申请号：PCT/US2015/063802
申请日：2015-12-03
申请人： CYMER, LLC
发明人： AHLAWAT, Rahul
IPC分类号： G03F7/20
CPC分类号： H01S3/104 , H01S3/036 , H01S3/09705 , H01S3/0971 , H01S3/10069 , H01S3/1055 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2308 , H01S2301/02
摘要： A pulsed light beam emitted from an optical source is received, the pulsed light beam being associated with a temporal repetition rate; a frequency of a disturbance in the optical source is determined, the frequency being an aliased frequency that varies with the temporal repetition rate of the pulsed light beam; a correction waveform is generated based on the aliased frequency; and the disturbance in the optical source is compensated by modifying a characteristic of the pulsed light beam based on the generated correction waveform.
摘要翻译：接收从光源发射的脉冲光束，脉冲光束与时间重复率相关联; 确定光源中的干扰频率，该频率是随着脉冲光束的时间重复率而变化的混叠频率; 基于混叠频率产生校正波形; 并且通过基于所生成的校正波形修改脉冲光束的特性来补偿光源中的干扰。

3. 发明申请

WO2016164157A1 WAVELENGTH STABILIZATION FOR AN OPTICAL SOURCE 审中-公开
标题翻译：光源的波长稳定
公开(公告)号：WO2016164157A1
公开(公告)日：2016-10-13
申请号：PCT/US2016/023281
申请日：2016-03-18
申请人： CYMER, LLC (A NEVADA COMPANY)
发明人： AHLAWAT, Rahul
IPC分类号： H01S3/13 , H01S3/10
CPC分类号： G03F7/70575 , G03F7/70041 , H01S3/0971 , H01S3/1305 , H01S3/137
摘要： A wavelength error for each pulse in a first subset of pulses emitted from an optical source is determined, the wavelength error being the difference between a wavelength for a particular pulse and a target wavelength; a pulse-by-pulse correction signal is determined based on the determined wavelength error, the pulse-by-pulse correction signal including a correction signal associated with each pulse In the first subset of pulses; and a correction based on the determined pulse-by-pulse correction signal is applied to each pulse in a second subset of pulses emitted from the optica! source, where applying a correction to a pulse in the second subset of pulses reduces the wavelength error of the pulse in the second subset of pulses.
摘要翻译：确定从光源发射的脉冲的第一子集中的每个脉冲的波长误差，波长误差是特定脉冲的波长与目标波长之间的差; 基于所确定的波长误差来确定逐脉冲校正信号，所述脉冲逐脉冲校正信号包括与所述第一脉冲子集中的每个脉冲相关联的校正信号; 并且基于确定的逐脉冲校正信号的校正被应用于从光学器件发射的脉冲的第二子集中的每个脉冲。源，其中对第二脉冲子集中的脉冲应用校正减少了脉冲的第二子集中的脉冲的波长误差。

4. 发明申请

WO2021015919A1 METHOD OF COMPENSATING WAVELENGTH ERROR INDUCED BY REPETITION RATE DEVIATION 审中-公开
公开(公告)号：WO2021015919A1
公开(公告)日：2021-01-28
申请号：PCT/US2020/039520
申请日：2020-06-25
申请人： CYMER, LLC
发明人： TENG, Kuo-Tai , AHLAWAT, Rahul
IPC分类号： H01S3/10 , H01S3/1055 , G03F7/20 , H01S3/08 , H01S3/13 , H01S3/137 , H01S3/225 , H01S3/23
摘要： A radiation system for controlling pulses of radiation comprising an optical element configured to interact with the pulses of radiation to control a characteristic of the pulses of radiation, an actuator configured to actuate the optical element according to a control signal received from a controller, the control signal at least partially depending on a reference pulse repetition rate of the radiation system and, a processor configured to receive pulse information from the controller and use the pulse information to determine an adjustment to the control signal. The radiation system may be used to improve an accuracy of a lithographic apparatus operating in a multi-focal imaging mode.

