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1. 发明申请

WO2012084657A1 A MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL 审中-公开
标题翻译：用于制造合成金刚石材料的微波等离子体反应器
公开(公告)号：WO2012084657A1
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072821
申请日：2011-12-14
申请人： ELEMENT SIX LIMITED , SCARSBROOK, Geoffrey Alan , WILMAN, Jonathan James , DODSON, Joseph Michael , BRANDON, John Robert , COE, Steven Edward , WORT, Christopher John Howard
发明人： SCARSBROOK, Geoffrey Alan , WILMAN, Jonathan James , DODSON, Joseph Michael , BRANDON, John Robert , COE, Steven Edward , WORT, Christopher John Howard
IPC分类号： H01J37/32 , C23C16/27
CPC分类号： C23C16/274 , C01B32/25 , C23C16/511 , C30B25/105 , C30B29/04 , H01J37/32192 , H01J37/32642 , H01J2237/339
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber; a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use; a microwave coupling configuration for feeding microwaves from a microwave generator into the plasma chamber; and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; wherein the microwave plasma reactor further comprises an electrically conductive plasma stabilizing annulus disposed around the substrate holder within the plasma chamber.
摘要翻译：一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：等离子体室; 衬底保持器，其设置在所述等离子体室中，并且包括支撑表面，所述支撑表面用于支撑在其上沉积合成金刚石材料的基底; 用于将微波从微波发生器馈入等离子体室的微波耦合配置; 以及用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 其中微波等离子体反应器还包括设置在等离子体室内的衬底保持器周围的导电等离子体稳定环。

2. 发明申请

WO2012084661A1 A MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL 审中-公开
标题翻译：用于制造合成金刚石材料的微波等离子体反应器
公开(公告)号：WO2012084661A1
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072825
申请日：2011-12-14
申请人： ELEMENT SIX LIMITED , COE, Steven Edward , WILMAN, Jonathan James , TWITCHEN, Daniel James , SCARSBROOK, Geoffrey Alan , BRANDON, John Robert , WORT, Christopher John Howard
发明人： COE, Steven Edward , WILMAN, Jonathan James , TWITCHEN, Daniel James , SCARSBROOK, Geoffrey Alan , BRANDON, John Robert , WORT, Christopher John Howard
IPC分类号： H01J37/32 , C30B29/04
CPC分类号： C23C16/45563 , C23C16/274 , C23C16/45504 , C23C16/45565 , C23C16/511 , C30B25/105 , C30B29/04 , H01J37/32192 , H01J37/32238 , H01J37/3244 , H01J37/32449
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber; a substrate holder disposed in the plasma chamber for supporting a substrate on which the synthetic diamond material is to be deposited in use; a microwave coupling configuration for feeding microwaves from a microwave generator into the plasma chamber; and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; wherein the gas flow system comprises a gas inlet nozzle array comprising a plurality of gas inlet nozzles disposed opposite the substrate holder for directing process gases towards the substrate holder, the gas inlet nozzle array comprising: at least six gas inlet nozzles disposed in a substantially parallel or divergent orientation relative to a central axis of the plasma chamber; a gas inlet nozzle number density equal to or greater than 0.1 nozzles/cm 2 , wherein the gas inlet nozzle number density is measured by projecting the nozzles onto a plane whose normal lies parallel to the central axis of the plasma chamber and measuring the gas inlet number density on said plane;and a nozzle area ratio of equal to or greater than 10, whereinthe nozzle area ratio is measured by projecting the nozzles onto a plane whose normal lies parallel to the central axis of the plasma chamber, measuring the total area of the gas inlet nozzle area on said plane, dividing by the total number of nozzles to give an area associated with each nozzle, and dividing the area associated with each nozzle by an actual area of each nozzle.
摘要翻译：一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：等离子体室; 设置在等离子体室中的衬底保持器，用于支撑在使用中沉积合成金刚石材料的衬底; 用于将微波从微波发生器馈入等离子体室的微波耦合配置; 以及用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 其中所述气体流动系统包括气体入口喷嘴阵列，所述气体入口喷嘴阵列包括与所述衬底保持器相对设置的多个气体入口喷嘴，用于将工艺气体引向所述衬底保持器，所述气体入口喷嘴阵列包括：至少六个气体入口喷嘴，或相对于等离子体室的中心轴线的发散取向; 气体入口喷嘴数密度等于或大于0.1喷嘴/ cm2，其中气体入口喷嘴数密度通过将喷嘴投影到平行于等离子体室的中心轴线的平面上并测量气体入口数所述平面上的密度;以及等于或大于10的喷嘴面积比，其中喷嘴面积比通过将喷嘴投射到平行于等离子体室的中心轴线的平面上测量，测量总面积在所述平面上的气体入口喷嘴面积除以总喷嘴数量以给出与每个喷嘴相关联的区域，并且将与每个喷嘴相关联的区域除以每个喷嘴的实际面积。

