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1. 发明申请

WO2012013751A1 EUV EXPOSURE APPARATUS 审中-公开
标题翻译： EUV曝光装置
公开(公告)号：WO2012013751A1
公开(公告)日：2012-02-02
申请号：PCT/EP2011/063002
申请日：2011-07-28
申请人： CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V. , BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
发明人： BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system, comprising a plurality of reflective optical elements, each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light. The lens further comprises support means for passively or actively supporting at least one optical element which is controlled to a temperature by a first tempering means. The support means comprising a temperature sensitive element, wherein the temperature sensitive element is controlled to a constant or to a predefined temperature by a second tempering element which is arranged between the temperature sensitive element and the first tempering element.
摘要翻译： EUV光刻投影曝光系统的投影透镜，包括多个反射光学元件，每个反射光学元件包括主体和反射表面，用于将投影透镜与基板上的图像场一起投射到基板上的图像场上， EUV灯的曝光强度。透镜还包括用于被动或主动地支撑由第一回火装置控制到温度的至少一个光学元件的支撑装置。所述支撑装置包括温度敏感元件，其中所述温度敏感元件通过布置在所述温度敏感元件和所述第一回火元件之间的第二回火元件被控制到恒定或预定温度。

2. 发明申请

WO2012013748A1 EUV EXPOSURE APPARATUS 审中-公开
标题翻译： EUV曝光装置
公开(公告)号：WO2012013748A1
公开(公告)日：2012-02-02
申请号：PCT/EP2011/062997
申请日：2011-07-28
申请人： CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V. , BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
发明人： BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system, comprising a plurality of reflective optical elements, each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein at least one reflective optical element comprises a material with a temperature dependent coefficient of thermal expansion which is zero at a zero cross temperature, and wherein the body of the optical element is semitransparent to IR radiation. Further, the body comprises a coating on or on almost its entire surface, wherein the coating reflects IR radiation inside the body.
摘要翻译： EUV光刻投影曝光系统的投影透镜，包括多个反射光学元件，每个反射光学元件包括主体和反射表面，用于将投影透镜与基板上的图像场一起投射到基板上的图像场上， EUV光的曝光功率，其中至少一个反射光学元件包括在零交叉温度下具有温度依赖的热膨胀系数为零的材料，并且其中所述光学元件的主体与IR辐射半透明。此外，主体包括在其整个表面上或之上的涂层，其中涂层反射体内的IR辐射。

3. 发明申请

WO2012013747A1 EUV EXPOSURE APPARATUS 审中-公开
标题翻译： EUV曝光装置
公开(公告)号：WO2012013747A1
公开(公告)日：2012-02-02
申请号：PCT/EP2011/062996
申请日：2011-07-28
申请人： CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V. , BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
发明人： BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
摘要翻译： EUV光刻投影曝光系统的投影透镜，其具有至少两个反射光学元件，每个反射光学元件均包括主体和反射表面，用于在掩模版上将物场投射到基板上的图像场上，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括具有温度依赖的热膨胀系数的材料，其在相应的零交叉温度下为零，并且其中零交叉温度之间的差的绝对值更多超过6K。

4. 发明申请

WO2012013746A1 EUV EXPOSURE APPARATUS 审中-公开
标题翻译： EUV曝光装置
公开(公告)号：WO2012013746A1
公开(公告)日：2012-02-02
申请号：PCT/EP2011/062995
申请日：2011-07-28
申请人： CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V. , BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
发明人： BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A mirror comprising a body and a reflective surface, the body comprising a material with a temperature dependent coefficient of thermal expansion which is zero at a zero cross temperature T 0k- Further, at least a part of the surface of the body comprises a wire grid for electrically resistive heating of the body and the mirror is adapted for a projection lens of an EUV-lithographic projection exposure system, for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light.
摘要翻译：一种包括主体和反射表面的反射镜，所述主体包括具有温度依赖的热膨胀系数的材料，其在零交叉温度T0k为零。此外，主体的表面的至少一部分包括用于本体和反射镜的电阻加热适用于EUV光刻投影曝光系统的投影透镜，用于将掩模版上的物场投影到基板上的图像场上，如果投影透镜以曝光量曝光 EUV灯。

