专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

101. 发明申请

WO2004100325A2 WAVEGUIDE LASER 审中-公开
标题翻译：波导激光
公开(公告)号：WO2004100325A2
公开(公告)日：2004-11-18
申请号：PCT/US2004013081
申请日：2004-04-29
申请人： LITELASER L L C , MONTY NATHAN PAUL
发明人： MONTY NATHAN PAUL
IPC分类号： G05B19/18 , H01S20060101 , H01S3/03 , H01S3/038 , H01S3/063 , H01S3/0975 , H01S3/22 , H01S3/223 , H01S
CPC分类号： H01S3/0385 , H01S3/0315 , H01S3/063 , H01S3/0632 , H01S3/0975 , H01S3/22
摘要： A laser waveguide, where the laser waveguide can be formed by electrodes and at least one sidewall in a manner allowing a more compact structure than previously provided. Protrusions in the electrodes allow easier laser starts, and sectional sidewall(s) allow easier fabrication of sidewall(s), decreasing manufacturing costs.
摘要翻译：激光波导，其中激光波导可以通过电极和至少一个侧壁以允许比先前提供的更紧凑的结构的方式形成。电极中的突起允许更容易的激光启动，并且截面侧壁允许更容易地制造侧壁，降低制造成本。

102. 发明申请

WO2004013940A3 GAS DISCHARGE LASER 审中-公开
标题翻译：气体放电激光器
公开(公告)号：WO2004013940A3
公开(公告)日：2004-04-15
申请号：PCT/EP0308328
申请日：2003-07-28
申请人： LAMBDA PHYSIK AG , BORISOV VLADIMIR MICHAILOVICH , KHRISTOFOROV OLEG BORISOVICH
发明人： BORISOV VLADIMIR MICHAILOVICH , KHRISTOFOROV OLEG BORISOVICH
IPC分类号： H01S1/00 , H01S3/03 , H01S3/038
CPC分类号： H01S3/0385 , H01S3/0305 , H01S3/0384
摘要： The invention relates to an excimer laser comprising a laser tube (1), in which primary electrodes (5, 6) are arranged. A gas discharge takes place between the primary electrodes (5, 6). The laser tube (1) essentially consists of a ceramic material.
摘要翻译：受激准分子激光器具有其中主电极（5,6）被布置在激光管（1）。主电极（5，6）之间发生气体放电。激光管（1）基本上由陶瓷材料组成。

103. 发明申请

WO2004013940A2 GASENTLADUNGSLASER 审中-公开
标题翻译：气体放电激光器
公开(公告)号：WO2004013940A2
公开(公告)日：2004-02-12
申请号：PCT/EP2003/008328
申请日：2003-07-28
申请人： LAMBDA PHYSIK AG , BORISOV, Vladimir, Michailovich , KHRISTOFOROV, Oleg, Borisovich
发明人： BORISOV, Vladimir, Michailovich , KHRISTOFOROV, Oleg, Borisovich
IPC分类号： H01S3/00
CPC分类号： H01S3/0385 , H01S3/0305 , H01S3/0384
摘要： Ein Excimerlaser hat eine Laserröhre (1), in der Hauptelektroden (5, 6) angeordnet sind. Eine Gasentladung erfolgt zwischen den Hauptelektroden (5, 6). Die Laserröhre (1) besteht im Wesentlichen aus einem Keramikwerkstoff.
摘要翻译：准分子激光器具有其中布置有主电极（5,6）的激光管（1）。在主电极（5,6）之间发生气体放电。激光管（1）基本上由陶瓷材料组成。

104. 发明申请

WO0060708A3 SURFACE PREIONIZATION FOR GAS LASERS 审中-公开
标题翻译：气体激光表面处理
公开(公告)号：WO0060708A3
公开(公告)日：2003-04-17
申请号：PCT/EP0002766
申请日：2000-03-29
申请人： LAMBDA PHYSIK AG
发明人： OSMANOW RUSTEM , STAMM UWE
IPC分类号： H01S3/0977 , H01S3/038 , H01S3/0971 , H01S3/0975 , H01S3/225
CPC分类号： H01S3/09716 , H01S3/0385 , H01S3/225
摘要： An excimer or molecular fluorine laser includes one or more sliding surface discharge preionization units (10a, 10b) each including an elongated preionization electrode (14) spaced from one or more associated preionization electrodes (12) by an elongated dielectric (16) within the discharge chamber. The dielectric includes a sliding discharge surface at a long axis, or side, surface of its cross-section substantially facing the discharge volume of the laser. A portion of each of the elongated and associated preionization electrodes conductively contacts a surface of the dielectric portion preferably at a cross-sectional short axis, or top or bottom, side of the dielectric. A significant area of the surface of at least one, and preferably both, of the elongated and associated electrodes contacts the corresponding surface of the dielectric such that the contact area is substantially larger than the area of the sliding discharge surface. Moreover, the sliding surface is preferably oriented and positioned such that generated UV radiation illuminates the laser gas at a substantially central location of the discharge volume.
摘要翻译：准分子或分子氟激光器包括一个或多个滑动表面放电预电离单元（10a，10b），每个滑动表面放电预电离单元包括通过细长电介质（16）在放电中与一个或多个相关联的预电离电极（12）间隔开的细长预除电极（14）室。电介质包括在其横截面的大致轴向或侧面的滑动放电表面，其基本面向激光器的放电容积。每个细长和相关的前置电极的一部分优选地在电介质的横截面短轴或顶部或底部侧电导接触电介质部分的表面。细长和相关电极中的至少一个，优选两个的表面的显着区域接触电介质的相应表面，使得接触面积基本上大于滑动放电表面的面积。此外，滑动表面优选地定向和定位成使得所产生的UV辐射在放电体积的基本中心位置照射激光气体。

