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1. 发明申请

WO2016187579A1 MULTI-OSCILLATOR, CONTINUOUS CODY-LORENTZ MODEL OF OPTICAL DISPERSION 审中-公开
标题翻译：多重振荡器，光学分散的连续编码LORENTZ模型
公开(公告)号：WO2016187579A1
公开(公告)日：2016-11-24
申请号：PCT/US2016/033613
申请日：2016-05-20
申请人： KLA-TENCOR CORPORATION
发明人： MALKOVA, Natalia , POSLAVSKY, Leonid
IPC分类号： G01N21/21 , H01L21/66 , G01N21/95 , G01N21/84
CPC分类号： G01R31/308 , G01N21/211 , G01N21/8422 , G01N21/9501 , G01N2021/213 , G01N2201/12 , G01R31/44 , H01L22/12 , H01L22/20
摘要： Methods and systems for monitoring band structure characteristics and predicting electrical characteristics of a sample early in a semiconductor manufacturing process flow are presented herein. High throughput spectrometers generate spectral response data from semiconductor wafers. In one example, the measured optical dispersion is characterized by a Gaussian oscillator, continuous Cody-Lorentz model. The measurement results are used to monitor band structure characteristics, including band gap and defects such as charge trapping centers, exciton states, and phonon modes in high-K dielectric layers and embedded nanostructures. The Gaussian oscillator, continuous Cody-Lorentz model can be generalized to include any number of defect levels. In addition, the shapes of absorption defect peaks may be represented by Lorentz functions, Gaussian functions, or both. These models quickly and accurately represent experimental results in a physically meaningful manner. The model parameter values can be subsequently used to gain insight and control over a manufacturing process.
摘要翻译：本文介绍了在半导体制造工艺流程中早期监测样品结构特征和预测样品电特性的方法和系统。高通量光谱仪从半导体晶圆产生光谱响应数据。在一个示例中，测量的光学色散的特征在于高斯振荡器，连续的Cody-Lorentz模型。测量结果用于监测高K电介质层和嵌入式纳米结构中的带结构特征，包括带隙和缺陷，例如电荷俘获中心，激子态和声子模式。高斯振荡器，连续Cody-Lorentz模型可以推广到包括任何数量的缺陷水平。此外，吸收缺陷峰的形状可以由洛伦兹函数，高斯函数或两者表示。这些模型以物理上有意义的方式快速准确地表示实验结果。模型参数值可以随后用于获得对制造过程的洞察和控制。

2. 发明申请

WO2015027088A1 MULTI-MODEL METROLOGY 审中-公开
标题翻译：多模式计量学
公开(公告)号：WO2015027088A1
公开(公告)日：2015-02-26
申请号：PCT/US2014/052142
申请日：2014-08-21
申请人： KLA-TENCOR CORPORATION
发明人： KIM, In-Kyo , LI, Xin , POSLAVSKY, Leonid , LEE, Lie-Quan Rich , CAO, Meng , YOO, Sungchul , PARK, Sangbong , SHCHEGROV, Andrei V.
IPC分类号： H01L21/66
CPC分类号： H01L22/20 , G03F7/70616 , G03F7/70625 , G06F17/5068 , H01L21/67288 , H01L22/12
摘要： Disclosed are apparatus and methods for characterizing a plurality of structures of interest on a semiconductor wafer. A plurality of models having varying combinations of floating and fixed critical parameters and corresponding simulated spectra is generated. Each model is generated to determine one or more critical parameters for unknown structures based on spectra collected from such unknown structures. It is determined which one of the models best correlates with each critical parameter based on reference data that includes a plurality of known values for each of a plurality of critical parameters and corresponding known spectra. For spectra obtained from an unknown structure using a metrology tool, different ones of the models are selected and used to determine different ones of the critical parameters of the unknown structure based on determining which one of the models best correlates with each critical parameter based on the reference data.
摘要翻译：公开了用于在半导体晶片上表征感兴趣的多个结构的装置和方法。产生具有浮动和固定关键参数和对应的模拟光谱的变化组合的多个模型。生成每个模型以基于从这样的未知结构收集的光谱来确定未知结构的一个或多个关键参数。基于包括多个关键参数和相应的已知光谱中的每一个的多个已知值的参考数据，确定哪一个模型与每个关键参数最佳相关。对于使用计量工具从未知结构获得的光谱，选择不同的模型并且用于基于确定哪一个模型与每个关键参数最相关的来确定未知结构的关键参数的不同的参数参考数据。

