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1. 发明申请

WO2009061188A3 METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2009061188A3
公开(公告)日：2009-05-14
申请号：PCT/NL2008/050700
申请日：2008-11-06
申请人： ASML Netherlands B.V. , SCHIMMEL, Hendrikus Gijsbertus , VAN EMPEL, Tjarko Adriaan Rudolf , SWINKELS, Gerardus Hubertus Petrus Maria , HAAST, Marc Antonius Maria , LABETSKI, Dzmitry , FRERIKS, Johannes Maria , VAN DE VIJVER, Yuri Johannes Gabriël , VERSTEEG, Wendelin Johanna Maria , JONKERS, Peter Gerardus
发明人： SCHIMMEL, Hendrikus Gijsbertus , VAN EMPEL, Tjarko Adriaan Rudolf , SWINKELS, Gerardus Hubertus Petrus Maria , HAAST, Marc Antonius Maria , LABETSKI, Dzmitry , FRERIKS, Johannes Maria , VAN DE VIJVER, Yuri Johannes Gabriël , VERSTEEG, Wendelin Johanna Maria , JONKERS, Peter Gerardus
IPC分类号： G03F7/20
摘要： The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.

2. 发明申请

WO2005005592A1 VORRICHTUNG ZUM MÄLZEN VON GETREIDE 审中-公开
标题翻译：设备技术越麦芽谷物
公开(公告)号：WO2005005592A1
公开(公告)日：2005-01-20
申请号：PCT/CH2004/000435
申请日：2004-07-08
申请人： BÜHLER AG , SWINKELS, Gerardus
发明人： SWINKELS, Gerardus
IPC分类号： C12C1/027
CPC分类号： C12C1/15 , C12C1/0275
摘要： Die Erfindung betrifft eine Vorrichtung (1) zum Mälzen von Getreide, einen Turm (2) mit einer Anzahl von Etagen umfassend, die voneinander durch Etagenböden (9, 10) getrennt sind, wobei jede Etage einen luftdurchlässigen Tragboden (13) zur Unterstützung des zu keimenden Getreides (24) und weiterhin Luftkonditionierungsmittel zum Konditionieren von Luft und Verlagerungsmittel umfasst, die mit einem Zufuhrkanal und einem Abfuhrkanal zum Verlagern von konditionierter Luft über den Zufuhrkanal versehen sind, welcher sich ab den Luftkonditionierungsmitteln zur Unterseite eines Tragbodens, durch den Tragboden und eine darauf gelegene Getreideschicht zur Oberseite der Getreideschicht, und über den Abfuhrkanal weg von der Oberseite der Getreideschicht erstreckt, wobei sich der Zufuhrkanal und/oder der Abfuhrkanal durch eine zentrale Öffnung in mindestens einem Etagenboden erstreckt.
摘要翻译：本发明涉及一种用于制麦粒的装置（1），塔架（2）具有多个包括楼层，彼此通过搁板（9，10）分离，每层具有透气性的支撑底部（13），以支持对发芽谷物（24），还包括空调装置，用于调节空气和位移装置，其设置有一个供给通道和用于在供给通道，其从空调延伸位移的调节空气的排出通道朝向托盘的底部是指，由所述支撑基体和随后的经由排出通道从晶层的顶侧而优选的粒面层的粒面层的顶侧，并延伸，其中所述供应通道和/或排出通道通过在至少一层地板的中心开口延伸。

