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1. 发明申请

WO2006047373A8 NOVEL METHODS FOR CLEANING ION IMPLANTER COMPONENTS 审中-公开
标题翻译：用于清洁离子植入物组分的新方法
公开(公告)号：WO2006047373A8
公开(公告)日：2006-08-10
申请号：PCT/US2005038102
申请日：2005-10-21
申请人： ADVANCED TECH MATERIALS , DIMEO FRANK JR , DIETZ JAMES , OLANDER W KARL , KAIM ROBERT , BISHOP STEVEN E , NEUNER JEFFREY W , ARNO JOSE I
发明人： DIMEO FRANK JR , DIETZ JAMES , OLANDER W KARL , KAIM ROBERT , BISHOP STEVEN E , NEUNER JEFFREY W , ARNO JOSE I
IPC分类号： B08B6/00 , B08B9/00
CPC分类号： C23G5/00 , C23C14/564 , H01J37/08 , H01J37/32862 , H01J2237/022 , H01J2237/31701
摘要： A method and apparatus for cleaning residue from components of the vacuum chamber and beamline of an ion implanter used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive halide composition for sufficient time and under sufficient conditions to at least partially remove the residue. The gas-phase reactive halide composition is chosen to react selectively with the residue, while not reacting with the components of the ion source region of the vacuum chamber.
摘要翻译：一种清洁残余物的方法和装置，用于制造微电子器件中使用的离子注入机的真空室和束线组件。为了有效地除去残留物，将组分与气相反应性卤化物组合物接触足够的时间并在足够的条件下至少部分地除去残余物。选择气相反应性卤化物组合物与残留物选择性反应，而不与真空室的离子源区域的组分反应。

2. 发明申请

WO2007127865A3 CLEANING OF SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开
标题翻译：半导体加工系统的清洁
公开(公告)号：WO2007127865A3
公开(公告)日：2008-12-11
申请号：PCT/US2007067542
申请日：2007-04-26
申请人： ADVANCED TECH MATERIALS , DIMEO FRANK JR , DIETZ JAMES , OLANDER W KARL , KAIM ROBERT , BISHOP STEVEN E , NEUNER JEFFREY W , ARNO JOSE I , MARGANSKI PAUL J , SWEENEY JOSEPH D , ELDRIDGE DAVID , YEDAVE SHARAD , BYL OLEG , STAUF GREGORY T
发明人： DIMEO FRANK JR , DIETZ JAMES , OLANDER W KARL , KAIM ROBERT , BISHOP STEVEN E , NEUNER JEFFREY W , ARNO JOSE I , MARGANSKI PAUL J , SWEENEY JOSEPH D , ELDRIDGE DAVID , YEDAVE SHARAD , BYL OLEG , STAUF GREGORY T
IPC分类号： C25F1/00 , C25F3/12
CPC分类号： C23C14/564 , C23C16/4405 , H01J37/32412 , H01J37/32862
摘要： A method and apparatus for cleaning residue from components of semiconductor processing systems used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive material for sufficient time and under sufficient conditions to at least partially remove the residue. When the residue and the material from which the components are constructed are different, the gas-phase reactive material is selectively reactive with the residue and minimally reactive with the materials from which the components of the ion implanter are constructed. When the residue and the material from which the components are constructed is the same, then the gas-phase reactive material may be reactive with both the residue and the component part. Particularly preferred gas-phase reactive materials utilized comprise gaseous compounds such as XeF2, XeF4, XeF6, NF3, IF5, IF7, SF6, C2F6, F2, CF4, KrF2, Cl2, HCl, ClF3, ClO2, N2F4, N2F2, N3F, NFH2, NH2F, HOBr, Br2, C3F8, C4F8, C5F8, CHF3, CH2F2, CH3F, COF2, HF, C2HF5, C2H2F4, C2H3F3, C2H4F2, C2H5F, C3F6, and organochlorides such as COCl2, CCl4, CHCl3, CH2Cl2 and CH3Cl.
摘要翻译：一种清洁残留物的方法和装置，用于制造微电子装置中使用的半导体处理系统的组件。为了有效地除去残留物，将组分与气相反应性材料接触足够的时间和足够的条件以至少部分地除去残余物。当残留物和构成组分的材料不同时，气相反应性材料与残余物选择性反应，并与构成离子注入机的组分的材料具有最低的反应性。当残留物和构成组分的材料相同时，气相反应性材料可以与残留物和组分部分反应。使用的特别优选的气相反应性材料包括气态化合物如XeF 2，XeF 4，XeF 6，NF 3，IF 5，IF 7，SF 6，C 2 F 6，F 2，CF 4，KrF 2，Cl 2，HCl，ClF 3，ClO 2，N 2 F 4，N 2 F 2，N 3 F，，NH2F，HOBr，Br2，C3F8，C4F8，C5F8，CHF3，CH2F2，CH3F，COF2，HF，C2HF5，C2H2F4，C2H3F3，C2H4F2，C2H5F，C3F6和有机氯化物，如COCl2，CCl4，CHCl3，CH2Cl2和CH3Cl。