3. 发明申请

WO2012084656A1 CONTROLLING DOPING OF SYNTHETIC DIAMOND MATERIAL 审中-公开
标题翻译：控制合成金刚石材料的掺杂
公开(公告)号：WO2012084656A1
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072820
申请日：2011-12-14
申请人： ELEMENT SIX LIMITED , COE, Steven Edward , WILMAN, Jonathan James , TWITCHEN, Daniel James , SCARSBROOK, Geoffrey Alan , BRANDON, John Robert , WORT, Christopher John Howard , MARKHAM, Matthew Lee
发明人： COE, Steven Edward , WILMAN, Jonathan James , TWITCHEN, Daniel James , SCARSBROOK, Geoffrey Alan , BRANDON, John Robert , WORT, Christopher John Howard , MARKHAM, Matthew Lee
IPC分类号： H01J37/32 , C30B29/04
CPC分类号： C30B25/14 , C01B32/25 , C23C16/274 , C23C16/278 , C30B25/02 , C30B25/165 , C30B29/04 , H01J37/32192 , H01J37/32449
摘要： A method of manufacturing synthetic CVD diamond material, the method comprising: providing a microwave plasma reactor comprising: a plasma chamber; one or more substrates disposed in the plasma chamber providing a growth surface area over which the synthetic CVD diamond material is to be deposited in use; a microwave coupling configuration for feeding microwaves from a microwave generator into the plasma chamber; and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom, injecting process gases into the plasma chamber; feeding microwaves from the microwave generator into the plasma chamber through the microwave coupling configuration to form a plasma above the growth surface area; and growing synthetic CVD diamond material over the growth surface area, wherein the process gases comprise at least one dopant in gaseous form, selected from a one or more of boron, silicon, sulphur, phosphorous, lithium and beryllium at a concentration equal to or greater than 0.01 ppm and/or nitrogen at a concentration equal to or greater than 0.3 ppm, wherein the gas flow system includes a gas inlet comprising one or more gas inlet nozzles disposed opposite the growth surface area and configured to inject process gases towards the growth surface area, and wherein the process gases are injected towards the growth surface area at a total gas flow rate equal to or greater than 500 standard cm 3 per minute and/or wherein the process gases are injected into the plasma chamber through the or each gas inlet nozzle with a Reynolds number a Reynolds number in a range 1 to 100.
摘要翻译：一种制造合成CVD金刚石材料的方法，所述方法包括：提供微波等离子体反应器，包括：等离子体室; 设置在等离子体室中的一个或多个衬底提供在使用中沉积合成CVD金刚石材料的生长表面区域; 用于将微波从微波发生器馈入等离子体室的微波耦合配置; 以及用于将工艺气体进料到等离子体室中并将其从其中除去的气体流系统，将工艺气体注入到等离子体室中; 通过微波耦合配置将微波从微波发生器馈送到等离子体室中，以在生长表面积之上形成等离子体; 以及在所述生长表面积上生长的合成CVD金刚石材料，其中所述工艺气体包含至少一种气体形式的掺杂剂，其选自硼，硅，硫，磷，锂和铍中的一种或多种，其浓度等于或大于处于浓度等于或大于0.3ppm的0.01ppm和/或氮气，其中所述气体流动系统包括气体入口，所述气体入口包括与生长表面区域相对设置的一个或多个气体入口喷嘴，并且被配置为朝着生长表面注入工艺气体并且其中所述工艺气体以等于或大于500标准立方厘米/分钟的总气体流速向所述生长表面区域注入，和/或其中所述工艺气体通过所述或每个气体入口喷嘴注入所述等离子体室雷诺数雷诺数在1到100之间。

