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1. 发明申请

WO2012013751A1 EUV EXPOSURE APPARATUS 审中-公开
标题翻译： EUV曝光装置
公开(公告)号：WO2012013751A1
公开(公告)日：2012-02-02
申请号：PCT/EP2011/063002
申请日：2011-07-28
申请人： CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V. , BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
发明人： BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system, comprising a plurality of reflective optical elements, each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light. The lens further comprises support means for passively or actively supporting at least one optical element which is controlled to a temperature by a first tempering means. The support means comprising a temperature sensitive element, wherein the temperature sensitive element is controlled to a constant or to a predefined temperature by a second tempering element which is arranged between the temperature sensitive element and the first tempering element.
摘要翻译： EUV光刻投影曝光系统的投影透镜，包括多个反射光学元件，每个反射光学元件包括主体和反射表面，用于将投影透镜与基板上的图像场一起投射到基板上的图像场上， EUV灯的曝光强度。透镜还包括用于被动或主动地支撑由第一回火装置控制到温度的至少一个光学元件的支撑装置。所述支撑装置包括温度敏感元件，其中所述温度敏感元件通过布置在所述温度敏感元件和所述第一回火元件之间的第二回火元件被控制到恒定或预定温度。

2. 发明申请

WO2012013748A1 EUV EXPOSURE APPARATUS 审中-公开
标题翻译： EUV曝光装置
公开(公告)号：WO2012013748A1
公开(公告)日：2012-02-02
申请号：PCT/EP2011/062997
申请日：2011-07-28
申请人： CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V. , BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
发明人： BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system, comprising a plurality of reflective optical elements, each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein at least one reflective optical element comprises a material with a temperature dependent coefficient of thermal expansion which is zero at a zero cross temperature, and wherein the body of the optical element is semitransparent to IR radiation. Further, the body comprises a coating on or on almost its entire surface, wherein the coating reflects IR radiation inside the body.
摘要翻译： EUV光刻投影曝光系统的投影透镜，包括多个反射光学元件，每个反射光学元件包括主体和反射表面，用于将投影透镜与基板上的图像场一起投射到基板上的图像场上， EUV光的曝光功率，其中至少一个反射光学元件包括在零交叉温度下具有温度依赖的热膨胀系数为零的材料，并且其中所述光学元件的主体与IR辐射半透明。此外，主体包括在其整个表面上或之上的涂层，其中涂层反射体内的IR辐射。

3. 发明申请

WO2012013747A1 EUV EXPOSURE APPARATUS 审中-公开
标题翻译： EUV曝光装置
公开(公告)号：WO2012013747A1
公开(公告)日：2012-02-02
申请号：PCT/EP2011/062996
申请日：2011-07-28
申请人： CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V. , BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
发明人： BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
摘要翻译： EUV光刻投影曝光系统的投影透镜，其具有至少两个反射光学元件，每个反射光学元件均包括主体和反射表面，用于在掩模版上将物场投射到基板上的图像场上，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括具有温度依赖的热膨胀系数的材料，其在相应的零交叉温度下为零，并且其中零交叉温度之间的差的绝对值更多超过6K。

4. 发明申请

WO2012013746A1 EUV EXPOSURE APPARATUS 审中-公开
标题翻译： EUV曝光装置
公开(公告)号：WO2012013746A1
公开(公告)日：2012-02-02
申请号：PCT/EP2011/062995
申请日：2011-07-28
申请人： CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V. , BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
发明人： BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A mirror comprising a body and a reflective surface, the body comprising a material with a temperature dependent coefficient of thermal expansion which is zero at a zero cross temperature T 0k- Further, at least a part of the surface of the body comprises a wire grid for electrically resistive heating of the body and the mirror is adapted for a projection lens of an EUV-lithographic projection exposure system, for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light.
摘要翻译：一种包括主体和反射表面的反射镜，所述主体包括具有温度依赖的热膨胀系数的材料，其在零交叉温度T0k为零。此外，主体的表面的至少一部分包括用于本体和反射镜的电阻加热适用于EUV光刻投影曝光系统的投影透镜，用于将掩模版上的物场投影到基板上的图像场上，如果投影透镜以曝光量曝光 EUV灯。

