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1. 发明申请

WO2007146329A2 DRIVE LASER FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的驱动激光器
公开(公告)号：WO2007146329A2
公开(公告)日：2007-12-21
申请号：PCT/US2007013862
申请日：2007-06-11
申请人： CYMER INC , ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , HOFFMAN JERZY R , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , HOFFMAN JERZY R , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： H01S3/00
CPC分类号： H01S3/2316 , H01S3/0057 , H01S3/11 , H01S3/2232 , H01S3/225 , H05G1/54 , H05G2/008
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (E s, 1 ) and a small signal gain (g o , 1 ); and the second amplifier may have a gain medium characterized by a saturation energy (E s, 2 ) and a small signal gain (g o , 2 ), with (g o , 1 ) > (g o , 2 ) and (E S , 2 ) > (E s,
摘要翻译：公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。对于源极，第一放大器可以具有特征在于饱和能量（E S，S 1）和小信号增益（g 1，...，）; 并且第二放大器可以具有特征在于饱和能量（E S，S 2）和小信号增益（g 0，S 2，N 2）的增益介质（g ，＆lt; 2＆gt;）和（E

2. 发明申请

WO2007008470A3 SYSTEMS AND METHODS FOR EUV LIGHT SOURCE METROLOGY 审中-公开
标题翻译：用于EUV光源计量的系统和方法
公开(公告)号：WO2007008470A3
公开(公告)日：2007-11-22
申请号：PCT/US2006025792
申请日：2006-06-29
申请人： CYMER INC , FOMENKOV IGOR V , BOWERING NORBERT R , HOFFMAN JERZY R
发明人： FOMENKOV IGOR V , BOWERING NORBERT R , HOFFMAN JERZY R
IPC分类号： G01J1/42
CPC分类号： G03F7/7085 , B82Y10/00 , G21K2201/061
摘要： Systems and methods for EUV Light Source metrology are disclosed. In a first aspect, a system for measuring an EUV light source power output may include a photoelectron source material disposed along an EUV light pathway to expose the material and generate a quantity of photoelectrons. The system may further include a detector for detecting the photoelectrons and producing an output indicative of EUV power. In another aspect, a system for measuring an EUV light intensity may include a multi-layer mirror, e.g., Mo/Si, disposable along an EUV light pathway to expose the mirror and generate a photocurrent in the mirror. A current monitor may be connected to the mirror to measure the photocurrent and produce an output indicative of EUV power. In yet another aspect, an off-line EUV metrology system may include an instrument for measuring a light characteristic and MoSi 2 /Si multi layer mirror.
摘要翻译：公开了用于EUV光源度量衡的系统和方法。在第一方面，用于测量EUV光源功率输出的系统可以包括沿着EUV光路径设置的光电子源材料，以暴露材料并产生一定量的光电子。该系统还可以包括用于检测光电子并产生指示EUV功率的输出的检测器。另一方面，用于测量EUV光强度的系统可以包括沿着EUV光路径可抛弃的多层反射镜，例如Mo / Si，以暴露反射镜并在反射镜中产生光电流。电流监测器可以连接到反射镜以测量光电流并产生指示EUV功率的输出。在又一方面，离线EUV测量系统可以包括用于测量光特性的仪器和MoSi 2 / Si多层镜。

3. 发明申请

WO2007002748A2 LPP EUV DRIVE LASER INPUT SYSTEM 审中-公开
标题翻译： LPP EUV驱动激光输入系统
公开(公告)号：WO2007002748A2
公开(公告)日：2007-01-04
申请号：PCT/US2006025171
申请日：2006-06-27
申请人： CYMER INC , SIMMONS RODNEY D , VIATELLA JOHN , HOFFMAN JERZY R , WEBB R KYLE , BYKANOV ALEXANDER N , KHODYKIN OLEH
发明人： SIMMONS RODNEY D , VIATELLA JOHN , HOFFMAN JERZY R , WEBB R KYLE , BYKANOV ALEXANDER N , KHODYKIN OLEH
IPC分类号： G21G4/00
CPC分类号： H05G2/001
摘要： A laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.
摘要翻译：公开了一种激光产生的等离子体（“LPP”）极紫外（“EUV”）光源及其操作方法，其可以包括具有室壁的EUV等离子体生产室; 在室壁中的驱动激光入口窗口; 在入口窗口中间的驱动激光入口外壳和腔室内的等离子体起始位置，并且包括入口外壳远端开口; 在远端开口和入口窗之间的至少一个孔板包括至少一个驱动激光通道孔。至少一个孔板可以包括至少两个孔板，其包括限定孔板中间空间的第一孔板和第二孔板。至少一个驱动激光孔通道可以包括至少两个驱动激光孔通道。激光通道孔可以限定足够大的开口，以使驱动激光束通过而没有衰减并且足够小以基本上减少通过入口窗的方向穿过激光通道孔的碎屑。

4. 发明申请

WO2006135546A3 SYSTEMS AND METHODS FOR DEFLECTING PLASMA-GENERATED IONS TO PREVENT THE IONS FROM REACHING AN INTERNAL COMPONENT OF AN EUV LIGHT SOURCE 审中-公开
标题翻译：用于去除等离子体生成的离子的系统和方法，以防止离子进入EUV光源的内部成分
公开(公告)号：WO2006135546A3
公开(公告)日：2007-03-01
申请号：PCT/US2006020224
申请日：2006-05-25
申请人： CYMER INC , RETTIG CURTIS L , HOFFMAN JERZY R , VARGAS ERNESTO L
发明人： RETTIG CURTIS L , HOFFMAN JERZY R , VARGAS ERNESTO L
IPC分类号： H01J49/40 , G02B5/00 , G03F7/20 , G21C11/00 , H01J1/50
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70983 , H05G2/001
摘要： A system for protecting an internal component (30) of an EUV light source (20) from ions (206a, 206b) generated at a plasma formation site (28) and initially directed toward the internal component (30), which includes at least one foil plate (180) interposed between die internal component (30) and die plasma formation site (28) and having a surface (208a, 208b) substantially aligned along a line extending from the plasma formation site (28) to die internal component (30); and a magnetic source (200a, 200b) for generating a magnetic field (B2) to deflect the ions (206a, 206b) into die foil plate surface (208a, 208b).
摘要翻译：一种用于保护EUV光源（20）的内部部件（30）免于在等离子体生成部位（28）处产生并且最初指向内部部件（30）的离子（206a，206b）的系统，其包括至少一个插入在管芯内部部件（30）和管芯等离子体生成部位（28）之间并且具有沿着从等离子体形成部位（28）延伸到管芯内部部件（30）的线基本上对准的表面（208a，208b）的箔片（180））; 以及用于产生磁场（B2）以将离子（206a，206b）偏转成模具箔片表面（208a，208b）的磁源（200a，200b）。

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