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1. 发明申请

WO2006047410A3 FLUID STORAGE AND DISPENSING SYSTEM INCLUDING DYNAMIC FLUID MONITORING OF FLUID STORAGE AND DISPENSING VESSEL 审中-公开
公开(公告)号：WO2006047410A3
公开(公告)日：2006-05-04
申请号：PCT/US2005/038173
申请日：2005-10-24
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , DIETZ, James , BISHOP, Steven, E. , MCMANUS, James, V. , LURCOTT, Steven, M. , WODJENSKI, Michael, J. , KAIM, Robert , DIMEO, Frank, Jr.
发明人： DIETZ, James , BISHOP, Steven, E. , MCMANUS, James, V. , LURCOTT, Steven, M. , WODJENSKI, Michael, J. , KAIM, Robert , DIMEO, Frank, Jr.
IPC分类号： H01L21/44 , H01L21/31 , C23C16/30
摘要： A monitoring system (100) for monitoring fluid in a fluid supply vessel (22, 24, 26, 28, 108) during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors (114, 126) for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module (40, 132, 146) operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor (50, 150) and display (52, 150) operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.

2. 发明申请

WO2007127865A3 CLEANING OF SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开
标题翻译：半导体加工系统的清洁
公开(公告)号：WO2007127865A3
公开(公告)日：2008-12-11
申请号：PCT/US2007067542
申请日：2007-04-26
申请人： ADVANCED TECH MATERIALS , DIMEO FRANK JR , DIETZ JAMES , OLANDER W KARL , KAIM ROBERT , BISHOP STEVEN E , NEUNER JEFFREY W , ARNO JOSE I , MARGANSKI PAUL J , SWEENEY JOSEPH D , ELDRIDGE DAVID , YEDAVE SHARAD , BYL OLEG , STAUF GREGORY T
发明人： DIMEO FRANK JR , DIETZ JAMES , OLANDER W KARL , KAIM ROBERT , BISHOP STEVEN E , NEUNER JEFFREY W , ARNO JOSE I , MARGANSKI PAUL J , SWEENEY JOSEPH D , ELDRIDGE DAVID , YEDAVE SHARAD , BYL OLEG , STAUF GREGORY T
IPC分类号： C25F1/00 , C25F3/12
CPC分类号： C23C14/564 , C23C16/4405 , H01J37/32412 , H01J37/32862
摘要： A method and apparatus for cleaning residue from components of semiconductor processing systems used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive material for sufficient time and under sufficient conditions to at least partially remove the residue. When the residue and the material from which the components are constructed are different, the gas-phase reactive material is selectively reactive with the residue and minimally reactive with the materials from which the components of the ion implanter are constructed. When the residue and the material from which the components are constructed is the same, then the gas-phase reactive material may be reactive with both the residue and the component part. Particularly preferred gas-phase reactive materials utilized comprise gaseous compounds such as XeF2, XeF4, XeF6, NF3, IF5, IF7, SF6, C2F6, F2, CF4, KrF2, Cl2, HCl, ClF3, ClO2, N2F4, N2F2, N3F, NFH2, NH2F, HOBr, Br2, C3F8, C4F8, C5F8, CHF3, CH2F2, CH3F, COF2, HF, C2HF5, C2H2F4, C2H3F3, C2H4F2, C2H5F, C3F6, and organochlorides such as COCl2, CCl4, CHCl3, CH2Cl2 and CH3Cl.
摘要翻译：一种清洁残留物的方法和装置，用于制造微电子装置中使用的半导体处理系统的组件。为了有效地除去残留物，将组分与气相反应性材料接触足够的时间和足够的条件以至少部分地除去残余物。当残留物和构成组分的材料不同时，气相反应性材料与残余物选择性反应，并与构成离子注入机的组分的材料具有最低的反应性。当残留物和构成组分的材料相同时，气相反应性材料可以与残留物和组分部分反应。使用的特别优选的气相反应性材料包括气态化合物如XeF 2，XeF 4，XeF 6，NF 3，IF 5，IF 7，SF 6，C 2 F 6，F 2，CF 4，KrF 2，Cl 2，HCl，ClF 3，ClO 2，N 2 F 4，N 2 F 2，N 3 F，，NH2F，HOBr，Br2，C3F8，C4F8，C5F8，CHF3，CH2F2，CH3F，COF2，HF，C2HF5，C2H2F4，C2H3F3，C2H4F2，C2H5F，C3F6和有机氯化物，如COCl2，CCl4，CHCl3，CH2Cl2和CH3Cl。

