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    • 1. 发明申请
    • CONTROLLING DOPING OF SYNTHETIC DIAMOND MATERIAL
    • 控制合成金刚石材料的掺杂
    • WO2012084656A1
    • 2012-06-28
    • PCT/EP2011/072820
    • 2011-12-14
    • ELEMENT SIX LIMITEDCOE, Steven EdwardWILMAN, Jonathan JamesTWITCHEN, Daniel JamesSCARSBROOK, Geoffrey AlanBRANDON, John RobertWORT, Christopher John HowardMARKHAM, Matthew Lee
    • COE, Steven EdwardWILMAN, Jonathan JamesTWITCHEN, Daniel JamesSCARSBROOK, Geoffrey AlanBRANDON, John RobertWORT, Christopher John HowardMARKHAM, Matthew Lee
    • H01J37/32C30B29/04
    • C30B25/14C01B32/25C23C16/274C23C16/278C30B25/02C30B25/165C30B29/04H01J37/32192H01J37/32449
    • A method of manufacturing synthetic CVD diamond material, the method comprising: providing a microwave plasma reactor comprising: a plasma chamber; one or more substrates disposed in the plasma chamber providing a growth surface area over which the synthetic CVD diamond material is to be deposited in use; a microwave coupling configuration for feeding microwaves from a microwave generator into the plasma chamber; and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom, injecting process gases into the plasma chamber; feeding microwaves from the microwave generator into the plasma chamber through the microwave coupling configuration to form a plasma above the growth surface area; and growing synthetic CVD diamond material over the growth surface area, wherein the process gases comprise at least one dopant in gaseous form, selected from a one or more of boron, silicon, sulphur, phosphorous, lithium and beryllium at a concentration equal to or greater than 0.01 ppm and/or nitrogen at a concentration equal to or greater than 0.3 ppm, wherein the gas flow system includes a gas inlet comprising one or more gas inlet nozzles disposed opposite the growth surface area and configured to inject process gases towards the growth surface area, and wherein the process gases are injected towards the growth surface area at a total gas flow rate equal to or greater than 500 standard cm 3 per minute and/or wherein the process gases are injected into the plasma chamber through the or each gas inlet nozzle with a Reynolds number a Reynolds number in a range 1 to 100.
    • 一种制造合成CVD金刚石材料的方法,所述方法包括:提供微波等离子体反应器,包括:等离子体室; 设置在等离子体室中的一个或多个衬底提供在使用中沉积合成CVD金刚石材料的生长表面区域; 用于将微波从微波发生器馈入等离子体室的微波耦合配置; 以及用于将工艺气体进料到等离子体室中并将其从其中除去的气体流系统,将工艺气体注入到等离子体室中; 通过微波耦合配置将微波从微波发生器馈送到等离子体室中,以在生长表面积之上形成等离子体; 以及在所述生长表面积上生长的合成CVD金刚石材料,其中所述工艺气体包含至少一种气体形式的掺杂剂,其选自硼,硅,硫,磷,锂和铍中的一种或多种,​​其浓度等于或大于 处于浓度等于或大于0.3ppm的0.01ppm和/或氮气,其中所述气体流动系统包括气体入口,所述气体入口包括与生长表面区域相对设置的一个或多个气体入口喷嘴,并且被配置为朝着生长表面注入工艺气体 并且其中所述工艺气体以等于或大于500标准立方厘米/分钟的总气体流速向所述生长表面区域注入,和/或其中所述工艺气体通过所述或每个气体入口喷嘴注入所述等离子体室 雷诺数雷诺数在1到100之间。
    • 2. 发明申请
    • A MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL
    • 用于制造合成金刚石材料的微波等离子体反应器
    • WO2012084661A1
    • 2012-06-28
    • PCT/EP2011/072825
    • 2011-12-14
    • ELEMENT SIX LIMITEDCOE, Steven EdwardWILMAN, Jonathan JamesTWITCHEN, Daniel JamesSCARSBROOK, Geoffrey AlanBRANDON, John RobertWORT, Christopher John Howard
    • COE, Steven EdwardWILMAN, Jonathan JamesTWITCHEN, Daniel JamesSCARSBROOK, Geoffrey AlanBRANDON, John RobertWORT, Christopher John Howard
    • H01J37/32C30B29/04
    • C23C16/45563C23C16/274C23C16/45504C23C16/45565C23C16/511C30B25/105C30B29/04H01J37/32192H01J37/32238H01J37/3244H01J37/32449
    • A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber; a substrate holder disposed in the plasma chamber for supporting a substrate on which the synthetic diamond material is to be deposited in use; a microwave coupling configuration for feeding microwaves from a microwave generator into the plasma chamber; and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; wherein the gas flow system comprises a gas inlet nozzle array comprising a plurality of gas inlet nozzles disposed opposite the substrate holder for directing process gases towards the substrate holder, the gas inlet nozzle array comprising: at least six gas inlet nozzles disposed in a substantially parallel or divergent orientation relative to a central axis of the plasma chamber; a gas inlet nozzle number density equal to or greater than 0.1 nozzles/cm 2 , wherein the gas inlet nozzle number density is measured by projecting the nozzles onto a plane whose normal lies parallel to the central axis of the plasma chamber and measuring the gas inlet number density on said plane;and a nozzle area ratio of equal to or greater than 10, whereinthe nozzle area ratio is measured by projecting the nozzles onto a plane whose normal lies parallel to the central axis of the plasma chamber, measuring the total area of the gas inlet nozzle area on said plane, dividing by the total number of nozzles to give an area associated with each nozzle, and dividing the area associated with each nozzle by an actual area of each nozzle.
