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51. 发明申请

WO2005046011A3 RELAX GAS DISCHARGE LASER LITHOGRAPHY LIGHT SOURCE 审中-公开
标题翻译：放电气体放电激光光刻光源
公开(公告)号：WO2005046011A3
公开(公告)日：2005-12-22
申请号：PCT/US2004035671
申请日：2004-10-27
申请人： CYMER INC , SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ERSHOV ALEXANDER I , RAFAC ROBERT J , RYLOV GERMAN E
发明人： SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ERSHOV ALEXANDER I , RAFAC ROBERT J , RYLOV GERMAN E
IPC分类号： B23K26/06 , B23K26/40 , G01J1/42 , G01J9/02 , G02B26/00 , G02B26/08 , G03F7/20 , H01S20060101 , H01S3/00 , H01S3/1055 , H01S3/22 , H01S3/225
CPC分类号： G01J1/429 , B23K26/0622 , B23K2201/40 , G01J9/02 , G02B26/002 , G02B26/0875 , G03F7/70041 , G03F7/70575 , H01S3/005 , H01S3/0057 , H01S3/1055 , H01S3/225
摘要： An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.
摘要翻译：公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在分散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置脉冲光束在可变折射光学元件上。可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。脉冲参数测量和脉冲调制控制的其他方面包括响应于来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

52. 发明申请

WO2005054949A3 LASER THIN FILM POLY-SILICON ANNEALING SYSTEM 审中-公开
标题翻译：激光薄膜多晶硅退火系统
公开(公告)号：WO2005054949A3
公开(公告)日：2005-12-15
申请号：PCT/US2004037617
申请日：2004-11-12
申请人： CYMER INC , PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSELL , THOMAS MICHAEL
发明人： PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSELL , THOMAS MICHAEL
IPC分类号： B23K26/06 , G03F20060101 , H01L21/20 , H01S3/081 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/0818 , B23K26/042 , B23K26/0622 , B23K26/0738 , B23K26/705 , H01L21/02532 , H01L21/02675 , H01S3/225 , H01S3/2255 , H01S3/2308 , H01S3/2366
摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.
摘要翻译：公开了一种气体放电激光结晶装置和方法，用于在工件上进行膜内晶体结构或取向的变换，其可包括主振荡器功率放大器MOPA或功率振荡器功率放大器配置的XeF激光系统，产生激光输出光脉冲束以高重复率和高功率以及脉冲到脉冲剂量控制; 光学系统从激光输出光脉冲束产生细长的薄脉冲工作光束。该设备可以进一步包括激光系统被配置为POPA激光系统并且还包括：中继光学器件，用于将来自第一激光PO单元的第一输出激光脉冲光束引导到第二激光PA单元中; 以及定时和控制模块，用于在第一和第二激光单元中产生正或负3ns内的气体放电，以产生作为第一激光输出光脉冲束的放大的第二激光输出光脉冲束。该系统可以包括振荡器激光器单元中的发散控制。发散控制可以包括不稳定的谐振器布置。该系统还可以包括位于激光器和工件之间的光束指向控制机构以及位于激光器和工件之间的光束位置控制机构。波束参数测量可以提供对波束指向机构的主动反馈控制和对波束位置控制机构的主动反馈控制。