3. 发明申请

WO2014197450A1 AUTOMATIC DETERMINATION OF FOURIER HARMONIC ORDER FOR COMPUTATION OF SPECTRAL INFORMATION FOR DIFFRACTION STRUCTURES 审中-公开
标题翻译：用于计算衍射结构的光谱信息的FOURIER HARMONIC ORDER的自动确定
公开(公告)号：WO2014197450A1
公开(公告)日：2014-12-11
申请号：PCT/US2014/040644
申请日：2014-06-03
申请人： TOKYO ELECTRON LIMITED , KLA-TENCOR CORPORATION
发明人： BACKUES, Mark , AOYAGI, Paul , POSLAVSKY, Leonid
IPC分类号： G01N21/956 , G01B11/30 , G01B11/16 , G01N21/25 , G06F17/00
CPC分类号： G01N21/4788 , G01B11/30 , G01B2210/56 , G01M11/025 , G01N21/211 , G01N21/956 , G01N2021/213 , G01N2021/214 , G03F7/70625 , G06F11/30 , G06F17/40 , G06F19/00 , H05K13/08
摘要： Automatic determination of Fourier harmonic order for computation of spectral information for diffraction structures described. An embodiment of a method includes automatically determining a Fourier harmonic order for computation of spectral information for periodic structures, wherein the determination of the Fourier harmonic order is based at least in part on the pitches in each of multiple directions of the periodic structures, material properties of the periodic structures, and characteristics of the periodic structures in which the materials are contained; and computing the spectral information for the periodic structures based at least in part on the determined Fourier harmonic order.
摘要翻译：自动确定用于计算衍射结构的光谱信息的傅里叶谐波次序。一种方法的实施例包括自动确定用于计算周期性结构的光谱信息的傅里叶谐波次序，其中，傅里叶谐波次序的确定至少部分地基于周期性结构的多个方向中的每一个的间距，材料特性的周期结构，以及包含材料的周期性结构的特征; 以及至少部分地基于所确定的傅里叶谐波顺序来计算所述周期性结构的频谱信息。

4. 发明申请

WO2015175900A1 LIBRARY EXPANSION SYSTEM, METHOD, AND COMPUTER PROGRAM PRODUCT FOR METROLOGY 审中-公开
标题翻译：图书馆扩展系统，方法和计算机程序产品
公开(公告)号：WO2015175900A1
公开(公告)日：2015-11-19
申请号：PCT/US2015/031015
申请日：2015-05-15
申请人： KLA-TENCOR CORPORATION
发明人： POSLAVSKY, Leonid , LEE, Lie-Quan Rich
IPC分类号： G06T15/00
CPC分类号： G01B11/02 , G01B11/00 , G01B21/04 , G01N21/211 , G01N21/9501 , G01N21/95607 , G01N2021/213 , G01N2021/95615 , G03F7/70625
摘要： A library expansion system, method, and computer program product for metrology are provided. In use, processing within a first multi-dimensional library is performed by a metrology system. During the processing within the first multi-dimensional library, a second multi-dimensional library is identified. The processing is then transitioned to the second multi-dimensional library. Further, processing within the second multi-dimensional library is performed by the metrology system.
摘要翻译：提供了图书馆扩展系统，方法和计算机程序产品。在使用中，第一多维库中的处理由计量系统执行。在第一多维库中的处理期间，识别第二个多维库。然后处理过渡到第二个多维库。此外，第二多维库中的处理由计量系统执行。

