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1. 发明申请

WO2017050350A1 SUBSTRATE CARRIER, AND SPUTTER DEPOSITION APPARATUS AND METHOD USING THE SAME 审中-公开
标题翻译：基板载体和溅射沉积装置及其使用方法
公开(公告)号：WO2017050350A1
公开(公告)日：2017-03-30
申请号：PCT/EP2015/071609
申请日：2015-09-21
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , KELLER, Stefan , HINTERSCHUSTER, Reiner , ZILBAUER, Thomas Werner
发明人： BRÜNING, Andre , KELLER, Stefan , HINTERSCHUSTER, Reiner , ZILBAUER, Thomas Werner
IPC分类号： C23C14/50 , H01J37/32 , H01J37/34 , H01L21/677 , H01L21/687
CPC分类号： H01J37/32715 , C23C14/34 , C23C14/50 , C23C14/562 , H01J37/32733 , H01J37/32752 , H01J37/3405 , H01L21/67706 , H01L21/67709 , H01L21/67712 , H01L21/6776 , H01L21/68757 , H01L21/68764 , H01L21/68771
摘要： A carrier (100) for supporting at least one substrate during a sputter deposition process is provided. The carrier (100) includes a non-conductive carrier body (102) having a first end (111) and an opposing second end (112); an electrically insulated first guiding device (120) provided at the first end (111) of the ceramic carrier body (102); and an electrically insulated second guiding device (130) provided at the second end (112) of the ceramic carrier body (102).
摘要翻译：提供了一种用于在溅射沉积工艺期间支撑至少一个基板的载体（100）。载体（100）包括具有第一端（111）和相对的第二端（112）的非导电载体主体（102）。设置在陶瓷载体主体（102）的第一端（111）处的电绝缘的第一引导装置（120）; 以及设置在陶瓷载体主体（102）的第二端（112）处的电绝缘的第二引导装置（130）。

2. 发明申请

WO2015014411A1 HOLDING ARRANGEMENT FOR SUBSTRATES 审中-公开
标题翻译：基板保持布置
公开(公告)号：WO2015014411A1
公开(公告)日：2015-02-05
申请号：PCT/EP2013/066294
申请日：2013-08-02
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , HINTERSCHUSTER, Reiner , WOLF, Hans Georg , ZILBAUER, Thomas Werner
发明人： BRÜNING, Andre , HINTERSCHUSTER, Reiner , WOLF, Hans Georg , ZILBAUER, Thomas Werner
IPC分类号： C23C14/50 , C03C17/00 , B65G49/06 , C23C16/458
CPC分类号： C23C16/4585 , C23C14/50 , C23C16/4587
摘要： A holding arrangement (10) for holding a substrate (20) during vacuum layer deposition is provided. The holding arrangement (10) includes a frame (30) having two or more frame elements (31, 32, 33, 34), the frame elements (31, 32, 33, 34) forming an aperture opening, and elastic means (40) configured to provide a clamping force acting against portions of the substrate edges for clamping the substrate (20) at said substrate edges.
摘要翻译：提供了一种用于在真空层沉积期间保持基板（20）的保持装置（10）。保持装置（10）包括具有两个或多个框架元件（31,32,33,34）的框架（30），形成开口的框架元件（31,32,33,34）和弹性装置（40 ），其被配置成提供作用于所述基板边缘的部分的夹紧力，以将所述基板（20）夹持在所述基板边缘。

