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1. 发明申请

WO2018001523A1 DEPOSITION APPARATUS FOR COATING A FLEXIBLE SUBSTRATE AND METHOD OF COATING A FLEXIBLE SUBSTRATE 审中-公开
标题翻译：涂覆柔性基板的沉积设备和涂覆柔性基板的方法
公开(公告)号：WO2018001523A1
公开(公告)日：2018-01-04
申请号：PCT/EP2016/065558
申请日：2016-07-01
申请人： APPLIED MATERIALS, INC. , DEPPISCH, Thomas , HEIN, Stefan , MORRISON, Neil , KUKLA, Reiner , KURTHEN, Christof , SCHLÄFER, Susanne , LORENZ, Stefan , WAGNER, Dirk , METT, Valerius , HACKER, Volker , HERMANNS, Uwe , STICKSEL-WEIS, Björn , WENDENMUTH, Walter , ULRICH, Jürgen
发明人： DEPPISCH, Thomas , HEIN, Stefan , MORRISON, Neil , KUKLA, Reiner , KURTHEN, Christof , SCHLÄFER, Susanne , LORENZ, Stefan , WAGNER, Dirk , METT, Valerius , HACKER, Volker , HERMANNS, Uwe , STICKSEL-WEIS, Björn , WENDENMUTH, Walter , ULRICH, Jürgen
IPC分类号： C23C14/08 , C23C14/10 , C23C14/34 , C23C14/56 , B08B7/00
CPC分类号： C23C14/562 , B08B7/0028 , C23C14/086 , C23C14/10 , C23C14/34 , C23C14/564
摘要： A deposition apparatus (100) for coating a flexible substrate (10) with a stack of layers is described. The deposition apparatus comprises: a first spool chamber (110) configured for housing a storage spool for providing the flexible substrate; a first deposition chamber (120) arranged downstream from the first spool chamber and comprising a first coating drum (122) configured for guiding the flexible substrate past a first plurality of deposition units (121); a second deposition chamber (140) arranged downstream from the first deposition chamber (120) and comprising a second coating drum (142) configured for guiding the flexible substrate past a second plurality of deposition units (141); a second spool chamber arranged downstream from the second deposition chamber (140) and configured for housing a wind-up spool for winding the flexible substrate thereon after deposition; and a roller assembly configured to transport the flexible substrate (10) along a partially convex and partially concave substrate transportation path from the first spool chamber to the second spool chamber. Further, a method of coating a flexible substrate, particularly with the described deposition apparatus, is described.
摘要翻译：描述了用于以柔性基板（10）涂覆层的沉积设备（100）。所述沉积设备包括：第一卷轴室（110），所述第一卷轴室构造成容纳用于提供所述柔性基板的存储卷轴; 第一沉积室（120），所述第一沉积室（120）布置在所述第一卷轴室的下游并且包括第一涂覆鼓（122），所述第一涂覆鼓被构造用于引导所述柔性基板经过第一多个沉积单元（121）布置在所述第一沉积室（120）下游并且包括第二涂布鼓（142）的第二沉积室（140），所述第二涂布鼓被配置用于引导所述柔性基材通过第二多个沉积单元（141）; 第二卷轴室，所述第二卷轴室布置在所述第二沉积室（140）的下游并且构造成用于容纳用于在沉积之后将柔性衬底卷绕在其上的卷绕卷轴; 以及辊子组件，所述辊子组件被构造成沿着部分凸出并且部分凹入的基板运送路径将所述柔性基板（10）从所述第一卷轴室运送至所述第二卷轴室。此外，描述了一种涂覆柔性基底的方法，特别是用所述的沉积设备进行涂覆的方法。