5. 发明申请

WO2012041697A1 MIRROR, PROJECTION OBJECTIVE COMPRISING SUCH A MIRROR, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION OBJECTIVE 审中-公开
标题翻译：镜子，包括这种镜子的投影目标和投影曝光装置，用于包含这样的投影目标的微型计算机
公开(公告)号：WO2012041697A1
公开(公告)日：2012-04-05
申请号：PCT/EP2011/065873
申请日：2011-09-13
申请人： CARL ZEISS SMT GMBH , FREIMANN, Rolf , BAER, Norman , LIMBACH, Guido , BOEHM, Thure , WITTICH, Gero
发明人： FREIMANN, Rolf , BAER, Norman , LIMBACH, Guido , BOEHM, Thure , WITTICH, Gero
IPC分类号： G21K1/06
CPC分类号： G02B5/0891 , B82Y10/00 , G03F7/70316 , G03F7/70958 , G21K1/062 , G21K2201/061
摘要： The invention relates to a mirror (la; la'; lb; lb'; lc; lc') comprising a substrate (S) and a layer arrangement, wherein the layer arrangement is designed in such a way that light (32) having a wavelength of less than 250 nm that is incident on the mirror (la; la'; lb; lb'; lc; lc') at at least an angle of incidence of between 0° and 30° is reflected with more than 20% of its intensity, and the layer arrangement comprises at least one surface layer system (Ρ"') consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) comprise two individual layers composed of different materials for a high refractive index layer (Η"') and a low refractive index layer (L'"), wherein the layer arrangement comprises at least one layer (G, SPL, B) composed of graphene. Furthermore, the invention relates to the use of graphene (G, SPL, B) on optical elements for reducing the surface roughness to less than 0.1 nm rms HSFR and/or for protecting the optical element in the EUV wavelength range against a radiation-induced irreversible change in volume of more than 1% and/or as a barrier layer for preventing interdiffusion between layers of so-called multilayer layer mirrors in the EUV wavelength range.
摘要翻译：本发明涉及一种包括衬底（S）和层布置的反射镜（1a; 1a'; 1b; 1b; 1c; 1c），其中所述层布置被设计成使得具有入射在反射镜（1a; 1a'; lb; lb'; lc; lc'）上的小于250nm的波长在0°至30°之间的入射角至少有20％以上其强度和层布置包括由各层的至少两个周期（P3）的周期性序列组成的至少一个表层系统（“），其中周期（P3）包括由不同材料组成的两个单独层对于高折射率层（α“'）和低折射率层（L'”），其中层布置包括由石墨烯组成的至少一层（G，SPL，B），此外，本发明涉及在光学元件上使用石墨烯（G，SPL，B）将表面粗糙度降低到小于0.1nm rms HSFR和/或用于保护光学元件 EUV波长范围内的α元素相对于辐射诱发的不可逆体积变化大于1％和/或作为阻挡层用于防止EUV波长范围内所谓的多层反射镜层之间的相互扩散。