105. 发明申请

WO2003021732A1 LASER LITHOGRAPHY LIGHT SOURCE WITH BEAM DELIVERY 审中-公开
标题翻译：激光光刻光源与光束交付
公开(公告)号：WO2003021732A1
公开(公告)日：2003-03-13
申请号：PCT/US2002/026400
申请日：2002-08-19
申请人： CYMER, INC. , KLENE, Brian, C. , DAS, Palash, P. , GROVE, Steven, L. , ERSHOV, Alexander, I. , SMITH, Scott, T. , PAN, Xiaojiang, J. , SANDSTROM, Richard, L.
发明人： KLENE, Brian, C. , DAS, Palash, P. , GROVE, Steven, L. , ERSHOV, Alexander, I. , SMITH, Scott, T. , PAN, Xiaojiang, J. , SANDSTROM, Richard, L.
IPC分类号： H01S3/22
CPC分类号： G03F7/70933 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser (4) light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band send beam which is amplified in the second discharge chamber. The MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable throughout the operating life of the lithography system, despite substantially degradation of optical components.
摘要翻译：本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光（4）光源。该系统包括用于将激光束传送到期望位置（例如生产线机器的入口）的封闭和清除的光束路径。在优选实施例中，生产线机器是光刻机（2），并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中被放大的非常窄的带发射光束。 MOPA系统能够以大大提高的光束质量将相当的单室激光器系统的输出脉冲能量大约翻倍。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。尽管光学部件基本上已经衰减，但是该优选实施例能够在光刻系统的整个工作寿命期间。

106. 发明申请

WO2003021731A1 SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：六至十赫兹或更大气体放电激光系统
公开(公告)号：WO2003021731A1
公开(公告)日：2003-03-13
申请号：PCT/US2002/026011
申请日：2002-08-16
申请人： CYMER, INC. , WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
发明人： WATSON, Tom, A. , UJAZDOWSKI, Richard, C. , IVASCHENKO, Alex, P. , SHANNON, Robert, A. , SANDSTROM, Richard, L. , WEBB, Robert, Kyle , PALENSCHAT, Frederick, A. , HOFMANN, Thomas , RETTIG, Curtis, L. , NESS, Richard, L. , MELCHER, Paul, C. , ERSHOV, Alexander, I.
IPC分类号： H01S3/22
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,000 pulses per second. Preferred embodiments are configured as KrF, ArF and F 2 lasers used in photolithography. Improvements include a suction fan (555) in the immediate vicinity of the anode (542) to increase gas flow. The intake of the fan (555) is between the anode (542) and the insulating spacer (544B).
摘要翻译：本发明提供了能够以6,000至10,000个脉冲/秒的重复频率在生产线容量中可靠长期运行的气体放电激光系统。优选实施例被配置为用于光刻的KrF，ArF和F2激光器。改进包括在阳极（542）附近的吸入风扇（555）以增加气体流量。风扇（555）的入口位于阳极（542）和绝缘间隔物（544B）之间。

107. 发明申请

WO2002082601A1 INJECTION SEEDED F2 LASER WITH WAVELENGTH CONTROL 审中-公开
标题翻译：注射种子F2激光与波长控制
公开(公告)号：WO2002082601A1
公开(公告)日：2002-10-17
申请号：PCT/US2002/009625
申请日：2002-03-29
申请人： CYMER, INC. , SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , ONKELS, Eckehard, D. , OH, Choonghoon
发明人： SANDSTROM, Richard, L. , NESS, Richard, M. , PARTLO, William, N. , ERSHOV, Alexander, I. , ONKELS, Eckehard, D. , OH, Choonghoon
IPC分类号： H01S3/22
CPC分类号： H01S3/105 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/08063 , H01S3/08068 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/10092 , H01S3/104 , H01S3/1305 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2325 , H01S3/2366
摘要： The present invention provides a narrow band laser system having two laser subsystems. The first laser subsystem (seed laser) provides a very narrow band pulsed output beam which is used to injection seed the second laser subsystem (slave osc. or power amp.) where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply (pulse power) precisely times the discharges in the two laser subsystems so that the discharges are properly synchronized. The laser gas comprises F 2 at a partial pressure less than about 1 % with a buffer gas comprised of helium, neon, or a combination thereof. Control of the center wavelength of the output beam is provided by adjusting one or more of the following parameters in the first laser subsystem: the total laser gas pressure, the relative concentration of helium or neon, F 2 partial pressure, laser gas temperature, discharge voltage and pulse energy.
摘要翻译：本发明提供一种具有两个激光子系统的窄带激光系统。第一个激光子系统（种子激光器）提供了一个非常窄的带状脉冲输出光束，用于对第二激光子系统（从属或功率放大器）进行种子注入，其中窄带脉冲种子光束被放大以产生窄带脉冲输出光束。脉冲电源（脉冲功率）精确地乘以两个激光子系统中的放电，使得放电正确同步。激光气体包含分压为小于约1％的F2，其中包含氦，氖或其组合的缓冲气体。通过调整第一激光子系统中的一个或多个以下参数来提供输出光束的中心波长的控制：总激光气体压力，氦或氖的相对浓度，F2分压，激光气体温度，放电电压和脉冲能量。

