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1. 发明公开

EP4447088A1 PLASMA GENERATING SYSTEM 审中-实审
公开(公告)号：EP4447088A1
公开(公告)日：2024-10-16
申请号：EP24167544.6
申请日：2024-03-28
申请人： CAPS MEDICAL LTD.
发明人： YANOVITZ, Leonid , UCHITEL, Ilan Oleg , KOGAN, Boris
IPC分类号： H01J37/32 , H05H1/46 , A61B18/04
CPC分类号： H05H1/4645 , A61B18/042 , H01J37/32174 , H05H1/46
摘要： Power circuitry for cold plasma generation; optionally plasma for therapeutic use. Cold plasma generation occurs at the distal end of a catheter-like device which is flexible, narrow (e.g., less than 5 mm in diameter), and longitudinally extended to reach, e.g., 50-100 cm into body cavities. A cable used for power transmission is a part of the power generating circuit, its intrinsic impedance being a major contributor to and constraint on the time constant of an entraining RC circuit whose resonant frequency entrains the frequency of power generation. In some embodiments, inductive transformer coupling to the entraining/transmission line circuit is used to generate voltage gain. In some embodiments, transformer coupling is divided into a plurality of stages. This potentially enables practically achieving high transmission frequencies with higher gain, lowered sensitivity to variability in distal portions of the entraining RC circuit, and/or longer transmission lines compared to a single-stage transformer configuration.

2. 发明公开

EP4432306A1 PLASMA CURTAIN GENERATOR IN ATMOSPHERIC PRESSURE STATE USING HIGH VOLTAGE AND MAGNETIC FORCE AND LOW-VACUUM INCINERATION FACILITY FOR LOW- AND INTERMEDIATE-LEVEL RADIOACTIVE WASTE TREATMENT USING SAME 审中-实审
公开(公告)号：EP4432306A1
公开(公告)日：2024-09-18
申请号：EP22893280.2
申请日：2022-11-11
申请人： Kang, Horim , Kang, Inhan , Kang, Hae
发明人： KANG, Horim , KIM, Hyejung , KANG, Inhan , KANG, Hae
IPC分类号： G21F9/32 , F23G7/00 , F23G5/00 , F23G5/08 , F23G5/44 , F23J15/08 , H05H1/46
CPC分类号： F23G5/00 , F23G5/08 , F23G7/00 , F23G5/44 , F23J15/08 , G21F9/32 , H05H1/46
摘要： According to one embodiment of the present disclosure, there is provided a plasma curtain generator comprising: a cylindrical magnet; a cylindrical copper tube disposed inside the cylindrical magnet; and at least one electrode rod disposed along a central axis of the cylindrical copper tube, wherein a high voltage is applied between the cylindrical copper tube and the electrode rod to continuously generate plasma in an atmospheric pressure state, and the cylindrical magnet provides a magnetic force for maintaining the plasma within a certain space inside the cylindrical copper tube. The plasma curtain generator may be installed in a chimney into which an exhaust gas flows from the incineration to reduce the pollutants contained in the exhaust gas in incineration facilities treating household or industrial waste, or in incineration facilities treating low- and intermediate-level radioactive waste.

3. 发明公开

EP4365446A3 REGELUNGSVORRICHTUNG UND PLASMAENERGETISCHE SCHUTZEINRICHTUNG FÜR EIN IONENTRIEBWERK 审中-实审
公开(公告)号：EP4365446A3
公开(公告)日：2024-07-24
申请号：EP23199258.7
申请日：2023-09-25
申请人： Tesat Spacecom GmbH & Co. KG
发明人： LAMPE, Alexander , ARTMANN, Jochen
IPC分类号： F03H1/00
CPC分类号： H03K5/1536 , G01R19/175 , F03H1/0018 , H03L7/085 , H05H1/46 , H03L5/02
摘要： Es ist eine Regelungsvorrichtung (100) für einen Frequenzgenerator (50) eines Ionentriebwerks (10) beschrieben. Die Regelungsvorrichtung (100) erlaubt die Erfassung von Nulldurchgängen eines Strom- und/oder Spannungsverlaufs nur während bestimmter Zeitspannen und sperrt sie während anderer Zeitspannen. Somit wird ein fehlerhaftes Schaltverhalten der Regelungsvorrichtung ausgehend von fehlerhaft erfassten Nulldurchgängen vermieden. Ein Tiefpass filtert Oberwellen aus den erfassten Strom- und/oder Spannungsverläufen. Ein Verzögerungsglied kompensiert parasitäre Verzögerungen bei der Erfassung der Nulldurchgänge. Daneben sind plasmaenergetische Schutzeinrichtungen beschrieben, die den Effekt eines Leistungsüberschlags von einer Triebwerkseinheit auf eine Leistungsversorgungseinheit eines Ionentriebwerks abmildern.

