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1. 发明申请

WO2013029893A3 LITHOGRAPHIC SYSTEM, METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：WO2013029893A3
公开(公告)日：2013-03-07
申请号：PCT/EP2012/064755
申请日：2012-07-27
申请人： ASML NETHERLANDS B.V. , DE JAGER, Pieter , BLEEKER, Arno , DEN BOEF, Arie , LOOPSTRA, Erik , PANDEY, Nitesh
发明人： DE JAGER, Pieter , BLEEKER, Arno , DEN BOEF, Arie , LOOPSTRA, Erik , PANDEY, Nitesh
IPC分类号： G03F7/20
摘要： A lithographic system has a lithographic apparatus, an inspection system and a controller. The lithographic apparatus includes a projection system configured to project a radiation beam onto a layer of material on or above a substrate. The inspection system is configured to inspect a pattern formed on the substrate. The pattern is formed on the substrate by application of the radiation beam. The controller is configured to control the lithographic apparatus to form a pattern based on data from an inspection by the inspection system of a previously exposed pattern.

2. 发明申请

WO2013020758A1 RADIATION SOURCE AND METHOD FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：放射源和方法用于光刻设备和器件制造方法
公开(公告)号：WO2013020758A1
公开(公告)日：2013-02-14
申请号：PCT/EP2012/063019
申请日：2012-07-04
申请人： ASML NETHERLANDS B.V. , LOOPSTRA, Erik , DIJKSMAN, Johan
发明人： LOOPSTRA, Erik , DIJKSMAN, Johan
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , B05B1/086 , B05B1/24 , B05B17/0607 , H05G2/005 , H05G2/006
摘要： A radiation source for generating EUV from a stream of molten fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel (314) and at least one laser configured to vaporize at least some of the droplets of fuel, whereby radiation is generated. The fuel droplet generator has a nozzle (301), a feed chamber, and a reservoir (303), with a pumping device arranged to supply a flow of fuel in molten state from the reservoir through the feed chamber and out of the nozzle as a stream of droplets. The feed chamber has an outer face in contact with a drive cavity (310) filled with a liquid, and the liquid is driven to oscillate by a vibrator (311) with the oscillation transmissible to the molten fuel in the feed chamber from the outer face of the feed chamber through the liquid. The arrangement permits oscillatory driving of a nozzle feed chamber to control fuel stream breakup into droplets without need for direct contact between a vibrator and the fuel nozzle feed chamber. This may reduce risk of loss of transmission from vibrator to feed chamber through contact failure and may allow for remote positioning of the vibrator at a cooled location for efficient operation.
摘要翻译：用于通过LPP（激光产生等离子体）或（双激光等离子体）从熔融燃料液滴流产生EUV的辐射源具有燃料液滴发生器，其布置成提供燃料液滴（314）和至少一个激光器，其配置成蒸发至少一些燃料液滴，从而产生辐射。燃料液滴发生器具有喷嘴（301），进料室和储存器（303），其中泵送装置被布置成将熔融状态的燃料流从储存器通过进料室提供出来并作为喷嘴液滴流。进料室具有与填充有液体的驱动腔（310）接触的外表面，并且液体被振动器（311）驱动振荡，振动器（311）可从外表面传送到进料室中的熔融燃料的进料室通过液体。该布置允许喷嘴进料室的振荡驱动以将燃料流分解成液滴，而不需要振动器和燃料喷嘴进料室之间的直接接触。这可以降低通过接触故障从振动器传递到进料室的损失的风险，并且可以允许将振动器远程定位在冷却的位置以进行有效的操作。

