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    • 10. 发明申请
    • PROCESSING SYSTEM AND METHOD FOR LARGE SCALE SUBSTRATES
    • 大规模基板的加工系统和方法
    • WO2016105277A1
    • 2016-06-30
    • PCT/SG2015/050243
    • 2015-07-30
    • ROKKO SYSTEMS PTE LTD
    • SHIN, Yun SukJUNG, Jong JaeBAEK, Seung Ho
    • H01L21/68H01L21/304H01L21/67
    • H01L21/67144H01L24/97H01L2924/14
    • An alignment assembly for aligning a plurality of IC units, the assembly comprising: a plate having vacuum apertures for receiving said IC units on an engagement surface; a first alignment member having a plurality of projections and recesses uniformly distributed along a first engagement edge; a second alignment member having a plurality of projections and recesses uniformly distributed along a second engagement edge; said first and second alignment members in sliding contact with the engagement surface; wherein said first and second alignment members arranged to move relative to each other so as to intermesh said respective projections and recesses, said intermeshed projections and recesses arranged to define a linear array of rectangular apertures sized to fit said IC units in an aligned condition.
    • 一种用于对准多个IC单元的对准组件,所述组件包括:具有用于在所述接合表面上接收所述IC单元的真空孔的板; 第一对准构件,其具有沿着第一接合边缘均匀分布的多个突起和凹部; 第二对准构件,具有沿着第二接合边缘均匀分布的多个突起和凹部; 所述第一和第二对准构件与所述接合表面滑动接触; 其中所述第一和第二对准构件被布置成相对于彼此移动以便互相啮合所述相应的突起和凹部,所述相互啮合的突起和凹陷布置成限定矩形孔的线性阵列,其大小适于将所述IC单元配合成对准状态。