4. 发明申请

WO2012084655A3 MICROWAVE PLASMA REACTORS AND SUBSTRATES FOR SYNTHETIC DIAMOND MANUFACTURE 审中-公开
公开(公告)号：WO2012084655A3
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072818
申请日：2011-12-14
申请人： ELEMENT SIX LIMITED , DODGE, Carlton Nigel , INGLIS, Paul Nicolas , SCARSBROOK, Geoffrey Alan , MOLLART, Timothy Peter , PICKLES, Charles Simon James , COE, Steven Edward , DODSON, Joseph Michael , CULLEN, Alexander Lamb , BRANDON, John Robert , WORT, Christopher John Howard
发明人： DODGE, Carlton Nigel , INGLIS, Paul Nicolas , SCARSBROOK, Geoffrey Alan , MOLLART, Timothy Peter , PICKLES, Charles Simon James , COE, Steven Edward , DODSON, Joseph Michael , CULLEN, Alexander Lamb , BRANDON, John Robert , WORT, Christopher John Howard
IPC分类号： H01J37/32 , C23C16/27
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode between the base and the top plate; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate; and a substrate disposed on the supporting surface,the substrate having a growth surface on which the synthetic diamond material is to be deposited in use, wherein the substrate dimensions and location within the resonance cavity are selected to generate a localized axisymmetric E z electric field profile across the growth surface in use, the localized axisymmetric E z electric field profile comprising a substantially flat central portion bound by a ring of higher electric field, the substantially flat central portion extending over at least 60% of an area of the growth surface of the substrate and having an E z electric field variation of no more than ±10% of a central E z electric field strength, the ring of higher electric field being disposed around the central portion and having a peak E z electric field strength in a range 10% to 50% higher than the central E z electric field strength.

5. 发明申请

WO2008090512A1 ELECTRONIC FIELD EFFECT DEVICES AND METHODS FOR THEIR MANUFACTURE 审中-公开
标题翻译：电子效应器件及其制造方法
公开(公告)号：WO2008090512A1
公开(公告)日：2008-07-31
申请号：PCT/IB2008/050216
申请日：2008-01-22
申请人： ELEMENT SIX LIMITED , DONALD, Heather June , WORT, Christopher John Howard , SCARSBROOK, Geoffrey Alan , FRIEL, Ian , BALMER, Richard Stuart
发明人： WORT, Christopher John Howard , SCARSBROOK, Geoffrey Alan , FRIEL, Ian , BALMER, Richard Stuart
IPC分类号： H01L29/812 , C30B25/20 , C30B29/04 , C23C14/02 , C23C16/27 , H01L21/04 , H01L29/16 , C23C14/58
CPC分类号： C01B32/28 , C23C16/27 , C23C16/274 , C23C16/278 , C30B25/105 , C30B25/20 , C30B29/04 , G01N21/87 , G01N21/95 , G01N27/308 , G01N2201/0636 , H01J37/321 , H01J2237/08 , H01J2237/3341 , H01L21/02104 , H01L21/02376 , H01L21/02527 , H01L21/02579 , H01L21/0262 , H01L21/02634 , H01L21/041 , H01L29/045 , H01L29/1602 , H01L29/167 , H01L29/36 , Y10T428/24355
摘要： Electronic field effect devices, and methods of manufacture of these electronic field effect devices are disclosed. In particular, there is disclosed an electronic field effect device which has improved electrical properties due to the formation of a highly mobile two-dimensional charge-carrier gas in a simple structure formed from diamond in combination with polar materials.
摘要翻译：公开了电子场效应装置及这些电子场效应装置的制造方法。特别地，公开了一种电子场效应器件，其由于由金刚石与极性材料组合形成的简单结构中形成高度移动的二维电荷载体气体而具有改善的电性能。