2. 发明申请

WO2018228683A1 DEPOSITION APPARATUS FOR COATING A FLEXIBLE SUBSTRATE AND METHOD OF COATING A FLEXIBLE SUBSTRATE 审中-公开
公开(公告)号：WO2018228683A1
公开(公告)日：2018-12-20
申请号：PCT/EP2017/064545
申请日：2017-06-14
申请人： APPLIED MATERIALS, INC. , DEPPISCH, Thomas , ULRICH, Jürgen , SCHLÄFER, Susanne , HEIN, Stefan , LORENZ, Stefan , WENDELMUTH, Walter , STICKSEL-WEIS, Björn , HACKER, Volker , DIETER, Torsten Bruno , MORRISON, Neil , HERMANNS, Uwe , WAGNER, Dirk , KUKLA, Reiner , KURTHEN, Christof , METT, Valerius
发明人： DEPPISCH, Thomas , ULRICH, Jürgen , SCHLÄFER, Susanne , HEIN, Stefan , LORENZ, Stefan , WENDELMUTH, Walter , STICKSEL-WEIS, Björn , HACKER, Volker , DIETER, Torsten Bruno , MORRISON, Neil , HERMANNS, Uwe , WAGNER, Dirk , KUKLA, Reiner , KURTHEN, Christof , METT, Valerius
IPC分类号： C23C14/56 , C23C14/50 , C23C16/54 , C23C16/458 , C23C16/44 , C23C16/46 , C23C14/54 , B65H23/24
CPC分类号： C23C14/562 , B65H20/02 , B65H2301/51145 , B65H2406/111 , C23C14/505 , C23C14/541 , C23C14/564 , C23C16/4409 , C23C16/458 , C23C16/466 , C23C16/545
摘要： A deposition apparatus (100) for coating a flexible substrate (10) with a stack of layers is described. The deposition apparatus comprises: a first spool chamber (110) housing a storage spool for providing the flexible substrate; a deposition chamber (120) arranged downstream from the first spool chamber and comprising a coating drum (122) for guiding the flexible substrate past a plurality of deposition units (121); a second spool chamber arranged downstream from the deposition chamber (120) and housing a wind-up spool for winding the flexible substrate thereon after deposition; and a roller assembly configured to transport the flexible substrate (10) along a partially convex and partially concave substrate transportation path from the first spool chamber to the second spool chamber. Further, a method of coating a flexible substrate, particularly with the described deposition apparatus, is described.

3. 发明申请

WO2013091694A1 SYSTEM AND METHODS FOR PROCESSING A SUBSTRATE 审中-公开
标题翻译：用于处理基板的系统和方法
公开(公告)号：WO2013091694A1
公开(公告)日：2013-06-27
申请号：PCT/EP2011/073634
申请日：2011-12-21
申请人： APPLIED MATERIALS, INC. , HERMANNS, Uwe , MORRISON, Neil , STOLLEY, Tobias , HACKER, Volker
发明人： HERMANNS, Uwe , MORRISON, Neil , STOLLEY, Tobias , HACKER, Volker
IPC分类号： C23C14/54 , C23C14/56 , C23C16/44 , C23C16/52 , C23C16/54
CPC分类号： C23C16/503 , C23C14/54 , C23C14/562 , C23C14/564 , C23C16/4401 , C23C16/52 , C23C16/545
摘要： According to the present disclosure, a substrate processing apparatus for processing a flexible substrate including a vacuum chamber configured for being evacuated and being configured for having a process gas provided therein, a processing module adapted to process the flexible substrate, wherein the processing module is provided within the vacuum chamber, and a discharging assembly configured to generate a flow of charged particles to discharge the flexible substrate is provided. The discharging assembly is configured to generate an electric field for ionizing a processing gas.
摘要翻译：根据本公开，一种用于处理包括真空室的柔性基板的基板处理装置，所述真空室被构造成被抽真空并且被配置为具有设置在其中的处理气体;处理模块，其适于处理柔性基板，其中提供处理模块并且设置有用于产生带电粒子流以排出柔性基板的排出组件。放电组件被配置为产生用于电离处理气体的电场。

