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1. 发明申请

WO2008127599A3 METHOD AND APPARATUS FOR STABILIZING AND TUNING THE BANDWIDTH OF LASER LIGHT 审中-公开
标题翻译：用于稳定和调谐激光束带宽的方法和装置
公开(公告)号：WO2008127599A3
公开(公告)日：2008-12-11
申请号：PCT/US2008004598
申请日：2008-04-09
申请人： CYMER INC A NEVADA CORP , PARTLO WILLIAM N , JACQUES ROBERT N , O'BRIEN KEVIN M , ISHIHARA TOSHIHIKO
发明人： PARTLO WILLIAM N , JACQUES ROBERT N , O'BRIEN KEVIN M , ISHIHARA TOSHIHIKO
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G02B27/646 , H01S3/137 , H01S3/139 , H01S3/225 , H01S2301/02
摘要： According to aspects of an embodiment of the disclosed subject matter, method and apparatus are disclose that ma y comprise adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, without utilizing any beam magnification control, or adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for other than bandwidth control, and adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for bandwidth control based on the error signal.
摘要翻译：根据所公开的主题的实施例的方面，公开了一种方法和装置，其包括基于误差信号调整种子激光器中的气体放电与用于带宽控制的放大器激光器之间的差分定时，或用于控制另一个除了带宽之外的激光操作参数，不利用任何光束放大控制，或者基于误差信号调整种子激光器和放大器激光器中的气体放电之间的差分定时，或用于控制除带宽之外的另一个激光器操作参数同时利用除带宽控制之外的光束放大控制，并且基于误差信号调整种子激光器和放大器激光器中的气体放电之间的差分定时，或用于控制除带宽之外的另一激光器操作参数，同时利用基于误差信号的带宽控制的光束放大控制。

2. 发明申请

WO2004012308A3 CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER 审中-公开
标题翻译：两台气体放电激光器的控制系统
公开(公告)号：WO2004012308A3
公开(公告)日：2004-07-15
申请号：PCT/US0324146
申请日：2003-07-30
申请人： CYMER INC , FALLON JOHN P , RULE JOHN A , JACQUES ROBERT N , LIPCON JACOB P , SANDSTROM RICHARD L , PARTLO WILLIAM N , ERSHOV ALEXANDER I , ISHIHARA TOSHIHIKO , MEISNER JOHN , NESS RICHARD M , MELCHER PAUL C
发明人： FALLON JOHN P , RULE JOHN A , JACQUES ROBERT N , LIPCON JACOB P , SANDSTROM RICHARD L , PARTLO WILLIAM N , ERSHOV ALEXANDER I , ISHIHARA TOSHIHIKO , MEISNER JOHN , NESS RICHARD M , MELCHER PAUL C
IPC分类号： H01S20060101 , H01S3/036 , H01S3/134 , H01S3/22 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2333 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线的控制系统。在优选实施例中，激光器是具有主振荡器（10）的生产线机器，其产生非常窄的带子种子束，其在第二放电室中被放大（12）。特别适用于双室气体放电激光系统的新型控制特征包括（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F2注射控制与新的学习算法。