3. 发明申请

WO2006047410A8 FLUID STORAGE AND DISPENSING SYSTEM INCLUDING DYNAMIC FLUID MONITORING OF FLUID STORAGE AND DISPENSING VESSEL 审中-公开
标题翻译：流体储存和分配系统，包括流体储存和分配容器的动态流体监测
公开(公告)号：WO2006047410A8
公开(公告)日：2006-07-27
申请号：PCT/US2005038173
申请日：2005-10-24
申请人： ADVANCED TECH MATERIALS , DIETZ JAMES , BISHOP STEVEN E , MCMANUS JAMES V , LURCOTT STEVEN M , WODJENSKI MICHAEL J , KAIM ROBERT , DIMEO FRANK JR
发明人： DIETZ JAMES , BISHOP STEVEN E , MCMANUS JAMES V , LURCOTT STEVEN M , WODJENSKI MICHAEL J , KAIM ROBERT , DIMEO FRANK JR
IPC分类号： H01L21/66 , B67D7/06 , B67D99/00
CPC分类号： G01N33/00 , F17C11/00 , G01F15/063 , G01F22/02 , G01F23/0076 , G01M3/32 , G01M3/3236 , G06Q10/087 , G06Q30/04 , G06Q50/04 , H01L21/561 , H01L21/568 , H01L21/6835 , H01L22/10 , H01L23/5389 , H01L24/24 , H01L24/48 , H01L24/82 , H01L25/03 , H01L25/0652 , H01L25/16 , H01L2224/16225 , H01L2224/16227 , H01L2224/24011 , H01L2224/2518 , H01L2224/48091 , H01L2224/48227 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01058 , H01L2924/01076 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/09701 , H01L2924/14 , H01L2924/19042 , H05K1/185 , H05K3/4602 , H05K2203/0165 , H05K2203/085 , H05K2203/1469 , Y02P90/30 , Y10T29/4913 , Y10T29/49133 , Y10T29/49165 , Y10T29/53183 , H01L2224/45099
摘要： A monitoring system (100) for monitoring fluid in a fluid supply vessel (22, 24, 26, 28, 108) during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors (114, 126) for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module (40, 132, 146) operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor (50, 150) and display (52, 150) operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.
摘要翻译：一种用于在操作期间监测流体供应容器（22,24,26,28,108）中的流体的监测系统（100），包括从所述流体供应容器分配流体。监测系统包括（i）用于监测流体供应容器或从其分配的流体的特性的一个或多个传感器（114,126），（ii）可操作地耦合到一个的数据采集模块（40,132,146）或多个传感器以从其接收监测数据并且响应地产生与由所述一个或多个传感器监测的特性相关的输出，以及（iii）处理器（50,150）和显示器（52,150），其与所述数据采集模块并且被布置成处理来自数据采集模块的输出并且响应地输出流体供应容器中的流体的图形表示，计费凭证，使用报告和/或再供应请求。

