会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Thermal isolation of hybrid thermal detectors through an anisotropic etch
    • 通过各向异性蚀刻对混合热探测器进行热隔离
    • US5572059A
    • 1996-11-05
    • US477718
    • 1995-06-07
    • William K. WalkerSteven N. FrankCharles M. HansonRobert J. S. KyleEdward G. MeissnerRobert A. OwenGail D. Shelton
    • William K. WalkerSteven N. FrankCharles M. HansonRobert J. S. KyleEdward G. MeissnerRobert A. OwenGail D. Shelton
    • H01L27/146H01L37/02H01L27/095
    • H01L37/02H01L27/1465
    • A thermal isolation structure (10) is disposed between a focal plane array and an integrated circuit substrate (12). The thermal isolation structure (10) includes a mesa-type formation (16) and a mesa strip conductor (18, 26) extending from the top of the mesa-type formation (16) to an associated contact pad (14) on the integrated circuit substrate (12). After formation of the mesa-type formation (16) and the mesa strip conductor (18, 26), an anisotropic etch using the mesa strip conductor (18, 26) as an etch mask removes excess mesa material to form trimmed mesa-type formation (24) for improved thermal isolation. Bump bonding material (20) may be deposited on mesa strip conductor (18, 26) and can also be used as an etch mask during the anisotropic etch. Thermal isolation structure (100) can include mesa-type formations (102), each with a centrally located via (110) extending vertically to an associated contact pad (104) of integrated circuit substrate (106). A conductor (108) is deposited on top of mesa-type formation (102), along the walls of via (110), and overlaying contact pad (104). An anistropic etch using the conductor (108) as an etch mask removes excess mesa material (118) for improved thermal isolation.
    • 热隔离结构(10)设置在焦平面阵列和集成电路基板(12)之间。 热隔离结构(10)包括从台面型结构(16)的顶部延伸到集成的台面型结构(16)的相关接触垫(14)的台面型结构(16)和台面状导体(18,26) 电路基板(12)。 在形成台面型结构(16)和台面状导体(18,26)之后,使用台面导体(18,26)作为蚀刻掩模的各向异性蚀刻去除多余的台面材料以形成修整的台面形成 (24),用于改善热隔离。 凸起接合材料(20)可以沉积在台面状导体(18,26)上,并且也可以在各向异性蚀刻期间用作蚀刻掩模。 热隔离结构(100)可以包括台面型结构(102),每个都具有垂直延伸到集成电路衬底(106)的相关接触焊盘(104)的中心定位的通孔(110)。 导体(108)沿着通孔(110)的壁和覆盖接触焊盘(104)沉积在台面型结构(102)的顶部上。 使用导体(108)作为蚀刻掩模的无捻蚀刻去除多余的台面材料(118)以改善热隔离。
    • 3. 发明授权
    • Inter-pixel thermal isolation for hybrid thermal detectors
    • 用于混合热探测器的像素间隔热隔离
    • US5424544A
    • 1995-06-13
    • US235835
    • 1994-04-29
    • Gail D. SheltonJames F. BelcherSteven N. FrankCharles M. HansonEdward G. MeissnerRobert A. Owen
    • Gail D. SheltonJames F. BelcherSteven N. FrankCharles M. HansonEdward G. MeissnerRobert A. Owen
    • G01J5/34H01L37/02H04N5/33
    • G01J5/34H01L37/02
    • A thermal detection system (100, 200) includes a focal plane array (102, 202), a thermal isolation structure (104, 204) and an integrated circuit substrate (106, 206). The focal plane array (102, 202) includes thermal sensors (114, 214) formed from a pyroelectric element (116, 216), such as barium strontium titanate (BST). One side of the pyroelectric element (116, 216) is coupled to a contact pad (110, 210) disposed on the integrated circuit substrate (106, 206) through a mesa strip conductor (112, 212) of the thermal isolation structure (104, 204). The other side of the pyroelectric element (116, 216) is coupled to a common electrode (120, 220). In one embodiment, slots (128) are formed in the common electrode (120) intermediate the thermal sensors (114) to improve inter-pixel thermal isolation. In another embodiment, slots (236) are formed in the optical coating (224) to improve inter-pixel thermal isolation. The common electrode (120, 220) may be formed from a thermally insulating material, such as a silicon monoxide and chromium matrix (cermet) or other metal oxide.