5. 发明申请

WO2013090816A1 TECHNIQUES FOR OPTIMIZED SCATTEROMETRY 审中-公开
标题翻译：优化分析的技术
公开(公告)号：WO2013090816A1
公开(公告)日：2013-06-20
申请号：PCT/US2012/069910
申请日：2012-12-14
申请人： TOKYO ELECTRON LIMITED , KLA-TENCOR CORPORATION , LLORETA, Jonathan , AOYAGI, Paul , CHU, Hanyou , CHARD, Jeffrey , JIANG, Peilin , SUSHCHIK, Mikhail , POSLAVSKY, Leonid , FLANNER, Phillip D.
发明人： LLORETA, Jonathan , AOYAGI, Paul , CHU, Hanyou , CHARD, Jeffrey , JIANG, Peilin , SUSHCHIK, Mikhail , POSLAVSKY, Leonid , FLANNER, Phillip D.
IPC分类号： G01N21/47 , G06T7/00
CPC分类号： G01B11/00 , G01B11/24 , G01B11/30 , G01B2210/56 , G03F7/70625 , G06F7/00 , G06F17/16 , G06F17/40 , G06F19/00 , H01L22/12
摘要： Provided are optimized scatterometry techniques for evaluating a diffracting structure. In one embodiment, a method includes computing a finite-difference derivative of a field matrix with respect to first parameters (including a geometric parameter of the diffracting structure), computing an analytic derivative of the Jones matrix with respect to the field matrix, computing a derivative of the Jones matrix with respect to the first parameters, and computing a finite-difference derivative of the Jones matrix with respect to second parameters (including a non-geometric parameter). In one embodiment, a method includes generating a transfer matrix having Taylor Series approximations for elements, and decomposing the field matrix into two or more smaller matrices based on symmetry between the incident light and the diffracting structure.
摘要翻译：提供了用于评估衍射结构的优化散射测量技术。在一个实施例中，一种方法包括相对于第一参数（包括衍射结构的几何参数）计算场矩阵的有限差分导数，计算相对于场矩阵的Jones矩阵的分析导数，计算相对于第一参数的Jones矩阵的导数，以及相对于第二参数（包括非几何参数）计算Jones矩阵的有限差分导数。在一个实施例中，一种方法包括生成对于元素具有泰勒级数逼近的传递矩阵，并且基于入射光和衍射结构之间的对称性将场矩阵分解为两个或更多个较小的矩阵。

6. 发明申请

WO2012048156A3 METHOD OF DETERMINING AN ASYMMETRIC PROPERTY OF A STRUCTURE 审中-公开
公开(公告)号：WO2012048156A3
公开(公告)日：2012-04-12
申请号：PCT/US2011/055163
申请日：2011-10-06
申请人： TOKYO ELECTRON LIMITED , KLA-TENCOR CORPORATION , SHIH, Meng-Fu , KIM, In-Kyo , ZHANG, Xiafang , POSLAVSKY, Leonid
发明人： SHIH, Meng-Fu , KIM, In-Kyo , ZHANG, Xiafang , POSLAVSKY, Leonid
IPC分类号： G01B11/24 , G01N21/47
摘要： Methods of determining asymmetric properties of structures are described. A method includes measuring, for a grating structure, a first signal and a second, different, signal obtained by optical scatterometry. A difference between the first signal and the second signal is then determined. An asymmetric structural parameter of the grating structure is determined based on a calculation using the first signal, the second signal, and the difference.

7. 发明申请

WO2016164372A1 FEED FORWARD OF METROLOGY DATA IN A METROLOGY SYSTEM 审中-公开
标题翻译：在计量系统中进入量纲数据
公开(公告)号：WO2016164372A1
公开(公告)日：2016-10-13
申请号：PCT/US2016/026060
申请日：2016-04-05
申请人： KLA-TENCOR CORPORATION
发明人： LEVY, Ady , KANDEL, Daniel , ADEL, Michael E. , POSLAVSKY, Leonid , ROBINSON, John , MARCIANO, Tal , BRINGOLTZ, Barak , GRUNZWEIG, Tzahi , KLEIN, Dana , ITZKOVICH, Tal , CARMEL, Nadav , AMIR, Nuriel , RAMANATHAN, Vidya , CAMP, Janay , WAGNER, Mark
IPC分类号： H01L21/66 , G01N21/95
CPC分类号： G01B11/272 , G01N21/211 , G01N21/31 , G01N21/41 , G01N21/4738 , G01N21/4788 , G01N21/6489 , G01N21/9501 , G01N2021/213 , G03F7/705 , G03F7/70525 , G03F7/70533 , G03F7/70616
摘要： A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.
摘要翻译：计量性能分析系统包括包括一个或多个检测器的计量工具和通信地耦合到所述一个或多个检测器的控制器。所述控制器被配置为从所述计量工具接收与度量目标相关联的一个或多个度量数据集，其中所述一个或多个测量数据集包括一个或多个测量的度量度量，并且所述一个或多个测量的度量度量指示与标称值的偏差。控制器还被配置为确定与标称值和一个或多个所选择的半导体工艺变化的偏差之间的关系，并且基于一个或多个测量值的值之间的关系确定偏离标称值的一个或多个根本原因度量和一个或多个所选择的半导体工艺变化。

