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31. 发明申请

WO2003021728A2 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：非常窄带，两个室，高倍率气体放电激光系统
公开(公告)号：WO2003021728A2
公开(公告)日：2003-03-13
申请号：PCT/US2002/027925
申请日：2002-08-28
申请人： CYMER, INC. (a Nevada corporation) , KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
IPC分类号： H01S
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配备有具有非常快的调谐镜的线窄化封装，能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长，精度低于0.2μm。

32. 发明申请

WO2003021727A2 LINE SELECTED F2 TWO CHAMBER LASER SYSTEM 审中-公开
标题翻译：线选择F2两室激光系统
公开(公告)号：WO2003021727A2
公开(公告)日：2003-03-13
申请号：PCT/US2002/026394
申请日：2002-08-19
申请人： CYMER, INC, , KNOWLES, David, S. , BROWN, Daniel, J., W. , SANDSTROM, Richard, L. , RYLOV, German, E. , ONKELS, Eckehard, D. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , NESS, Richard, M. , SMITH, Scot, T. , HULBURD, William, G.
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , SANDSTROM, Richard, L. , RYLOV, German, E. , ONKELS, Eckehard, D. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , NESS, Richard, M. , SMITH, Scot, T. , HULBURD, William, G.
IPC分类号： H01S
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F 2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F 2 spectral line.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门设计用作集成电路光刻的光源的F2激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配有一个线选择包，用于选择最强的F2谱线。

33. 发明申请

WO2003012937A1 RING LASER GYROSCOPE HAVING COMBINED ELECTRODE AND GETTER 审中-公开
标题翻译：具有组合电极和电极的环形激光陀螺仪
公开(公告)号：WO2003012937A1
公开(公告)日：2003-02-13
申请号：PCT/US2002/023027
申请日：2002-07-18
申请人： LITTON SYSTEM, INC.
发明人： PATEL, Dhirubai , ASSENDRUP, James , GITELMAN, David , SAMMON, Shane
IPC分类号： H01S3/036
CPC分类号： G01C19/661 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0388 , H01S3/0835
摘要： An electrode and getter structure (37) for a ring laser gyroscope (10) that includes a frame (12) having a cavity (26) therein that contains a gain medium (55) and an electrode bore (40) extending from a surface (42) of the frame (12) to the cavity (26) includes a metalization layer (4') formed on the surface (42) of the frame (12). The metalization layer (44) includes an electrode (52) that is adjacent the electrode bore (40). A getter well (64) is sealed to the metalization layer (44) around the electrode bore (40), and a getter (72) is mounted in the getter well (64) spaced apart from the frame (12). The getter well (64) preferably is a hollow glass cylinder (63) having a closed end (66) and an open end (68) mounted to the metalization layer (44). A spring (46) preferably is retained in the getter well (64) by elastic forces in the spring (46) with the getter (72) being attached to the spring (46) and aligned with the electrode bore (40).
摘要翻译：一种用于环形激光陀螺仪（10）的电极和吸气体结构（37），其包括其中具有腔（26）的框架（12），所述框架包含增益介质（55）和从表面延伸的电极孔（40）框架（12）到空腔（26）的一个金属化层（42）包括形成在框架（12）的表面（42）上的金属化层（4'）。金属化层（44）包括邻近电极孔（40）的电极（52）。吸气井（64）围绕电极孔（40）密封到金属化层（44），并且吸气剂（72）安装在与框架（12）间隔开的吸气井（64）中。吸气井（64）优选是具有封闭端（66）和安装到金属化层（44）的开口端（68）的中空玻璃圆筒（63）。弹簧（46）优选地通过弹簧（46）中的弹性力保持在吸气阱（64）中，吸气剂（72）附接到弹簧（46）并与电极孔（40）对齐。

34. 发明申请

WO2003011595A2 LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS 审中-公开
标题翻译：激光光谱工程用于光刻工艺
公开(公告)号：WO2003011595A2
公开(公告)日：2003-02-13
申请号：PCT/US2002/022190
申请日：2002-07-11
申请人： CYMER, INC. , SPANGLER, Ronald, L. , LIPCON, Jacob, P. , RULE, John, A. , JACQUES, Robert, N. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor, V. , ALGOTS, John, M.
发明人： SPANGLER, Ronald, L. , LIPCON, Jacob, P. , RULE, John, A. , JACQUES, Robert, N. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor, V. , ALGOTS, John, M.
IPC分类号： B41C
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要翻译：一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。其它优选实施例利用三个独立的波长调谐位置产生具有三个单独峰值的光谱。