4. 发明申请

WO2011124467A1 A DEVICE FOR SEALING A CHAMBER INLET OR A CHAMBER OUTLET FOR A FLEXIBLE SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR ASSEMBLING SUCH A DEVICE 审中-公开
标题翻译：用于密封腔室入口或用于柔性基板的室出口的设备，基板处理设备和用于组装这样的设备的方法
公开(公告)号：WO2011124467A1
公开(公告)日：2011-10-13
申请号：PCT/EP2011/054363
申请日：2011-03-22
申请人： APPLIED MATERIALS, INC. , WENK, Karl-Heinrich , HACKER, Volker
发明人： WENK, Karl-Heinrich , HACKER, Volker
IPC分类号： C23C14/56 , B29C37/00 , F16K7/10 , H01J37/18
CPC分类号： C23C14/568 , B29C37/0089 , F16K7/10 , H01J2237/166 , Y10T29/49826
摘要： The disclosure relates to a device (100) for sealing a chamber inlet (18) or a chamber outlet for a flexible substrate (16), comprising a body (104) having a sealing surface (108), a substrate opening (106) formed in the body configured to be traversed by the flexible substrate, an elastic tube (116) at least partially facing the sealing surface, wherein the elastic tube has a connecting portion for connecting to a gas supply (136) and being adapted for inflating and deflating during operation. Further, the disclosure relates to a method for assembling a device for sealing a chamber inlet or a chamber outlet for a flexible substrate (16), comprising providing a body (104) having a sealing surface (108), wherein a substrate opening (106) is formed in the body configured to be traversed by the flexible substrate; inserting an elastic tube (116) into the body, such that the elastic tube (116) is facing at least partially the sealing surface (108), the elastic tube having a connecting portion and being adapted for inflating and deflating during operation; and connecting the connecting portion of the elastic tube to a gas supply (136).
摘要翻译：本发明涉及用于密封用于柔性基底（16）的腔室入口（18）或室出口的装置（100），其包括具有密封表面（108）的本体（104），形成的基底开口（106）在构造成被柔性基板穿过的主体中，至少部分地面向密封表面的弹性管（116），其中弹性管具有用于连接到气体供应（136）的连接部分，并适于充气和放气在运行期间。此外，本公开涉及一种组装用于密封柔性基板（16）的室入口或室出口的装置的方法，包括提供具有密封表面（108）的主体（104），其中基板开口（106））形成在构造成被柔性基板穿过的主体中; 将弹性管（116）插入到所述主体中，使得所述弹性管（116）至少部分地面对所述密封表面（108），所述弹性管具有连接部分并且适于在操作期间充气和放气; 以及将所述弹性管的连接部分连接到气体供应源（136）。

5. 发明申请

WO2009080430A9 LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICCATIONS OF ELECTRON SOURCES 审中-公开
公开(公告)号：WO2009080430A9
公开(公告)日：2009-07-02
申请号：PCT/EP2008/066096
申请日：2008-11-24
申请人： APPLIED MATERIALS, INC. , KLEMM, Guenter , HACKER, Volker , LOTZ, Hans-Georg
发明人： KLEMM, Guenter , HACKER, Volker , LOTZ, Hans-Georg
IPC分类号： H01J37/077 , H01J37/305 , C23C14/30
摘要： A method of charging a web or foil is described. The method includes guiding a web or foil having a thickness of 10 µm or larger with at least on roller; providing a linear electron source (100) having a housing (112) acting as an anode, the housing having side walls (312); a slit opening (114) in the housing for trespassing of a linear electron beam, the slit opening defining a length direction of the source; a cathode being arranged within the housing and having a first side (413) facing the slit opening; at least one gas supply (70) for providing a gas into the housing; and a power supply for providing a high voltage between the anode and the cathode; and emitting the linear electron beam, wherein the high voltage is adjusted for providing an electron energy to implant electrons of the electron beam within the web or foil.