3. 发明申请

WO2013023710A1 RADIATION SOURCE 审中-公开
标题翻译：辐射源
公开(公告)号：WO2013023710A1
公开(公告)日：2013-02-21
申请号：PCT/EP2011/072633
申请日：2011-12-13
申请人： ASML NETHERLANDS B.V. , KEMPEN, Antonius , LOOPSTRA, Erik , WAGNER, Christian , TEGENBOSCH, Henricus , SWINKELS, Gerardus
发明人： KEMPEN, Antonius , LOOPSTRA, Erik , WAGNER, Christian , TEGENBOSCH, Henricus , SWINKELS, Gerardus
IPC分类号： H05G2/00
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A radiation source includes: a nozzle configured to direct a stream of fuel droplets (30) along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location, the catch including: a container (40) configured to contain a fluid (42); a driver (44) configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.
摘要翻译：辐射源包括：喷嘴，其构造成沿着轨迹朝向等离子体形成位置引导燃料液滴流（30）; 配置成输出激光辐射的激光器，引导到等离子体形成位置处的燃料液滴处的激光辐射，以在使用中产生辐射产生等离子体; 以及构造成捕获通过等离子体形成位置的燃料液滴的挡块，所述挡块包括：构造成容纳流体（42）的容器（40）; 构造成驱动流体的驱动器（44），以使流体移动; 捕捉器构造成使得燃料液滴入射到该移动流体上。

4. 发明申请

WO2012031841A1 LITHOGRAPHIC APPARATUS, EUV RADIATION GENERATION APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光刻设备，EUV辐射发生装置和装置制造方法
公开(公告)号：WO2012031841A1
公开(公告)日：2012-03-15
申请号：PCT/EP2011/063443
申请日：2011-08-04
申请人： ASML NETHERLANDS B.V. , LOOPSTRA, Erik , SWINKELS, Gerardus , BUURMAN, Erik , STAMM, Uwe
发明人： LOOPSTRA, Erik , SWINKELS, Gerardus , BUURMAN, Erik , STAMM, Uwe
IPC分类号： H01S3/00 , G03F7/20 , H05G2/00
CPC分类号： G03F7/70033 , B23K26/0643 , G03F7/70025 , G03F7/70191 , G03F7/7055 , H01S3/0071 , H01S3/2308 , H05G2/001 , H05G2/008
摘要： An EUV radiation generation apparatus includes a laser (300) configured to generate pulses (205) of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector (305) and a radially positioned reflector (306). The rotatably mounted reflector and the laser are synchronized such that a reflective surface (307,308) of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location (313) and cause a radiation emitting plasma to be generated via vaporization of a droplet (313a) of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation (316) reflected from the plasma formation location.
摘要翻译： EUV辐射发生装置包括被配置为产生激光辐射的脉冲（205）的激光器（300）和包括可旋转地安装的反射器（305）和径向定位的反射器（306）的光学隔离装置。可旋转地安装的反射器和激光器被同步，使得当光隔离装置接收到激光辐射的脉冲以允许激光辐射的脉冲时，可旋转地安装的反射器的反射表面（307,308）与径向定位的反射器光学连通传递到等离子体形成位置（313）并且通过燃料材料的液滴（313a）的蒸发而产生辐射发射等离子体。可旋转地安装的反射器和激光器进一步同步，使得当光隔离设备接收从等离子体形成位置反射的辐射（316）时，可旋转安装的反射器的反射表面至少部分地与径向定位的反射器光学隔离。

5. 发明申请

WO2009061192A1 RADIATION SYSTEM AND METHOD, AND A SPECTRAL PURITY FILTER 审中-公开
标题翻译：辐射系统和方法，以及光谱滤光片
公开(公告)号：WO2009061192A1
公开(公告)日：2009-05-14
申请号：PCT/NL2008/050704
申请日：2008-11-07
申请人： ASML NETHERLANDS B.V. , SCHIMMEL, Hendrikus Gijsbertus , VAN EMPEL, Tjarko Adriaan Rudolf , SWINKELS, Gerardus Hubertus Petrus Maria , VAN HERPEN, Maarten Marinus Johannes Wilhelmus , LABETSKI, Dzmitry
发明人： SCHIMMEL, Hendrikus Gijsbertus , VAN EMPEL, Tjarko Adriaan Rudolf , SWINKELS, Gerardus Hubertus Petrus Maria , VAN HERPEN, Maarten Marinus Johannes Wilhelmus , LABETSKI, Dzmitry
IPC分类号： G03F7/20 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70575 , G03F7/70983 , G21K1/10 , G21K2201/061 , H05G2/003
摘要： A radation system (3) configured to generate a radiation beam (B). The system (3) has a chamber (3). The chamber (3) includes a radiation source (50) configured to generate radiation (B), and a radiation collector (70) configured to collect radiation (B) generated by the source (50), to transmit collected radiation to a radiation beam emission aperture (60). A spectral purity filter (80) enhances a spectral purity of the radiation (B) that is to be emitted via the aperture (60). The filter (80) is divided the chamber (3) into a high pressure region (Rl) and a low pressure region (R2).
摘要翻译：辐射系统（3），被配置为产生辐射束（B）。系统（3）具有腔室（3）。腔室（3）包括被配置为产生辐射（B）的辐射源（50）和被配置为收集由源（50）产生的辐射（B））的辐射收集器（70），以将收集的辐射传输到辐射束发射孔径（60）。光谱纯度滤光器（80）增强了经由孔径（60）发射的辐射（B）的光谱纯度。过滤器（80）将腔室（3）分成高压区域（R1）和低压区域（R2）。