5. 发明申请

WO2016209669A1 PULSED LIGHT BEAM SPECTRAL FEATURE CONTROL 审中-公开
标题翻译：脉冲光束光谱特征控制
公开(公告)号：WO2016209669A1
公开(公告)日：2016-12-29
申请号：PCT/US2016/037435
申请日：2016-06-14
申请人： CYMER, LLC (A NEVADA COMPANY)
发明人： O'BRIEN, Kevin, Michael , AHLAWAT, Rahul
IPC分类号： H01S3/10 , H01S3/104 , H01S3/125 , H01S3/134
CPC分类号： G03F7/2006 , G01B11/02 , G01J3/12 , G02B26/007 , G03F7/70 , G03F7/70141 , G03F7/70575 , H01S3/10 , H01S3/104 , H01S3/11
摘要： A system includes a first actuation module coupled to a first actuatable apparatus of m optical source, she first actuatable apparatus being altered by the first actuation module to adjust the spectral feature of the pulsed light beam a second actuation module coupled to a second actuatable apparatus of the optical source, the second actuatable apparatus being altered by the second actuation module to adjust the spectral feature of the pulsed light beam; arid a control system configured to receive an indication regarding the operating state of the first actuatab!e apparatus; and send a signal to the second actuation module to adjust the spectral feature of the pulsed light beam to either: prevent the first actuatable apparatus from saturating based on the operating state of the first actuatable apparatus, or the first actuatable apparatus if the first actuatable apparatus is saturated.
摘要翻译：系统包括耦合到m个光源的第一可致动装置的第一致动模块，第一可致动装置被第一致动模块改变以调节脉冲光束的光谱特征，第二致动模块耦合到第二可致动装置光源，第二致动装置被第二致动模块改变以调节脉冲光束的光谱特征; 以及配置为接收关于所述第一致动器装置的操作状态的指示的控制系统; 并且向第二致动模块发送信号以将脉冲光束的光谱特征调整为：基于第一可致动装置或第一致动装置的操作状态来防止第一致动装置饱和，如果第一致动装置饱和。

6. 发明申请

WO2019060164A1 FLUORINE DETECTION IN A GAS DISCHARGE LIGHT SOURCE 审中-公开
公开(公告)号：WO2019060164A1
公开(公告)日：2019-03-28
申请号：PCT/US2018/050301
申请日：2018-09-10
申请人： CYMER, LLC
发明人： THORNES, Joshua Jon , AHLAWAT, Rahul , LUO, Edward Siqi , PADMABANDU, Gamaralalage G
IPC分类号： G01N31/00 , G01N33/00 , H01S3/223 , H01S3/225
摘要： An apparatus includes: a gas maintenance system having a gas supply system fluidly connected to one or more gas discharge chambers; a detection apparatus fluidly connected to each gas discharge chamber; and a control system connected to the gas maintenance system and the detection apparatus. The detection apparatus includes: a vessel defining a reaction cavity that houses a metal oxide and is fluidly connected to the gas discharge chamber for receiving mixed gas including fluorine from the gas discharge chamber in the reaction cavity, the vessel enabling a reaction between the fluorine of the received mixed gas and the metal oxide to form a new gas mixture including oxygen; and an oxygen sensor fluidly connected to the new gas mixture to sense an amount of oxygen within the new gas mixture. The control system is configured to estimate a concentration of fluorine in the received mixed gas.

7. 发明申请

WO2018106379A1 WAVELENGTH CONTROL SYSTEM FOR PULSE-BY-PULSE WAVELENGTH TARGET TRACKING IN DUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2018106379A1
公开(公告)日：2018-06-14
申请号：PCT/US2017/060312
申请日：2017-11-07
申请人： CYMER, LLC
发明人： AHLAWAT, Rahul , DUFFEY, Thomas Patrick
IPC分类号： G02B26/10 , H01S3/13
CPC分类号： H01S3/106 , G03F7/2006 , G03F7/70025 , G03F7/70575 , H01S3/08004 , H01S3/08009 , H01S3/10069 , H01S3/11 , H01S3/137
摘要： Wafer positioning errors in stepper-scanners contribute to imaging defects. Changing the wavelength of the light source's generated light can compensate for wafer positional errors in the Z-direction. The wafer's real-time z-position is determined and a change in wavelength target to offset this error is communicated to the light source. The light source uses this change in wavelength target in a feed-forward operation and in an embodiment, in combination with existing feedback operations, on a pulse-by-pulse basis for subsequent pulses in a current burst of pulses in addition to receiving the newly-specified laser wavelength target for a subsequent burst of laser pulses.

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