3. 发明申请

WO2010037575A1 PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：投影系统和平面设备
公开(公告)号：WO2010037575A1
公开(公告)日：2010-04-08
申请号：PCT/EP2009/059222
申请日：2009-07-17
申请人： ASML Netherlands B.V. , LOOPSTRA, Erik , DE BOEIJ, Wilhelmus , BUTLER, Hans , DE JONGH, Robertus , VAN SCHOOT, Jan , SENGERS, Timotheus , WIJCKMANS, Maurice , JANSSEN, Franciscus
发明人： LOOPSTRA, Erik , DE BOEIJ, Wilhelmus , BUTLER, Hans , DE JONGH, Robertus , VAN SCHOOT, Jan , SENGERS, Timotheus , WIJCKMANS, Maurice , JANSSEN, Franciscus
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70825
摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.
摘要翻译：提供了一种投影系统（PS），在一个实施例中包括两个帧。投影系统的光学元件安装在第一框架（200）上。使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。第二测量系统（920）用于测量与第二帧的变形相关联的参数。由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。通常，框架的变形是由于共振振荡和热膨胀。具有两个框架使得投影系统的光学元件能够以高精确度定位。可选地，可以提供温度控制系统（780,790），以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

4. 发明申请

WO2009104962A1 LITHOGRAPHIC APPARATUS COMPRISING A MAGNET, METHOD FOR THE PROTECTION OF A MAGNET IN A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：包含磁铁的平面设备，用于保护磁铁的方法和设备制造方法
公开(公告)号：WO2009104962A1
公开(公告)日：2009-08-27
申请号：PCT/NL2009/050074
申请日：2009-02-19
申请人： ASML Netherlands B.V. , MOORS, Johannes Hubertus Josephina , KOSTER, Norbertus Benedictus , LOOPSTRA, Erik Roelof , SMEETS, Martin Frans Pierre , KEMPEN, Antonius Theodorus Wilhelmus
发明人： MOORS, Johannes Hubertus Josephina , KOSTER, Norbertus Benedictus , LOOPSTRA, Erik Roelof , SMEETS, Martin Frans Pierre , KEMPEN, Antonius Theodorus Wilhelmus
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , G03F7/70808 , G03F7/70858 , G03F7/70916
摘要： A lithographic apparatus (1) includes a magnet (100) being contained in a protective enclosure (110), the protective enclosure (110) being arranged to protect the magnet (100) from contact with a H2-containing or H-atom containing gas. The enclosure (110) may further contain a hydrogen getter (120), a magnet-surface modifying gas (130), or a non- hydrogen containing gas (130). A non-hydrogen containing gas flow may be provided or a magnet-surface modifying gas flow may be provided through at least part of the protective enclosure (110).
摘要翻译：光刻设备（1）包括容纳在保护壳体（110）中的磁体（100），保护外壳（110）被布置成保护磁体（100）免受含H2或含H原子气体的接触。外壳（110）还可以包含氢吸气剂（120），磁体表面改性气体（130）或非含氢气体（130）。可以提供不含氢的气流，或者可以通过保护外壳（110）的至少一部分提供磁体表面改性气体流。

5. 发明申请

WO2008136666A2 IMAGE SENSOR, METHOD FOR IMAGE DETECTION AND COMPUTER PROGRAM PRODUCT 审中-公开
标题翻译：图像传感器，图像检测方法和计算机程序产品
公开(公告)号：WO2008136666A2
公开(公告)日：2008-11-13
申请号：PCT/NL2008/050264
申请日：2008-04-29
申请人： ASML Netherlands B.V. , STAALS, Frank , LOF, Joeri , LOOPSTRA, Erik, Roelof , TEL, Wim, Tjibbo , MOEST, Bearrach
发明人： STAALS, Frank , LOF, Joeri , LOOPSTRA, Erik, Roelof , TEL, Wim, Tjibbo , MOEST, Bearrach
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens arranged to form a detection image of the aerial pattern and an image detector arranged to measure radiation intensities in a plurality of positions in the detection image.
摘要翻译：本发明涉及一种用于检测天线图案的图像，其包括用于曝光基板的光刻设备中的辐射束的横截面中的辐射强度的空间差异。图像传感器包括布置成形成天线图案的检测图像的透镜和布置成测量检测图像中的多个位置中的辐射强度的图像检测器。