3. 发明申请

WO2015176751A1 DEPOSITION APPARATUS FOR DEPOSITION OF A MATERIAL ON A SUBSTRATE AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE 审中-公开
标题翻译：用于沉积基材上的材料的沉积装置和在基材上沉积材料的方法
公开(公告)号：WO2015176751A1
公开(公告)日：2015-11-26
申请号：PCT/EP2014/060360
申请日：2014-05-20
申请人： APPLIED MATERIALS, INC , ZILBAUER, Thomas Werner , HELLMICH, Anke , HINTERSCHUSTER, Reiner , MÜHLFELD, Uwe , STOCK, Bernhard , WOLF, Hans Georg , BENDER, Marcus
发明人： ZILBAUER, Thomas Werner , HELLMICH, Anke , HINTERSCHUSTER, Reiner , MÜHLFELD, Uwe , STOCK, Bernhard , WOLF, Hans Georg , BENDER, Marcus
IPC分类号： C23C14/56 , C23C14/34
CPC分类号： C23C14/568 , C23C14/3464 , C23C14/562
摘要： A deposition apparatus (300) for deposition of a material on a substrate is provided. The deposition apparatus (300) includes two or more processing chambers including a first processing chamber (310) and a second processing chamber (320); a substrate support (330) extending at least through the first processing chamber (310) and the second processing chamber (320); and two or more deposition source assemblies including a first deposition source assembly (350) in the first processing chamber (310) and a second deposition source assembly (360) in the second processing chamber (320). Each of the two or more deposition source assemblies includes at least one deposition source support (351, 361) configured to support at least one first deposition source and at least one process device. The at least one deposition source support (351, 361) is configured to be moveable at least between a first position and a second position. In the first position, the at least one first deposition source is oriented towards the substrate support (330), and, in the second position, the at least one process device is oriented towards the substrate support (330).
摘要翻译：提供了用于将材料沉积在基板上的沉积设备（300）。沉积装置（300）包括两个或多个处理室，包括第一处理室（310）和第二处理室（320）。至少延伸穿过第一处理室（310）和第二处理室（320）的衬底支撑件（330）; 以及包括第一处理室（310）中的第一沉积源组件（350）和第二处理室（320）中的第二沉积源组件（360）的两个或更多个沉积源组件。两个或更多个沉积源组件中的每一个包括被配置为支撑至少一个第一沉积源和至少一个处理装置的至少一个沉积源支撑件（351,361）。至少一个沉积源支撑件（351,361）构造成至少在第一位置和第二位置之间是可移动的。在第一位置，至少一个第一沉积源朝向衬底支撑件（330）定向，并且在第二位置，至少一个处理装置朝向衬底支撑件（330）取向。

4. 发明申请

WO2018082792A1 CARRIER FOR HOLDING A SUBSTRATE, USE OF THE CARRIER IN A PROCESSING SYSTEM, PROCESSING SYSTEM EMPLOYING THE CARRIER, AND METHOD FOR CONTROLLING A TEMPERATURE OF A SUBSTRATE 审中-公开
标题翻译：用于保持基板的载体，载体在处理系统中的使用，使用载体的处理系统以及用于控制基板的温度的方法
公开(公告)号：WO2018082792A1
公开(公告)日：2018-05-11
申请号：PCT/EP2016/076830
申请日：2016-11-07
申请人： APPLIED MATERIALS, INC. , LAU, Simon , WOLF, Gerhard , HINTERSCHUSTER, Reiner , ZILBAUER, Thomas Werner
发明人： LAU, Simon , WOLF, Gerhard , HINTERSCHUSTER, Reiner , ZILBAUER, Thomas Werner
IPC分类号： H01L21/673 , C23C14/50 , C23C14/56 , C23C16/46 , C23C16/458 , C23C16/54
摘要： A carrier (100) for holding a substrate is described. The carrier (100) includes a carrier body (110) having a first surface (111), and an adhesive arrangement (120) provided on the first surface (111). The carrier body (110) includes one or more conduits (115) configured for providing a gas into the adhesive arrangement (120). Further, a method for controlling a temperature of a substrate is described. The method includes providing a carrier as described herein; supplying a gas through the one or more conduits into the adhesive arrangement; and providing the gas to a backside of the substrate attached to the adhesive arrangement.
摘要翻译：描述用于保持衬底的载体（100）。载体（100）包括具有第一表面（111）的载体主体（110）和设置在第一表面（111）上的粘合剂装置（120）。载体主体（110）包括一个或多个导管（115），其被配置用于将气体提供到粘合剂装置（120）中。此外，描述了用于控制衬底温度的方法。该方法包括提供如本文所述的载体; 通过一个或多个导管将气体供应到粘合剂装置中; 并将气体提供给附着在粘合剂装置上的基材的背面。