5. 发明申请

WO2011039103A1 OPTICAL ARRANGEMENT IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置中的光学装置
公开(公告)号：WO2011039103A1
公开(公告)日：2011-04-07
申请号：PCT/EP2010/064090
申请日：2010-09-23
申请人： CARL ZEISS SMT GMBH , SCHÖPPACH, Armin , MANN, Hans-Jürgen , EISERT, Frank , KWAN, Yim-Bun-Patrick
发明人： SCHÖPPACH, Armin , MANN, Hans-Jürgen , EISERT, Frank , KWAN, Yim-Bun-Patrick
IPC分类号： G03F7/20 , G03B7/02 , G02B7/182
CPC分类号： G03F7/70825 , G02B17/0657
摘要： The invention concerns inter alia an optical arrangement in a microlithographic projection exposure apparatus comprising at least one optical element (110, 210) and a support element (120, 220) for the optical element (110, 210), wherein the optical element (110, 210) and the support element (120, 220) are connected together by way of at least three decoupling elements (131, 132, 133; 231, 232, 233), and wherein said decoupling elements (131, 132, 133; 231, 232, 233) are formed monolithically with the optical element (110, 210) and with the support element (120, 220).
摘要翻译：本发明尤其涉及一种微光刻投影曝光装置中的光学装置，其包括用于光学元件（110,210）的至少一个光学元件（110,210）和支撑元件（120,220），其中光学元件（110 ，210）和所述支撑元件（120,220）通过至少三个去耦元件（131,132,133; 231,232,233）连接在一起，并且其中所述去耦元件（131,132,133; 231），232,233）与所述光学元件（110,210）和所述支撑元件（120,220）整体形成。

6. 发明申请

WO2013004403A1 OPTICAL IMAGING ARRANGEMENT WITH VIBRATION DECOUPLED SUPPORT UNITS 审中-公开
标题翻译：光学成像装置与振动解除支持单元
公开(公告)号：WO2013004403A1
公开(公告)日：2013-01-10
申请号：PCT/EP2012/053743
申请日：2012-03-05
申请人： CARL ZEISS SMT GMBH , KWAN, Yim-Bun-Patrick , LARO, Dick Antonius Hendrikus
发明人： KWAN, Yim-Bun-Patrick , LARO, Dick Antonius Hendrikus
IPC分类号： G03F7/20
CPC分类号： G02B27/646 , G03F7/7015 , G03F7/70825 , G03F7/70833 , G03F7/709
摘要： There is provided an optical imaging arrangement comprising an optical projection system and a support structure system. The optical projection system comprises a group of optical elements configured to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask supported by a mask support structure onto a substrate supported by a substrate support structure. The mask support structure and the substrate support structure form a primary source of vibration. The support structure system comprises a base support structure, an optical element support structure and at least one secondary vibration source support structure of a secondary vibration source other than the primary source of vibration. The optical element support structure supports the optical elements. The at least one secondary vibration source support structure supports a secondary vibration source, the secondary vibration source being a source of a secondary vibration disturbance comprising structure borne vibration energy and the secondary vibration source being located internal to the optical imaging arrangement. The base support structure supports the optical element support structure and the secondary vibration source support structure in such a manner that a structural path of the structure borne vibration energy from the secondary vibration source to the optical element support structure only exists through the base support unit.
摘要翻译：提供了一种包括光学投影系统和支撑结构系统的光学成像装置。该光学投影系统包括：一组光学元件，被配置为在曝光过程中使用曝光光沿着曝光光路将由掩模支撑结构支撑的掩模的图案的图像转印到由基板支撑结构支撑的基板上。掩模支撑结构和基板支撑结构形成主要振动源。支撑结构系统包括基座支撑结构，光学元件支撑结构以及除了主要振动源之外的次级振动源的至少一个次级振动源支撑结构。光学元件支撑结构支撑光学元件。所述至少一个次级振动源支撑结构支撑次级振动源，所述次级振动源是包括结构承载的振动能量的次级振动干扰的源，并且所述次级振动源位于所述光学成像装置的内部。基部支撑结构以这样的方式支撑光学元件支撑结构和次级振动源支撑结构，使得结构承载的振动能量从二次振动源到光学元件支撑结构的结构路径仅通过基座支撑单元存在。