6. 发明申请

WO2005054955A2 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2005054955A2
公开(公告)日：2005-06-16
申请号：PCT/EP2004013310
申请日：2004-11-24
申请人： ASML NETHERLANDS BV , ZEISS CARL SMT AG , STREEFKERK BOB , BASELMANS JOHANNES JACOBUS MAT , GRAUPNER PAUL , HAISMA JAN , HATTU NICODEMUS , HOOGENDAM CHRISTAAN ALEXANDER , LOOPSTRA ERIK ROELOF , MULKENS JOHANNES CATHARINUS HU , GELLRICH BERNARD
发明人： STREEFKERK BOB , BASELMANS JOHANNES JACOBUS MAT , GRAUPNER PAUL , HAISMA JAN , HATTU NICODEMUS , HOOGENDAM CHRISTAAN ALEXANDER , LOOPSTRA ERIK ROELOF , MULKENS JOHANNES CATHARINUS HU , GELLRICH BERNARD
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/7095
摘要： The joint between the lens (21) and its support (22) comprises an inorganic layer or a direct bond and is thus liquid tight which prevents deformation by the immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. The lens (21) and its support (22) are preferably made of quartz.
摘要翻译：透镜（21）与其支撑体（22）之间的接合部包括无机层或直接接合，因此液密，防止浸渍液变形。关节可以做温暖还是冷。焊料，胶水和胶水保护都可用于形成这种接头。透镜（21）及其支撑体（22）优选地由石英制成。

7. 发明申请

WO2013029893A2 LITHOGRAPHIC SYSTEM, METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光栅系统，控制光刻设备的方法和器件制造方法
公开(公告)号：WO2013029893A2
公开(公告)日：2013-03-07
申请号：PCT/EP2012064755
申请日：2012-07-27
申请人： ASML NETHERLANDS BV , DE JAGER PIETER , BLEEKER ARNO , DEN BOEF ARIE , LOOPSTRA ERIK , PANDEY NITESH
发明人： DE JAGER PIETER , BLEEKER ARNO , DEN BOEF ARIE , LOOPSTRA ERIK , PANDEY NITESH
IPC分类号： G03F7/20
CPC分类号： G03F7/70291 , G03F7/70391 , G03F7/704 , G03F7/70525 , G03F7/70675
摘要： A lithographic system has a lithographic apparatus, an inspection system and a controller. The lithographic apparatus includes a projection system configured to project a radiation beam onto a layer of material on or above a substrate. The inspection system is configured to inspect a pattern formed on the substrate. The pattern is formed on the substrate by application of the radiation beam. The controller is configured to control the lithographic apparatus to form a pattern based on data from an inspection by the inspection system of a previously exposed pattern.
摘要翻译：光刻系统具有光刻设备，检查系统和控制器。光刻设备包括投影系统，该投影系统配置成将辐射束投影到基底上或上方的材料层上。检查系统被配置为检查形成在基板上的图案。通过施加辐射束在衬底上形成图案。控制器被配置为基于来自检查系统对先前曝光的图案的检查的数据来控制光刻设备以形成图案。

8. 发明申请

WO2013029879A1 LITHOGRAPHIC APPARATUS, METHOD OF SETTING UP A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：平面设备，设置平面设备的方法和设备制造方法
公开(公告)号：WO2013029879A1
公开(公告)日：2013-03-07
申请号：PCT/EP2012/064452
申请日：2012-07-24
申请人： ASML NETHERLANDS B.V. , BLEEKER, Arno , LOOPSTRA, Erik , VAN DER SCHOOT, Harmen , PHILIPS, Danny , BEERENS, Ruud
发明人： BLEEKER, Arno , LOOPSTRA, Erik , VAN DER SCHOOT, Harmen , PHILIPS, Danny , BEERENS, Ruud
IPC分类号： G03F7/20
CPC分类号： G03F7/70641 , G03F7/7005 , G03F7/70275 , G03F7/70291 , G03F7/70308 , G03F7/70391 , G03F7/704 , G03F7/70825
摘要： A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.
摘要翻译：一种具有可编程图案形成装置和投影系统的光刻设备。可编程图案形成装置被配置为提供多个辐射束。投影系统具有配置成将多个辐射束投影到基板上的透镜组阵列。投影系统还包括对应于透镜组阵列的透镜组的光路中的焦点调节器。焦点调节器具有基本上为零光功率的光学元件。