4. 发明授权

EP1518256B1 DISPOSITIF DE PRODUCTION D'UNE NAPPE DE PLASMA 有权转让
公开(公告)号：EP1518256B1
公开(公告)日：2018-12-19
申请号：EP03756046.3
申请日：2003-06-03
申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE -CNRS- , Boreal Plasmas
发明人： LAGARDE, Thierry, Léon , LACOSTE, Ana , PELLETIER, Jacques , ARNAL, Yves, Alban-Marie
IPC分类号： H01J37/32 , H05H1/46
CPC分类号： H01J37/32211 , H01J37/32192 , H01J37/32678 , H05H1/46

5. 发明授权

EP2317829B1 GAS REFORMING DEVICE AND METHOD OF OPERATION OF THE SAME 有权
公开(公告)号：EP2317829B1
公开(公告)日：2018-12-05
申请号：EP09806675.6
申请日：2009-08-07
申请人： NGK Insulators, Ltd.
发明人： SHIMIZU Naohiro , IMANISHI Yuuichirou , HOTTA Sozaburo
IPC分类号： H05H1/24 , B01J19/08 , H05H1/46
CPC分类号： C01B3/342 , B01J19/088 , B01J2219/0811 , B01J2219/0826 , B01J2219/0839 , B01J2219/0875 , B01J2219/0894 , C01B2203/0861 , H05H1/46 , H05H2245/121
摘要： A gas reforming device that efficiently generates reform gas is provided. The gas reforming device includes: a flow passage forming body which a flow passage through which process gas flows is formed; a cathode provided on a cross section of the flow passage; an anode that is provided apart from the cathode, and includes a bar-like portion; and a pulse power supply that applies a pulse voltage to between the cathode and the first anode. The cathode includes: an opening array body that has at least a surface thereof made of an insulator, and has a planar structure in which openings through which the process gas passes are arrayed; and a grounding electrode provided on a peripheral portion of the flow passage. A tip end of the bar-like portion of the anode is located in an inside of the flow passage of the process gas, and is spaced apart from the opening array body in a direction parallel to a direction where the process gas flows. The grounding electrode is provided at a position of contacting an end portion of an ion sheath layer spread on the surface of the opening array body by the application of the pulse voltage to between the cathode and the anode.

6. 发明公开

EP3391715A1 APPARATUS AND METHOD FOR PLASMA SYNTHESIS OF CARBON NANOTUBES 有权转让
公开(公告)号：EP3391715A1
公开(公告)日：2018-10-24
申请号：EP16815918.4
申请日：2016-12-14
申请人： FGV Cambridge Nanosystems Limited
发明人： PAUKNER, Catharina , KURZEPA, Lukasz , KOZIOL, Krzysztof Kazimierz
IPC分类号： H05H1/46 , H01J37/32
CPC分类号： B01J19/088 , B01J19/126 , B01J19/129 , B01J2219/0869 , B01J2219/0875 , B01J2219/0892 , C01B32/162 , C01B32/164 , H01J37/32192 , H05H1/46 , H05H2001/4622
摘要： Apparatus 12 for plasma synthesis of carbon nanotubes comprises: a plasma nozzle coupled to a reaction tube or chamber 7; and means 5 for supplying a process gas to the plasma nozzle 11, which gas comprises a carbon-containing species. Also provided are means for supplying radio frequency radiation to the process gas within the plasma nozzle in order to cause cracking of the carbon containing species, and also means for providing a catalyst. The plasma nozzle is arranged such that an afterglow of the plasma extends into the reaction tube/chamber. The cracked carbon-containing species pass into the reaction tube/chamber, and recombine within the afterglow so as to form carbon nanotubes in the presence of the catalyst. Preferably, the plasma nozzle is shaped so as to cause, in use, three vortices to be formed in the process gas within the nozzle (see figure 2). The reaction tube/chamber may be cylindrical with curved side walls and an opening 9 for the carbon nanotubes to exit through, and may have means cooling the afterglow.

7. 发明公开

EP3386275A1 FREQUENCY CONTROL FOR A FREQUENCY GENERATOR OF AN ION ENGINE 有权
公开(公告)号：EP3386275A1
公开(公告)日：2018-10-10
申请号：EP18155803.2
申请日：2018-02-08
申请人： Tesat Spacecom GmbH & Co. KG
发明人： JOHN, Frederik , LAMPE, Alexander
IPC分类号： H05H1/46 , F03H1/00 , H03L7/00 , H03J3/04
CPC分类号： F03H1/0006 , B64G1/405 , F03H1/0018 , F03H1/0037 , H03J3/04 , H03L5/02 , H03L7/00 , H03L7/085 , H05H1/46 , H05H1/54 , H05H2001/4682
摘要： A control device (100) for a frequency generator (50) is provided. The control device (100) comprises an acquiring unit (110) and a processing unit (120). The acquiring unit (110) is configured to acquire a voltage course and a current course of a determinable number of periods of the frequency generator (50) and to transmit these to the processing unit (120). The processing unit (120) is configured to determine a temporal offset (Δt1) between a rising edge of the current course and a rising edge of the voltage course for each period of the determinable number of periods, and further to determine if this temporal offset (Δt1) is positive or negative. The processing unit is furthermore configured to determine a difference between the number of periods with positive temporal offset and the number of periods with negative temporal offset within the determinable number of periods, and to generate and adapt a switching signal for a switch-on time of the voltage course if the number of periods with positive temporal offset differs from the number of periods with negative temporal offset.