3. 发明申请

WO2006101897A3 METHOD AND APPARATUS FOR MONITORING PLASMA CONDITIONS IN AN ETCHING PLASMA PROCESSING FACILITY 审中-公开
公开(公告)号：WO2006101897A3
公开(公告)日：2006-09-28
申请号：PCT/US2006/009330
申请日：2006-03-15
申请人： ADVANCED TECHNOLOGY MATERIALS, INC , CHEN, Ing-Shin , NEUNER, Jeffrey, W. , DIMEO, Frank, Jr. , CHEN, Philip, S.H. , WELCH, James , ROEDER, Jeffrey, F.
发明人： CHEN, Ing-Shin , NEUNER, Jeffrey, W. , DIMEO, Frank, Jr. , CHEN, Philip, S.H. , WELCH, James , ROEDER, Jeffrey, F.
IPC分类号： H01L21/302
摘要： The present invention relates to a method and system of using downstream sensor elements (214) for determining the plasma conditions (e.g., plasma etching end point) in a semiconductor etching facility (202) that utilizes halogen-containing plasma and/or oxygen- containing plasma. Such sensor elements (214) are capable of exhibiting temperature change in the presence of energetic gas species, e.g., fluorine, chlorine, iodine, bromine, oxygen, and derivatives and radicals thereof that are generated by the plasma (204), and correspondingly generating an output signal indicative of such temperature change for determination of the plasma conditions in the etching plasma processing facility (202).

4. 发明申请

WO2006047410A8 FLUID STORAGE AND DISPENSING SYSTEM INCLUDING DYNAMIC FLUID MONITORING OF FLUID STORAGE AND DISPENSING VESSEL 审中-公开
标题翻译：流体储存和分配系统，包括流体储存和分配容器的动态流体监测
公开(公告)号：WO2006047410A8
公开(公告)日：2006-07-27
申请号：PCT/US2005038173
申请日：2005-10-24
申请人： ADVANCED TECH MATERIALS , DIETZ JAMES , BISHOP STEVEN E , MCMANUS JAMES V , LURCOTT STEVEN M , WODJENSKI MICHAEL J , KAIM ROBERT , DIMEO FRANK JR
发明人： DIETZ JAMES , BISHOP STEVEN E , MCMANUS JAMES V , LURCOTT STEVEN M , WODJENSKI MICHAEL J , KAIM ROBERT , DIMEO FRANK JR
IPC分类号： H01L21/66 , B67D7/06 , B67D99/00
CPC分类号： G01N33/00 , F17C11/00 , G01F15/063 , G01F22/02 , G01F23/0076 , G01M3/32 , G01M3/3236 , G06Q10/087 , G06Q30/04 , G06Q50/04 , H01L21/561 , H01L21/568 , H01L21/6835 , H01L22/10 , H01L23/5389 , H01L24/24 , H01L24/48 , H01L24/82 , H01L25/03 , H01L25/0652 , H01L25/16 , H01L2224/16225 , H01L2224/16227 , H01L2224/24011 , H01L2224/2518 , H01L2224/48091 , H01L2224/48227 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01058 , H01L2924/01076 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/09701 , H01L2924/14 , H01L2924/19042 , H05K1/185 , H05K3/4602 , H05K2203/0165 , H05K2203/085 , H05K2203/1469 , Y02P90/30 , Y10T29/4913 , Y10T29/49133 , Y10T29/49165 , Y10T29/53183 , H01L2224/45099
摘要： A monitoring system (100) for monitoring fluid in a fluid supply vessel (22, 24, 26, 28, 108) during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors (114, 126) for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module (40, 132, 146) operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor (50, 150) and display (52, 150) operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.
摘要翻译：一种用于在操作期间监测流体供应容器（22,24,26,28,108）中的流体的监测系统（100），包括从所述流体供应容器分配流体。监测系统包括（i）用于监测流体供应容器或从其分配的流体的特性的一个或多个传感器（114,126），（ii）可操作地耦合到一个的数据采集模块（40,132,146）或多个传感器以从其接收监测数据并且响应地产生与由所述一个或多个传感器监测的特性相关的输出，以及（iii）处理器（50,150）和显示器（52,150），其与所述数据采集模块并且被布置成处理来自数据采集模块的输出并且响应地输出流体供应容器中的流体的图形表示，计费凭证，使用报告和/或再供应请求。

