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    • 8. 发明申请
    • DEPOSITION APPARATUS WITH GAS SUPPLY AND METHOD FOR DEPOSITING MATERIAL
    • 具有气体供应的沉积装置和沉积材料的方法
    • WO2014127845A1
    • 2014-08-28
    • PCT/EP2013/053720
    • 2013-02-25
    • APPLIED MATERIALS, INC.ZILBAUER, Thomas WernerBENDER, Marcus
    • ZILBAUER, Thomas WernerBENDER, Marcus
    • C23C14/00C23C14/22H01L21/02
    • C23C14/0036C23C14/0047C23C14/0063C23C14/06C23C14/0641C23C14/0652C23C14/0676C23C14/0694C23C14/081C23C14/083C23C14/086
    • An apparatus for depositing a material on a substrate (310) is described. The apparatus includes a vacuum chamber (300); a substrate receiving portion (305) in the vacuum chamber for receiving the substrate during deposition of the material; a target support (320) configured to hold a target (330) during deposition of the material on the substrate (305); a plasma generating device in the vacuum chamber (300) for generating a plasma between the substrate receiving portion (305) and the target support (320); and a first gas inlet (360) for providing a supersonic stream of a gas (365), wherein the gas inlet is directed towards the substrate receiving portion (305). Further, a method for depositing a material on a substrate (310) in a vacuum chamber (300) is described. The method includes forming a plasma between the substrate (310) and a target (330); releasing particles (335) from the target (330) using the plasma; and directing a supersonic stream of gas (365) towards the substrate surface, on which the material is to be deposited.
    • 描述了一种用于在衬底(310)上沉积材料的装置。 该设备包括真空室(300); 真空室中的衬底接收部分(305),用于在材料沉积期间接收衬底; 目标支撑件(320),其配置成在所述材料沉积在所述基底(305)上时保持目标(330); 用于在所述基板接收部分(305)和所述目标支撑件(320)之间产生等离子体的所述真空室(300)中的等离子体产生装置; 和用于提供气体(365)的超音速流的第一气体入口(360),其中所述气体入口指向所述衬底接收部分(305)。 此外,描述了在真空室(300)中的衬底(310)上沉积材料的方法。 该方法包括在衬底(310)和靶(330)之间形成等离子体; 使用等离子体从靶(330)释放颗粒(335); 并将气体(365)的超音速流引向所述材料将要沉积的衬底表面。