6. 发明申请

WO2007007126A1 SINGLE CRYSTAL DIAMOND ELEMENTS HAVING CONVEX SURFACES AND METHODS OF ITS FABRICATION 审中-公开
标题翻译：具有凸面的单晶钻石元素及其制造方法
公开(公告)号：WO2007007126A1
公开(公告)日：2007-01-18
申请号：PCT/GB2006/050195
申请日：2006-07-07
申请人： ELEMENT SIX LIMITED , NELISSEN, Wilhelmus Gerarda Maria , GODFRIED, Herman Philip , HOUWMAN, Evert Pieter , KRIELE, Paulus Adrianus Cornelis , LAMERS, Johannes Cornelis , PELS, Gerrit Jan , OERLE, Bartholomeus Mathias Van , SPAAY, Paulus Gerardus Hendricus Maria , MCCLYMONT, Mark Robin , WORT, Christopher John Howard , SCARSBROOK, Geoffrey Alan
发明人： NELISSEN, Wilhelmus Gerarda Maria , GODFRIED, Herman Philip , HOUWMAN, Evert Pieter , KRIELE, Paulus Adrianus Cornelis , LAMERS, Johannes Cornelis , PELS, Gerrit Jan , OERLE, Bartholomeus Mathias Van , SPAAY, Paulus Gerardus Hendricus Maria , MCCLYMONT, Mark Robin , WORT, Christopher John Howard , SCARSBROOK, Geoffrey Alan
IPC分类号： G02B1/02
CPC分类号： G02B1/02 , B23K26/0006 , B23K26/0075 , B23K26/361 , B23K26/40 , B23K2203/50 , G02B3/00 , Y10T428/24355 , Y10T428/24479 , Y10T428/24612 , Y10T428/24628
摘要： A single crystal diamond element having a convex surface is disclosed, the convex surface including a spherical segment for which the maximum peak to valley deviation from a perfect spherical surface is less than about 5 µm. Alternatively or in addition, the RMS deviation from a perfect spherical surface may be less than about 500 nm, or the RMS roughness less than about 30 nm. A single crystal diamond element with a radius of curvature less than about 20 mm is also disclosed. In one aspect a single crystal diamond element having a conical half-angle greater than about 10° is described. The invention also provides a method for forming a rotationally symmetrical surface on a single crystal diamond element, comprising rotating the element about a first axis, applying a laser beam to the element in a direction perpendicular to the first axis, and translating the laser beam in two dimensions in a plane perpendicular to the direction of the beam. If the two-dimensional path follows the arc of a circle a spherical surface may be formed. The invention also provides improving a spherical surface on a single crystal diamond element by pressing a rapidly rotating cup onto a slowly rotating element. The element may be a lens, in particular a solid immersion lens.
摘要翻译：公开了具有凸面的单晶金刚石元件，该凸面包括与完美球面的最大峰谷偏差小于约5μm的球形段。或者或另外，与完美球形表面的RMS偏差可以小于约500nm，或RMS粗糙度小于约30nm。还公开了具有小于约20mm的曲率半径的单晶金刚石元件。在一个方面，描述了具有大于约10°的锥形半角的单晶金刚石元件。本发明还提供了一种用于在单晶金刚石元件上形成旋转对称表面的方法，包括围绕第一轴线旋转元件，在垂直于第一轴线的方向上向元件施加激光束，并将激光束在垂直于光束方向的平面内的两个尺寸。如果二维路径遵循圆弧，则可以形成球形表面。本发明还通过将快速旋转的杯按压到缓慢旋转的元件上来改善单晶金刚石元件上的球形表面。元件可以是透镜，特别是固体浸没透镜。

7. 发明申请

WO2006043157A2 DIAMOND COATED SURFACES 审中-公开
标题翻译：金刚石涂层表面
公开(公告)号：WO2006043157A2
公开(公告)日：2006-04-27
申请号：PCT/IB2005/003134
申请日：2005-10-20
申请人： ELEMENT SIX LIMITED , KEMP, Mark , WORT, Christopher John Howard , SCARSBROOK, Geoffrey Alan , MOLLART, Timothy Peter
发明人： WORT, Christopher John Howard , SCARSBROOK, Geoffrey Alan , MOLLART, Timothy Peter
CPC分类号： C23C16/274 , C23C16/0263
摘要： A method of producing a diamond coated surface on a substrate. A surface of the substrate is prepared by exposing it to a power beam, such as an electron beam, to increase the surface area and surface roughness. Such preparation may also provide the surface with three dimensional features onto which a diamond layer can adhere and mechanically lock. Adhesion of a diamond layer applied to the prepared surface is increased.
摘要翻译：一种在衬底上制造金刚石涂覆表面的方法。通过将基底暴露于诸如电子束的功率束来制备基底的表面以增加表面积和表面粗糙度。这样的准备还可以为表面提供三维特征，金刚石层可以粘附和机械锁定在三维特征上。应用于制备表面的金刚石层的附着力增加。

8. 发明申请

WO2009060195A1 COMPOSITE MATERIAL 审中-公开
标题翻译：复合材料
公开(公告)号：WO2009060195A1
公开(公告)日：2009-05-14
申请号：PCT/GB2008/003740
申请日：2008-11-06
申请人： ELEMENT SIX LIMITED , WORT, Christopher John Howard , WHITEHEAD, Andrew John , BALMER, Richard Stuart
发明人： WORT, Christopher John Howard , WHITEHEAD, Andrew John , BALMER, Richard Stuart
IPC分类号： H01L21/762
CPC分类号： H01L21/76254 , C04B35/52 , C04B37/00 , C04B2235/3826 , C04B2235/427 , C04B2235/428 , C04B2235/5427 , C04B2235/5436 , C04B2235/5472 , C04B2235/608 , C04B2235/616 , C04B2235/6562 , C04B2235/6581 , C04B2235/722 , C04B2235/725 , C04B2235/728 , C04B2235/77 , C04B2235/80 , C04B2235/9615 , C04B2235/963 , C04B2235/9638 , C04B2237/30 , C04B2237/363 , C04B2237/52
摘要： The present invention relates to composite material comprising a layer of diamond material chemically bonded to a surface of a layer of silicon material, wherein the layer of diamond material comprises a mixture of diamond particles, silicon carbide and silicon and methods for producing the same.
摘要翻译：本发明涉及复合材料，其包括化学键合到硅材料层的表面的金刚石材料层，其中金刚石材料层包括金刚石颗粒，碳化硅和硅的混合物以及用于制造其的方法。