5. 发明申请

WO2022194377A1 METHOD OF DEPOSITING MATERIAL ON A SUBSTRATE 审中-公开
公开(公告)号：WO2022194377A1
公开(公告)日：2022-09-22
申请号：PCT/EP2021/056964
申请日：2021-03-18
申请人： APPLIED MATERIALS, INC. , ZILBAUER, Thomas Werner , HELLMICH, Anke , BENDER, Marcus , CHOI, Soo Young , HINTERSCHUSTER, Reiner , MUNDORF, Christoph
发明人： ZILBAUER, Thomas Werner , HELLMICH, Anke , BENDER, Marcus , CHOI, Soo Young , HINTERSCHUSTER, Reiner , MUNDORF, Christoph
IPC分类号： C23C14/35 , C23C14/56 , C23C14/34 , H01J37/34
摘要： A method of depositing at least one material on a substrate is described. The method includes a first deposition including: sputtering from a first and a second rotary target through an aperture, the aperture being adjustable and having less than a first size. The first rotary target has a first magnet assembly providing a plasma confinement in a first direction facing the second rotary target. The second rotary target has a second magnet assembly providing a plasma confinement in a second direction facing the first rotary target. The first direction and the second direction deviate from being parallel to a substrate plane of the substrate by an angle of less than a first value. The method includes a second deposition on top of the first deposition. The second deposition includes: sputtering from the first and the second rotary target through the aperture, the aperture having at least a second size, the second size being larger than the first size. The first magnet assembly provides a plasma confinement in a third direction. The second magnet assembly provides a plasma confinement in a fourth direction. At least one of the third or the fourth direction deviate from being parallel to the substrate plane by an angle of at least a second value, the second value being larger than the first value.

6. 发明申请

WO2015176750A1 DEPOSITION APPARATUS FOR DEPOSITION OF A MATERIAL ON A SUBSTRATE AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE 审中-公开
标题翻译：用于沉积基材上的材料的沉积装置和在基材上沉积材料的方法
公开(公告)号：WO2015176750A1
公开(公告)日：2015-11-26
申请号：PCT/EP2014/060359
申请日：2014-05-20
申请人： APPLIED MATERIALS, INC. , ZILBAUER, Thomas, Werner , HELLMICH, Anke , HINTERSCHUSTER, Reiner , MÜHLFELD, Uwe , STOCK, Bernhard , WOLF, Hans, Georg , BENDER, Marcus
发明人： ZILBAUER, Thomas, Werner , HELLMICH, Anke , HINTERSCHUSTER, Reiner , MÜHLFELD, Uwe , STOCK, Bernhard , WOLF, Hans, Georg , BENDER, Marcus
IPC分类号： C23C14/56 , C23C16/44 , C23C16/54
CPC分类号： C23C14/56 , C23C16/4412 , C23C16/54
摘要： A deposition apparatus (300) for deposition of a material on a substrate is provided. The deposition apparatus (300) includes a first processing chamber (310) and a second processing chamber (320); at least one first deposition source (311) in the first processing chamber (310) and at least one second deposition source (321) in the second processing chamber (320); and at least one first shield device (350). The at least one first shield device (350) is configured to be moveable at least between a first position and a second position, wherein the at least one first shield device (350) is configured to shield the at least one first deposition source (311) when the at least one first shield device (350) is in the first position. The at least one first shield device (350) is configured to be moveable at least between the first processing chamber (310) and the second processing chamber (320).
摘要翻译：提供了用于将材料沉积在基板上的沉积设备（300）。沉积设备（300）包括第一处理室（310）和第二处理室（320）; 第一处理室（310）中的至少一个第一沉积源（311）和第二处理室（320）中的至少一个第二沉积源（321）; 和至少一个第一屏蔽装置（350）。所述至少一个第一屏蔽装置（350）被配置为至少在第一位置和第二位置之间可移动，其中所述至少一个第一屏蔽装置（350）被配置为屏蔽所述至少一个第一沉积源），当所述至少一个第一屏蔽装置（350）处于所述第一位置时。所述至少一个第一屏蔽装置（350）被配置为至少在所述第一处理室（310）和所述第二处理室（320）之间可移动。