3. 发明申请

WO2005091879A2 EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源
公开(公告)号：WO2005091879A2
公开(公告)日：2005-10-06
申请号：PCT/US2005005935
申请日：2005-02-24
申请人： CYMER INC , PARTLO WILLIAM N , BOWERING NORBERT R , ERSHOV ALEXANDER I , FOMENKOV IGOR V , OLIVER I ROGER , VIATELLA JOHN , JACQUES ROBERT N
发明人： PARTLO WILLIAM N , BOWERING NORBERT R , ERSHOV ALEXANDER I , FOMENKOV IGOR V , OLIVER I ROGER , VIATELLA JOHN , JACQUES ROBERT N
IPC分类号： G03F7/20 , G21K1/06 , H01J35/20 , H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.
摘要翻译：公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集光学元件具有限定期望的等离子体起始位置的焦点，包括：目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中，所述目标流轨迹来自所述目标流轨迹的成像速度摄像机太慢，不能成像形成被作为目标流轨迹成像的目标流的各个等离子体形成目标; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流轨道检测在大致垂直于目标流轨迹的至少一个轴上的目标流轨迹位置的误差。至少一个目标交叉检测器可以瞄准目标轨道并且检测等离子体形成目标通过目标轨道中的选定点的通过。驱动激光触发机构利用目标交叉检测器的输出来确定驱动激光触发的定时，以便驱动激光输出脉冲在等离子体引发目标处沿着目标轨道在一般最接近的等离子体起始位置处相交接近所需的等离子体引发位点。等离子体起始检测器可以瞄准目标轨道并且检测针对相应目标的等离子体起始位置沿着目标轨迹的位置。中间焦点照明器可以照亮形成在中间焦点处的孔，以对至少一个成像装置中的孔进行成像。所述至少一个成像装置可以是至少两个成像装置，每个成像装置基于对所述中间焦点的图像的图像的分析，提供与所述目标轨道与所述中间焦点的图像的垂直中心线轴线分离相关的误差信号所述至少两个成像装置。目标传送反馈和控制系统可以包括目标传送单元; 目标传送位移控制机构至少在对应于从第一成像装置中的图像的分析导出的第一位移误差信号的轴上移动目标传送机构，并且至少在与由第二位移误差信号对第二成像装置中的图像进行分析。

4. 发明申请

WO2005089130A2 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：高重复率激光器生产等离子体光源
公开(公告)号：WO2005089130A2
公开(公告)日：2005-09-29
申请号：PCT/US2005007056
申请日：2005-03-03
申请人： CYMER INC , AKINS ROBERT P , SANDSTROM RICHARD L , PARTLO WILLIAM N , FOMENKOV IGOR V , STEIGER THOMAS D , ALGOTS MARTIN J , BOWERING NORBERT R , JACQUES ROBERT N , PALENSCHAT FREDERICK A , SONG JUN
发明人： AKINS ROBERT P , SANDSTROM RICHARD L , PARTLO WILLIAM N , FOMENKOV IGOR V , STEIGER THOMAS D , ALGOTS MARTIN J , BOWERING NORBERT R , JACQUES ROBERT N , PALENSCHAT FREDERICK A , SONG JUN
IPC分类号： G01J1/00 , G03F7/20 , H01J65/04 , H05G2/00
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.
摘要翻译：公开了一种EUV光源装置和方法，其可以包括脉冲激光，其以所选择的脉冲重复频率提供激光脉冲，聚焦在期望的目标点火部位; 目标形成系统，以与激光脉冲重复率配合的选定间隔提供离散目标; 目标转向系统在目标地层系统和期望的目标点火站点之间; 以及目标跟踪系统，其提供关于目标形成系统和目标转向系统之间的目标移动的信息，使得目标转向系统能够将目标定向到期望的目标点火点。目标跟踪系统可以提供能够创建激光点火控制信号的信息，并且可以包括液滴检测器，该液滴检测器包括指向与靶的投影传送路径上的点相交的准直光源，具有相应的相对设置的光检测器检测目标通过相应点的通道，或包括与坐标轴对准的多个光敏元件的线性阵列的检测器，来自光源的光与目标的投影传送路径相交，至少一个其可以包括平面截距检测装置。液滴检测器可以包括以不同光频率操作的多个液滴检测器，或者具有视场的摄像机和成像视场的二维像素阵列。该装置和方法可以包括静电等离子体容纳装置，其在点火时在目标点火点处或附近提供等离子体限制场，目标跟踪系统提供能够控制静电等离子体容纳装置的信号。该装置和方法可以包括具有中间壁的容器和具有低压阱的容器，其允许EUV光通过并且保持横跨低压阱的压差。该装置和方法可以包括磁性等离子体限制机构，其在目标点火点附近产生磁场，以将等离子体限制在目标点火位置，该目标点火点可以是脉冲的并且可以使用来自目标跟踪系统的输出进行控制。