53. 发明申请

WO2005104313A2 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 审中-公开
标题翻译：气体放电激光室改进
公开(公告)号：WO2005104313A2
公开(公告)日：2005-11-03
申请号：PCT/US2005/007168
申请日：2005-03-03
申请人： CYMER, INC. , PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
发明人： PARTLO, William, N. , AMADA, Yoshiho , CARMICHAEL, James, A. , DYER, Timothy, S. , GILLESPIE, Walter, D. , MOOSMAN, Bryan, G. , RETTIG, Curtis, L. , STRATE, Brian, D. , STEIGER, Thomas, D. , TRINTCHOUK, Fedor, B. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.
摘要翻译：如果公开的方法和装置，其可以包括高功率高重复率气体放电激光器UV光源，其可以包括：气体放电室，其包括包括垂直壁和相邻底壁的内壁; 气体循环风扇，其产生邻近内部垂直壁和相邻底壁的气体流动路径; 室内除尘器定位低气流区域，其可以沿着内壁并且可以包括至少一个网状筛网，例如多个网状筛网，其可以包括至少两个不同的规格网状筛网。除尘器可以沿着室的底部内壁和/或内壁的垂直部分延伸。除尘器可以包括具有第一量规的第一网状筛网; 第二网眼屏幕，其具有小于第一规格的第二规格; 并且第二网状屏幕在第一网状筛网和内壁之间中间。腔室可以包括在腔室的垂直内壁和底壁中的至少一个中的多个集尘凹部，其可以从包括一部分凹部和多部分凹部的组中选择，该组包括两个相对于彼此成角度的部分。除尘器可以包括定位在主绝缘体的一部分和室的内壁之间的压力阱。该腔室可以包括气体循环风扇，其包括具有风扇切断装置的横流风扇，其可以包括涡流控制袋。所述腔室可以包括预电离机构，其包括在所述预电离管内的细长开口内包含接地棒的前置离子槽，其可以包括柔顺构件，自动预除电切断机构，预电离起始控制机构和/或聚焦元件。腔室可以包括细长的挡板，其可以包括多个金字塔结构，其包括不同数量的大体锥体元件，并且以不同数量的大体锥体元件组成并且沿纵向轴线并且横向于纵向轴线定向。通过将人工钳位器引入激光放电的定时，也可以通过在脉冲串内从脉冲到脉冲随机地或以重复模式改变脉冲周期的时间来减小腔室内的声共振。

54. 发明申请

WO2005104312A2 VERY HIGH REPETITION RATE NARROW BAND GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：非常高的重复率窄带带隙放电激光系统
公开(公告)号：WO2005104312A2
公开(公告)日：2005-11-03
申请号：PCT/US2005/007064
申请日：2005-03-03
申请人： CYMER, INC. , STEIGER, Thomas, D. , HOLTAWAY, Edward, P. , MOOSMAN, Bryan, G. , RAO, Rajasekhar, M.
发明人： STEIGER, Thomas, D. , HOLTAWAY, Edward, P. , MOOSMAN, Bryan, G. , RAO, Rajasekhar, M.
IPC分类号： H01S3/22
CPC分类号： H01S3/038 , H01S3/0057 , H01S3/07 , H01S3/097 , H01S3/09702 , H01S3/104 , H01S3/1305 , H01S3/2333
摘要： A method and apparatus for producing a very high repetition rate gas discharge laser system in a MOPA configuration is disclosed which may comprise a master oscillator gas discharge layer system producing a beam of oscillator laser output light pulses at a very high pulse repetition rate; at least two power amplification gas discharge laser systems receiving laser output light pulses from the master oscillator gas discharge laser system and each of the at least two power amplification gas discharge laser systems amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate, which may be positioned in series with respect to the oscillator laser output light pulse beam. The apparatus and method may further comprise a beam delivery unit connected to the laser light output of the power amplification laser system. The apparatus and method may be a very high repetition rate gas discharge laser system in a MOPO configuration. The apparatus and method may comprise a compression head comprising a compression head charge storage device being charged at x times per second; a gas discharge chamber comprising at least two sets of paired gas discharge electrodes; at least two magnetically saturable switches, respectively connected between the compression head charge storage device and one of the at least two sets of paired electrodes and comprising first and second opposite biasing windings having a first biasing current for the first biasing winding and a second biasing current for the second biasing winding and comprising a switching circuit to switch the biasing current from the first biasing current to the second biasing current such that only one of the at least two switches receives the first biasing current at a repetition rate equal to x divided by the number of the at least two sets of paired electrodes while the remainder of the at least two magnetically saturable switches receives the second biasing current. The apparatus and method may be utilized as a lithography tool or for producing laser produced plasma EUV light.
摘要翻译：公开了一种用于制造MOPA结构中非常高的重复率气体放电激光系统的方法和装置，其可以包括以非常高的脉冲重复频率产生振荡器激光输出光脉冲的主振荡器气体放电层系统; 至少两个功率放大气体放电激光器系统接收来自主振荡器气体放电激光器系统的激光输出光脉冲，并且至少两个功率放大气体放电激光器系统中的每一个以脉冲重复放大接收到的激光输出光脉冲的一部分，非常高的脉冲重复率的一部分等于至少两个功率放大气体放电激光系统的数量之一，以形成以非常高的脉冲重复频率的放大的输出激光束脉冲束，其可以与对振荡器的激光输出光脉冲光束。该装置和方法还可以包括连接到功率放大激光系统的激光输出的光束传送单元。该装置和方法可以是MOPO配置中非常高的重复率气体放电激光系统。该装置和方法可以包括压缩头，该压缩头包括以每秒x次的速率充电的压缩头电荷存储装置; 气体放电室，包括至少两组成对的气体放电电极; 至少两个磁饱和开关，分别连接在所述压缩头电荷存储装置和所述至少两组成对电极中的一个之间，并且包括具有用于所述第一偏置绕组的第一偏置电流的第一和第二相对偏置绕组，以及第二偏置电流用于所述第二偏置绕组并且包括切换电路，以将所述偏置电流从所述第一偏置电流切换到所述第二偏置电流，使得所述至少两个开关中仅一个接收到所述第一偏置电流，所述重复率等于x除以至少两组成对电极的数量，而至少两个磁饱和开关的其余部分接收第二偏置电流。该装置和方法可以用作光刻工具或用于产生激光产生的等离子体EUV光。

