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1. 发明公开

EP3395844A1 CURABLE COMPOSITION, ADHESIVE LAYER, TRANSPARENT SURFACE MATERIAL, LAYERED BODY, AND IMAGE DISPLAY DEVICE 审中-公开
公开(公告)号：EP3395844A1
公开(公告)日：2018-10-31
申请号：EP16878545.9
申请日：2016-12-15
申请人： AGC Inc.
发明人： SHIBUYA, Takashi , KAKUTA, Junichi
IPC分类号： C08F290/06 , B32B27/30 , C09J4/02 , C09J7/02 , G06F3/041
CPC分类号： C08F20/36 , B32B7/12 , B32B27/30 , B32B33/00 , B32B37/12 , B32B2307/412 , B32B2457/20 , C08F2/46 , C08F290/06 , C08K5/3475 , C08K5/41 , C08L71/02 , C09J7/20 , C09J171/02 , G06F3/041
摘要： To provide a curable composition to be used to form an adhesive layer having deterioration by light suppressed, an adhesive layer obtained by curing the curable composition, and a transparent surface material, laminate and image display device provided with the adhesive layer. A curable composition characterized by comprising a curable compound, a photopolymerization initiator and a light stabilizer, wherein the curable compound comprises at least one urethane (meth)acrylate (A) having an addition-polymerizable unsaturated group and a molecular weight of 1,000-100,000, and at least one monomer (B) having an addition-polymerizable unsaturated group and a molecular weight of 100-600, and the light stabilizer is a light stabilizer having an addition-polymerizable unsaturated group in the molecule.

2. 发明授权

EP1670610B1 LASER PROCESSING FOR HEAT-SENSITIVE MESOSCALE DEPOSITION 失效
公开(公告)号：EP1670610B1
公开(公告)日：2018-05-30
申请号：EP04789155.1
申请日：2004-09-27
申请人： Optomec Design Company
发明人： RENN, Michael, J. , KING, Bruce, H. , ESSIEN, Marcelino , Sheu, Jyh-Chemg
IPC分类号： B05D1/02 , C23C18/02 , B05D3/06 , C08F2/46 , C23C18/14
CPC分类号： C08F2/46 , B05D1/02 , B05D3/06 , C23C18/02 , C23C18/14 , H01L51/0009
摘要： A method of depositing various materials onto heat-sensitive targets. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M DTM) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like. This laser processing may be performed in an ambient environment with laser powers of less than 100 milliwatts.

3. 发明公开

EP3133145A4 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING CELL CULTURE SUBSTRATE 审中-公开
公开(公告)号：EP3133145A4
公开(公告)日：2018-03-14
申请号：EP15779517
申请日：2015-04-10
申请人： TOKYO OHKA KOGYO CO LTD
发明人： SENZAKI TAKAHIRO
IPC分类号： C12M1/00 , B29C41/12 , C08F2/46 , C08J7/00
CPC分类号： C12M23/20 , B29C35/002 , B29C35/0805 , B29C41/003 , B29C41/12 , B29C41/42 , B29C71/0009 , B29C71/04 , B29C2035/0827 , B29C2071/0045 , B29D7/00 , B29K2033/04 , B29K2067/06 , B29K2071/00 , B29L2007/00 , C08F2/46 , C08J7/00
摘要： Provided are: a photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, that has low cytotoxicity, and that can form a cell culture substrate with which cells can be cultured well; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. In the photosensitive resin composition, which includes a photopolymerizable monomer (A) and a photopolymerization initiator (B), the photopolymerizable monomer (A) used contains a defined amount of a polyfunctional monomer (A1) that is at least trifunctional, and the content of the photopolymerization initiator (B) is within a prescribed range.