5. 发明申请

WO2006047373A2 NOVEL METHODS FOR CLEANING ION IMPLANTER COMPONENTS 审中-公开
标题翻译：用于清洁离子植入物组分的新方法
公开(公告)号：WO2006047373A2
公开(公告)日：2006-05-04
申请号：PCT/US2005/038102
申请日：2005-10-21
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , DIMEO, Frank, Jr. , DIETZ, James , OLANDER, W., Karl , KAIM, Robert , BISHOP, Steven, E. , NEUNER, Jeffrey, w. , ARNO, Jose, I.
发明人： DIMEO, Frank, Jr. , DIETZ, James , OLANDER, W., Karl , KAIM, Robert , BISHOP, Steven, E. , NEUNER, Jeffrey, w. , ARNO, Jose, I.
IPC分类号： B08B6/00 , B08B9/00
CPC分类号： C23G5/00 , C23C14/564 , H01J37/08 , H01J37/32862 , H01J2237/022 , H01J2237/31701
摘要： A method and apparatus for cleaning residue from components of the vacuum chamber and beaming of an ion implanter used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive halide composition for sufficient time and under sufficient conditions to at least partially remove the residue. The gas-phase reactive halide composition is chosen to react selectively with the residue, while not reacting with the components of the ion source region of the vacuum chamber.
摘要翻译：一种用于清洁真空室的部件的残留物和用于制造微电子器件的离子注入机的抛光的方法和装置。为了有效地除去残留物，将组分与气相反应性卤化物组合物接触足够的时间并在足够的条件下至少部分地除去残余物。选择气相反应性卤化物组合物与残留物选择性反应，而不与真空室的离子源区域的组分反应。

6. 发明申请

WO2005072161A3 APPARATUS AND PROCESS FOR SENSING TARGET GAS SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开
标题翻译：在半导体加工系统中感测目标气体物种的装置和工艺
公开(公告)号：WO2005072161A3
公开(公告)日：2005-12-29
申请号：PCT/US2005001409
申请日：2005-01-14
申请人： ADVANCED TECH MATERIALS , CHEN PHILIP S H , CHEN ING-SHIN , DIMEO FRANK JR , NEUNER JEFFREY W , WELCH JAMES , ROEDER JEFFREY F
发明人： CHEN PHILIP S H , CHEN ING-SHIN , DIMEO FRANK JR , NEUNER JEFFREY W , WELCH JAMES , ROEDER JEFFREY F
IPC分类号： G01N9/00 , G01N27/12 , G01N33/00
CPC分类号： G01N27/16
摘要： A gas detector and process for detecting a target gas species, such as a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The gas detector in one aspect employs a nickel-containing filament that is sensitive to the fluorine-containing species, which can function both as a sensing component and as a heat source when elevated temperature sensing is required. The gas detector in one aspect employs an elongated gas sensor element that can be vertically mounted on a support structure. Vertical mounting of such elongated gas sensor element on the support structure significantly improves the signal strength, reduces the response time, minimizes the footprint of the gas detector, and provides structural flexibility for accommodating thermal expansion/contraction of such gas sensor element.
摘要翻译：一种用于检测目标气体种类的气体检测器和方法，例如含有其的气体中的含氟物质，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。一个方面的气体检测器采用对含氟物质敏感的含镍丝，当需要高温检测时，它们既可以作为传感元件又可作为热源。气体检测器在一个方面使用可以垂直安装在支撑结构上的细长的气体传感器元件。这种细长气体传感器元件在支撑结构上的垂直安装显着地改善了信号强度，减少了响应时间，使气体检测器的占地面积最小化，并提供了用于适应这种气体传感器元件的热膨胀/收缩的结构灵活性。