8. 发明公开

EP3359486A1 COLD PLASMA OZONE GENERATOR 审中-实审
公开(公告)号：EP3359486A1
公开(公告)日：2018-08-15
申请号：EP16853207.5
申请日：2016-10-06
申请人： Aquallence Ltd Israel
发明人： RODAN, Yuval , BADALOV, Meir , VIZEL, Moty
IPC分类号： C01B13/11 , C01B13/10
CPC分类号： C01B13/115 , C01B2201/12 , C01B2201/22 , C01B2201/32 , C01B2201/60 , C01B2201/62 , C01B2201/64 , C01B2201/66 , H05H1/2406 , H05H1/46 , H05H2001/466 , H05H2240/20 , H05H2245/121
摘要： The present invention provides a cold plasma ozone generator, comprising: an inlet gas port; at least one in-electrode, said in-electrode having a plurality of holes substantially at a perimeter of the same; said plurality of perimeter holes are in fluid communication with said inlet gas port, said plurality of perimeter holes configured to allow said dry gas to pass therethrough; at least one out-electrode, said out-electrode having at least one hole at the center of the same, said at least one hole configured to allow gas to pass therethrough; said in-electrode and said out-electrode configured to maintain said high voltage AC therebetween; at least one spacer between said in-electrode and said out-electrode, said spacer configured to maintain a constant-width gap between said in-electrode and said out-electrode; an outlet port.

9. 发明公开

EP3329748A1 CHAMBERS FOR MICROWAVE PLASMA GENERATION 有权
公开(公告)号：EP3329748A1
公开(公告)日：2018-06-06
申请号：EP16832383.0
申请日：2016-07-20
申请人： Agilent Technologies, Inc.
发明人： HAMMER, Mike
IPC分类号： H05H1/30 , H05H1/46 , H05H1/26
CPC分类号： H05H1/30 , G01J3/443 , H01J49/105 , H05H1/46 , H05H2001/4622
摘要： A microwave chamber for plasma generation. The microwave chamber comprises a launch structure at a first end of the microwave chamber to accommodate a microwave source for producing microwave energy and a termination section at a second end of the microwave chamber opposite the first end. The termination section is configured to substantially block propagation of the microwave energy from the second end of the chamber. The microwave chamber further comprises an internal wall structure for guiding the microwave energy received within the microwave chamber at the first end toward the second end and defines a cavity. The internal wall structure comprises an impedance matching section intermediate the first end and the second end, and a capacitive loaded section intermediate the impedance matching section and the second end, wherein the capacitive loaded section comprises at least one ridge extending along a longitudinal axis of the chamber. The microwave chamber defines a first opening extending through a first wall of the capacitive loaded section and a second opening extending through a second wall of the capacitive loaded section. The second wall is opposite the first wall. The first opening and second opening are configured to cooperate with one another to receive a plasma torch in the capacitive loaded section along an axis extending through first opening and second opening and substantially perpendicular to the longitudinal axis of the chamber.

10. 发明公开

EP3307030A4 PLASMA GENERATING DEVICE 有权转让
公开(公告)号：EP3307030A4
公开(公告)日：2018-05-23
申请号：EP15894173
申请日：2015-06-02
申请人： FUJI MACHINE MFG
发明人： NIWA AKIHIRO , JINDO TAKAHIRO
IPC分类号： H05H1/46
CPC分类号： H05H1/46 , H05H2001/4675
摘要： With an atmospheric pressure plasma generating device of the present invention, nozzle block 36 in which fourth gas passages 66 from which plasma gas is emitted are formed, is covered by cover 22, and through-hole 70 is formed in the cover such that the leading end of the fourth gas passage is positioned on the inside. Heated gas is supplied inside the cover. Thus, heated gas is emitted from the through-hole of the cover, and plasma gas is emitted so as to penetrate the heated gas. By the plasma gas being surrounded by the heated gas in this manner, deactivation of the plasma gas is prevented. Also, distance X between the leading end of the fourth gas passage and an opening of the through-hole at an outer wall of the cover is set from 0 to 2 mm in an emission direction of the plasma gas. By this, it is possible to appropriately cover plasma gas with heated gas without obstructing the flow of the plasma gas.

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