35. 发明申请

WO2002093703A1 IMPROVED FAN FOR GAS DISCHARGE LASER 审中-公开
标题翻译：改进的风扇排放激光
公开(公告)号：WO2002093703A1
公开(公告)日：2002-11-21
申请号：PCT/US2002/012417
申请日：2002-04-18
申请人： CYMER, INC. , PARTLO, William, N. , RETTIG, Curtis, L.
发明人： PARTLO, William, N. , RETTIG, Curtis, L.
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , F04D29/283 , F04D29/666 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An electric discharge laser apparatus having a laser chamber containing a laser gas and two longitudinal electrodes defining a discharge region for producing electrical discharges, and a tangential fan for circulating the laser gas. The fan has blade members and hub members (12) configured to minimize adverse effects of reflections of electric discharge generated shock waves back to the discharge region simultaneously with a subsequent discharge.
摘要翻译：一种具有包含激光气体的激光室和限定用于产生放电的放电区域的两个纵向电极的放电激光装置和用于循环激光气体的切向风扇。风扇具有叶片构件和轮毂构件（12），其构造成使放电产生的冲击波的反射的不利影响最小化，以随后的放电同时返回到放电区域。

36. 发明申请

WO2002082597A1 INJECTION SEEDED LASER WITH PRECISE TIMING CONTROL 审中-公开
标题翻译：注射式激光与精确时序控制
公开(公告)号：WO2002082597A1
公开(公告)日：2002-10-17
申请号：PCT/US2002/010448
申请日：2002-04-02
申请人： CYMER, INC. , NESS, Richard, M. , SANDSTROM, Richard, L. , PARTLO, William, N. , ERSHOV, Alexander, I.
发明人： NESS, Richard, M. , SANDSTROM, Richard, L. , PARTLO, William, N. , ERSHOV, Alexander, I.
IPC分类号： H01S3/10
CPC分类号： H01S3/2366 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/10092 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2325 , H01S3/2333
摘要： A narrow band laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely time the discharges in the two laser subsystem so that the discharges are properly synchronized. Preferred embodiments include a pulse power system with a pulse transformer unit having two sets of transformer cores. A single upstream pulse compression circuit provides high voltage pulses in parallel to the primary windings of all of the cores in both sets. Separate secondary conductors (one passing through one set of cores and the other passing through the other set of cores) provide very high voltage pulses respectively to separate downstream circuits supplying discharge pulses to the electrodes in each of two separate laser chambers. Preferred embodiments include KrF, ArF and F 2 systems. In these preferred embodiments, line narrowing may be accomplished within the resonant cavity of the seed laser or the output of the seed laser could be line narrowed using a pre-gain filter.
摘要翻译：具有两个激光子系统的窄带激光系统。第一激光子系统被配置为提供非常窄的带状脉冲输出光束，其用于向第二激光子系统注入种子，其中窄带脉冲种子光束被放大以产生窄带脉冲输出光束。提供了一种脉冲电源，其特别配置为精确地对两个激光子系统中的放电进行时间放电，使得放电正确同步。优选实施例包括具有脉冲变压器单元的脉冲功率系统，其具有两组变压器磁芯。单个上游脉冲压缩电路在两组中提供与所有磁芯的初级绕组并联的高电压脉冲。分离的次级导体（一个穿过一组芯，另一组穿过另一组芯）分别提供非常高的电压脉冲，以分离向两个单独的激光室中的每一个中的电极提供放电脉冲的下游电路。优选的实施方案包括KrF，ArF和F2系统。在这些优选实施例中，可以在种子激光器的谐振腔内实现线窄化，或者使用预增益滤波器可以使种子激光器的输出变窄。

37. 发明申请

WO0169731B1 COMPACT, FLEXIBLE, RAPID-PULSED, MOLECULAR GAS LASER 审中-公开
标题翻译：紧凑，灵活，快速脉冲，分子燃气激光
公开(公告)号：WO0169731B1
公开(公告)日：2002-02-07
申请号：PCT/US0106812
申请日：2001-03-01
申请人： HILL ALAN E
发明人： HILL ALAN E
IPC分类号： H01S1/00 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/102 , H01S3/223 , H01S3/22 , H01S3/00
CPC分类号： H01S1/005 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/09707 , H01S3/0971 , H01S3/1024 , H01S3/2232
摘要： A compact molecular gas laser and circuit apparatus for same. A plasma volume and active laser gain region (110) is positioned centrally between two substantially symmetrical flow corridors (210, 210'). The laser gain region is further positioned between two electrodes (cathode (120) and anode (150)). An acoustic chamber (212) comprises at least one cylindrical metal speaker driver housing (200) for mounting at least two loudspeaker flow reciprocators (230, 230'), which comprise planar honeycomb loudspeaker driver diaphragms (240, 240').
摘要翻译：一种紧凑的分子气体激光器及其电路装置。等离子体体积和主动激光增益区域（110）位于两个基本对称的流动走廊（210,210'）之间的中心。激光增益区域进一步定位在两个电极（阴极（120）和阳极（150））之间。声室（212）包括至少一个圆柱形金属扬声器驱动器壳体（200），用于安装至少两个扬声器流动往复运动器（230,230'），其包括平面蜂窝扬声器驱动器隔片（240,240'）。

