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1. 发明申请

WO2005046011A3 RELAX GAS DISCHARGE LASER LITHOGRAPHY LIGHT SOURCE 审中-公开
标题翻译：放电气体放电激光光刻光源
公开(公告)号：WO2005046011A3
公开(公告)日：2005-12-22
申请号：PCT/US2004035671
申请日：2004-10-27
申请人： CYMER INC , SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ERSHOV ALEXANDER I , RAFAC ROBERT J , RYLOV GERMAN E
发明人： SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , YAGER THOMAS A , ERSHOV ALEXANDER I , RAFAC ROBERT J , RYLOV GERMAN E
IPC分类号： B23K26/06 , B23K26/40 , G01J1/42 , G01J9/02 , G02B26/00 , G02B26/08 , G03F7/20 , H01S20060101 , H01S3/00 , H01S3/1055 , H01S3/22 , H01S3/225
CPC分类号： G01J1/429 , B23K26/0622 , B23K2201/40 , G01J9/02 , G02B26/002 , G02B26/0875 , G03F7/70041 , G03F7/70575 , H01S3/005 , H01S3/0057 , H01S3/1055 , H01S3/225
摘要： An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.
摘要翻译：公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在分散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置脉冲光束在可变折射光学元件上。可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。脉冲参数测量和脉冲调制控制的其他方面包括响应于来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

2. 发明申请

WO03096497A8 HIGH POWER DEEP ULTRAVIOLET LASER WITH LONG LIFE OPTICS 审中-公开
标题翻译：高功率深紫外线激光与长寿命光学
公开(公告)号：WO03096497A8
公开(公告)日：2004-12-29
申请号：PCT/US0312819
申请日：2003-04-23
申请人： CYMER INC , YAGER THOMAS A , PARTLO WILLIAM N , SANDSTROM RICHARD L , PAN XIAOJIANG , MELCHIOR JOHN T , ALGOTS JOHN M , BALL MATTHEW , ERSHOV ALEXANDER I , FLEUROV VLADIMIR , GILLESPIE WALTER D , GLATZEL HOLGER K , LUBLIN LEONARD , MARSH ELIZABETH , MORTON RICHARD G , UJAZDOWKI RICHARD C , WARKENTIN DAVID J , WEBB R KYLE
发明人： YAGER THOMAS A , PARTLO WILLIAM N , SANDSTROM RICHARD L , PAN XIAOJIANG , MELCHIOR JOHN T , ALGOTS JOHN M , BALL MATTHEW , ERSHOV ALEXANDER I , FLEUROV VLADIMIR , GILLESPIE WALTER D , GLATZEL HOLGER K , LUBLIN LEONARD , MARSH ELIZABETH , MORTON RICHARD G , UJAZDOWKI RICHARD C , WARKENTIN DAVID J , WEBB R KYLE
IPC分类号： H01S3/034 , G03F7/20 , H01S3/00 , H01S3/225 , H01S3/22
CPC分类号： G03F7/7055 , H01S3/005 , H01S3/225
摘要： The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems (Fig. 1B) producing a high repetition rate high power output beam (38). The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics (4260) (422)(424)(426) located in high pulse intensity sections (10)(26) of the output beam (14C) of prototype laser systems. Embodiments include an enclosed (4) and purged beam path (14C) with beam pointing control (40A) (40B)(6) for beam delivery of billions of output laser pulses (38). Optical components and modules described herein are capable of controlling ultraviolet laser output pulses (14A) with wavelength less than 200nm with average output pulse intensities greater than 1.75x10 Watts/cm and with peak intensity or greater 3.5x10 Watts/cm for many billions of pulses (14A) as compared to prior art components and modules which failed after only a few minutes in these pulse intensities.
摘要翻译：本发明提供了用于产生高重复率高功率输出光束（38）的模块化高重复率紫外线气体放电激光系统（图1B）的长寿命光学器件。本发明包括由原始激光系统的输出光束（14C）的高脉冲强度部分（10）（26）中的CaF2光学器件（4260）（422）（424）（426）发现的由申请人发现的表面损伤问题的解决方案。实施例包括具有用于束输送数十亿个输出激光脉冲（38）的光束指向控制（40A）（40B）（6））的封闭（4）和净化光束路径（14C）。本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲（14A），平均输出脉冲强度大于1.75×10 6瓦/ cm 2，峰值强度或更大的3.5×10 6 与现有技术的元件和模块相比，在这些脉冲强度仅在几分钟之后就失败了，数十亿脉冲（14A）的功率>瓦特/平方厘米（2）。