7. 发明申请

WO2007024988A2 MATERIAL CONTAINMENT SYSTEM 审中-公开
标题翻译：材料容纳系统
公开(公告)号：WO2007024988A2
公开(公告)日：2007-03-01
申请号：PCT/US2006/032978
申请日：2006-08-22
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , MCMANUS, James, V. , DIMEO, Frank, Jr.
发明人： MCMANUS, James, V. , DIMEO, Frank, Jr.
IPC分类号： G06F21/20
CPC分类号： F17C11/00 , B65D55/14
摘要： Containment packages (10) having utility for transport of hazardous gases and security systems for controlling access to packages, e.g., hazardous gas containment packages (20). In a specific implementation, a containment package includes an overpack (11) for improving the safety and security of gas-containment vessels during transportation, e.g., air shipment, in which the overpack is pressurized by a protective gas at pressure in excess of the pressure in the gas- containment vessels, and a global positioning system (GPS) coordinated programmable lock and key system (30) is integrated with the containment package for controlled access to the gas- containment vessels only when the GPS component indicates that the containment package is at a specific geographic location.
摘要翻译：具有用于运输危险气体的容纳包装（10）和用于控制进入包装的安全系统，例如危险气体容纳包装（20）。在具体实施中，遏制包装包括用于改善运输期间气体容纳容器的安全性和安全性的外包装（11），例如空运，其中外包装由压力超过压力的保护气体加压在气体储存容器中，并且全球定位系统（GPS）协调的可编程锁和钥匙系统（30）与容纳包集成在一起，仅在GPS组件指示容纳包是在特定的地理位置。

8. 发明申请

WO2005072161A2 APPARATUS AND PROCESS FOR SENSING TARGET GAS SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开
标题翻译：在半导体处理系统中用于检测目标气体种类的装置和方法
公开(公告)号：WO2005072161A2
公开(公告)日：2005-08-11
申请号：PCT/US2005/001409
申请日：2005-01-14
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , CHEN, Philip, S., H. , CHEN, Ing-Shin , DIMEO, Frank, Jr. , NEUNER, Jeffrey, W. , WELCH, James , ROEDER, Jeffrey, F.
发明人： CHEN, Philip, S., H. , CHEN, Ing-Shin , DIMEO, Frank, Jr. , NEUNER, Jeffrey, W. , WELCH, James , ROEDER, Jeffrey, F.
IPC分类号： G01N9/00 , G01N27/12 , G01N33/00
CPC分类号： G01N27/16
摘要： A gas detector and process for detecting a target gas species, such as a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF 3 , etc. The gas detector in one aspect employs a nickel-containing filament that is sensitive to the fluorine-containing species, which can function both as a sensing component and as a heat source when elevated temperature sensing is required. The gas detector in one aspect employs an elongated gas sensor element that can be vertically mounted on a support structure. Vertical mounting of such elongated gas sensor element on the support structure significantly improves the signal strength, reduces the response time, minimizes the footprint of the gas detector, and provides structural flexibility for accommodating thermal expansion/contraction of such gas sensor element.
摘要翻译：用于检测目标气体物质的气体检测器和方法，所述目标气体物质例如在含有气体的气体中的含氟物质，例如用HF进行蚀刻清洁的半导体加工工具的流出物，气体检测器在一个方面采用对含氟物质敏感的含镍丝，当升高温度感测时，所述含镍丝可以用作感测组件和热源需要。气体检测器在一个方面采用可以垂直安装在支撑结构上的细长的气体传感器元件。这种细长的气体传感器元件在支撑结构上的垂直安装显着提高了信号强度，减少了响应时间，使气体检测器的占用面积最小，并且提供了适应这种气体传感器元件的热膨胀/收缩的结构灵活性。 >