4. 发明公开

EP3176613A1 TRANSPARENT LAMINATE 有权
标题翻译：透明薄膜
公开(公告)号：EP3176613A1
公开(公告)日：2017-06-07
申请号：EP15827016.5
申请日：2015-07-09
申请人： Dexerials Corporation
发明人： KAKINUMA, Masayasu , TAKENOUCHI, Masaki , OHTA, Eiji , KAWAMURA, Satoshi , OGAWA, Maki
IPC分类号： G02B1/118 , A61F9/02 , B32B3/30 , B32B27/30 , C08F2/46
CPC分类号： A61F9/029 , A41D13/1184 , A61F9/02 , B32B3/30 , B32B27/30 , C08F2/46 , C08J3/24 , C08J7/047 , C08J2369/00 , C08J2433/06 , G02B1/118 , G02B1/18 , G02B27/0006
摘要： A transparent laminate including: transparent substrate; and structure layer which contains protrusion portions, depression portions, or both on a surface thereof, average distance between the protrusion portions adjacent or the depression portions adjacent being equal to or less than wavelength of visible light; the structure layer including polymerized product of active-energy-ray-curable resin composition including composition of (meth)acrylate-based-polymerizable compound; the composition including at least any of the following (A) and (B), and the following (C) and (D):
(A) ester (meth)acrylate of trihydric alcohol having main and side chain each including alkyl chain;
(B) ester di(meth)acrylate of ethylene-oxide-modified bisphenol A;
(C) polyalkylene glycol di(meth)acrylate; and
(D) ester di(meth)acrylate of dihydric alcohol having main chain including linear alkyl chain;
water contact angle on the surface of the structure layer being 26° or more and 74° or less; and
storage elastic modulus at 180°C of the structure layer being less than 0.5 GPa.
摘要翻译：透明层压体，包括：透明基材; 在其表面上包含突起部分，凹陷部分或两者的结构层，相邻的突出部分或相邻的凹陷部分之间的平均距离等于或小于可见光的波长; 所述结构层包括包含（甲基）丙烯酸酯基聚合性化合物的组合物的活性能量射线固化型树脂组合物的聚合物; 所述组合物包含以下（A）和（B）中的至少任一个，以及（C）和（D）：（A）具有主链和侧链的三元醇的（甲基）丙烯酸酯各自包括烷基链; （B）环氧乙烷改性双酚A的二（甲基）丙烯酸酯; （C）聚亚烷基二醇二（甲基）丙烯酸酯; 和（D）具有主链包括直链烷基链的二元醇的二（甲基）丙烯酸酯; 结构层表面的水接触角为26°以上且74°以下; 并且结构层的180℃下的储能弹性模量小于0.5GPa。

5. 发明公开

EP3133145A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING CELL CULTURE SUBSTRATE 审中-公开
标题翻译： LICHTEMPFINDLICHE HARZZUSAMMENSETZUNG ZUR HERSTELLUNG EINES ZELLKULTURSUBSTRATS
公开(公告)号：EP3133145A1
公开(公告)日：2017-02-22
申请号：EP15779517.0
申请日：2015-04-10
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： SENZAKI, Takahiro
IPC分类号： C12M1/00 , B29C41/12 , C08F2/46 , C08J7/00
CPC分类号： C12M23/20 , B29C35/002 , B29C35/0805 , B29C41/003 , B29C41/12 , B29C41/42 , B29C71/0009 , B29C71/04 , B29C2035/0827 , B29C2071/0045 , B29D7/00 , B29K2033/04 , B29K2067/06 , B29K2071/00 , B29L2007/00 , C08F2/46 , C08J7/00
摘要： Provided are: a photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, that has low cytotoxicity, and that can form a cell culture substrate with which cells can be cultured well; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. In the photosensitive resin composition, which includes a photopolymerizable monomer (A) and a photopolymerization initiator (B), the photopolymerizable monomer (A) used contains a defined amount of a polyfunctional monomer (A1) that is at least trifunctional, and the content of the photopolymerization initiator (B) is within a prescribed range.
摘要翻译：提供：一种细胞培养基材的感光性树脂组合物，其能够低成本地制造细胞培养基材，当在细胞培养基材的表面上提供具有低细胞毒性的表面时可以容易地形成各种形状的图案，可以形成能够良好培养细胞的细胞培养基质; 使用该感光性树脂组合物形成的细胞培养基材; 以及使用该感光性树脂组合物的细胞培养基板的制造方法。在包含光聚合性单体（A）和光聚合引发剂（B）的感光性树脂组合物中，使用的光聚合性单体（A）含有规定量的至少三官能的多官能单体（A1），其含量光聚合引发剂（B）在规定范围内。