55. 发明申请

WO2005060623A2 METHOD AND APPARATUS FOR CONTROLLING THE OUTPUT OF A GAS DISCHARGE MOPA LASER SYSTEM 审中-公开
标题翻译：用于控制气体放电摩尔定律激光系统输出的方法和装置
公开(公告)号：WO2005060623A2
公开(公告)日：2005-07-07
申请号：PCT/US2004/041384
申请日：2004-12-10
申请人： CYMER, INC. , RULE, John, A. , ZAMBON, Paulo
发明人： RULE, John, A. , ZAMBON, Paulo
IPC分类号： H01S3/134 , H01S3/22 , H01S3/225 , H01S3/23
CPC分类号： H01S3/225 , H01S3/134 , H01S3/2258 , H01S3/2308 , H01S3/2366
摘要： A method and apparatus are disclosed for controlling the output of a two chamber gas discharge laser comprising an oscillator gas discharge laser and an amplifier gas discharge laser that may comprise establishing a multidimensional variable state space comprising a coordinate system having at least two coordinates, each coordinate comprising a selected variable representing an operating parameter of the oscillator or the amplifier; tracking a multidimensional operating point in the multidimensional variable state space according to the variation of the selected variables in either or both of the oscillator or the amplifier to determine the position of the multidimensional operating point in the multidimensional state space; determining from the position of the multidimensional operating point in the multidimensional operating space a region from a plurality of defined regions in the multidimensional operating space in which the multidimensional operating point is located and identifying the region.
摘要翻译：公开了一种用于控制包括振荡器气体放电激光器和放大器气体放电激光器的二腔气体放电激光器的输出的方法和装置，其可以包括建立包括具有至少两个坐标的坐标系的多维可变状态空间，每个坐标包括表示振荡器或放大器的工作参数的选定变量; 根据所述振荡器或放大器中的任一个或两者中的所选变量的变化来跟踪所述多维可变状态空间中的多维工作点，以确定所述多维工作点在所述多维状态空间中的位置; 从所述多维操作空间中的所述多维操作区域中的所述多维操作区域中的所述多维操作区域中的所述多维操作区域的位置确定所述多维操作空间中的所述多维操作空间，并识别所述区域。

