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1. 发明授权

EP2599113B1 LIQUID CHEMICAL DEPOSITION APPARATUS 有权转让
公开(公告)号：EP2599113B1
公开(公告)日：2018-11-14
申请号：EP11815040.8
申请日：2011-07-25
申请人： De Rochemont, L. Pierre
发明人： KOVACS, Alexander, J.
IPC分类号： H01L21/365 , B05D3/02 , B05D3/06 , B05C5/00 , B05C9/14 , C01B19/00 , C23C18/12 , C23C18/14 , C23C16/54
CPC分类号： B32B5/22 , B32B5/00 , B32B7/02 , B32B15/00 , B32B18/00 , C23C18/1204 , C23C18/1212 , C23C18/1216 , C23C18/1291 , C23C18/1295 , C23C18/14 , Y10T428/24942 , Y10T428/249921 , Y10T428/25 , Y10T428/258 , Y10T428/31504 , Y10T428/31678
摘要： A method, apparatus and material produced thereby in an amorphous or crystalline form having multiple elements with a uniform molecular distribution of elements at the molecular level.

2. 发明授权

EP1692324B1 METHOD AND APPARATUS FOR MATERIAL DEPOSITION 有权
公开(公告)号：EP1692324B1
公开(公告)日：2018-10-03
申请号：EP04813286.4
申请日：2004-12-07
申请人： LAM RESEARCH CORPORATION
发明人： DORDI, Yezdi , BOYD, John , THIE, William , MARASCHIN, Bob , REDEKER, Fred, C. , COOK, Joel, M.
IPC分类号： C23C18/16 , C23C18/54
CPC分类号： C23C18/1667 , C23C18/14 , C23C18/1612 , C23C18/1676
摘要： A method and an apparatus are provided for selective heating of a surface of a wafer exposed to an electroless plating solution. Selective heating by a radiant energy source causes a temperature increase at an interface between the wafer surface and the electroless plating solution. This temperature increase causes a plating reaction to occur at the wafer surface. Thus, material is deposited on the wafer surface through an electroless plating reaction that is initiated and controlled by varying the temperature of the wafer surface using an appropriately defined radiant energy source. Additionally, a planar member can be positioned over and proximate to the wafer surface to entrap electroless plating solution between the planar member and the wafer surface. Material deposited through the plating reactions forms a planarizing layer that conforms to a planarity of the planar member.

3. 发明授权

EP2643497B1 VERFAHREN ZUR HERSTELLUNG VON METALLISCHEN STRUKTUREN 有权
公开(公告)号：EP2643497B1
公开(公告)日：2018-09-12
申请号：EP11791506.6
申请日：2011-11-23
申请人： Leibniz-Institut für Neue Materialien gemeinnützige GmbH
发明人： MOH, Karsten , DE OLIVEIRA, Peter William , SCHUMACHER, Sarah , ARZT, Eduard
IPC分类号： C23C18/14
CPC分类号： C23C16/48 , C23C18/14 , H01L2924/0002 , Y10T428/24917 , H01L2924/00

4. 发明公开

EP3231512A4 HIERARCHICAL POROUS MATERIAL AND PREPARATION METHOD THEREFOR 有权
公开(公告)号：EP3231512A4
公开(公告)日：2018-07-18
申请号：EP14894183
申请日：2014-12-19
申请人： DALIAN INST CHEM & PHYSICS CAS
发明人： SUM GONGQUAN , YUAN LIZHI , JIANG LUHUA
IPC分类号： B01J23/66 , B01J23/89 , B01J35/10 , B01J37/34 , C25D11/02
CPC分类号： B01J23/66 , B01J21/04 , B01J23/02 , B01J23/06 , B01J23/14 , B01J23/50 , B01J23/688 , B01J23/72 , B01J23/8906 , B01J23/8913 , B01J23/892 , B01J23/8926 , B01J35/0013 , B01J35/002 , B01J35/006 , B01J35/1061 , B01J35/1066 , B01J35/1071 , B01J35/1076 , B01J35/109 , B01J37/348 , C23C14/34 , C23C18/14 , C25D3/02 , C25D5/00 , C25D9/08 , C25D11/02
摘要： This invention belongs to the field of nanomaterials. Specifically relates to a kind of hierarchical porous material and its preparation method. A kind of hierarchical porous material is disclosed, and said hierarchical porous material is composed of primary pore aggregates, the primary pore aggregates get together and formed the secondary pore aggregates, then the secondary pore aggregates connect to each other formed the hierarchical porous material; there are primary pores on said primary pore aggregates wherein the diameter of primary pore is 5ˆ¼500 nm; there are secondary pores on said secondary pore aggregates wherein the diameter of secondary pore is 1ˆ¼5 µm. Compared with existing technology, said hierarchical porous materials of this invention has apparent advantages of large surface area, high usage of precious metal and so on, which facilitating its mass transfer reaction when used as oxygen reduction reaction catalysts and other special applications. The preparation method of said hierarchical porous materials of this invention is green, simple, easy and low-cost as well as controllable pore size and porosity of hierarchical porous materials during preparation. When said hierarchical porous materials is used as oxygen reduction reaction (ORR) catalysts or photocatalysts, the catalytic activity can be improved significantly.