    • 热检测系统(100,200)包括焦平面阵列(102,202),热隔离结构(104,204)和集成电路基板(106,206)。 焦平面阵列(102,202)包括由热电元件(116,216)形成的热传感器(114,214),例如钛酸锶钡(BST)。 热电元件(116,216)的一侧通过热隔离结构(104,210)的台面导体(112,212)耦合到设置在集成电路基板(106,206)上的接触焊盘(110,210) ,204)。 热电元件(116,216)的另一侧耦合到公共电极(120,220)。 在一个实施例中,槽(128)形成在热传感器(114)中间的公共电极(120)中,以改进像素间热隔离。 在另一个实施例中,槽(236)形成在光学涂层(224)中以改进像素间热隔离。 公共电极(120,220)可以由诸如一氧化硅和铬基体(金属陶瓷)或其它金属氧化物的绝热材料形成。
    • 4. 发明授权
    • Thermal detector and method
    • 热探测器和方法
    • US5708269A
    • 1998-01-13
    • US693770
    • 1996-08-07
    • Edward G. MeissnerCharles M. Hanson
    • Edward G. MeissnerCharles M. Hanson
    • G01J5/22G01J5/34H01L37/02H04N5/33H01L31/09
    • H01L37/02G01J5/22G01J5/34H04N5/33
    • A thermal imaging system (10) for providing an image representative of an amount of thermal radiation incident to the system is provided. The system (10) includes a thermal detector (28 or 30) made from a layer of temperature sensitive material forming a first element of a signal-producing circuit (54). The first element (28 or 30) has either a resistance or capacitance value depending on its temperature. The system (10) also includes an integrated circuit substrate (32) having a second element (56 or 58) of the signal-producing circuit (54) complementary and electrically coupled to the first element (28 or 30). The signal-producing circuit (54) may produce an output signal having a amplitude. The amplitude of the output signal is monitored as representing an absolute temperature of the detector (28 or 30) so as to determine the amount of thermal energy incident to the system (10).
    • 提供一种用于提供表示入射到系统的热辐射量的图像的热成像系统(10)。 系统(10)包括由形成信号产生电路(54)的第一元件的感温材料层制成的热检测器(28或30)。 第一个元件(28或30)的电阻或电容值取决于其温度。 系统(10)还包括集成电路基板(32),其具有互补且电耦合到第一元件(28或30)的信号产生电路(54)的第二元件(56或58)。 信号产生电路(54)可以产生具有振幅的输出信号。 监测输出信号的振幅,表示检测器(28或30)的绝对温度,以便确定入射到系统(10)的热能的量。
    • 5. 发明授权
    • Thermal isolation of hybrid thermal detectors through an anisotropic etch
    • 通过各向异性蚀刻对混合热探测器进行热隔离
    • US5478242A
    • 1995-12-26
    • US236778
    • 1994-04-29
    • William K. WalkerSteven N. FrankCharles M. HansonRobert J. S. KyleEdward G. MeissnerRobert A. OwenGail D. Shelton
    • William K. WalkerSteven N. FrankCharles M. HansonRobert J. S. KyleEdward G. MeissnerRobert A. OwenGail D. Shelton
    • H01L27/146H01L37/02H01L31/18
    • H01L37/02H01L27/1465
    • A thermal isolation structure (10) is disposed between a focal plane array and an integrated circuit substrate (12). The thermal isolation structure (10) includes a mesa-type formation (16) and a mesa strip conductor (18, 26) extending from the top of the mesa-type formation (16) to an associated contact pad (14) on the integrated circuit substrate (12). After formation of the mesa-type formation (16) and the mesa strip conductor (18, 26), an anisotropic etch using the mesa strip conductor (18, 26) as an etch mask removes excess mesa material to form trimmed mesa-type formation (24) for improved thermal isolation. Bump bonding material (20) may be deposited on mesa strip conductor (18, 26) and can also be used as an etch mask during the anisotropic etch. Thermal isolation structure (100) can include mesa-type formations (102), each with a centrally located via (110) extending vertically to an associated contact pad (104) of integrated circuit substrate (106). A conductor (108) is deposited on top of mesa-type formation (102), along the walls of via (110), and overlying contact pad (104). An anisotropic etch using the conductor (108) as an etch mask removes excess mesa material (118) for improved thermal isolation.
