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1. 发明申请

WO2010100078A1 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING AN ILLUMINATION MODE 审中-公开
标题翻译：照明系统，光刻设备和形成照明模式的方法
公开(公告)号：WO2010100078A1
公开(公告)日：2010-09-10
申请号：PCT/EP2010/052432
申请日：2010-02-25
申请人： ASML NETHERLANDS B.V. , LOOPSTRA, Erik , VAN INGEN SCHENAU, Koen , VAN SCHOOT, Jan , WAGNER, Christian , DE VRIES, Gosse
发明人： LOOPSTRA, Erik , VAN INGEN SCHENAU, Koen , VAN SCHOOT, Jan , WAGNER, Christian , DE VRIES, Gosse
IPC分类号： G03F7/20 , G02B7/18 , H01L21/00
CPC分类号： G03F7/70825 , G03F7/70075 , G03F7/70116
摘要： Provided is an illumination system of a lithographic apparatus, the illumination system having a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation which directs radiation towards a first location the pupil plane and a second orientation which directs radiation towards a second location in the pupil plane, the first orientation and the second orientation of the reflective element being defined by end stops.
摘要翻译：提供了一种光刻设备的照明系统，所述照明系统具有布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。在不同的取向中，反射元件将辐射引导到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动，反射元件的第一取向和第二取向由端部停止。

2. 发明申请

WO2011076500A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2011076500A1
公开(公告)日：2011-06-30
申请号：PCT/EP2010/067834
申请日：2010-11-19
申请人： ASML NETHERLANDS B.V. , VAN INGEN SCHENAU, Koen , VAN SCHOOT, Jan , DE VRIES, Gosse
发明人： VAN INGEN SCHENAU, Koen , VAN SCHOOT, Jan , DE VRIES, Gosse
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70075
摘要： In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set to effect that mode. In order to adjust an imaging parameter, a fraction of the movable facets are set to different positions. The determination of which facets to set to different positions is based on summing the effects of setting each facet to a different position.
摘要翻译：在光刻设备中，使用包括多个可移动小平面的场反射镜来设置照明模式，以将辐射引导到瞳孔面反射镜上的可选位置。从一组预定照明模式中选择基本照明模式，并且可移动小面被设置为实现该模式。为了调整成像参数，可移动小面的一部分被设定为不同的位置。确定哪些面设置到不同的位置是基于将每个方面设置为不同位置的效果相加。

3. 发明申请

WO2011060975A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2011060975A1
公开(公告)日：2011-05-26
申请号：PCT/EP2010/063192
申请日：2010-09-08
申请人： ASML NETHERLANDS B.V. , VAN SCHOOT, Jan , VAN INGEN SCHENAU, Koen , DE VRIES, Gosse
发明人： VAN SCHOOT, Jan , VAN INGEN SCHENAU, Koen , DE VRIES, Gosse
IPC分类号： G03F7/20 , G02B5/09
CPC分类号： G03F7/70425 , G02B26/0833 , G02B27/0068 , G03F7/70075 , G03F7/70116 , G03F7/70191
摘要： In a lithographic apparatus, an illumination mode is set using a field mirror comprising a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror.In the event that a field facet mirror is defective and cannot be set to a desired position, another of the movable facet mirrors is set to a corrective position, different than its desired position, to at least partially ameliorate a deleterious effect of the defective facet mirror.
摘要翻译：在光刻设备中，使用包括多个可移动小面的场反射镜来设置照明模式，以将辐射引导到光瞳面反射镜上的可选择位置。在场面反射镜有缺陷并且不能被设置到期望位置的情况下另一个可移动小平面镜被设置到与其期望位置不同的校正位置，以至少部分地改善有缺陷的面反射镜的有害影响。

4. 发明申请

WO2011080019A1 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD 审中-公开
标题翻译：照明系统，光刻设备和照明方法
公开(公告)号：WO2011080019A1
公开(公告)日：2011-07-07
申请号：PCT/EP2010/068395
申请日：2010-11-29
申请人： ASML NETHERLANDS B.V. , DE BOEIJ, Wilhelmus , LOOPSTRA, Erik , MICKAN, Uwe , VAN SCHOOT, Jan , DE VRIES, Gosse
发明人： DE BOEIJ, Wilhelmus , LOOPSTRA, Erik , MICKAN, Uwe , VAN SCHOOT, Jan , DE VRIES, Gosse
IPC分类号： G03F7/20 , G02B5/09
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.
摘要翻译：照明系统包括场分面镜装置和配置成调节入射在场面镜装置上的辐射束的光瞳镜。场面反射镜装置包括相对于入射光束在第一和第二取向之间移动的反射场面。其第一取向中的场小面有效地将入射辐射反射到各个反射光瞳面，以便形成从瞳孔面反射镜装置反射的条件光束的一部分。其第二取向中的场面有效地将入射的辐射反射到被指定为光束聚集区域的瞳孔面反射镜装置的相应区域上。这些区域被布置成防止入射到区域上的辐射形成调节梁的一部分，并且被布置在瞳孔面反射镜装置上的环形区域的极限之间，有效地限定条件束的内部和外部区域从瞳孔面反射镜。

