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    • 8. 发明申请
    • EVAPORATION UNIT AND VACUUM COATING APPARATUS
    • 蒸发单元和真空涂料设备
    • WO2012072132A1
    • 2012-06-07
    • PCT/EP2010/068661
    • 2010-12-01
    • APPLIED MATERIALS, INC.HEIN, StefanHOFFMANN, Gerd
    • HEIN, StefanHOFFMANN, Gerd
    • C23C14/56
    • C23C14/24C23C14/562
    • Vacuum coating apparatus for coating a web includes a first rotatable coating drum (11) and a second rotatable coating drum (12) disposed parallel to the first drum (11) with a gap (17) formed between the first and the second coating drums (11, 12) for transporting at least one web (15). A first evaporator (21) has at least one evaporation source (21a) for generating a first evaporation beam (31b), wherein the first evaporator (21) is arranged next to the first coating drum (11). A second evaporator (22) has at least one evaporation source (22a) for generating a second evaporation beam (32b), wherein the second evaporator (22) is arranged next to the second coating drum (12). The first and the second evaporators (21, 22) are inclined relative to each other.
    • 用于涂布卷材的真空涂布装置包括:第一可旋转涂布滚筒(11)和平行于第一滚筒(11)设置的第二可旋转涂布滚筒(12),在第一和第二涂布滚筒之间形成间隙(17) 用于运输至少一个网(15)的装置(11,12)。 第一蒸发器(21)具有用于产生第一蒸发束(31b)的至少一个蒸发源(21a),其中第一蒸发器(21)设置在第一涂布滚筒(11)的旁边。 第二蒸发器(22)具有用于产生第二蒸发束(32b)的至少一个蒸发源(22a),其中所述第二蒸发器(22)设置在所述第二涂布滚筒(12)的旁边。 第一和第二蒸发器(21,22)相对于彼此倾斜。
    • 9. 发明申请
    • SEALING ELEMENT
    • 密封元件
    • WO2011138182A1
    • 2011-11-10
    • PCT/EP2011/056440
    • 2011-04-21
    • TYCO ELECTRONICS AMP GMBHHEIN, StefanSZELAG, MartinHERRMANN, Andreas
    • HEIN, StefanSZELAG, MartinHERRMANN, Andreas
    • H01R13/52H02G3/08
    • H05K5/02H01R13/5205H02G3/0658H02G15/013
    • The invention relates to a sealing element (1) for sealing between an electric line (2) and a housing (100). In order to provide a sealing element (1) for a plurality of different line diameters, provision is made according to the invention for the sealing element (1) to have an elastically expandable inner sleeve (5) which has, in an axial direction (X) of the sealing element (1), a passage opening (4) for the line (2) which has at least one inner sealing surface (6a, 6b) extending along its inner periphery (6), an outer sleeve (10) surrounding the inner sleeve (5), which outer sleeve has at least one outer sealing surface (11a, 11b) extending along its outer periphery (11), and comprises at least one compensation section (7a-d) which is designed to be compressible in a radial direction (Y, Z) of the sealing element (1) and has a yieldingness which is greater than the yieldingness of the outer sleeve (10).
    • 本发明涉及一种用于密封电线(2)和壳体(100)之间的密封元件(1)。 为了提供用于多个不同线径的密封元件(1),根据本发明为密封元件(1)提供具有可弹性膨胀的内套筒(5),其沿轴向( (1)的通道开口(4),其具有至少一个沿着其内周(6)延伸的内密封表面(6a,6b),外套筒(10) 围绕所述内套筒(5),所述外套筒具有沿着其外周缘(11)延伸的至少一个外密封表面(11a,11b),并且包括至少一个被设计为可压缩的补偿部分(7a-d) 在密封元件(1)的径向(Y,Z)处,并且具有大于外套筒(10)的屈服度的屈服强度。
    • 10. 发明申请
    • PLASMA DEPOSITION SOURCE AND METHOD FOR DEPOSITING THIN FILMS
    • 等离子体沉积源和沉积薄膜的方法
    • WO2010136464A1
    • 2010-12-02
    • PCT/EP2010/057181
    • 2010-05-25
    • APPLIED MATERIALS, INC.MORRISON, NeilHERZOG, AndreHEIN, StefanSKUK, Peter
    • MORRISON, NeilHERZOG, AndreHEIN, StefanSKUK, Peter
    • H01J37/32
    • H01J37/32C23C14/505H01J37/3277
    • A plasma deposition source for transferring a deposition gas into a plasma phase and for depositing, from the plasma phase, a thin film onto a substrate moving in a substrate transport direction in a vacuum chamber is described. The plasma deposition source includes a multiregion electrode device adapted to be positioned in the vacuum chamber and including at least one RF electrode arranged opposite to the moving substrate, and an RF power generator adapted for supplying RF power to the RF electrode. The RF electrode has at least one gas inlet arranged at one edge of the RF electrode and at least one gas outlet arranged at the opposed edge of the RF electrode. A normalized plasma volume is provided by a plasma volume defined between an electrode surface and an opposite substrate position, divided by an electrode length. The normalized plasma volume is tuned to a depletion length of the deposition gas.
    • 一种等离子体沉积源,用于将沉积气体转移到等离子体相中,并且用于从等离子体相将薄膜沉积到在真空室中沿基板输送方向移动的基板上。 等离子体沉积源包括多电极电极装置,其适于定位在真空室中并且包括与移动衬底相对布置的至少一个RF电极,以及适于向RF电极提供RF功率的RF功率发生器。 RF电极具有布置在RF电极的一个边缘处的至少一个气体入口和布置在RF电极的相对边缘处的至少一个气体出口。 通过在电极表面和相对的衬底位置之间限定的等离子体体积除以电极长度来提供归一化的等离子体体积。 将归一化的等离子体体积调节到沉积气体的耗尽长度。