6. 发明申请

WO2012119672A1 LITHOGRAPIC APPARATUS, SPECTRAL PURITY FILTER AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光电设备，光谱滤光片和器件制造方法
公开(公告)号：WO2012119672A1
公开(公告)日：2012-09-13
申请号：PCT/EP2011/073537
申请日：2011-12-21
申请人： ASML Netherlands B.V. , BANINE, Vadim , LOOPSTRA, Erik , MOORS, Roel , VAN SCHOOT, Jan , SWINKELS, Gerardus , YAKUNIN, Andrei , VAN DIJSSELDONK, Antonius , DE BOEIJ, Wilhelmus
发明人： BANINE, Vadim , LOOPSTRA, Erik , MOORS, Roel , VAN SCHOOT, Jan , SWINKELS, Gerardus , YAKUNIN, Andrei , VAN DIJSSELDONK, Antonius , DE BOEIJ, Wilhelmus
IPC分类号： G03F7/20 , G21K1/06
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译：一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度过滤器具有彼此不同的辐射过滤结构。

7. 发明申请

WO2011098169A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：WO2011098169A1
公开(公告)日：2011-08-18
申请号：PCT/EP2010/069192
申请日：2010-12-08
申请人： ASML NETHERLANDS B.V. , KEMPEN, Antonius , BRULS, Richard , LOOPSTRA, Erik , MOORS, Roel , SWINKELS, Gerardus , MESTROM, Wilbert
发明人： KEMPEN, Antonius , BRULS, Richard , LOOPSTRA, Erik , MOORS, Roel , SWINKELS, Gerardus , MESTROM, Wilbert
IPC分类号： G03F7/20
CPC分类号： G03F7/70908 , B08B3/08 , G03F7/70033 , G03F7/708 , G03F7/70916 , G03F7/70925
摘要： A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H 2 O, H 2 O 2 , O 2 , NH 3 or NO x , is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.
摘要翻译：辐射源为光刻设备产生极紫外辐射，作为设置有低压氢环境的室。向腔室提供痕量的保护性化合物，例如H 2 O，H 2 O 2，O 2，NH 3或NO x，以有助于在室中的金属（例如钛）组分上维持保护性氧化膜。

8. 发明申请

WO2011082891A1 EUV RADIATION SOURCE COMPRISING A DROPLET ACCELERATOR AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：包含减速机加速器和平面设备的EUV辐射源
公开(公告)号：WO2011082891A1
公开(公告)日：2011-07-14
申请号：PCT/EP2010/068421
申请日：2010-11-29
申请人： ASML NETHERLANDS B.V. , MESTROM, Wilbert , LOOPSTRA, Erik , SWINKELS, Gerardus , BUURMAN, Erik
发明人： MESTROM, Wilbert , LOOPSTRA, Erik , SWINKELS, Gerardus , BUURMAN, Erik
IPC分类号： H05G2/00
CPC分类号： H05G2/001 , H05G2/006
摘要： An EUV radiation source includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a nozzle configured to eject droplets of fuel, and a droplet accelerator configured to accelerate the fuel droplets. The EUV radiation source includes a laser radiation source configured to irradiate the fuel supplied by the fuel supply at the plasma formation location.
摘要翻译： EUV辐射源包括配置成向等离子体形成位置供应燃料的燃料供应。燃料供给包括喷射燃料液滴的喷嘴，和配置成加速燃料液滴的液滴加速器。 EUV辐射源包括被配置为照射由等离子体形成位置处的燃料供应供应的燃料的激光辐射源。