5. 发明申请

WO2011023419A1 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF ADJUSTING AN ILLUMINATION MODE 审中-公开
标题翻译：照明系统，平面设备和调节照明模式的方法
公开(公告)号：WO2011023419A1
公开(公告)日：2011-03-03
申请号：PCT/EP2010/053539
申请日：2010-03-18
申请人： ASML Netherlands B.V. , DE VRIES, Gosse , BUIS, Edwin , VAN DAM, Marinus , VAN SCHOOT, Jan , BOON, Fidelus , KREUWEL, Hermanus
发明人： DE VRIES, Gosse , BUIS, Edwin , VAN DAM, Marinus , VAN SCHOOT, Jan , BOON, Fidelus , KREUWEL, Hermanus
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system is disclosed that has a plurality of moveable reflective elements (22a, 22b, 22c) and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element (22a, 22b, 22c) between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element (22a, 22b, 22c) forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.
摘要翻译：公开了一种具有多个可移动反射元件（22a，22b，22c）和相关联的致动器的照明系统，其可以被配置为形成照明模式。一个或多个致动器布置成在第一，第二和第三位置之间移动，并且因此在第一，第二和第三取向之间移动相关联的可移动反射元件（22a，22b，22c），第一和第二取向使得辐射从可动反射元件（22a，22b，22c）反射形成照明模式的一部分，并且第三取向使得从可移动反射元件反射的辐射不会形成照明模式的一部分。

6. 发明申请

WO2010145959A1 LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
标题翻译：平面设备和方法
公开(公告)号：WO2010145959A1
公开(公告)日：2010-12-23
申请号：PCT/EP2010/057916
申请日：2010-06-07
申请人： ASML NETHERLANDS B.V. , VAN SCHOOT, Jan , DE VRIES, Gosse
发明人： VAN SCHOOT, Jan , DE VRIES, Gosse
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G03F7/70075 , G03F7/70116
摘要： An illumination system having a plurality of reflective elements, the reflective elements being movable between different orientations which direct radiation towards different locations in a pupil plane, thereby forming different illumination modes, is described. Each reflective element is moveable to a first orientation in which it directs radiation to a location in an inner illumination location group, to a second orientation in which it directs radiation to a location in an intermediate illumination location group, and to a third orientation in which it directs radiation to a location in an outer illumination location group. The reflective elements are configured to be oriented such that they can direct equal amounts of radiation towards the inner, intermediate and outer illumination location groups, and are configured to be oriented such that they can direct substantially no radiation into the outer illumination location group and direct substantially equal amounts of radiation towards the inner and intermediate illumination location groups.
摘要翻译：一种具有多个反射元件的照明系统，所述反射元件可在不同取向之间移动，所述方向将光束朝向光瞳平面中的不同位置引导，从而形成不同的照明模式。每个反射元件可移动到第一方向，其中它将辐射引导到内部照明位置组中的位置，到第二方向，其中它将辐射引导到中间照明位置组中的位置，并且其中第三方向它将辐射引导到外部照明位置组中的位置。反射元件被配置为被定向成使得它们可以将等量的辐射引导到内部，中间和外部照明位置组，并且被配置为被定向成使得它们可以基本上不将辐射引导到外部照明位置组中并且直接基本相等量的辐射朝向内部和中间照明位置组。

7. 发明申请

WO2010037575A1 PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：投影系统和平面设备
公开(公告)号：WO2010037575A1
公开(公告)日：2010-04-08
申请号：PCT/EP2009/059222
申请日：2009-07-17
申请人： ASML Netherlands B.V. , LOOPSTRA, Erik , DE BOEIJ, Wilhelmus , BUTLER, Hans , DE JONGH, Robertus , VAN SCHOOT, Jan , SENGERS, Timotheus , WIJCKMANS, Maurice , JANSSEN, Franciscus
发明人： LOOPSTRA, Erik , DE BOEIJ, Wilhelmus , BUTLER, Hans , DE JONGH, Robertus , VAN SCHOOT, Jan , SENGERS, Timotheus , WIJCKMANS, Maurice , JANSSEN, Franciscus
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70825
摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.
摘要翻译：提供了一种投影系统（PS），在一个实施例中包括两个帧。投影系统的光学元件安装在第一框架（200）上。使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。第二测量系统（920）用于测量与第二帧的变形相关联的参数。由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。通常，框架的变形是由于共振振荡和热膨胀。具有两个框架使得投影系统的光学元件能够以高精确度定位。可选地，可以提供温度控制系统（780,790），以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