9. 发明申请

WO2008059428A2 ROBUST RADIATION DETECTOR COMPRISING DIAMOND 审中-公开
标题翻译：包含钻石的鲁棒辐射探测器
公开(公告)号：WO2008059428A2
公开(公告)日：2008-05-22
申请号：PCT/IB2007/054583
申请日：2007-11-12
申请人： ELEMENT SIX LIMITED , DONALD, Heather June , WHITEHEAD, Andrew John , WORT, Christopher John Howard , OLIVER, Kevin John
发明人： WHITEHEAD, Andrew John , WORT, Christopher John Howard , OLIVER, Kevin John
IPC分类号： G01T1/26
CPC分类号： G01T1/26
摘要： A radiation detector comprises a substrate of diamond material and at least one electrode formed at a surface of the substrate. The electrode comprises electrically conductive material deposited in a cavity in the surface of the substrate so that at least a portion of the material of the electrode is below the surface of the substrate. The cavity will typically be an elongate trench or channel in which electrically conductive material such as boron-doped diamond is deposited. In some embodiments, at least two electrodes are located adjacent to one another at the surface of the substrate. In other embodiments, the device has a plurality of electrodes, at least one of which is located at a first surface and at least one of which is located at an opposed second surface of the substrate. In the latter case, an electrode at one surface of the substrate can be connected to an electrode at the opposed surface of the substrate by means of a conductive via, which consists of a through-hole filled or coated with conductive material. Typically, the electrodes are arranged in an interdigitated configuration, each electrode having a plurality of elongate electrode elements. Each such electrode element extends parallel to at least one adjacent electrode element of another electrode.
摘要翻译：放射线检测器包括金刚石材料的衬底和形成在衬底的表面处的至少一个电极。电极包括沉积在基底表面中的空腔中的导电材料，使得电极的材料的至少一部分位于基底的表面下方。该腔通常将是其中沉积诸如硼掺杂金刚石之类的导电材料的细长沟槽或沟道。在一些实施例中，至少两个电极在衬底的表面处彼此相邻定位。在其他实施例中，该装置具有多个电极，其中至少一个电极位于第一表面处，并且其中至少一个电极位于基板的相对的第二表面处。在后一种情况下，基板一个表面上的电极可以通过导电通孔连接到基板相对表面上的电极，该导电通孔由填充或涂覆有导电材料的通孔组成。典型地，电极布置成交叉配置，每个电极具有多个细长电极元件。每个这样的电极元件平行于另一电极的至少一个相邻电极元件延伸。

10. 发明申请

WO2014029671A1 METHOD OF CUTTING SUPER-HARD MATERIALS USING AN ELECTRON BEAM AND A RANGE OF BEAM SCANNING VELOCITIES 审中-公开
标题翻译：使用电子束切割超硬材料的方法和光束扫描速度范围
公开(公告)号：WO2014029671A1
公开(公告)日：2014-02-27
申请号：PCT/EP2013/066967
申请日：2013-08-14
申请人： ELEMENT SIX LIMITED
发明人： WORT, Christopher John Howard
IPC分类号： B23K15/08 , B23K15/10 , B28D5/00
CPC分类号： B23K15/08 , B23K15/00 , B23K15/0006 , B23K15/10 , B23K2203/08 , B23K2203/50 , B23K2203/52 , B26D5/00 , B28D5/00 , C30B33/08 , H01J37/31
摘要： A method of cutting a super-hard material (8) using an electron beam (6), wherein the electron beam (6) is directed onto a surface of the super-hard material (8) and moved relative to the surface such that the electron beam (6) moves across the surface of the super-hard material (8) at an electron beam scanning velocity in a range 100 to 5000 mms -1 to cut the super-hard material (8).
摘要翻译：一种使用电子束（6）切割超硬材料（8）的方法，其中电子束（6）被引导到超硬材料（8）的表面上并相对于表面移动，使得电子束（6）以100-5000mms-1的电子束扫描速度跨过超硬材料（8）的表面移动，以切割超硬材料（8）。

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