4. 发明申请

WO2006047373A3 NOVEL METHODS FOR CLEANING ION IMPLANTER COMPONENTS 审中-公开
标题翻译：用于清洁离子植入物组分的新方法
公开(公告)号：WO2006047373A3
公开(公告)日：2009-04-23
申请号：PCT/US2005038102
申请日：2005-10-21
申请人： ADVANCED TECH MATERIALS , DIMEO FRANK JR , DIETZ JAMES , OLANDER W KARL , KAIM ROBERT , BISHOP STEVEN E , NEUNER JEFFREY W , ARNO JOSE I
发明人： DIMEO FRANK JR , DIETZ JAMES , OLANDER W KARL , KAIM ROBERT , BISHOP STEVEN E , NEUNER JEFFREY W , ARNO JOSE I
IPC分类号： B08B7/00 , B08B7/04
CPC分类号： C23G5/00 , C23C14/564 , H01J37/08 , H01J37/32862 , H01J2237/022 , H01J2237/31701
摘要： A method and apparatus for cleaning residue from components of the vacuum chamber and beamline of an ion implanter used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive halide composition for sufficient time and under sufficient conditions to at least partially remove the residue. The gas-phase reactive halide composition is chosen to react selectively with the residue, while not reacting with the components of the ion source region of the vacuum chamber.
摘要翻译：一种清洁残余物的方法和装置，用于制造微电子器件中使用的离子注入机的真空室和束线组件。为了有效地除去残留物，将组分与气相反应性卤化物组合物接触足够的时间并在足够的条件下至少部分地除去残余物。选择气相反应性卤化物组合物与残留物选择性反应，而不与真空室的离子源区域的组分反应。

5. 发明申请

WO2006047410A2 FLUID STORAGE AND DISPENSING SYSTEM INCLUDING DYNAMIC FLUID MONITORING OF FLUID STORAGE AND DISPENSING VESSEL 审中-公开
标题翻译：流体储存和分配系统，包括流体储存和分配容器的动态流体监测
公开(公告)号：WO2006047410A2
公开(公告)日：2006-05-04
申请号：PCT/US2005038173
申请日：2005-10-24
申请人： ADVANCED TECH MATERIALS , DIETZ JAMES , BISHOP STEVEN E , MCMANUS JAMES V , LURCOTT STEVEN M , WODJENSKI MICHAEL J , KAIM ROBERT , DIMEO FRANK JR
发明人： DIETZ JAMES , BISHOP STEVEN E , MCMANUS JAMES V , LURCOTT STEVEN M , WODJENSKI MICHAEL J , KAIM ROBERT , DIMEO FRANK JR
IPC分类号： H01L21/66 , B67D7/06 , B67D99/00
CPC分类号： G01N33/00 , F17C11/00 , G01F15/063 , G01F22/02 , G01F23/0076 , G01M3/32 , G01M3/3236 , G06Q10/087 , G06Q30/04 , G06Q50/04 , H01L21/561 , H01L21/568 , H01L21/6835 , H01L22/10 , H01L23/5389 , H01L24/24 , H01L24/48 , H01L24/82 , H01L25/03 , H01L25/0652 , H01L25/16 , H01L2224/16225 , H01L2224/16227 , H01L2224/24011 , H01L2224/2518 , H01L2224/48091 , H01L2224/48227 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01058 , H01L2924/01076 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/09701 , H01L2924/14 , H01L2924/19042 , H05K1/185 , H05K3/4602 , H05K2203/0165 , H05K2203/085 , H05K2203/1469 , Y02P90/30 , Y10T29/4913 , Y10T29/49133 , Y10T29/49165 , Y10T29/53183 , H01L2224/45099
摘要： A monitoring system (100) for monitoring fluid in a fluid supply vessel (22, 24, 26, 28, 108) during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors (114, 126) for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module (40, 132, 146) operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor (50, 150) and display (52, 150) operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.
摘要翻译：一种监视系统（100），用于在操作期间监视流体供给容器（22,24,26,28,108）中的流体，包括从流体供给容器分配流体。监测系统包括（i）用于监测流体供应容器或从其分配的流体的特性的一个或多个传感器（114,126），（ii）数据采集模块（40,132,146），其可操作地耦合到所述一个或更多传感器以从其接收监测数据并响应地产生与由所述一个或更多个传感器监测的特性相关的输出，以及（iii）处理器（50,150）和显示器（52,150），可操作地与所述数据采集模块并且布置成处理来自数据采集模块的输出并且响应地输出流体供应容器中的流体的图形表示，计费文档，使用报告和/或再供应请求。