6. 发明申请

WO2012041744A1 ARRANGEMENT FOR MIRROR TEMPERATURE MEASUREMENT AND/OR THERMAL ACTUATION OF A MIRROR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：在微波投影曝光装置中的镜子的温度测量和/或热致动装置的布置
公开(公告)号：WO2012041744A1
公开(公告)日：2012-04-05
申请号：PCT/EP2011/066415
申请日：2011-09-21
申请人： CARL ZEISS SMT GMBH , HAUF, Markus , BAER, Norman , WALTER, Holger , HARTJES, Joachim
发明人： HAUF, Markus , BAER, Norman , WALTER, Holger , HARTJES, Joachim
IPC分类号： G03F7/20 , G02B7/18
CPC分类号： G03F7/70058 , G01J5/02 , G02B7/181 , G02B7/1815 , G03F7/70266 , G03F7/70891
摘要： The invention concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus, wherein the mirror (101, 301, 401, 701, 801, 901) has an optical effective surface (101a, 301a, 401a, 701a, 801a, 901a) and at least one access passage (110, 310, 410, 710, 711, 712, 810, 811, 812, 910) extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of said effective surface, wherein the arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror (101, 301, 401, 701, 801, 901) by means of electromagnetic radiation which is propagated along the access passage (110, 310, 410, 710, 711, 712, 810, 811, 812, 910, 910'), and wherein the electromagnetic radiation is reflected a plurality of times within the access passage (110, 310, 410, 710, 711, 712, 810, 811, 812, 910)
摘要翻译：本发明涉及一种用于在微光刻投影曝光装置中的反射镜的镜温度测量和/或热致动的装置，其中反射镜（101,301,401,701,801,901）具有光学有效表面（101a，301a， 401a，701a，801a，901a）以及从反射镜的表面延伸的至少一个进入通道（110,310,410,710,711,712,810,811,812,910），其不对应于光学在所述有效表面的方向上的有效表面，其中所述布置被设计用于通过沿着所述有效表面传播的电磁辐射来镜像反射镜（101,301,401,701,801,901）的反射镜温度测量和/或热致动所述通道（110,310,410,710,711,712,810,811,812,910,910'），并且其中所述电磁辐射在所述通路 710,711,712,810,811,812,910）

7. 发明申请

WO2022028709A1 MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
公开(公告)号：WO2022028709A1
公开(公告)日：2022-02-10
申请号：PCT/EP2020/072214
申请日：2020-08-07
申请人： CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V. , GRUNER, Toralf , BAER, Norman , VAN BERKEL, Koos , VAN BOKHOVEN, Laurentius J.A. , LORENZ, Maike , MONZ, Thomas , SCHNEIDER, Eva , STIEPAN, Hans-Michael , STREEFKERK, Bob
发明人： GRUNER, Toralf , BAER, Norman , VAN BERKEL, Koos , VAN BOKHOVEN, Laurentius J.A. , LORENZ, Maike , MONZ, Thomas , SCHNEIDER, Eva , STIEPAN, Hans-Michael , STREEFKERK, Bob
IPC分类号： G03F7/20
摘要： The invention relates to a mirror, in particular for a microlithographic projection exposure apparatus. A mirror according to the invention has an optical effective surface (101, 201, 301), a mirror substrate (110, 210, 310, 410), a reflection layer system (120, 220, 320) for reflecting electromagnetic radiation that is incident on the optical effective surface (101, 201, 301), at least one actuator layer which is configured to transmit an adjustable mechanical force on the reflection layer system (120, 220, 320), thereby producing a locally variable deformation of the optical effective surface (101, 201, 301), and at least one cooling device configured to at least partially dissipate heat generated by said actuator layer.

8. 发明申请

WO2022028710A1 OPTICAL SYSTEM AND METHOD OF OPERATING AN OPTICAL SYSTEM 审中-公开
公开(公告)号：WO2022028710A1
公开(公告)日：2022-02-10
申请号：PCT/EP2020/072216
申请日：2020-08-07
申请人： CARL ZEISS SMT GMBH , ASML NETHERLANDS B.V. , GRUNER, Toralf , BAER, Norman , VAN BERKEL, Koos , VAN BOKHOVEN, Laurentius J.A. , LORENZ, Maike , MONZ, Thomas , SCHNEIDER, Eva , STIEPAN, Hans-Michael , STREEFKERK, Bob , DIRAUF, André
发明人： GRUNER, Toralf , BAER, Norman , VAN BERKEL, Koos , VAN BOKHOVEN, Laurentius J.A. , LORENZ, Maike , MONZ, Thomas , SCHNEIDER, Eva , STIEPAN, Hans-Michael , STREEFKERK, Bob , DIRAUF, André
IPC分类号： G03F7/20 , G02B7/18
摘要： The invention relates to an optical system, in particular for microlithography, and to a method for operating an optical system. According to an aspect of the invention, an optical system comprises at least one mirror (100, 500, 600) having an optical effective surface (101, 501, 601) and a mirror substrate (110, 510, 610), wherein at least one cooling channel (115, 515, 615) in which a cooling fluid is capable to flow is arranged in the mirror substrate in order to dissipate heat that is generated in the mirror substrate due to absorption of electromagnetic radiation incident from a light source on the optical effective surface, and a unit (135, 535, 635) to adjust the temperature and/or the flow rate of the cooling fluid either dependent on a measured quantity that characterizes the thermal load in the mirror substrate or dependent on an estimated thermal load to be expected in the mirror substrate for a given power of the light source.