38. 发明申请

WO01097347A1 GAS DISCHARGE LASER ELECTRODE WITH REDUCED SENSITIVITY TO ADVERSE BOUNDARY LAYER EFFECTS 审中-公开
标题翻译：气体放电激光电极，具有降低敏感性，不利于边界层效应
公开(公告)号：WO01097347A1
公开(公告)日：2001-12-20
申请号：PCT/US2001/013197
申请日：2001-04-24
IPC分类号： G03F7/20 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/0979 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/708 , G03F7/70933 , H01S3/036 , H01S3/0381 , H01S3/0382 , H01S3/0384 , H01S3/0385 , H01S3/223 , H01S3/225 , H01S3/2256
摘要： A long life laser chamber for a halogen containing gas discharge laser. In a preferred embodiment electrode erosion caused by excited fluorine (i.e., atomic fluorine and fluorine ions) is reduced by forcing the excited fluorine away from the discharge footprint of the electrodes. Preferred embodiments include electrodes (83) with a large number of small holes (42) in the discharge footprint through which laser gas flows (86a) to remove the excited fluorine from the footprint region in the time period between electric discharges.
摘要翻译：一种用于含卤素气体放电激光器的长寿命激光室。在优选实施例中，由激发的氟（即原子氟和氟离子）引起的电极腐蚀通过迫使激发的氟远离电极的放电足迹而减小。优选实施例包括在放电足迹中具有大量小孔（42）的电极（83），通过该放电足迹，激光气体流过（86a）以在放电期间从占位区域去除激发的氟。

39. 发明申请

WO01097346A1 DISCHARGE LASER HAVING ELECTRODES WITH SPUTTER CAVITIES AND DISCHARGE PEAKS 审中-公开
标题翻译：具有透射孔和放电峰的电极的放电激光
公开(公告)号：WO01097346A1
公开(公告)日：2001-12-20
申请号：PCT/US2001/013673
申请日：2001-04-27
IPC分类号： B01J19/12 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/708 , H01S3/036 , H01S3/0385
摘要： A gas discharge laser having a laser chamber with two elongated electrode elements, each having a discharge section having an optimum array of discharge peaks and sputter cavities. The sputter cavities provide sputter metal ions to contribute to a plasma between the electrodes and support a glow-type discharge. The peaks provide very high fields which produce a very large number of filament-type discharges. The electrodes erode gradually but since the discharge region is confined to the array of discharge peaks and sputter cavities, the shape of the discharge remains approximately constant for billions of pulses. A pulse power system provides electrical pulses of at least 2J at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges.
摘要翻译：一种气体放电激光器，其具有具有两个细长电极元件的激光室，每个具有放电部分，其具有最佳放电峰阵列和溅射腔。溅射腔提供溅射金属离子以有助于电极之间的等离子体并且支持辉光型放电。这些峰提供非常高的场，其产生非常大量的灯丝型放电。电极逐渐腐蚀，但是由于放电区域被限制在放电峰和溅射腔阵列中，因此数十亿脉冲的放电形状保持近似恒定。脉冲功率系统以至少1KHz的速率提供至少2J的电脉冲。鼓风机以至少5m / s的速度在电极之间循环激光气体，并且提供热交换器以去除由鼓风机和排出物产生的热量。

40. 发明申请

WO01097344A1 FLOW SHAPING ELECTRODE WITH EROSION PAD FOR GAS DISCHARGE LASER 审中-公开
标题翻译：流体形成电极，用于气体放电激光的腐蚀垫
公开(公告)号：WO01097344A1
公开(公告)日：2001-12-20
申请号：PCT/US2001/013198
申请日：2001-04-24
IPC分类号： G03F7/20 , H01S3/036 , H01S3/038 , H01S3/0979 , H01S3/223 , H01S3/225 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/708 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0385 , H01S3/0387 , H01S3/0979 , H01S3/223 , H01S3/225
摘要： An excimer laser with a laser chamber (2) containing a circulating laser gas containing fluorine and a set of long life electrode structures (83A and 84A). At least one of the electrode structures has an erosion pad (83C) and a cross section shape designed to provide in conjunction with other chamber structure a gradual increasing flow cross section (83B) between the discharge region and the circulating tangential fan blade (4). In a preferred embodiment, electrode lifetime is increased by annealing the erosion rod after it is are machined. This annealing relieves the surface stress caused by the machining operation and reduces the exposed metallic grain boundary length per unit area on the surface of the electrodes, which provides substantial reduction in erosion caused by fluorine chemical attack. Annealing after machining also reduces the stress throughout the bulk of the electrode material. In preferred embodiments the anode is a copper-aluminum alloy and the cathode is a copper-zinc alloy.
摘要翻译：具有激光室（2）的准分子激光器，其包含含有氟的循环激光气体和一组长寿命电极结构（83A和84A）。电极结构中的至少一个具有冲蚀垫（83C）和横截面形状，其被设计成与其他腔室结构一起提供在放电区域和循环切向风扇叶片（4）之间逐渐增加的流动横截面（83B）。在优选的实施方案中，通过在侵蚀棒被加工之后对其进行退火来增加电极寿命。该退火减轻了加工操作引起的表面应力，降低了电极表面单位面积暴露的金属晶界长度，大大减少了氟化学侵蚀引起的侵蚀。加工后的退火也可以减少整个电极材料的应力。在优选实施例中，阳极是铜 - 铝合金，阴极是铜 - 锌合金。

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