9. 发明申请

WO2007136887A2 NANOPOROUS CARBON MATERIALS, AND SYSTEMS AND METHODS UTILIZING SAME 审中-公开
标题翻译：纳米碳材料，以及使用其的系统和方法
公开(公告)号：WO2007136887A2
公开(公告)日：2007-11-29
申请号：PCT/US2007061256
申请日：2007-01-29
申请人： ADVANCED TECH MATERIALS , DIMEO FRANK JR , CARRUTHERS J DONALD , WODJENSKI MICHAEL J , MCMANUS JAMES V , MARZULLO JOSEPH
发明人： DIMEO FRANK JR , CARRUTHERS J DONALD , WODJENSKI MICHAEL J , MCMANUS JAMES V , MARZULLO JOSEPH
IPC分类号： H01L21/31
CPC分类号： B01D53/0415 , B01D53/0446 , B01D2253/102 , B01D2253/1122 , B01D2253/202 , B01D2253/308 , B01D2253/311 , B01D2253/342 , B01D2256/24 , B01D2257/30 , B01D2258/0216 , B01D2259/40096 , B01D2259/4146 , B01D2259/4525 , B01D2259/455 , B01J20/20 , B01J20/28011 , B01J20/28014 , B01J20/28023 , B01J20/28033 , B01J20/28042 , B01J20/28052 , B01J20/2808 , B01J20/28097 , B01J2220/66 , B82Y30/00 , C01B3/0021 , C01B13/0251 , C10G25/003 , C10G45/02 , C10G67/06 , C10G2300/1033 , C10G2300/1044 , C10G2300/1051 , C10G2300/1055 , C10G2300/202 , C10G2300/207 , F17C11/00 , F17C11/007 , Y02E60/321 , Y02E60/325 , Y10S95/903 , Y10T428/249956 , Y10T428/249957
摘要： A porous carbon composite having porosity that is at least partially filled with material imparting to the composite an enhanced character with respect to characteristics selected from the group consisting of hardness, wear-resistance and toughness, as compared with the nanoporous carbon alone. Porous carbon material is also described as a storage medium for chlorine gas, or as a hydrogen storage medium, e.g., for hydrogen fuel cells.
摘要翻译：与单独的纳米多孔碳相比，具有至少部分填充有赋予复合材料的材料相对于选自硬度，耐磨性和韧性的特性的增强特性的多孔碳复合材料。多孔碳材料也被描述为用于氯气的储存介质，或作为储氢介质，例如氢燃料电池。

10. 发明申请

WO2006101897A2 METHOD AND APPARATUS FOR MONITORING PLASMA CONDITIONS IN AN ETCHING PLASMA PROCESSING FACILITY 审中-公开
标题翻译：在蚀刻等离子体处理设备中监测等离子体条件的方法和装置
公开(公告)号：WO2006101897A2
公开(公告)日：2006-09-28
申请号：PCT/US2006009330
申请日：2006-03-15
申请人： ADVANCED TECH MATERIALS , CHEN ING-SHIN , NEUNER JEFFREY W , DIMEO FRANK JR , CHEN PHILIP S H , WELCH JAMES , ROEDER JEFFREY F
发明人： CHEN ING-SHIN , NEUNER JEFFREY W , DIMEO FRANK JR , CHEN PHILIP S H , WELCH JAMES , ROEDER JEFFREY F
IPC分类号： H01L21/302 , C23F1/00 , G01L21/30
CPC分类号： B81C1/00587 , B81C99/0065 , B81C2201/0138 , C23C16/4405 , G01N27/16 , H01J37/32935
摘要： A gas sensor and method of gas sensing, e.g., of a type as useful with downstream sensor elements for determining the plasma conditions (e.g., plasma etching end point) in a semiconductor etching facility that utilizes halogen-containing plasma and/or oxygen-containing plasma. Such sensor elements are capable of exhibiting temperature change in the presence of energetic gas species, e.g., fluorine, chlorine, iodine, bromine, oxygen, and derivatives and radicals thereof that are generated by the plasma, and correspondingly generating an output signal indicative of such temperature change for determination of the plasma conditions in the etching plasma processing facility.
摘要翻译：一种气体传感器和气体传感方法，例如，对于使用含卤素等离子体和/或含氧的半导体蚀刻设备中用于确定等离子体条件（例如，等离子体蚀刻终点）的下游传感器元件有用的类型等离子体。这样的传感器元件能够在由等离子体产生的能量气体物质例如氟，氯，碘，溴，氧及其衍生物和自由基的存在下表现出温度变化，并且相应地产生指示其的输出信号用于确定蚀刻等离子体处理设备中的等离子体条件的温度变化。

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