7. 发明申请

WO2013004278A1 OPTICAL IMAGING ARRANGEMENT WITH INDIVIDUALLY ACTIVELY SUPPORTED COMPONENTS 审中-公开
标题翻译：光学成像安排与个别活跃的支持组件
公开(公告)号：WO2013004278A1
公开(公告)日：2013-01-10
申请号：PCT/EP2011/061157
申请日：2011-07-01
申请人： CARL ZEISS SMT GMBH , KWAN, Yim-Bun-Patrick
发明人： KWAN, Yim-Bun-Patrick
IPC分类号： G03F7/20
CPC分类号： G02B27/646 , G03F7/7015 , G03F7/70825 , G03F7/70833 , G03F7/709
摘要： There is provided an optical imaging arrangement comprising an optical projection unit and a control device. The optical projection unit comprises a support structure and a group of optical element units adapted to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask unit onto a substrate of a substrate unit. The group of optical element units comprises a first optical element unit and a plurality of second optical element units, the first optical element unit and the second optical element units, under a control by said control device, being actively supported by the support structure. The first optical element unit is actively supported at a low first control bandwidth, while the second optical element units are actively supported at a second control bandwidth to substantially maintain a given spatial relationship of each of the second optical elements with respect to the first optical element unit.
摘要翻译：提供了包括光学投影单元和控制装置的光学成像装置。光学投影单元包括支撑结构和一组光学元件单元，其适于在使用沿着曝光光路的曝光光的曝光处理中将掩模单元的图案的图像转印到基板单元的基板上。所述光学元件单元组包括第一光学元件单元和多个第二光学元件单元，所述第一光学元件单元和所述第二光学元件单元在所述控制设备的控制下由所述支撑结构主动地支撑。第一光学元件单元以低的第一控制带宽被主动地支持，而第二光学元件单元被主动地支持在第二控制带宽以基本上保持每个第二光学元件相对于第一光学元件的给定的空间关系单元。

8. 发明申请

WO2013050081A1 METHOD FOR CONTROLLING A MOTION OF OPTICAL ELEMENTS IN LITHOGRAPHY SYSTEMS 审中-公开
标题翻译：控制光刻系统中光学元件运动的方法
公开(公告)号：WO2013050081A1
公开(公告)日：2013-04-11
申请号：PCT/EP2011/067532
申请日：2011-10-07
申请人： CARL ZEISS SMT GmbH , KWAN, Yim-Bun-Patrick , LARO, Dick Antonius Hendrikus
发明人： KWAN, Yim-Bun-Patrick , LARO, Dick Antonius Hendrikus
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , G03F7/70591 , G03F7/70825 , G03F7/70833 , G03F7/7085
摘要： A Method for controlling a vibrating optical element (2) of a lithographic system the optical element (2) having a predetermined number of degrees of freedom comprises: detecting a number of displacements of the optical element (2), each displacement corresponding to a degree of freedom, wherein the number of detected displacements is larger than the number of degrees of freedom; for each displacement according to a degree of freedom, generating a sensor signal (S z1 , S z2 , S z3 , S z4 ) corresponding to a movement in a degree of freedom; wherein the optical element moves as a function of a rigid body transformation matrix (Ty), the optical element movement including a first type of movement and a second type of movement; and modifying the sensor signals (S z1 , S z2 , S z3 , S z4 ) as a function of a modified transformation matrix, wherein the modified transformation matrix at least partially reduces at least one eigen mode or resonance of one of the first type of movements or the second type of movements.
摘要翻译：一种用于控制光刻系统的振动光学元件（2）的方法，所述光学元件（2）具有预定数量的自由度，包括：检测所述光学元件（2）的位移数，每个位移对应于所述光学元件的自由度，其中检测到的位移的数量大于自由度的数量; 根据自由度对每个位移产生对应于自由度运动的传感器信号（Sz1，Sz2，Sz3，Sz4）; 其中所述光学元件作为刚体变换矩阵（Ty）的函数移动，所述光学元件移动包括第一类型的运动和第二类型的运动; 以及修改作为修改的变换矩阵的函数的所述传感器信号（Sz1，Sz2，Sz3，Sz4），其中所述修改的变换矩阵至少部分地减少所述第一类型的运动中的至少一个本征模式或共振，运动类型