6. 发明申请

WO2009080430A1 LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICCATIONS OF ELECTRON SOURCES 审中-公开
标题翻译：线性电子源，使用线性电子源的蒸发器和电子源的应用
公开(公告)号：WO2009080430A1
公开(公告)日：2009-07-02
申请号：PCT/EP2008/066096
申请日：2008-11-24
申请人： APPLIED MATERIALS, INC. , KLEMM, Guenter , HACKER, Volker , LOTZ, Hans-Georg
发明人： KLEMM, Guenter , HACKER, Volker , LOTZ, Hans-Georg
IPC分类号： H01J37/077 , H01J37/305 , C23C14/30
CPC分类号： H01J37/077 , C23C14/22 , C23C14/243 , C23C14/30 , H01J37/3053
摘要： A method of charging a web or foil is described. The method includes guiding a web or foil having a thickness of 10 µm or larger with at least on roller; providing a linear electron source (100) having a housing (112) acting as an anode, the housing having side walls (312); a slit opening (114) in the housing for trespassing of a linear electron beam, the slit opening defining a length direction of the source; a cathode being arranged within the housing and having a first side (413) facing the slit opening; at least one gas supply (70) for providing a gas into the housing; and a power supply for providing a high voltage between the anode and the cathode; and emitting the linear electron beam, wherein the high voltage is adjusted for providing an electron energy to implant electrons of the electron beam within the web or foil.
摘要翻译：描述了对网或箔进行充电的方法。该方法包括至少在辊上引导具有10μm或更大厚度的纤维网或箔; 提供具有用作阳极的壳体（112）的线性电子源（100），所述壳体具有侧壁（312）; 所述壳体中的狭缝开口（114）用于侵入线性电子束，所述狭缝开口限定所述源的长度方向; 阴极布置在壳体内并且具有面向狭缝开口的第一侧面（413）用于将气体提供到所述壳体中的至少一个气体供应装置（70）以及用于在阳极和阴极之间提供高电压的电源; 并发射线性电子束，其中调节高电压以提供电子能量以在电子束或箔内注入电子束的电子。

7. 发明申请

WO2016070940A1 APPARATUS AND METHOD FOR TREATMENT OF FLEXIBLE SUBSTRATES HAVING A LARGE WIDTH USING AN ELECTRON BEAM 审中-公开
标题翻译：用于处理使用电子束的大幅宽度的柔性基板的装置和方法
公开(公告)号：WO2016070940A1
公开(公告)日：2016-05-12
申请号：PCT/EP2014/074087
申请日：2014-11-07
申请人： APPLIED MATERIALS, INC. , KLEMM, Günter , HACKER, Volker , TRASSL, Roland
发明人： KLEMM, Günter , HACKER, Volker , TRASSL, Roland
IPC分类号： H01J3/02 , H01J37/077 , G21K5/10
CPC分类号： H01J3/025 , G21K5/04 , G21K5/10 , H01J37/077
摘要： According to the present disclosure, a charged particle device for treatment of a substrate and method for increasing the extraction efficiency of a charged particle device are provided. The charged particle device includes: a housing providing a first electrode, the housing having a back wall and a front wall; a slit opening in the housing; and a second electrode being arranged within the housing and having a first side facing the slit opening. The second electrode includes one or more beam shaping extension that protrude from the second electrode in a direction towards the front wall of the housing for guiding the charged particle beam through the slit opening.
摘要翻译：根据本公开，提供了一种用于处理基板的带电粒子装置和用于提高带电粒子装置的提取效率的方法。所述带电粒子装置包括：提供第一电极的壳体，所述壳体具有后壁和前壁; 壳体中的狭缝开口; 并且第二电极布置在壳体内并且具有面向狭缝开口的第一侧。第二电极包括一个或多个光束成形延伸部，其沿着朝向壳体的前壁的方向从第二电极突出，用于引导带电粒子束穿过狭缝开口。

8. 发明申请

WO2016070939A1 APPARATUS AND METHOD FOR TREATMENT OF FLEXIBLE SUBSTRATES USING AN ELECTRON BEAM 审中-公开
标题翻译：使用电子束处理柔性基板的装置和方法
公开(公告)号：WO2016070939A1
公开(公告)日：2016-05-12
申请号：PCT/EP2014/074085
申请日：2014-11-07
申请人： APPLIED MATERIALS, INC. , KLEMM, Günter , HACKER, Volker , TRASSL, Roland
发明人： KLEMM, Günter , HACKER, Volker , TRASSL, Roland
IPC分类号： H01J37/077 , H01J37/304 , G21K5/10
CPC分类号： H01J37/077 , G21K5/04 , G21K5/10 , H01J37/304 , H01J2237/30455 , H01J2237/30483
摘要： According to the present disclosure, a charged particle device for treatment of a moveable substrate and a method for treatment of a moving substrate in a processing system are provided. The charged particle device includes a source for forming a beam of charged particles for treatment of the substrate moving along a transport direction and a beam displacement device for moving the beam of charged particles from a first beam trajectory to at least a second beam trajectory along the transport direction.
摘要翻译：根据本公开，提供了一种用于处理可移动基板的带电粒子装置和处理系统中的移动基板的处理方法。带电粒子装置包括用于形成用于处理沿输送方向移动的基底的带电粒子束的源和用于将带电粒子束从第一光束轨迹移动到至少第二光束轨迹的光束位移装置，运输方向。