6. 发明授权

EP1670610B1 LASER PROCESSING FOR HEAT-SENSITIVE MESOSCALE DEPOSITION 失效
公开(公告)号：EP1670610B1
公开(公告)日：2018-05-30
申请号：EP04789155.1
申请日：2004-09-27
申请人： Optomec Design Company
发明人： RENN, Michael, J. , KING, Bruce, H. , ESSIEN, Marcelino , Sheu, Jyh-Chemg
IPC分类号： B05D1/02 , C23C18/02 , B05D3/06 , C08F2/46 , C23C18/14
CPC分类号： C08F2/46 , B05D1/02 , B05D3/06 , C23C18/02 , C23C18/14 , H01L51/0009
摘要： A method of depositing various materials onto heat-sensitive targets. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M DTM) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like. This laser processing may be performed in an ambient environment with laser powers of less than 100 milliwatts.

7. 发明公开

EP3209734A4 COMPOSITION FOR FORMING A PATTERNED METAL FILM ON A SUBSTRATE 审中-公开
公开(公告)号：EP3209734A4
公开(公告)日：2017-11-29
申请号：EP15851864
申请日：2015-10-20
申请人： ORELTECH LTD
发明人： ZAMOSHCHIK NATALIA
IPC分类号： C23C4/12 , C09D11/037 , C09D11/322 , C09D11/52 , C23C4/02 , C23C18/06 , C23C18/08 , C23C18/14 , H05H1/26
CPC分类号： C09D11/52 , B41M3/006 , B41M5/0023 , B41M5/0047 , B41M5/007 , B41M7/00 , B41M7/0081 , C09D11/037 , C09D11/322 , C23C4/02 , C23C4/134 , C23C18/06 , C23C18/08 , C23C18/14 , H05H1/46 , H05H2001/4645 , H05H2245/123
摘要： A composition for forming a patterned thin metal film on a substrate is presented. The composition includes metal cations; and at least one solvent, wherein the patterned thin metal film is adhered to a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma.

8. 发明公开

EP3231512A1 HIERARCHICAL POROUS MATERIAL AND PREPARATION METHOD THEREFOR 有权
标题翻译：层状多孔材料及其制备方法
公开(公告)号：EP3231512A1
公开(公告)日：2017-10-18
申请号：EP14894183.4
申请日：2014-12-19
申请人： Dalian Institute Of Chemical Physics, Chinese Academy Of Sciences
发明人： SUM, Gongquan , YUAN, Lizhi , JIANG, Luhua
IPC分类号： B01J23/66 , B01J23/89 , B01J35/10 , B01J37/34 , C25D11/02
CPC分类号： B01J23/66 , B01J21/04 , B01J23/02 , B01J23/06 , B01J23/14 , B01J23/50 , B01J23/688 , B01J23/72 , B01J23/8906 , B01J23/8913 , B01J23/892 , B01J23/8926 , B01J35/0013 , B01J35/002 , B01J35/006 , B01J35/1061 , B01J35/1066 , B01J35/1071 , B01J35/1076 , B01J35/109 , B01J37/348 , C23C14/34 , C23C18/14 , C25D3/02 , C25D5/00 , C25D9/08 , C25D11/02
摘要： This invention belongs to the field of nanomaterials. Specifically relates to a kind of hierarchical porous material and its preparation method. A kind of hierarchical porous material is disclosed, and said hierarchical porous material is composed of primary pore aggregates, the primary pore aggregates get together and formed the secondary pore aggregates, then the secondary pore aggregates connect to each other formed the hierarchical porous material; there are primary pores on said primary pore aggregates wherein the diameter of primary pore is 5∼500 nm; there are secondary pores on said secondary pore aggregates wherein the diameter of secondary pore is 1∼5 µm. Compared with existing technology, said hierarchical porous materials of this invention has apparent advantages of large surface area, high usage of precious metal and so on, which facilitating its mass transfer reaction when used as oxygen reduction reaction catalysts and other special applications. The preparation method of said hierarchical porous materials of this invention is green, simple, easy and low-cost as well as controllable pore size and porosity of hierarchical porous materials during preparation. When said hierarchical porous materials is used as oxygen reduction reaction (ORR) catalysts or photocatalysts, the catalytic activity can be improved significantly.
摘要翻译：本发明属于纳米材料领域。具体涉及一种层次多孔材料及其制备方法。本发明公开了一种分级多孔材料，所述分级多孔材料由初级孔隙聚集体组成，初级孔隙聚集体聚集形成次级孔隙聚集体，次级孔隙聚集体相互连接形成分级多孔材料; 在所述主要孔隙聚集体上存在主要孔隙，其中主要孔隙的直径为5〜500nm; 所述次生孔隙聚集体上有次生孔隙，其次生孔径为1〜5μm。与现有技术相比，本发明的分级多孔材料具有表面积大，贵金属使用率高等优点，有利于作为氧还原反应催化剂等特殊用途时的传质反应。本发明所述分级多孔材料的制备方法是绿色的，简单，容易且成本低廉，并且制备过程中分层多孔材料的孔径和孔隙率可控。当所述分级多孔材料用作氧还原反应（ORR）催化剂或光催化剂时，催化活性可显着提高。