3. 发明申请

WO2007053335A3 LASER SYSTEM 审中-公开
标题翻译：激光系统
公开(公告)号：WO2007053335A3
公开(公告)日：2008-04-24
申请号：PCT/US2006041107
申请日：2006-10-20
申请人： CYMER INC , ERSHOV ALEXANDER I , PARTLO WILLIAM N , BROWN DANIEL J W , FOMENKOV IGOR V , BERGSTEDT ROBERT A , SANDSTROM RICHARD L , LALOVIC IVAN
发明人： ERSHOV ALEXANDER I , PARTLO WILLIAM N , BROWN DANIEL J W , FOMENKOV IGOR V , BERGSTEDT ROBERT A , SANDSTROM RICHARD L , LALOVIC IVAN
IPC分类号： H01S3/22
CPC分类号： H01S3/225 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/03 , H01S3/034 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/105 , H01S3/2251 , H01S3/2333
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage wherein the output of the seed laser oscillator passes through the amplifying gain medium of the ring power amplification stage at least two times per loop.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括：激光输出光束脉冲，其可以包括环形功率放大级，其中种子激光振荡器的输出通过环形功率放大级的放大增益介质至少每循环两次。

4. 发明申请

WO2006093826A2 LPP EUV DRIVE LASER 审中-公开
标题翻译： LPP EUV驱动激光
公开(公告)号：WO2006093826A2
公开(公告)日：2006-09-08
申请号：PCT/US2006006597
申请日：2006-02-22
申请人： CYMER INC , BROWN DANIEL J W , ERSHOV ALEXANDER I , FLEUROV VLADIMIR B , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： BROWN DANIEL J W , ERSHOV ALEXANDER I , FLEUROV VLADIMIR B , FOMENKOV IGOR V , PARTLO WILLIAM N
CPC分类号： H01S3/225 , H01S3/094 , H01S3/10015 , H01S3/10023 , H01S3/109 , H01S3/1611 , H01S3/1653 , H01S3/2255 , H01S3/2308 , H01S3/2333 , H01S3/2366 , H01S3/2375 , H01S3/2383 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise an EUV drive laser system comprising: a solid state seed laser master oscillator laser; a gas discharge excimer laser gain generator producing a drive laser output light beam. The solid state seed laser may comprise a third harmonic Nd: YLF laser, which may be tunable. The gas discharge excimer gain generator laser may comprise a XeF excimer laser power amplifier or power oscillator. The solid state laser may comprise a tunable laser tuned by changing the temperature of a laser crystal comprising the solid state laser, or by utilizing a wavelength selection element, e.g., a Lyot filter or an etalon.
摘要翻译：公开了一种可以包括EUV驱动激光系统的装置和方法，该系统包括：固态种子激光主振荡器激光器; 产生驱动激光输出光束的气体放电准分子激光增益发生器。固态种子激光器可以包括可调谐的三次谐波Nd：YLF激光器。气体放电准分子增益发生器激光器可以包括XeF准分子激光功率放大器或功率振荡器。固体激光器可以包括通过改变包括固态激光器的激光晶体的温度或通过利用波长选择元件例如Lyot滤光器或标准具来调节的可调谐激光器。