56. 发明申请

WO03100826A8 LITHOGRAPHY LASER WITH BEAM DELIVERY AND BEAM POINTING CONTROL 审中-公开
标题翻译：光束传输和光束控制的光刻激光器
公开(公告)号：WO03100826A8
公开(公告)日：2004-11-25
申请号：PCT/US0314387
申请日：2003-05-05
申请人： CYMER INC , DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
发明人： DAS PALASH P , WEBB R KYLE , GIOVANARDI MARCO , FRANCIS GREGORY , DORN HUCKLEBERRY B , ERLANDSEN KYLE P , NELSON JOHN W , SANDSTROM RICHARD L , ERSHOV ALEXANDER I
IPC分类号： H01L21/027 , G02B26/08 , G02B27/09 , G03F7/20 , H01L20060101 , H01L21/00 , H01S3/00 , H01S3/034 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/0971 , H01S3/10 , H01S3/13 , H01S3/134 , H01S3/136 , H01S3/137 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/7055 , G02B26/0816 , G02B27/0972 , G03F7/70025 , G03F7/70041 , G03F7/70058 , H01S3/005 , H01S3/0057 , H01S3/036 , H01S3/041 , H01S3/0971 , H01S3/136 , H01S3/137 , H01S3/225 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source (Fig. 1) with a beam delivery to a production line machine (2). The system includes an enclosed (4) and purged beam path (14C) with a beam pointing control (40A) (40B) (6) for delivery of the laser beam to a desired location such as the entrance port of the production line machine (2). In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers (8)(10) are provided, one of which is a part of a master oscillator (8) producing a very narrow band seed beam (14A), which is amplified in the second discharge chamber (10). This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译：本发明提供了一种模块化的高重复频率紫外线气体放电激光光源（图1），光束传输到生产线机器（2）。该系统包括具有光束指向控制器（40A）（40B）（6）的封闭（4）和清洗光束路径（14C），用于将激光束传送到期望位置，例如生产线机器的入口 2）。在优选实施例中，生产线机器是光刻机器（2），并且提供两个单独的放电室（8）（10），其中一个是主振荡器（8）的一部分，产生非常窄带的种子束在第二放电室（10）中被放大。该MOPA系统的输出脉冲能量大约是可比较的单腔激光系统的两倍，大大改善了光束质量。

57. 发明申请

WO2004100325A3 WAVEGUIDE LASER 审中-公开
公开(公告)号：WO2004100325A3
公开(公告)日：2004-11-18
申请号：PCT/US2004/013081
申请日：2004-04-29
申请人： LITELASER L.L.C. , MONTY, Nathan Paul
发明人： MONTY, Nathan Paul
IPC分类号： H01S3/22
摘要： A laser waveguide (1), where the laser waveguide (1) can be formed by electrodes (2 and 4) and at least one sidewall (3a-d) in a manner allowing a more compact structure than previously provided. Protrusions in the electrodes (2 and 4) allow easier laser starts, and sectional sidewall(s) allow easier fabrication of sidewall(s), decreasing manufacturing costs.