5. 发明申请

WO0199246A3 LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER 审中-公开
标题翻译：具有压电驱动器的激光波长控制单元
公开(公告)号：WO0199246A3
公开(公告)日：2002-02-28
申请号：PCT/US0113863
申请日：2001-04-30
申请人： CYMER INC , SPANGLER RONALD L , JACQUES ROBERT N , EVERAGE GEORGE J , ANDERSON STUART L , PALENSCHAT FREDERICK A , FOMENKOV IGOR V , SANDSTROM RICHARD L , PARTLO WILLIAM N , ALGOTS JOHN M , BROWN DANIEL J W
发明人： SPANGLER RONALD L , JACQUES ROBERT N , EVERAGE GEORGE J , ANDERSON STUART L , PALENSCHAT FREDERICK A , FOMENKOV IGOR V , SANDSTROM RICHARD L , PARTLO WILLIAM N , ALGOTS JOHN M , BROWN DANIEL J W
IPC分类号： H01S3/137 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/22 , H01S3/225
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： Fast wavelenght correction equipment for an electric discharge laser includes at least one piezoelectic drive (80) and a fast wavelength measurement system and a fast feedback response time. In a preferred embodiment equipment is provided to control wavelength on a slow, intermediate amd fast time scales, which vary in range from several milliseconds to a few microseconds respectively. Techniques include a combination of a relatively slow stepper motor (82) and a very fast piezoelectric drive (80) for tuning the laser wavelength using a tuning mirror (14).
摘要翻译：用于放电激光器的快速波长校正设备包括至少一个压电驱动器（80）和快速波长测量系统以及快速反馈响应时间。在优选实施例中，提供了设备来控制在缓慢的，中间的快速时间尺度上的波长，其分别在几毫秒至几微秒的范围内变化。技术包括相对较慢的步进电机（82）和非常快的压电驱动器（80）的组合，用于使用调谐镜（14）来调谐激光波长。

6. 发明申请

WO2006039157A3 MULTI-CHAMBERED EXCIMER OR MOLECULAR FLUORINE GAS DISCHARGE LASER FLUORINE INJECTION CONTROL 审中-公开
标题翻译：多层离子注射器或分子荧光体排放激光器氟注射控制
公开(公告)号：WO2006039157A3
公开(公告)日：2008-02-07
申请号：PCT/US2005033754
申请日：2005-09-19
申请人： CYMER INC , BESAUCELE HERVE A , DUNSTAN WAYNE J , ISHIHARA TOSHIHIKO , JACQUES ROBERT N , TRINTCHOUK FEDOR B
发明人： BESAUCELE HERVE A , DUNSTAN WAYNE J , ISHIHARA TOSHIHIKO , JACQUES ROBERT N , TRINTCHOUK FEDOR B
IPC分类号： H01S3/22 , H01S3/036 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/036 , H01S3/225 , H01S3/2316 , H01S3/2366
摘要： A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and the at least one amplifier chamber, and producing an output representative of an estimated halogen gas consumption in the at least one oscillator chamber and of the halogen gas consumption in the at least one amplifier chamber, and a halogen gas injection controller determining the amount of halogen gas injection for the at least one oscillator chamber and the at least one amplifier chamber based upon the estimated fluorine consumption outputs from the fluorine consumption estimator and a cost function comprising a plurality of weighted injection decision determinations.
摘要翻译：一种多室准分子或分子卤素气体放电激光系统，包括至少一个振荡器室和至少一个产生振荡器的放大器室输出在至少一个功率室中放大的激光脉冲，具有氟注入控制系统和方法公开了它们，其可以包括：卤素气体消耗估计器：基于至少一个振荡器之一的至少一个振荡器中的至少一个的至少一个振荡器的至少第一操作参数来估计在至少一个振荡器室中的一个中消耗的卤素气体的量室和所述至少一个放大器室，以及所述至少一个振荡器室和所述至少一个放大器室的第二操作参数之间的差异，以及估计至少在另一个中消耗的卤素气体的量基于所述至少一个的另一个的至少第三操作参数，一个振荡器室和所述至少一个放大器室 e振荡器室和所述至少一个放大器室，并且产生代表所述至少一个振荡器室中的估计的卤素气体消耗的值和在所述至少一个放大器室中的卤素气体消耗的输出，以及卤素气体注入控制器确定基于来自氟消耗估计器的估计的氟消耗量输出和包括多个加权喷射判定确定的成本函数，至少一个振荡室和至少一个放大器室的卤素气体注入量。