5. 发明申请

WO2005089131A3 LPP EUV LIGHT SOURCE 审中-公开
标题翻译： LPP EUV光源
公开(公告)号：WO2005089131A3
公开(公告)日：2006-06-08
申请号：PCT/US2005007063
申请日：2005-03-03
申请人： CYMER INC , PARTLO WILLIAM N , BROWN DANIEL J W , FOMENKOV IGOR V , BOWERING NORBERT R , RETTIG CURTIS L , MACFARLANE JOSEPH J , ERSHOV ALEXANDER I , HANSSON BJORN A M
发明人： PARTLO WILLIAM N , BROWN DANIEL J W , FOMENKOV IGOR V , BOWERING NORBERT R , RETTIG CURTIS L , MACFARLANE JOSEPH J , ERSHOV ALEXANDER I , HANSSON BJORN A M
IPC分类号： H01J35/20 , G03F7/20 , H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H01S3/0085 , H01S3/0092 , H01S3/1611 , H01S3/1653 , H01S3/2255 , H01S3/2325 , H01S3/2375 , H01S3/2383 , H05G2/005 , H05G2/008
摘要： An LPP EUV light source (20) comprises a laser initial target irradiation pulse generating mechanism (60) for irradiating a plasma initiation target (94) with an initial target irradiation pulse (55) to form an EUV generating plasma (30) having an emission region emitting in-band EUV light (40); a laser plasma irradiation pulse generating mechanism (72) for irradiating the plasma (30) with a plasma irradiation pulse (76) after the initial target irradiation pulse (55) to compress emission material in the plasma (30).
摘要翻译： LPP EUV光源（20）包括激光初始靶照射脉冲发生机构（60），用于用初始靶照射脉冲（55）照射等离子体引发靶（94）以形成具有发射的EUV产生等离子体（30）区域发射带内EUV光（40）; 用于在初始目标照射脉冲（55）之后用等离子体照射脉冲（76）照射等离子体（30）以压缩等离子体（30）中的发射材料的激光等离子体照射脉冲产生机构（72）。

6. 发明申请

WO2006093693A2 METHOD AND APPARATUS FOR EUV PLASMA SOURCE TARGET DELIVERY 审中-公开
标题翻译：用于EUV等离子体源目标传送的方法和装置
公开(公告)号：WO2006093693A2
公开(公告)日：2006-09-08
申请号：PCT/US2006005647
申请日：2006-02-17
申请人： CYMER INC , ALGOTS JOHN MARTIN , FOMENKOV IGOR V , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , HEMBERG OSCAR , BYKANOV ALEXANDER N , COBB DENNIS W
发明人： ALGOTS JOHN MARTIN , FOMENKOV IGOR V , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , HEMBERG OSCAR , BYKANOV ALEXANDER N , COBB DENNIS W
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.
摘要翻译：公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

7. 发明申请

WO2004012308A3 CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER 审中-公开
标题翻译：两台气体放电激光器的控制系统
公开(公告)号：WO2004012308A3
公开(公告)日：2004-07-15
申请号：PCT/US0324146
申请日：2003-07-30
申请人： CYMER INC , FALLON JOHN P , RULE JOHN A , JACQUES ROBERT N , LIPCON JACOB P , SANDSTROM RICHARD L , PARTLO WILLIAM N , ERSHOV ALEXANDER I , ISHIHARA TOSHIHIKO , MEISNER JOHN , NESS RICHARD M , MELCHER PAUL C
发明人： FALLON JOHN P , RULE JOHN A , JACQUES ROBERT N , LIPCON JACOB P , SANDSTROM RICHARD L , PARTLO WILLIAM N , ERSHOV ALEXANDER I , ISHIHARA TOSHIHIKO , MEISNER JOHN , NESS RICHARD M , MELCHER PAUL C
IPC分类号： H01S20060101 , H01S3/036 , H01S3/134 , H01S3/22 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2333 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线的控制系统。在优选实施例中，激光器是具有主振荡器（10）的生产线机器，其产生非常窄的带子种子束，其在第二放电室中被放大（12）。特别适用于双室气体放电激光系统的新型控制特征包括（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F2注射控制与新的学习算法。