9. 发明公开

EP3209808A1 A METHOD AND SYSTEM FOR FORMING A PATTERNED METAL FILM ON A SUBSTRATE 审中-公开
标题翻译：一种在衬底上形成图案化金属膜的方法和系统
公开(公告)号：EP3209808A1
公开(公告)日：2017-08-30
申请号：EP15852271.4
申请日：2015-10-20
申请人： Oreltech Ltd.
发明人： ZAMOSHCHIK, Natalia
IPC分类号： C23C4/12 , C23C4/02 , H05H1/26
CPC分类号： C09D11/52 , B41M3/006 , B41M5/0023 , B41M5/0047 , B41M5/007 , B41M7/00 , B41M7/0081 , C09D11/037 , C09D11/322 , C23C4/02 , C23C4/134 , C23C18/06 , C23C18/08 , C23C18/14 , H05H1/46 , H05H2001/4645 , H05H2245/123
摘要： A method and system for forming a thin patterned metal film on a substrate are presented. The method includes applying an ink composition on a pre-treated surface of the substrate, wherein the ink composition includes at least metal cations; and exposing at least the applied ink composition on the substrate to a low-energy plasma, wherein the low-energy plasma is operated according to a first set of exposure parameters.
摘要翻译：介绍了一种用于在衬底上形成图案化金属薄膜的组合物。该组合物包含金属阳离子; 以及至少一种溶剂，其中在将所述至少金属阳离子暴露于低能等离子体时，所述图案化的薄金属膜粘附至所述基板的表面。

10. 发明授权

EP2376434B1 FUNKTIONELLES MATERIAL FÜR GEDRUCKTE ELEKTRONISCHE BAUTEILE 有权
标题翻译： FUNKTIONELLES材料FÜRGEDRUCKTE ELEKTRONISCHE BAUTEILE
公开(公告)号：EP2376434B1
公开(公告)日：2017-05-24
申请号：EP09799248.1
申请日：2009-12-10
申请人： Merck Patent GmbH
发明人： KUEGLER, Ralf , KLYSZCZ, Andreas , RENKER, Sabine , SCHNEIDER, Joerg J. , HOFFMANN, Rudolf
IPC分类号： C07C251/70 , C23C18/12 , H01L21/335 , H05K3/12 , H05K3/14
CPC分类号： H01L29/786 , C07C249/08 , C07F7/2204 , C23C18/1216 , C23C18/1279 , C23C18/1295 , C23C18/14 , H01L21/02175 , H01L21/02178 , H01L21/02181 , H01L21/02189 , H01L21/02192 , H01L21/02288 , H01L21/02348 , H01L21/28008 , H01L21/316 , H01L27/1225 , H01L27/1248 , H01L27/1292 , H01L29/45 , H01L29/4908 , H01L29/78603 , H01L29/7869 , H01L2924/0002 , C07C251/70 , H01L2924/00

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