9. 发明申请

WO2009061188A2 METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：用于确定抑制系统的抑制因子的方法和系统和光刻设备
公开(公告)号：WO2009061188A2
公开(公告)日：2009-05-14
申请号：PCT/NL2008050700
申请日：2008-11-06
申请人： ASML NETHERLANDS BV , SCHIMMEL HENDRIKUS GIJSBERTUS , VAN EMPEL TJARKO ADRIAAN RUDOL , SWINKELS GERARDUS HUBERTUS PET , HAAST MARC ANTONIUS MARIA , LABETSKI DZMITRY , FRERIKS JOHANNES MARIA , VAN DE VIJVER YURI JOHANNES GA , VERSTEEG WENDELIN JOHANNA MARI , JONKERS PETER GERARDUS
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , VAN EMPEL TJARKO ADRIAAN RUDOLF , SWINKELS GERARDUS HUBERTUS PET , HAAST MARC ANTONIUS MARIA , LABETSKI DZMITRY , FRERIKS JOHANNES MARIA , VAN DE VIJVER YURI JOHANNES GA , VERSTEEG WENDELIN JOHANNA MARI , JONKERS PETER GERARDUS
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/70841 , G03F7/70908
摘要： The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.
摘要翻译：本发明涉及一种确定抑制系统抑制因子的方法。抑制系统被布置成抑制污染气体从第一系统中的迁移。抑制因子表示抑制系统的性能。该方法包括在子系统中引入示踪气体，提供检测系统，其被配置为检测已经从第一系统迁出的示踪气体的量，确定示踪气体的抑制系统的第一抑制因子。该方法还包括基于第一抑制因子确定用于污染气体的抑制系统的第二抑制因子。

10. 发明申请

WO2011036248A1 SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：源收集装置，光刻装置和装置制造方法
公开(公告)号：WO2011036248A1
公开(公告)日：2011-03-31
申请号：PCT/EP2010/064140
申请日：2010-09-24
申请人： ASML NETHERLANDS B.V. , LOOPSTRA, Erik , BANINE, Vadim , SWINKELS, Gerardus , PEKELDER, Sven , LABETSKI, Dzmitry , STAMM, Uwe , CYMER, INC. , PARTLO, William N.
发明人： LOOPSTRA, Erik , BANINE, Vadim , SWINKELS, Gerardus , PEKELDER, Sven , LABETSKI, Dzmitry , STAMM, Uwe , PARTLO, William N.
IPC分类号： G03F7/20 , C01B3/50 , G21K1/06
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70175 , G03F7/70808 , G03F7/70908 , G03F7/70916 , G03F7/70925 , H05G2/003 , H05G2/005
摘要： An EUV lithographic apparatus (100) comprises a source collector apparatus (SO) in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma (210) emitting the radiation. The source collector apparatus (SO) includes a chamber (310) in fluid communication with a guide way (320) external to the chamber (310). A pump (BPS) for circulating buffer gas is part of the guide way (320), and provides a closed loop buffer gas flow (222). The gas flowing through the guide way (302) traverses a gas decomposer (TD1) wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path (222).
摘要翻译： EUV光刻设备（100）包括源极收集器（SO），其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体（210）。源收集器装置（SO）包括与室（310）外部的引导方式（320）流体连通的室（310）。用于循环缓冲气体的泵（BPS）是引导方式（320）的一部分，并且提供闭环缓冲气体流（222）。流过引导方式（302）的气体穿过其中分解燃料和缓冲气体材料的化合物的气体分解器（TD1），使得分解的缓冲气体材料可以反馈回闭环流动路径（222）。

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