58. 发明申请

WO2003096492A3 AUTOMATIC GAS CONTROL SYSTEM FOR A GAS DISCHARGE LASER 审中-公开
公开(公告)号：WO2003096492A3
公开(公告)日：2003-11-20
申请号：PCT/US2003/013939
申请日：2003-05-05
申请人： CYMER, INC. , RULE, John, A. , HOFMANN, Thomas , MORTON, Richard, G. , BROWN, Daniel, J., W. , FLEUROV, Vladimir, B. , TRINTCHOUK, Fedor , ISHIHARA, Toshihiko , ERSHOV, Alexander, I. , WITTAK, Christian, J.
发明人： RULE, John, A. , HOFMANN, Thomas , MORTON, Richard, G. , BROWN, Daniel, J., W. , FLEUROV, Vladimir, B. , TRINTCHOUK, Fedor , ISHIHARA, Toshihiko , ERSHOV, Alexander, I. , WITTAK, Christian, J.
IPC分类号： H01S3/22
摘要： An automatic F 2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor (604) for monitoring the F 2 consumption rates through the operating life of the laser system (4). These consumption rates are used by a processor (604) programmed with an algorithm to determine F 2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F 2 controls for a two-chamber MOPA laser system (5).

59. 发明申请

WO2003049241A1 TIMING CONTROL FOR TWO-CHAMBER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：两台气体放电激光系统的时序控制
公开(公告)号：WO2003049241A1
公开(公告)日：2003-06-12
申请号：PCT/US2002/034045
申请日：2002-10-23
申请人： CYMER INC. , ERSHOV, Alexander, I. , NESS, Richard, M.
发明人： ERSHOV, Alexander, I. , NESS, Richard, M.
IPC分类号： H01S3/22
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308 , H01S3/2333 , H01S3/2366
摘要： Feedback timing control equipment and process for an injection seeded modular gas discharge laser (11). A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. The feedback timing control is programmed to permit in some circumstances discharges timed so that no significant laser energy is output from the system. Use of this technique permits burst mode operation in which the first discharge of a burst is a no-output discharge so that timing parameters for each of the two chambers can be monitored before the first laser output pulse of the burst. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber.
摘要翻译：反馈定时控制设备和注射种子模块化气体放电激光器的工艺（11）。优选的实施方案是能够以大约4,000Hz或更大的脉冲速率产生高质量脉冲激光束并且在约20至40瓦或更大的集成输出的脉冲能量为约5至10mJ或更大的系统。反馈定时控制被编程为允许在某些情况下放电定时，使得不会从系统输出显着的激光能量。使用这种技术允许突发模式操作，其中突发的第一次放电是无输出放电，使得可以在突发的第一激光输出脉冲之前监视两个室中的每一个的定时参数。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许在主振荡器中优化波长参数并优化放大室中的脉冲能量参数。

60. 发明申请

WO2002093702A1 GAS DISCHARGE LASER WITH IMPROVED BEAM PATH 审中-公开
标题翻译：具有改进光束路径的气体放电激光
公开(公告)号：WO2002093702A1
公开(公告)日：2002-11-21
申请号：PCT/US2002/012200
申请日：2002-04-17
申请人： CYMER, INC. , PARTLO, William, N. , SANDSTROM, Richard, L. , GLATZEL, Holger, K. , CYBULSKI, Ray, F. , NEWMAN, Peter, C. , HOWEY, James, K. , HULBURD, William , MELCHIOR, John, T. , IVASCHENKO, Alex, P.
发明人： PARTLO, William, N. , SANDSTROM, Richard, L. , GLATZEL, Holger, K. , CYBULSKI, Ray, F. , NEWMAN, Peter, C. , HOWEY, James, K. , HULBURD, William , MELCHIOR, John, T. , IVASCHENKO, Alex, P.
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element (70A) to minimize thermal distortions in the LNP (54). This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. A wavemeter (7) is provided with a special purge of a compartment exposed to the output laser beam.
摘要翻译：具有清除光束路径的准分子激光器，其能够以大约5mJ或更大的脉冲能量产生超过2000Hz的脉冲速率的高质量脉冲激光束。通过激光系统的整个清除的光束路径被密封以最小化光束路径的污染。优选实施例包括热去耦LNP孔元件（70A），以最小化LNP（54）中的热失真。该优选实施例是专门设计为用于集成电路光刻的光源的ArF准分子激光器。波导计（7）具有暴露于输出激光束的隔室的特殊吹扫。

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