7. 发明申请

WO2008105988A2 LASER GAS INJECTION SYSTEM 审中-公开
标题翻译：激光喷射系统
公开(公告)号：WO2008105988A2
公开(公告)日：2008-09-04
申请号：PCT/US2008001348
申请日：2008-02-01
申请人： CYMER INC , DUNSTAN WAYNE J , O'BRIEN KEVIN M , JACQUES ROBERT N , BESAUCELE HERVE A , RIGGS DANIEL J , RATNAM ARAVIND
发明人： DUNSTAN WAYNE J , O'BRIEN KEVIN M , JACQUES ROBERT N , BESAUCELE HERVE A , RIGGS DANIEL J , RATNAM ARAVIND
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , G03F7/70025 , G03F7/70525 , G03F7/70975 , H01S3/0014 , H01S3/1305 , H01S3/1306 , H01S3/134 , H01S3/2251 , H01S3/2256
摘要： A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen contaim'ng lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.
摘要翻译：公开了一种可以包括预测用于光刻工艺的气体放电激光源的气体寿命的方法和装置，包括卤素阻挡激光气体的光源可以包括：利用多个激光操作输入中的至少一个和/或输出参数; 在光刻工艺中利用一组至少一个利用参数来确定相对于相应的输入或输出参数的气体使用模型; 根据模型和相应的输入或输出参数的测量来预测气体寿命的结束。该参数可以包括脉冲利用模式。该方法和装置可以包括对用于光刻工艺的气体放电激光光源执行气体管理，该光源包括含卤素的激光气体，其包括：利用周期性和频繁的部分气体再填充，其包括含有卤素气体和体积的混合物气体通常与在全气体再填充中提供给激光器的预混合比率相同，并且其量小于注射前总气体压力的2％。

8. 发明申请

WO2007097855A2 ACTIVE SPECTRAL CONTROL OF DUV LIGHT SOURCE 审中-公开
标题翻译： DUV光源的主动光谱控制
公开(公告)号：WO2007097855A2
公开(公告)日：2007-08-30
申请号：PCT/US2007001667
申请日：2007-01-22
申请人： CYMER INC , DUNSTAN WAYNE J , JACQUES ROBERT N , RAO RAJASEKHAR M , TRINTCHOUK FEDOR B
发明人： DUNSTAN WAYNE J , JACQUES ROBERT N , RAO RAJASEKHAR M , TRINTCHOUK FEDOR B
IPC分类号： H01S3/13
CPC分类号： H01S3/13 , G03F7/70575 , H01S3/134 , H01S3/136
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output light pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.
摘要翻译：根据所公开主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出光脉冲带宽的带宽测量模块由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。