9. 发明申请

WO2013023710A1 RADIATION SOURCE 审中-公开
标题翻译：辐射源
公开(公告)号：WO2013023710A1
公开(公告)日：2013-02-21
申请号：PCT/EP2011/072633
申请日：2011-12-13
申请人： ASML NETHERLANDS B.V. , KEMPEN, Antonius , LOOPSTRA, Erik , WAGNER, Christian , TEGENBOSCH, Henricus , SWINKELS, Gerardus
发明人： KEMPEN, Antonius , LOOPSTRA, Erik , WAGNER, Christian , TEGENBOSCH, Henricus , SWINKELS, Gerardus
IPC分类号： H05G2/00
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A radiation source includes: a nozzle configured to direct a stream of fuel droplets (30) along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location, the catch including: a container (40) configured to contain a fluid (42); a driver (44) configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.
摘要翻译：辐射源包括：喷嘴，其构造成沿着轨迹朝向等离子体形成位置引导燃料液滴流（30）; 配置成输出激光辐射的激光器，引导到等离子体形成位置处的燃料液滴处的激光辐射，以在使用中产生辐射产生等离子体; 以及构造成捕获通过等离子体形成位置的燃料液滴的挡块，所述挡块包括：构造成容纳流体（42）的容器（40）; 构造成驱动流体的驱动器（44），以使流体移动; 捕捉器构造成使得燃料液滴入射到该移动流体上。

10. 发明申请

WO2012031841A1 LITHOGRAPHIC APPARATUS, EUV RADIATION GENERATION APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光刻设备，EUV辐射发生装置和装置制造方法
公开(公告)号：WO2012031841A1
公开(公告)日：2012-03-15
申请号：PCT/EP2011/063443
申请日：2011-08-04
申请人： ASML NETHERLANDS B.V. , LOOPSTRA, Erik , SWINKELS, Gerardus , BUURMAN, Erik , STAMM, Uwe
发明人： LOOPSTRA, Erik , SWINKELS, Gerardus , BUURMAN, Erik , STAMM, Uwe
IPC分类号： H01S3/00 , G03F7/20 , H05G2/00
CPC分类号： G03F7/70033 , B23K26/0643 , G03F7/70025 , G03F7/70191 , G03F7/7055 , H01S3/0071 , H01S3/2308 , H05G2/001 , H05G2/008
摘要： An EUV radiation generation apparatus includes a laser (300) configured to generate pulses (205) of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector (305) and a radially positioned reflector (306). The rotatably mounted reflector and the laser are synchronized such that a reflective surface (307,308) of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location (313) and cause a radiation emitting plasma to be generated via vaporization of a droplet (313a) of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation (316) reflected from the plasma formation location.
摘要翻译： EUV辐射发生装置包括被配置为产生激光辐射的脉冲（205）的激光器（300）和包括可旋转地安装的反射器（305）和径向定位的反射器（306）的光学隔离装置。可旋转地安装的反射器和激光器被同步，使得当光隔离装置接收到激光辐射的脉冲以允许激光辐射的脉冲时，可旋转地安装的反射器的反射表面（307,308）与径向定位的反射器光学连通传递到等离子体形成位置（313）并且通过燃料材料的液滴（313a）的蒸发而产生辐射发射等离子体。可旋转地安装的反射器和激光器进一步同步，使得当光隔离设备接收从等离子体形成位置反射的辐射（316）时，可旋转安装的反射器的反射表面至少部分地与径向定位的反射器光学隔离。

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