108. 发明申请

WO2002061897A1 PURGE MONITORING SYSTEM FOR GAS DISCHARGE LASER 审中-公开
标题翻译：气体放电激光灌装监控系统
公开(公告)号：WO2002061897A1
公开(公告)日：2002-08-08
申请号：PCT/US2002/000958
申请日：2002-01-14
申请人： CYMER, INC. , NEWMAN, Peter, C. , VAN DOORN, John , FULLEN, Darrell, W. , CLOPTON, William, H. , ROKNI, Shahryar
发明人： NEWMAN, Peter, C. , VAN DOORN, John , FULLEN, Darrell, W. , CLOPTON, William, H. , ROKNI, Shahryar
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： A laser component purge system for discharge lasers. The LNP (2), the output coupler and the wavemeter (14) are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N 2 is directed to each of the inlet ports. A purge monitoring system (17) is provided which monitors the purge flow and provides one or more signals to a processor which is programmed to minimize laser timeouts attributable to purge conditions without endangering the purged optical components. In a preferred embodiment, gas exiting the outlet ports are directed to flow monitors which provide the one or more signals to the processor. Purge gas may be exhausted or recirculated.
摘要翻译：用于放电激光器的激光元件清除系统。 LNP（2），输出耦合器和波形计（14）包含在各自具有净化入口和净化出口的密封室中。吹扫气体如N 2被引导到每个入口端口。提供清洗监测系统（17），其监测吹扫流量并向处理器提供一个或多个信号，该处理器被编程为使归因于吹扫条件的激光器超时最小化，而不危及清洗的光学部件。在优选实施例中，离开出口的气体被引导到向处理器提供一个或多个信号的流量监视器。吹扫气体可能被排出或再循环。

109. 发明申请

WO0198012A9 FOUR KHz GAS DISCHARGE LASER 审中-公开
标题翻译： 4千赫气体放电激光器
公开(公告)号：WO0198012A9
公开(公告)日：2002-06-13
申请号：PCT/US0116985
申请日：2001-05-23
申请人： CYMER INC , NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
发明人： NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
IPC分类号： H01S3/134 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供了一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以大约4,000Hz的脉冲速率产生高质量脉冲激光束。一个优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。改进的波长计配有专用软件，可监测输出光束参数，并控制非常快速的PZT驱动调谐镜和脉冲功率充电电压，以将波长和脉冲能量保持在期望的限制范围内。在一个优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间清除来自放电区域的放电碎片。

110. 发明申请

WO02037629A1 ANNEALED COPPER ALLOY ELECTRODES FOR FLUORINE CONTAINING GAS DISCHARGE LASERS 审中-公开
标题翻译：用于含氟气体放电激光器的退火铜合金电极
公开(公告)号：WO02037629A1
公开(公告)日：2002-05-10
申请号：PCT/US2001/031346
申请日：2001-10-05
IPC分类号： G03F7/20 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/0979 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/03 , H01S3/097
CPC分类号： H01S3/038 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/0381 , H01S3/0382 , H01S3/0385 , H01S3/0387 , H01S3/041 , H01S3/0979 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225
摘要： An excimer laser with a laser chamber containing a circulating laser gas containing fluorine and long-life, annealed, copper alloy electrodes. Electrode lifetime is increased by annealing them after the electrodes are machined. This annealing relieves the surface stress caused by the machining operation and reduces the exposed metallic grain boundary length per unit area on the surface of the electrodes, which provides substantial reduction in erosion caused by fluorine chemical attack. Annealing after machining also reduces teh stress throughout the bulk of the electrode material. In preferred embodiments the anode is a copper-aluminum alloy and the cathode is a copper-zinc alloy.
摘要翻译：准激光激光器，激光腔包含含有氟和长寿命，退火的铜合金电极的循环激光气体。电极寿命通过在电极加工后退火而增加。该退火减轻了加工操作引起的表面应力，降低了电极表面单位面积暴露的金属晶界长度，大大减少了氟化学侵蚀引起的侵蚀。加工后的退火也减少了整个电极材料的应力。在优选实施例中，阳极是铜 - 铝合金，阴极是铜 - 锌合金。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式