9. 发明申请

WO2007021406A2 MULTI-CHAMBER GAS DISCHARGE LASER BANDWIDTH CONTROL THROUGH DISCHARGE TIMING 审中-公开
标题翻译：多腔气体放电激光带宽通过放电时间控制
公开(公告)号：WO2007021406A2
公开(公告)日：2007-02-22
申请号：PCT/US2006027015
申请日：2006-07-12
申请人： CYMER INC , JACQUES ROBERT N , PARTLO WILLIAM M , BROWN DANIEL J W
发明人： JACQUES ROBERT N , PARTLO WILLIAM M , BROWN DANIEL J W
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/225 , H01S3/08022 , H01S3/09702 , H01S3/1301 , H01S3/134 , H01S3/2308 , H01S3/2366
摘要： A method and apparatus are disclosed for controlling bandwidth in a multi- portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first' laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.
摘要翻译：公开了一种用于控制多部分激光系统中的带宽的方法和设备，所述系统包括向放大器激光系统部分提供线变窄的种子脉冲的第一线变窄的振荡器激光系统部分，可以包括利用定义差值曲线，第一'激光系统工作参数，除了带宽和定时差以及曲线上定义期望定时差的期望点，其中曲线上的每个唯一工作点对应于相应的带宽值; 确定从曲线上的期望点处的时间差异到曲线上的实际工作点的实际偏移; 确定实际偏移与对应于期望带宽的期望偏移之间的误差; 修改点火差动定时以消除实际偏移与期望偏移之间的误差。

10. 发明申请

WO9951310A3 BASEBALL BAT 审中-公开
标题翻译：棒球棒
公开(公告)号：WO9951310A3
公开(公告)日：2000-01-06
申请号：PCT/US9907247
申请日：1999-04-01
申请人： ACTIVE CONTROL EXPERTS INC , SPANGLER RONALD , GILBERT DAVID , PRESTIA CARL , BIANCHINI EMANUELE , LAZARUS B KENNETH , MOORE JEFFREY W , JACQUES ROBERT N , ALLEN JONATHAN C , RUSSO FARLA M
发明人： SPANGLER RONALD , GILBERT DAVID , PRESTIA CARL , BIANCHINI EMANUELE , LAZARUS B KENNETH , MOORE JEFFREY W , JACQUES ROBERT N , ALLEN JONATHAN C , RUSSO FARLA M
IPC分类号： A63B53/14 , A63B49/08 , A63B53/00 , A63B59/00 , A63C5/00 , A63C5/075
CPC分类号： A63C5/075 , A63B53/00 , A63B60/54 , A63B2208/12
摘要： A baseball bat includes an electroactive assembly attached near the handle and electrically tuned to capture energy from several modes with high efficiency. More generally, a sports implement includes an electroactive element, such as a piezoceramic sheet attached to the implement, and a circuit attached to the electroactive element. The circuit may be a shunt, or may include processing such as amplification and phase control to apply a driving signal which may compensate for strain sensed in the implement, or may simply alter the stiffness to affect performance. In a ski, the electroactive element is located near to the root in a region of high strain to apply damping, and the element captures between about one and five percent of the strain energy of the ski. The region of high strain may be found by modeling mechanics of the sports implement, or may be located by empirically mapping the strain distribution which occurs during use of the implement. In other embodiments, the electroactive elements may remove resonances, adapt performance to different situations, or enhance handling or comfort of the implement. Other embodiments include striking implements intended to hit a ball or object in play, such as mallets, golf clubs and tennis racquets, wherein the strain elements may alter the performance, feel or comfort of the implement. The electroactive elements may be configured in sets to capture energy in different modes, and/or along different directions.
摘要翻译：棒球棒包括附接在手柄附近的电活性组件，并被电调谐以从高效率的几种模式捕获能量。更一般地，运动器具包括电活性元件，例如附接到器具的压电陶瓷片，以及附接到电活性元件的电路。该电路可以是分流器，或者可以包括诸如放大和相位控制的处理以施加可以补偿在工具中感测到的应变的驱动信号，或者可以简单地改变刚度以影响性能。在滑雪板中，电动元件位于高应变区域的根部附近以施加阻尼，并且该元件捕获滑雪板的应变能量的大约百分之一至百分之五。高应变区域可以通过运动器具的建模机制找到，或者可以通过经验地映射在使用过程中发生的应变分布来定位。在其他实施例中，电活性元件可以去除谐振，适应不同情况的性能，或增强器具的处理或舒适度。其他实施例包括旨在击中游戏中的球或物体的击打工具，例如槌，高尔夫球杆和网球拍，其中应变元件可改变工具的性能，感觉或舒适性。电活性元件可以被配置成以不同模式和/或沿不同方向捕获能量。

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