6. 发明申请

WO2004039478B1 APPARATUS AND METHOD FOR INHIBITING DECOMPOSITION OF GERMANE 审中-公开
标题翻译：用于抑制德国分解的装置和方法
公开(公告)号：WO2004039478B1
公开(公告)日：2006-03-23
申请号：PCT/US0333836
申请日：2003-10-27
申请人： ADVANCED TECH MATERIALS
发明人： STURM EDWARD , WANG LUPING , DIETZ JAMES
IPC分类号： B01D53/04 , B01D53/02 , B01D59/26
CPC分类号： B01D53/04 , B01D2253/102 , B01D2259/40083 , B01D2259/40086 , B01D2259/40088 , B01D2259/4525 , Y10S95/901
摘要： A germane storage and dispensing system, in which germane gas is sorptively retained on an activated carbon sorbent medium in a vessel containing adsorbed and free germane gas. The activated carbon sorbent medium is deflagration-resistant in relation to the germane gas adsorbed thereon, i.e., under deflagration conditions of 65 °C and 650 torr, under which free germane gas undergoes deflagration, the activated carbon sorbent medium does not sustain deflagration of the adsorbed germane gas or thermally desorb the germane gas so that it undergoes subsequent deflagration. The deflagration-resistance of the activated carbon sorbent medium is promoted by pre-treatment of the sorbent material to remove extraneous sorbables therefrom and by maintaining the fill level of the sorbent medium in the gas storage and dispensing vessel at a substantial value, e.g., of at least 30 %.
摘要翻译：锗烷存储和分配系统，其中将锗烷气体吸附保留在含有吸附和游离的锗烷气体的容器中的活性炭吸附剂介质上。活性炭吸附剂介质相对于其上吸附的锗烷气体，即在65℃和650乇的爆燃条件下，具有爆燃阻力，在此条件下，游离的锗烷气体经历爆燃，活性炭吸附剂介质不会维持爆燃吸附的锗烷气体或热解吸锗烷气体，使其经历随后的爆燃。通过预处理吸附剂材料来促进活性炭吸附剂介质的防爆性，以从其中除去外来的吸附物，并且通过将吸附剂介质在气体储存和分配容器中的填充水平保持在基本值，例如至少30％。

7. 发明申请

WO0105487A9 AUTO-SWITCHING GAS DELIVERY SYSTEM UTILIZING SUB-ATMOSPHERIC PRESSURE GAS SUPPLY VESSELS 审中-公开
标题翻译：自动切换气体输送系统利用亚大气压气体供应船
公开(公告)号：WO0105487A9
公开(公告)日：2002-08-29
申请号：PCT/US0019458
申请日：2000-07-14
申请人： ADVANCED TECH MATERIALS
发明人： DIETZ JAMES
IPC分类号： F17D1/04 , B01D53/04 , B01J4/00 , C23C16/455 , F17C9/00 , F17C13/02 , F17C13/04 , H01L21/205 , B08B9/02 , B08B9/027
CPC分类号： F17C9/00 , B01D53/0454 , F17C13/02 , F17C13/045 , F17C2205/0146 , F17C2223/038 , F17C2227/0135 , F17C2227/044 , F17C2250/032 , F17C2250/034 , F17C2250/043 , F17C2250/0443 , F17C2250/072 , F17C2270/0518 , Y10T137/0419 , Y10T137/4259 , Y10T137/87249
摘要： An auto-switching sub-atmospheric pressure gas delivery system (10), for dispensing gas to a gas-consuming process unit (38), e.g., a semi-conductor manufacturing tool (38).
摘要翻译：一种用于将气体分配到例如半导体制造工具（38）的耗气处理单元（38）的自动切换次大气压气体输送系统（10）。

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