8. 发明申请

WO2012119672A1 LITHOGRAPIC APPARATUS, SPECTRAL PURITY FILTER AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光电设备，光谱滤光片和器件制造方法
公开(公告)号：WO2012119672A1
公开(公告)日：2012-09-13
申请号：PCT/EP2011/073537
申请日：2011-12-21
申请人： ASML Netherlands B.V. , BANINE, Vadim , LOOPSTRA, Erik , MOORS, Roel , VAN SCHOOT, Jan , SWINKELS, Gerardus , YAKUNIN, Andrei , VAN DIJSSELDONK, Antonius , DE BOEIJ, Wilhelmus
发明人： BANINE, Vadim , LOOPSTRA, Erik , MOORS, Roel , VAN SCHOOT, Jan , SWINKELS, Gerardus , YAKUNIN, Andrei , VAN DIJSSELDONK, Antonius , DE BOEIJ, Wilhelmus
IPC分类号： G03F7/20 , G21K1/06
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译：一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度过滤器具有彼此不同的辐射过滤结构。

9. 发明申请

WO2012013751A1 EUV EXPOSURE APPARATUS 审中-公开
标题翻译： EUV曝光装置
公开(公告)号：WO2012013751A1
公开(公告)日：2012-02-02
申请号：PCT/EP2011/063002
申请日：2011-07-28
申请人： CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V. , BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
发明人： BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system, comprising a plurality of reflective optical elements, each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light. The lens further comprises support means for passively or actively supporting at least one optical element which is controlled to a temperature by a first tempering means. The support means comprising a temperature sensitive element, wherein the temperature sensitive element is controlled to a constant or to a predefined temperature by a second tempering element which is arranged between the temperature sensitive element and the first tempering element.
摘要翻译： EUV光刻投影曝光系统的投影透镜，包括多个反射光学元件，每个反射光学元件包括主体和反射表面，用于将投影透镜与基板上的图像场一起投射到基板上的图像场上， EUV灯的曝光强度。透镜还包括用于被动或主动地支撑由第一回火装置控制到温度的至少一个光学元件的支撑装置。所述支撑装置包括温度敏感元件，其中所述温度敏感元件通过布置在所述温度敏感元件和所述第一回火元件之间的第二回火元件被控制到恒定或预定温度。

10. 发明申请

WO2010012589A1 ALIGNMENT OF COLLECTOR DEVICE IN LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：收集器装置在光刻装置中的对准
公开(公告)号：WO2010012589A1
公开(公告)日：2010-02-04
申请号：PCT/EP2009/059048
申请日：2009-07-15
申请人： ASML NETHERLANDS B.V. , KLAASSEN, Michel , VAN SCHOOT, Jan , DUTARTRE, Sylvain
发明人： KLAASSEN, Michel , VAN SCHOOT, Jan , DUTARTRE, Sylvain
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/70825 , G03F7/7085
摘要： A lithographic apparatus (2) can include a radiation source (SO) configured to provide radiation (200), a radiation collector (CO) configured to collect radiation (200) from the radiation source (SO), an illumination system (IL), and a detector (300). The detector (300) can be disposed in a fixed positional relationship with the illumination system (IL) relative to an alignment of the collector (CO). Further, a region (310) of the collector (CO) can be configured to direct a portion of radiation (200) emanating from the radiation source (SO) and traversing the region (310) towards the detector (300). The detector (300) can be configured to detect a change in a portion of the radiation (200). The change can be indicative of a change in position or orientation of the collector (CO) relative to the illumination system (IL) relative to an alignment of the collector (CO).
摘要翻译：光刻设备（2）可以包括被配置为提供辐射（200）的辐射源（SO），被配置为从辐射源（SO）收集辐射（200）的辐射收集器（CO），照明系统（IL）和检测器（300）。检测器（300）可以相对于收集器（CO）的排列与照明系统（IL）以固定的位置关系设置。此外，收集器（CO）的区域（310）可以被配置为引导从辐射源（SO）发出并且朝向检测器（300）横穿该区域（310）的一部分辐射（200）。检测器（300）可以被配置为检测辐射（200）的一部分中的变化。该变化可以指示相对于收集器（CO）的对准，收集器（CO）相对于照明系统（IL）的位置或取向的变化。

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