9. 发明申请

WO2009080411A1 LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICATIONS OF ELECTRON SOURCES 审中-公开
标题翻译：线性电子源，使用线性电子源的蒸发器，以及电子源的应用
公开(公告)号：WO2009080411A1
公开(公告)日：2009-07-02
申请号：PCT/EP2008/065703
申请日：2008-11-17
申请人： APPLIED MATERIALS, INC. , KLEMM, Guenter , HACKER, Volker , LOTZ, Hans-Georg
发明人： KLEMM, Guenter , HACKER, Volker , LOTZ, Hans-Georg
IPC分类号： H01J3/02 , H01J37/077 , H01J37/305 , C23C14/30 , G21K5/04 , B32B37/00 , H01J1/32
CPC分类号： H01J37/077 , H01J3/025 , H01J37/3053
摘要： A linear plasma electron source (100) is provided. The linear plasma electron source includes a housing (112) acting as a first electrode, the housing having side walls (312), a slit opening (114) in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode (110) being arranged within the housing and having a first side (413) facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply (70) for providing a gas into the housing.
摘要翻译：提供线性等离子体电子源（100）。线性等离子体电子源包括用作第一电极的壳体（112），壳体具有侧壁（312），壳体中用于侵入电子束的狭缝开口（114），狭缝开口限定长度方向所述源极，第二电极（110）布置在所述壳体内并且具有面向所述狭缝开口的第一侧面（413），所述第一侧面与所述狭缝开口间隔开第一距离，其中所述电子源的长度在长度方向为第一距离的至少5倍，以及用于将气体提供到壳体中的至少一个气体供应源（70）。

10. 发明申请

WO2009080312A1 LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICATIONS OF ELECTRON SOURCES 审中-公开
标题翻译：线性电子源，使用线性电子源的蒸发器，以及电子源的应用
公开(公告)号：WO2009080312A1
公开(公告)日：2009-07-02
申请号：PCT/EP2008/010923
申请日：2008-12-19
申请人： APPLIED MATERIALS, INC. , KLEMM, Guenter , HACKER, Volker , LOTZ, Hans-Georg
发明人： KLEMM, Guenter , HACKER, Volker , LOTZ, Hans-Georg
IPC分类号： H01J37/077 , H01J37/305 , C23C14/30 , G21K5/00 , H05B7/00
CPC分类号： H01J37/077 , C23C14/243 , C23C14/30 , G21K5/00 , H01J37/3053
摘要： An evaporation apparatus for evaporating a material to be deposited is described. The evaporation apparatus includes at least one evaporation crucible having a body with an area for receiving the material to be deposited at one side; a linear electron source (100) being positioned adjacent to the evaporation crucible for impingement of an electron beam on another side. The linear electron source includes a housing (112) acting as a first electrode, the housing having side walls (312); slit opening (114) in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source; a second electrode being arranged within the housing and having a first side (413) facing the slit opening; and at least one gas supply for providing a gas into the housing, wherein the first electrode is the anode and the second electrode is the cathode.
摘要翻译：描述用于蒸发待沉积材料的蒸发装置。蒸发装置包括至少一个蒸发坩埚，其具有主体，该主体具有用于接收待在一侧沉积的材料的区域; 位于蒸发坩埚附近的线性电子源（100），用于在另一侧上撞击电子束。线性电子源包括用作第一电极的壳体（112），壳体具有侧壁（312）; 所述壳体中的用于侵入电子束的狭缝开口（114），所述狭缝开口限定所述源的长度方向; 第二电极布置在所述壳体内并且具有面向所述狭缝开口的第一侧面（413）以及用于将气体提供到壳体中的至少一个气体供应源，其中第一电极是阳极，第二电极是阴极。

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