    • 一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器,所述微波等离子体反应器包括:等离子体室; 设置在等离子体室中的衬底保持器,用于支撑在使用中沉积合成金刚石材料的衬底; 用于将微波从微波发生器馈入等离子体室的微波耦合配置; 以及用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 其中所述气体流动系统包括气体入口喷嘴阵列,所述气体入口喷嘴阵列包括与所述衬底保持器相对设置的多个气体入口喷嘴,用于将工艺气体引向所述衬底保持器,所述气体入口喷嘴阵列包括:至少六个气体入口喷嘴, 或相对于等离子体室的中心轴线的发散取向; 气体入口喷嘴数密度等于或大于0.1喷嘴/ cm2,其中气体入口喷嘴数密度通过将喷嘴投影到平行于等离子体室的中心轴线的平面上并测量气体入口数 所述平面上的密度;以及等于或大于10的喷嘴面积比,其中喷嘴面积比通过将喷嘴投射到平行于等离子体室的中心轴线的平面上测量,测量总面积 在所述平面上的气体入口喷嘴面积除以总喷嘴数量以给出与每个喷嘴相关联的区域,并且将与每个喷嘴相关联的区域除以每个喷嘴的实际面积。
    • 4. 发明申请
    • DIAMOND SENSORS, DETECTORS, AND QUANTUM DEVICES
    • 钻石传感器,探测器和量子设备
    • WO2012152617A1
    • 2012-11-15
    • PCT/EP2012/057960
    • 2012-05-01
    • ELEMENT SIX LIMITEDTWITCHEN, Daniel JamesMARKHAM, Matthew LeeSCARSBROOK, Geoffrey Alan
    • TWITCHEN, Daniel JamesMARKHAM, Matthew LeeSCARSBROOK, Geoffrey Alan
    • C30B25/02C30B29/04C30B31/22C30B33/00G06N99/00
    • C30B29/04C30B25/02C30B31/22C30B33/00G06N99/002
    • A synthetic single crystal diamond material comprising: a first region of synthetic single crystal diamond material comprising a plurality of electron donor defects; a second region of synthetic single crystal diamond material comprising a plurality of quantum spin defects; and a third region of synthetic single crystal diamond material disposed between the first and second regions such that the first and second regions are spaced apart by the third region, wherein the second and third regions of synthetic single crystal diamond material have a lower concentration of electron donor defects than the first region of synthetic single crystal diamond material, and wherein the first and second regions are spaced apart by a distance in a range 10 nm to 100 μιη which is sufficiently close to allow electrons to be donated from the first region of synthetic single crystal diamond material to the second region of synthetic single crystal diamond material thus forming negatively charged quantum spin defects in the second region of synthetic single crystal diamond material and positively charged defects in the first region of synthetic single crystal diamond material while being sufficiently far apart to reduce other coupling interactions between the first and second regions which would otherwise unduly reduce the decoherence time of the plurality of quantum spin defects and/or produce strain broaden of a spectral line width of the plurality of quantum spin defects in the second region of synthetic single crystal diamond material.
    • 一种合成单晶金刚石材料,包括:合成单晶金刚石材料的第一区域,其包含多个电子供体缺陷; 包括多个量子自旋缺陷的合成单晶金刚石材料的第二区域; 以及设置在第一和第二区域之间的合成单晶金刚石材料的第三区域,使得第一和第二区域被第三区域间隔开,其中合成单晶金刚石材料的第二和第三区域具有较低的电子浓度 施主缺陷比合成单晶金刚石材料的第一区域,并且其中第一和第二区域间隔开10nm至100μΩ的范围内的距离 其足够接近以允许将电子从合成单晶金刚石材料的第一区域捐赠到合成单晶金刚石材料的第二区域,从而在合成单晶金刚石材料的第二区域中形成带负电荷的量子自旋缺陷并带正电荷 合成单晶金刚石材料的第一区域中的缺陷,同时足够远以减少第一和第二区域之间的其它耦合相互作用,否则会过度地减少多个量子自旋缺陷的去相干时间和/或产生应变扩展 在合成单晶金刚石材料的第二区域中的多个量子自旋缺陷的谱线宽度。