    • 热隔离结构(10)设置在焦平面阵列和集成电路基板(12)之间。 热隔离结构(10)包括从台面型结构(16)的顶部延伸到集成的台面型结构(16)的相关接触垫(14)的台面型结构(16)和台面状导体(18,26) 电路基板(12)。 在形成台面型结构(16)和台面状导体(18,26)之后,使用台面导体(18,26)作为蚀刻掩模的各向异性蚀刻去除多余的台面材料以形成修整的台面形成 (24),用于改善热隔离。 凸起接合材料(20)可以沉积在台面状导体(18,26)上,并且也可以在各向异性蚀刻期间用作蚀刻掩模。 热隔离结构(100)可以包括台面型结构(102),每个都具有垂直延伸到集成电路衬底(106)的相关接触焊盘(104)的中心定位的通孔(110)。 导体(108)沿着通孔(110)的壁和覆盖接触垫(104)沉积在台面型结构(102)的顶部上。 使用导体(108)作为蚀刻掩模的各向异性蚀刻去除多余的台面材料(118)以改善热隔离。
    • 8. 发明授权
    • Thermal isolation of monolithic thermal detector
    • 单片热探测器的隔热
    • US6087661A
    • 2000-07-11
    • US959943
    • 1997-10-29
    • Robert A. OwenCharles M. HansonSteven N. FrankHoward R. BeratanScott R. Summerfelt
    • Robert A. OwenCharles M. HansonSteven N. FrankHoward R. BeratanScott R. Summerfelt
    • G01J5/10G01J5/20G01J5/22
    • G01J5/10G01J5/20
    • A thermal sensor (36, 84, 114) comprising a thermal assembly (44, 88, 118) and a signal flowpath (46, 90, 120). The thermal assembly (44, 88, 118) may comprise a thermally sensitive element (50) and a pair of electrodes (52, 54). The thermally sensitive element (50) may generate a signal representative of an amount of thermal radiation incident to the thermally sensitive element (50). The electrodes (52, 54) may collect the signal generated by the thermally sensitive element (50). The signal flowpath (46, 90, 120) may transmit the signal collected by the electrodes (52, 54) to the substrate (34, 82, 112). The signal flowpath (46, 90, 120) may comprise a pair of arms (56, 58, 92, 122) each extending from an electrode (52, 54) and be connected to the substrate (34, 82, 112). The arms (56, 58, 92, 122) may support the thermal assembly (44, 88, 118) in spaced relation with the substrate (34, 82, 112). The arms (56, 58, 92, 122) may be formed of a thermally insulating material.
    • 包括热组件(44,88,118)和信号流路(46,90,120)的热传感器(36,84,114)。 热组件(44,88,118)可以包括热敏元件(50)和一对电极(52,54)。 热敏元件(50)可以产生表示入射到热敏元件(50)的热辐射量的信号。 电极(52,54)可以收集由热敏元件(50)产生的信号。 信号流路(46,90,120)可以将由电极(52,54)收集的信号传送到基板(34,82,112)。 信号流路(46,90,120)可以包括一对臂(56,58,92,122),每对臂从电极(52,54)延伸并连接到衬底(34,82,112)。 臂(56,58,92,122)可以以与衬底(34,82,112)间隔开的关系支撑热组件(44,48,118)。 臂(56,58,92,122)可以由隔热材料形成。
    • 10. 发明授权
    • Thermal imaging system with integrated thermal chopper
    • 具有集成热切割机的热成像系统
    • US5486698A
    • 1996-01-23
    • US229497
    • 1994-04-19
    • Charles M. HansonDana DudleyJames E. Robinson
    • Charles M. HansonDana DudleyJames E. Robinson
    • G01J5/10H04N5/33
    • G01J5/02G01J5/0245G01J5/10H04N5/33
    • A thermal imaging system (10) contains a focal plane array (14) including a plurality of thermal sensors (50) mounted on a substrate (52). The focal plane array (14) generates both a reference signal which represents the temperature of the substrate (52) and a biased signal corresponding to the total radiance emitted by a scene (11). Electronics (16) process the reference signal and the biased signal to obtain an unbiased signal representing radiance differences emitted by objects in the scene (11). A thermoelectric cooler/heater (38) may be provided to optimally adjust the temperature of the substrate (52) to improve overall image quality. Each thermal sensor (50) contains an electrode (66 and 68) that electrically couples the thermal sensor (50) to the substrate (52) and also allows the thermal sensor (50) to deflect, contact, and thermally shunt with the substrate (52).
    • 热成像系统(10)包含焦平面阵列(14),其包括安装在基底(52)上的多个热传感器(50)。 焦平面阵列(14)产生表示衬底(52)的温度的参考信号和对应于由场景(11)发射的总辐射度的偏置信号。 电子设备(16)处理参考信号和偏置信号以获得表示场景(11)中物体发射的辐射差的无偏信号。 可以提供热电冷却器/加热器(38)以最佳地调节基板(52)的温度以提高整体图像质量。 每个热传感器(50)包含一个将热传感器(50)电耦合到衬底(52)的电极(66和68),并且还允许热传感器(50)偏转,接触并与衬底热分流 52)。