8. 发明申请

WO02061388A2 HIGH RESOLUTION ETALON-GRATING MONOCHROMATOR SPECTROMETER 审中-公开
标题翻译：高分辨率ETALON-GRATING MONOCHROMATOR SPECTROMETER
公开(公告)号：WO02061388A2
公开(公告)日：2002-08-08
申请号：PCT/US0202453
申请日：2002-01-28
申请人： CYMER INC , SANDSTROM RICHARD L , ERSHOV ALEXANDER I , FOMENKOV IGOR V , BROWN DANIEL J W , SMITH SCOTT T
发明人： SANDSTROM RICHARD L , ERSHOV ALEXANDER I , FOMENKOV IGOR V , BROWN DANIEL J W , SMITH SCOTT T
IPC分类号： G01J3/26 , G01J1/42 , G01J3/12 , G01J3/22 , G01J9/02 , G21K1/06 , H01S3/134 , H01S3/137 , G01N
CPC分类号： G01J3/12 , G01J1/4257 , G01J3/22 , G01J3/26 , G01J9/02
摘要： A high resolution etalon-grating spectrometer or monochromator. A preferred embodiment presents as extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser illuminates an etalon (ET). A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated (L3) and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit (2) and monitored by a light detector (PMT). When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow as about 0.034pm "FWHM" and about 0.091pm "95 percent integral". The etalon and the grating are placed in a leak-tight containment (50) filled with a gas, such a nitrogen or helium.
摘要翻译：高分辨率标准光栅光谱仪或单色仪。优选的实施例在紫外范围内呈现极窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。来自激光器的光聚焦成漫射器（D），离散扩散器的散射光照射标准具（ET）。将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。通过狭缝的光被准直（L3），并且准直光照射位于大约Littrow配置中的光栅（GR1），其根据波长分散光。表示对应于所选标准具条纹的波长的分散光的一部分通过第二狭缝（2）并由光检测器（PMT）监测。当标准具和光栅调谐到相同的精确波长时，定义了狭缝功能，其极窄，约0.034pm“FWHM”和约0.091μm“95％积分”。标准具和光栅放置在充满气体（例如氮气或氦气）的密封密封（50）中。

9. 发明申请

WO2007146329A2 DRIVE LASER FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的驱动激光器
公开(公告)号：WO2007146329A2
公开(公告)日：2007-12-21
申请号：PCT/US2007013862
申请日：2007-06-11
申请人： CYMER INC , ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , HOFFMAN JERZY R , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , HOFFMAN JERZY R , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： H01S3/00
CPC分类号： H01S3/2316 , H01S3/0057 , H01S3/11 , H01S3/2232 , H01S3/225 , H05G1/54 , H05G2/008
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (E s, 1 ) and a small signal gain (g o , 1 ); and the second amplifier may have a gain medium characterized by a saturation energy (E s, 2 ) and a small signal gain (g o , 2 ), with (g o , 1 ) > (g o , 2 ) and (E S , 2 ) > (E s,
摘要翻译：公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。对于源极，第一放大器可以具有特征在于饱和能量（E S，S 1）和小信号增益（g 1，...，）; 并且第二放大器可以具有特征在于饱和能量（E S，S 2）和小信号增益（g 0，S 2，N 2）的增益介质（g ，＆lt; 2＆gt;）和（E

10. 发明申请

WO2006020080A3 SYSTEMS AND METHODS FOR REDUCING THE INFLUENCE OF PLASMA-GENERATED DEBRIS ON THE INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE 审中-公开
标题翻译：用于减少等离子体生成物对EUV光源的内部成分的影响的系统和方法
公开(公告)号：WO2006020080A3
公开(公告)日：2007-04-05
申请号：PCT/US2005025232
申请日：2005-07-15
申请人： CYMER INC , ERSHOV ALEXANDER I , MARX WILLIAM F , BOWERING NORBERT R , HANSSON BJORN A M , KHODYKIN OLEH , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： ERSHOV ALEXANDER I , MARX WILLIAM F , BOWERING NORBERT R , HANSSON BJORN A M , KHODYKIN OLEH , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： C25F1/00 , G03F7/20 , G21K5/10 , H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/7085 , G03F7/70916 , G21K1/06 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.
摘要翻译：公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

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