6. 发明授权

EP2742071B1 AQUEOUS RADIATION CURABLE COATING COMPOSITIONS 有权转让
标题翻译：水性可辐射固化的涂料组合物
公开(公告)号：EP2742071B1
公开(公告)日：2015-09-09
申请号：EP12737558.2
申请日：2012-07-19
申请人： Allnex Belgium, S.A.
发明人： VANMEULDER, Guido , SALVIATO, Jean-Yves
IPC分类号： C08F2/46 , C09D7/00 , C09D175/16 , C08L75/16 , C08F220/06
CPC分类号： C09D7/005 , C08F2/46 , C08F220/06 , C08F222/1006 , C08G18/672 , C08K3/36 , C08L33/02 , C09D5/02 , C09D7/42 , C09D7/65 , C09D175/16 , C08F220/56
摘要： The present invention relates to an aqueous radiation curable coating composition comprising at least one radiation curable polymer (A) and at least one organic matting polymer (B) providing uniform matt coatings.

7. 发明授权

EP2454017B1 REAKTIV-SYSTEME 有权
标题翻译：反应体系
公开(公告)号：EP2454017B1
公开(公告)日：2015-03-18
申请号：EP10734474.9
申请日：2010-07-06
申请人： Elantas GmbH
发明人： LIENERT, Klaus-Wilhelm , VOEDISCH, Sabine , AL-MASRI, Majdi , BERKEI, Michael , TECKLENBRUG, Janin , SAWITOWSKI, Thomas
IPC分类号： C08F2/54 , C08F2/46 , C08F290/06
CPC分类号： C08F2/54 , C08F2/46 , C08F4/00 , C08F290/061 , C08F212/08

8. 发明授权

EP2581416B1 Photocurable Organopolysiloxane Composition 有权
标题翻译： LichthärtbareOrganopolysiloxanzusammensetzung
公开(公告)号：EP2581416B1
公开(公告)日：2014-06-11
申请号：EP12187669.2
申请日：2012-10-08
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Sakamoto, Takafumi , Araki, Tadashi , Ikeno, Masayuki
IPC分类号： C08L83/04 , C08K5/00 , G03F7/26
CPC分类号： C08F30/08 , B82Y10/00 , B82Y40/00 , C08F2/46 , C08F2/50 , C08K5/0091 , C08L83/04 , C08L83/08 , G03F7/0002 , G03F7/0043 , G03F7/038 , G03F7/0757

9. 发明公开

EP2732460A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN 有权
标题翻译：固化性组合物硬币，筛选方法与模式
公开(公告)号：EP2732460A1
公开(公告)日：2014-05-21
申请号：EP12811906.2
申请日：2012-07-09
申请人： Fujifilm Corporation
发明人： KODAMA, Kunihiko , ENOMOTO, Yuichiro , USUKI, Kazuyuki , OMATSU, Tadashi , KITAGAWA, Hirotaka
IPC分类号： H01L21/027 , B29C59/02 , C08F2/44 , G11B5/84
CPC分类号： C08K5/053 , B29C59/005 , C08F2/46 , C08F2/48 , C08F220/10 , C08F220/22 , C08F222/1006 , C08F230/08 , C08F2220/1833 , C08F2220/185 , C08F2220/1875 , C08F2220/1891 , C08F2220/382 , C08F2222/1013 , C08F2222/102 , C09D4/06 , G11B5/855 , Y10T428/24479 , C09D133/04 , C08L71/02
摘要： Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

10. 发明授权

EP2414623B1 LINING OF WELLBORE TUBING 有权
标题翻译：衬砌 - 洞管子的
公开(公告)号：EP2414623B1
公开(公告)日：2014-05-14
申请号：EP10758116.7
申请日：2010-02-19
申请人： Schlumberger Technology B.V. , Schlumberger Holdings Limited , Services Petroliers Schlumberger (SPS) , Prad Research And Development Limited
发明人： BAILEY, Louise , VIDICK, Benoit , WAY, PAUL , COOK, John
IPC分类号： E21B23/02 , E21B33/127 , C08F2/48
CPC分类号： C08F2/48 , C08F2/46 , C08F222/1006 , E21B7/02 , E21B7/025 , E21B19/14 , E21B19/24 , E21B29/10 , E21B33/038 , E21D20/003

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