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    • 5. 发明申请
    • POWER SWITCHING SYSTEMS COMPRISING HIGH POWER E-MODE GAN TRANSISTORS AND DRIVER CIRCUITRY
    • 包含高功率E模式晶体管和驱动电路的电源开关系统
    • WO2015135072A1
    • 2015-09-17
    • PCT/CA2015/000168
    • 2015-03-10
    • GAN SYSTEMS INC.
    • ROBERTS, JohnSCOTT, Iain, H.
    • H03K17/687H01L27/085H01L29/20H01L29/778
    • H03K17/687H01L27/0605H01L27/085H01L29/2003H01L29/7787H03K5/08H03K17/04123H03K2217/0036
    • Driver circuitry for switching systems comprising enhancement mode (E-Mode) GaN power transistors with low threshold voltage is disclosed. An E-Mode high electron mobility transistor (HEMT) D3 has a monolithically integrated GaN driver, comprising smaller E- Mode GaN HEMTs D1 and D2, and a discrete dual-voltage pre-driver. D1 provides the gate drive voltage to the gate of the GaN switch D3, D2 clamps the gate of the GaN switch D3, an internal source-sense connection closely couples the source of D3 and the source of D1. An additional source-sense connection is provided for the pre-driver. Boosting the drive voltage to the gate of D1 produces firm and rapid pull-up of D1 and D3 for improved switching performance at higher switching speeds. High current handling components of the driver circuitry are integrated with the GaN switch and closely coupled to reduce inductance, while the discrete pre-driver can be thermally separated from the GaN chip.
    • 公开了包括具有低阈值电压的增强模式(E模))GaN功率晶体管的开关系统的驱动电路。 E模式高电子迁移率晶体管(HEMT)D3具有单片集成GaN驱动器,其包括较小的E-mode GaN HEMT D1和D2以及分立的双电压预驱动器。 D1将栅极驱动电压提供给GaN开关D3的栅极,D2钳位GaN开关D3的栅极,内部源极检测连接紧密耦合D3的源极和D1源。 为前置驱动程序提供了一个附加的源感测连接。 将D1和D3的驱动电压提升到D1的栅极,可以实现更快速的D1和D3上拉,从而提高开关速度下的开关性能。 驱动器电路的大电流处理部件与GaN开关集成,并且紧密耦合以减小电感,而离散预驱动器可以与GaN芯片热分离。
    • 9. 发明申请
    • FAULT TOLERANT DESIGN FOR LARGE AREA NITRIDE SEMICONDUCTOR DEVICES
    • 用于大面积氮化物半导体器件的容错设计
    • WO2015061881A1
    • 2015-05-07
    • PCT/CA2014/000762
    • 2014-10-28
    • GAN SYSTEMS INC.
    • KLOWAK, Gregory P.MCKNIGHT-MACNEIL, CameronTWEDDLE, HowardMIZAN, AhmadSPRINGETT, Nigel
    • H01L29/778H01L21/66H01L29/41H01L27/02H01L29/20
    • H01L29/2003H01L22/14H01L22/22H01L29/41758H01L29/7786
    • A fault tolerant design for large area nitride semiconductor devices is provided, which facilitates testing and isolation of defective areas. A transistor comprises an array of a plurality of islands, each island comprising an active region, source and drain electrodes, and a gate electrode. Electrodes of each island are electrically isolated from electrodes of neighbouring islands in at least one direction of the array. Source, drain and gate contact pads are provided to enable electrical testing of each island. After electrical testing of islands to identify defective islands, overlying electrical connections are formed to interconnect source electrodes in parallel, drain electrodes in parallel, and to interconnect gate electrodes to form a common gate electrode of large gate width Wg. Interconnections are provided selectively to good islands, while electrically isolating defective islands. This approach makes it economically feasible to fabricate large area GaN devices, including hybrid devices.
    • 提供了大面积氮化物半导体器件的容错设计,便于测试和隔离缺陷区域。 晶体管包括多个岛的阵列,每个岛包括有源区,源极和漏极以及栅电极。 每个岛的电极在阵列的至少一个方向上与相邻岛的电极电隔离。 提供源极,漏极和栅极接触焊盘,以实现每个岛的电气测试。 在岛的电测试以识别有缺陷的岛之后,形成覆盖的电连接以使源电极并联连接,并联的漏电极,并且互连栅电极以形成具有大栅极宽度Wg的公共栅电极。 选择性地向好的岛提供互连,同时电隔离有缺陷的岛。 这种方法使得制造大面积GaN器件(包括混合器件)在经济上是可行的。