7. 发明申请

WO2012025484A1 CARRIER FOR A SUBSTRATE AND A METHOD FOR ASSEMBLING THE SAME 审中-公开
标题翻译：用于衬底的载体和用于组装衬底的方法
公开(公告)号：WO2012025484A1
公开(公告)日：2012-03-01
申请号：PCT/EP2011/064371
申请日：2011-08-22
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , HEIMEL, Oliver , HINTERSCHUSTER, Reiner , WOLF, Hans Georg
发明人： BRÜNING, Andre , HEIMEL, Oliver , HINTERSCHUSTER, Reiner , WOLF, Hans Georg
IPC分类号： C23C14/50
CPC分类号： C23C14/50 , C03C17/002 , Y10T29/49826 , Y10T29/49963
摘要： The present invention is relates to carriers for substrates and to methods for assembling the same in the field of vacuum deposition of thin films. In particular, the present invention is directed a carrier (1) for a substrate to be coated in a vacuum chamber comprising: a first frame (3) comprising two vertical sections (32) and two horizontal sections (31) being dimensioned to surround the substrate; a second frame (2) dimensioned to define an area of the substrate to be coated, and to cover at least a first part (33) of the first frame (3) to prevent the first part (33) of the first frame (3) from being coated when the second frame (2) is mounted to the first frame (3); and wherein the second frame (2) is detachably mounted to the first frame (3).
摘要翻译：本发明涉及用于衬底的载体及其在薄膜的真空沉积领域中的组装方法。特别地，本发明涉及一种用于要涂覆在真空室中的基底的载体（1），包括：包括两个垂直部分（32）和两个水平部分（31）的第一框架（3），其尺寸被设计成围绕基质; 第二框架（2）的尺寸设置成限定待涂覆的基底的区域，并且覆盖第一框架（3）的至少第一部分（33）以防止第一框架（3）的第一部分（33））在第二框架（2）安装到第一框架（3）时被涂覆; 并且其中所述第二框架（2）可拆卸地安装到所述第一框架（3）。

8. 发明申请

WO2016015745A1 APPARATUS AND METHOD FOR HOLDING A SUBSTRATE DURING LAYER DEPOSITION IN A VACUUM CHAMBER 审中-公开
标题翻译：在真空室中的层沉积期间保持基底的装置和方法
公开(公告)号：WO2016015745A1
公开(公告)日：2016-02-04
申请号：PCT/EP2014/066181
申请日：2014-07-28
申请人： APPLIED MATERIALS, INC. , HINTERSCHUSTER, Reiner , BRÜNING, Andre
发明人： HINTERSCHUSTER, Reiner , BRÜNING, Andre
IPC分类号： C23C16/458 , C23C14/50 , B65G49/06
CPC分类号： C23C16/4587 , B25B11/005 , C23C14/50
摘要： The present disclosure provides a holding arrangement (100) for holding a substrate (10) during layer deposition in a vacuum chamber. The holding arrangement (100) includes a carrier (110) having a support surface (112) configured for supporting the substrate (10); and one or more holding devices (120) provided at the carrier (110). Each each holding device (120) includes at least one rotatable device (122) configured to rotate around a rotation axis (124), wherein the rotation axis (124) is substantially perpendicular to the support surface (112), and wherein the rotatable device (122) has a contact element (126, 526) positioned at a distance from the rotation axis (124) for holding the substrate (10) after rotation.
摘要翻译：本公开提供了一种用于在层沉积期间在真空室中保持衬底（10）的保持装置（100）。保持装置（100）包括具有支撑表面（112）的载体（110），支撑表面（112）构造成支撑基底（10）; 以及设置在所述载体（110）处的一个或多个保持装置（120）。每个保持装置（120）包括构造成围绕旋转轴线（124）旋转的至少一个可旋转装置（122），其中旋转轴线（124）基本上垂直于支撑表面（112），并且其中可旋转装置（122）具有定位在离开旋转轴线（124）一定距离处的接触元件（126,526），用于在旋转之后保持基板（10）。