8. 发明申请

WO2014197447A1 DYNAMIC REMOVAL OF CORRELATION OF HIGHLY CORRELATED PARAMETERS FOR OPTICAL METROLOGY 审中-公开
标题翻译：用于光学计量学的高相关参数的相关动态移除
公开(公告)号：WO2014197447A1
公开(公告)日：2014-12-11
申请号：PCT/US2014/040639
申请日：2014-06-03
申请人： TOKYO ELECTRON LIMITED , KLA-TENCOR CORPORATION
发明人： LEE, Lie-Quan , POSLAVSKY, Leonid , PANDEV, Stilian Ivanov
IPC分类号： G01N21/00 , G01N21/25 , G01N21/47 , G01B11/00 , G06F19/00
CPC分类号： G03F7/70616
摘要： Dynamic removal of correlation of highly-correlated parameters for optical metrology is described. An embodiment of a method includes determining a model of a structure, the model including a set of parameters; performing optical metrology measurement of the structure, including collecting spectra data on a hardware element; during the measurement of the structure, dynamically removing correlation of two or more parameters of the set of parameters, an iteration of the dynamic removal of correlation including: generating a Jacobian matrix of the set of parameters, applying a singular value decomposition of the Jacobian matrix, selecting a subset of the set of parameters, and computing a direction of the parameter search based on the subset of parameters. If the model does not converge, performing one or more additional iterations of the dynamic removal of correlation until the model converges; and if the model does converge, reporting the results of the measurement.
摘要翻译：描述了用于光学测量的高度相关参数的相关性的动态去除。方法的实施例包括确定结构的模型，所述模型包括一组参数; 执行结构的光学测量测量，包括在硬件元件上收集光谱数据; 在结构测量期间，动态地去除该组参数中的两个或多个参数的相关性，相关动态去除的迭代包括：生成该组参数的雅可比矩阵，应用雅可比矩阵的奇异值分解，选择参数集合的子集，以及基于参数子集计算参数搜索的方向。如果模型不收敛，则执行动态去除相关性的一个或多个附加迭代，直到模型收敛; 如果模型收敛，报告测量结果。

9. 发明申请

WO2014186768A1 METROLOGY SYSTEM CALIBRATION REFINEMENT 审中-公开
标题翻译：计量系统校准精炼
公开(公告)号：WO2014186768A1
公开(公告)日：2014-11-20
申请号：PCT/US2014/038495
申请日：2014-05-16
申请人： KLA-TENCOR CORPORATION
发明人： KWAK, Hidong , LESOINE, John , SADIQ, Malik , WEI, Lanhua , KRISHNAN, Shankar , POSLAVSKY, Leonid , SUSHCHIK, Mikhail
IPC分类号： H01L21/66
CPC分类号： G01N21/211 , G01B2210/56 , G01N21/274 , G01N21/9501 , G01N2021/213
摘要： Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.
摘要翻译：提出了用于匹配一个或多个光学测量系统的测量光谱的方法和系统。用于确定样本对目标计量系统执行的测量的光谱响应的一个或多个系统参数的值被优化。对系统参数值进行优化，使得由参考系统生成的测量光谱与目标系统之间的差异最小化，以测量相同的度量目标。还提出了用于在一个或多个光学测量系统上匹配光谱误差的方法和系统。可靠的计量系统测量至少一个样本参数的值，以最小化由参考和目标计量系统测量时存在的不同测量条件引入的模型误差。提出了基于低阶响应面的参数优化方法和系统，以减少改进系统校准参数所需的计算时间。

10. 发明申请

WO2013090200A1 LIBRARY GENERATION WITH DERIVATIVES IN OPTICAL METROLOGY 审中-公开
标题翻译：在光学计量学中具有衍生物的图书馆生成
公开(公告)号：WO2013090200A1
公开(公告)日：2013-06-20
申请号：PCT/US2012/068786
申请日：2012-12-10
申请人： TOKYO ELECTRON LIMITED , KLA-TENCOR CORPORATION
发明人： LEE, Lie-Quan , POSLAVSKY, Leonid
IPC分类号： H01L21/66
CPC分类号： G06F17/5009 , G01B11/24 , G01B21/04 , G01B2210/56 , G06F2217/16
摘要： Methods of library generation with derivatives for optical metrology are described. For example, a method of generating a library for optical metrology includes determining a function of a parameter data set for one or more repeating structures on a semiconductor substrate or wafer. The method also includes determining a first derivative of the function of the parameter data set. The method also includes providing a spectral library based on both the function and the first derivative of the function.
摘要翻译：描述了用于光学测量的衍生物的图书馆生成方法。例如，生成用于光学测量的库的方法包括确定半导体衬底或晶片上的一个或多个重复结构的参数数据集的函数。该方法还包括确定参数数据集的函数的一阶导数。该方法还包括基于函数的函数和一阶导数提供谱库。

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