9. 发明申请

WO2011057906A1 IMAGING OPTICS 审中-公开
标题翻译：成像光学
公开(公告)号：WO2011057906A1
公开(公告)日：2011-05-19
申请号：PCT/EP2010/066525
申请日：2010-10-29
申请人： CARL ZEISS SMT GMBH , LÖRING, Ulrich , MÜLLER, Ralf , MANN, Hans-Jürgen , BAER, Norman
发明人： LÖRING, Ulrich , MÜLLER, Ralf , MANN, Hans-Jürgen , BAER, Norman
IPC分类号： G02B17/06 , G02B5/00 , G02B27/00 , G03F7/20
CPC分类号： G02B17/0657 , G02B5/005 , G02B27/0018 , G03F7/70233 , G03F7/70275
摘要： An imaging optics (7) has a plurality of mirrors (M3; M5, M6, M8) which reflect imaging light (3) and thus image an object field in an object plane into an image field in an image plane. A mirror body (22) of at least one of the mirrors (M8) has a through-opening (21) for the imaging light (3) to pass through. The through-opening (21) has an internal region (23) of a smallest opening width in the mirror body (22). The through-opening (21) expands from the internal region (23) towards both edge regions (24, 25) of the mirror body (22). As a result, an imaging optics is obtained where a disturbing influence of unused light portions is reduced or eliminated completely.
摘要翻译：成像光学器件（7）具有反射成像光（3）的多个反射镜（M3; M5，M6，M8），从而将物平面中的物场映像成图像平面中的图像场。至少一个反射镜（M8）的镜体（22）具有用于成像光（3）穿过的通孔（21）。通孔（21）在镜体（22）中具有最小开口宽度的内部区域（23）。通孔（21）从内部区域（23）向镜体（22）的两个边缘区域（24,25）扩张。结果，获得了其中完全减少或消除未使用的光部分的干扰影响的成像光学元件。

10. 发明申请

WO2022161659A1 OPTISCHES SYSTEM, SOWIE VERFAHREN ZUM BETREIBEN EINES OPTISCHEN SYSTEMS 审中-公开
公开(公告)号：WO2022161659A1
公开(公告)日：2022-08-04
申请号：PCT/EP2021/083360
申请日：2021-11-29
申请人： CARL ZEISS SMT GMBH , DIRAUF, Andre , GRUNER, Toralf , BAER, Norman , MONZ, Thomas , BUETTNER, Paul
发明人： DIRAUF, Andre , GRUNER, Toralf , BAER, Norman , MONZ, Thomas , BUETTNER, Paul
IPC分类号： G03F7/20 , G02B7/18
摘要： Die Erfindung betrifft ein optisches System sowie ein Verfahren zum Betreiben eines optischen Systems, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage. Gemäß einem Aspekt der Erfindung weist ein optisches System wenigstens einen Spiegel (100, 200, 300, 400, 500, 600) mit einer optischen Wirkfläche (101, 201, 301, 401, 501, 601) und einem Spiegelsubstrat (110, 210, 310, 410, 510, 610), wobei in dem Spiegelsubstrat eine Mehrzahl von Temperierzonen (131-136, 141-146, 231-236, 241-246, 331-336, 341-346, 431, 441-446, 531-536, 541, 631, 641) angeordnet ist, und eine Temperiereinrichtung (150, 250, 350, 450, 550, 650), über welche die in den Temperierzonen jeweils vorliegenden Temperaturen unabhängig voneinander einstellbar sind, auf, wobei diese Temperierzonen in wenigstens zwei Ebenen mit unterschiedlichem Abstand von der optischen Wirkfläche angeordnet sind, und wobei die Temperierzonen in diesen wenigstens zwei Ebenen als Kühlkanäle ausgestaltet sind, welche unabhängig voneinander von einem Kühlfluid mit variabel einstellbarer Kühlfluidtemperatur durchströmbar sind.

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