9. 发明申请

WO2015158390A1 CARRIER FOR SUBSTRATES 审中-公开
标题翻译：基板载体
公开(公告)号：WO2015158390A1
公开(公告)日：2015-10-22
申请号：PCT/EP2014/057919
申请日：2014-04-17
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , HEIMEL, Oliver , HINTERSCHUSTER, Reiner
发明人： BRÜNING, Andre , HEIMEL, Oliver , HINTERSCHUSTER, Reiner
IPC分类号： H01J37/32 , H01L21/687 , C23C16/458 , C23C14/50 , G03F7/20
CPC分类号： H01J37/32715 , C23C14/50 , C23C16/4585 , C23C16/4587 , G03F7/707 , G03F7/70716 , G03F7/70783 , H01J37/32376 , H01L21/68728
摘要： A carrier (100) for supporting a substrate (101) in a substrate processing chamber (600) for vacuum processing is described. The carrier includes at least two holders (120), wherein each holder includes a fixed portion (122), which is configured to be attached to a carrier body having a fixed position with respect to the carrier body, a floating portion (123), which is movable relative to the fixed portion along at least one direction (140), and a fixing mechanism, which is provided in a fixed position relative to the floating portion and which is configured to clamp the substrate in the holder. Moreover, the floating portion is movable along the at least one direction from a first end position to a second end position, and said floating portion further comprises a force arrangement (130) configured to center or to pull the substrate in the carrier in the at least one direction.
摘要翻译：描述了用于在用于真空处理的基板处理室（600）中支撑基板（101）的载体（100）。载体包括至少两个保持器（120），其中每个保持器包括固定部分（122），其被构造成附接到相对于载体主体具有固定位置的载体主体，浮动部分（123）其可沿至少一个方向（140）相对于所述固定部分移动;以及固定机构，所述固定机构相对于所述浮动部分设置在固定位置，并且被构造成将所述基板夹持在所述保持器中。此外，浮动部分可以沿着至少一个方向从第一端部位置移动到第二端部位置，并且所述浮动部分还包括力装置（130），其配置成使载体中的基板在中心位置或在其中拉动至少一个方向。

10. 发明申请

WO2015188878A1 CLAMP ARRANGEMENT FOR A SUBSTRATE CARRIER, AND METHOD FOR OPENING AND FASTENING A CLAMP ARRANGEMENT 审中-公开
标题翻译：底板承载件的夹紧装置，以及打开和紧固夹紧装置的方法
公开(公告)号：WO2015188878A1
公开(公告)日：2015-12-17
申请号：PCT/EP2014/062420
申请日：2014-06-13
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , HINTERSCHUSTER, Reiner
发明人： BRÜNING, Andre , HINTERSCHUSTER, Reiner
IPC分类号： H01L21/67 , H01L21/687
CPC分类号： H01L21/68707 , H01L21/67115 , H01L21/68728
摘要： A clamp device (100), a clamp tool (200), and a clamp arrangement (300) for clamping a substrate (480) to be processed in a substrate carrier (500) are described. The clamp device includes a first lever (110) and a second lever (120), wherein the first lever (110) is movably supported in a first joint (115), the second lever (120) is movably supported in a second joint (125), and wherein the first lever (110) and the second lever (120) are movably connected to each other by a first common joint (140). The second lever (120) includes a clamping portion (121) adapted for being pressed against the substrate (480; 510) to be processed. At least one of the first lever (110) and the second lever (120) comprises a contact portion (116; 126) for providing functional contact to a clamp tool (200; 610). The clamp tool is adapted for opening and fastening the clamp device.
摘要翻译：描述了夹持装置（100），夹紧工具（200）和用于夹持待处理衬底（480）在衬底载体（500）中的夹具装置（300）。夹持装置包括第一杆（110）和第二杆（120），其中第一杆（110）可移动地支撑在第一接头（115）中，第二杆（120）可移动地支撑在第二接头 125），并且其中所述第一杆（110）和所述第二杆（120）通过第一公共接头（140）可移动地彼此连接。第二杆（120）包括适于被压靠待加工的衬底（480; 510）的夹紧部分（121）。所述第一杆（110）和所述第二杆（120）中的至少一个包括用于向夹具（200; 610）提供功能接触的接触部分（116; 126）。夹具用于打开和固定夹紧装置。

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