9. 发明申请

WO2011039124A1 OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY 审中-公开
标题翻译：投影曝光装置的光学装置
公开(公告)号：WO2011039124A1
公开(公告)日：2011-04-07
申请号：PCT/EP2010/064198
申请日：2010-09-24
申请人： CARL ZEISS SMT GMBH , KULITSKY, Viktor , GELLRICH, Bernhard , XALTER, Stefan , KWAN, Yim-Bun-Patrick , DEUFEL, Peter , WURMBRAND, Andreas
发明人： KULITSKY, Viktor , GELLRICH, Bernhard , XALTER, Stefan , KWAN, Yim-Bun-Patrick , DEUFEL, Peter , WURMBRAND, Andreas
IPC分类号： G03F7/20 , G02B7/00
CPC分类号： G03F7/70916 , G02B7/00 , G03F7/70233 , G03F7/70808 , G03F7/70825 , G03F7/70891
摘要： The invention concerns an optical arrangement in a projection exposure apparatus for EUV lithography, comprising a multiplicity of optical elements (101, 102) and a carrier structure (100, 300) which carries the optical elements (101, 102), wherein the carrier structure is composed of at least two releasably interconnected modules (110-140, 310-340, 510, 610), and wherein each module (110-140, 310-340, 510, 610) is composed of at least one carrier structure subelement (121-124, 421, 511 -514, 612-614), wherein a subhousing is produced by a multiplicity of carrier structure subelements (121-124, 421, 511-514, 612-614) and/or modules (110-140, 310, 340, 510, 610), and wherein said subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in said projection exposure apparatus, said usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus.
摘要翻译：本发明涉及用于EUV光刻的投影曝光装置中的光学装置，包括多个光学元件（101,102）和承载光学元件（101,102）的载体结构（100,300），其中载体结构由至少两个可释放地互连的模块（110-140,310-340,510,610）组成，并且其中每个模块（110-140,310-340,510,610）由至少一个载体结构子元件 121-124,421,511-514,612-614），其中通过多个载体结构子元件（121-124,421,511-514,612-614）和/或模块（110-140）产生子阱，310,340,510,610），并且其中所述子孔具有至少在区域中对应于所述投影曝光设备中的可用光束路径而变化的几何形状，所述可用光束路径被定义为所有光的包络束可以从场平面中的所有场点传播到投影曝光的图像平面装置。

10. 发明申请

WO2011029467A1 OPTICAL ELEMENT WITH LOW SURFACE FIGURE DEFORMATION 审中-公开
标题翻译：具有低表面形状的光学元件
公开(公告)号：WO2011029467A1
公开(公告)日：2011-03-17
申请号：PCT/EP2009/061650
申请日：2009-09-08
申请人： CARL ZEISS SMT GMBH , KWAN, Yim-Bun-Patrick
发明人： KWAN, Yim-Bun-Patrick
IPC分类号： G03F7/20
CPC分类号： G03F7/70858 , G03F7/70825
摘要： A reflective optical element with a body with a first reflective surface (750) of a high precision geometrical form for reflecting light in a wavelength range less than 50 nm in an EUV- lithographic projection exposure system. The body comprises a first (741) and a second (742) non-reflecting surface. Further, the body comprises a single connection area (730) formed on the first non-reflecting surface with at least one fixation surface inside the connection area for fixing the entire optical element directly or indirectly to at least one bearing surface of a bearing element. In addition, the second non-reflecting surface is different from the single connection area formed on the first non- reflective surface, and the second non-reflecting surface at least partly surrounds the single connection area, Further, at least one stress relief recess is formed into the body, wherein the stress relief recess (793) at least partly separates the first non-reflective surface from the second non-reflecting surface.
摘要翻译：一种具有主体的反射光学元件，其具有用于在EUV-光刻投影曝光系统中反射波长范围小于50nm的光的高精度几何形状的第一反射表面（750）。主体包括第一（741）和第二（742）非反射表面。此外，主体包括形成在第一非反射表面上的单个连接区域（730），在连接区域内具有至少一个固定表面，用于将整个光学元件直接或间接地固定到轴承元件的至少一个支承表面。此外，第二非反射表面不同于形成在第一非反射表面上的单个连接区域，并且第二非反射表面至少部分地围绕单个连接区域。此外，至少一个应力释放凹部是形成到所述主体中，其中所述应力消除凹部（793）至少部分地将所述第一非反射表面与所述第二非反射表面分离。

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