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41. 发明申请

WO2002061388A3 HIGH RESOLUTION ETALON-GRATING MONOCHROMATOR SPECTROMETER 审中-公开
公开(公告)号：WO2002061388A3
公开(公告)日：2002-08-08
申请号：PCT/US2002/002453
申请日：2002-01-28
申请人： CYMER, INC. , SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , BROWN, Daniel, J., W. , SMITH, Scott, T.
发明人： SANDSTROM, Richard, L. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , BROWN, Daniel, J., W. , SMITH, Scott, T.
IPC分类号： G01B9/02
摘要： A high resolution etalon-grating spectrometer or monochromator. A preferred embodiment presents as extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser illuminates an etalon (ET). A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated (L3) and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit (2) and monitored by a light detector (PMT). When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow as about 0.034pm "FWHM" and about 0.091pm "95 percent integral". The etalon and the grating are placed in a leak-tight containment (50) filled with a gas, such a nitrogen or helium.

42. 发明申请

WO2009123733A1 SYSTEMS AND METHODS FOR FILTERING OUT-OF-BAND RADIATION IN EUV EXPOSURE TOOLS 审中-公开
标题翻译：用于在EUV接触工具中过滤带外辐射的系统和方法
公开(公告)号：WO2009123733A1
公开(公告)日：2009-10-08
申请号：PCT/US2009/002058
申请日：2009-04-01
申请人： CYMER, INC. , AKINS, Robert, P. , FOMENKOV, Igor, V.
发明人： AKINS, Robert, P. , FOMENKOV, Igor, V.
IPC分类号： A61N5/06
CPC分类号： G03F7/70566 , G02B5/0891 , G02B5/3075 , G03F7/70033 , H01J35/06 , H05G2/001
摘要： In a first aspect, an apparatus for exposing a substrate with EUV radiation is described herein which may comprise a target material; a laser source generating a laser beam having a wavelength, λ, for irradiating the target material to generate EUV radiation, the laser beam defining a primary polarization direction; at least one mirror reflecting the EUV radiation along a path to the substrate; and a polarization filter disposed along the path filtering at least a portion of light having the wavelength, λ.
摘要翻译：在第一方面，本文描述了一种用EUV辐射曝光衬底的装置，其可包括靶材料; 激光源，其产生具有用于照射所述目标材料以产生EUV辐射的波长λ的激光束，所述激光束限定主偏振方向; 至少一个反射EUV辐射的镜子沿着到衬底的路径; 以及偏振滤光器，沿着所述路径设置，对至少一部分具有波长λ的光进行滤波。

43. 发明申请

WO2003011595A2 LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS 审中-公开
标题翻译：激光光谱工程用于光刻工艺
公开(公告)号：WO2003011595A2
公开(公告)日：2003-02-13
申请号：PCT/US2002/022190
申请日：2002-07-11
申请人： CYMER, INC. , SPANGLER, Ronald, L. , LIPCON, Jacob, P. , RULE, John, A. , JACQUES, Robert, N. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor, V. , ALGOTS, John, M.
发明人： SPANGLER, Ronald, L. , LIPCON, Jacob, P. , RULE, John, A. , JACQUES, Robert, N. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor, V. , ALGOTS, John, M.
IPC分类号： B41C
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要翻译：一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。其它优选实施例利用三个独立的波长调谐位置产生具有三个单独峰值的光谱。

44. 发明申请

WO2003011595A3 LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS 审中-公开
公开(公告)号：WO2003011595A3
公开(公告)日：2003-02-13
申请号：PCT/US2002/022190
申请日：2002-07-11
申请人： CYMER, INC. , SPANGLER, Ronald, L. , LIPCON, Jacob, P. , RULE, John, A. , JACQUES, Robert, N. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor, V. , ALGOTS, John, M.
发明人： SPANGLER, Ronald, L. , LIPCON, Jacob, P. , RULE, John, A. , JACQUES, Robert, N. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor, V. , ALGOTS, John, M.
IPC分类号： H01S3/10
摘要： An integrated circuit lithography technique called (spectral engineering for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adjusts the center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment (106) is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. A wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser.

45. 发明申请

WO2013028272A1 ENERGY SENSORS FOR LIGHT BEAM ALIGNMENT 审中-公开
标题翻译：用于光束对准的能量传感器
公开(公告)号：WO2013028272A1
公开(公告)日：2013-02-28
申请号：PCT/US2012/046093
申请日：2012-07-10
申请人： CYMER, INC. ( A NEVADA CORPORATION) , GRAHAM, Matthew, R. , CHANG, Steven , CROUCH, James, H. , FOMENKOV, Igor, V.
发明人： GRAHAM, Matthew, R. , CHANG, Steven , CROUCH, James, H. , FOMENKOV, Igor, V.
IPC分类号： H05G2/00
CPC分类号： G03F7/70033 , H05G2/003 , H05G2/008
摘要： An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy.
摘要翻译：一种装置包括驱动激光系统，其产生沿驱动轴线行进的放大的脉冲光束; 射束传送系统，其将放大的脉冲光束朝向目标区域引导; 目标材料输送系统，其在目标区域中提供含有靶材料的目标混合物; 两个或更多个传感器与跨越目标区域的主轴径向分离，两个或更多个传感器被配置为当被放大的脉冲光束与目标混合物相交时，检测从目标材料的等离子体状态发射的紫外电磁辐射的能量 ; 以及接收来自两个或更多个传感器的输出的控制器。控制器被配置为基于对所检测的能量的分析来估计目标混合物和目标区域内的驱动轴之间的相对径向对准。

46. 发明申请

WO2007005415A2 LPP EUV LIGHT SOURCE DRIVE LASER SYSTEM 审中-公开
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：WO2007005415A2
公开(公告)日：2007-01-11
申请号：PCT/US2006/024960
申请日：2006-06-27
申请人： CYMER, INC. , ERSHOV, Alexander, I. , BYKANOV, Alexander, N. , KHODYKN, Oleh , FOMENKOV, Igor, V.
发明人： ERSHOV, Alexander, I. , BYKANOV, Alexander, N. , KHODYKN, Oleh , FOMENKOV, Igor, V.
IPC分类号： G01J1/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 µm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO 2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译：公开了一种可以包括激光产生的等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。该装置和方法可以包括驱动激光束由具有波长的驱动激光产生，该激光具有如下优点：在有效等离子体产生能量的情况下聚焦在小于约100μm的EUV目标液滴上，如果在所涉及的几何形状的约束条件下聚焦镜头驱动激光器可以包括CO 2激光器。驱动激光重定向机构可以包括镜子。

47. 发明申请

WO2008088488A1 LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源
公开(公告)号：WO2008088488A1
公开(公告)日：2008-07-24
申请号：PCT/US2007/024896
申请日：2007-12-04
申请人： CYMER, INC. , HANSSON, Bjorn, A. M. , BYKANOV, Alexander, N. , FOMENKOV, Igor, V. , BRANDT, David, C.
发明人： HANSSON, Bjorn, A. M. , BYKANOV, Alexander, N. , FOMENKOV, Igor, V. , BRANDT, David, C.
IPC分类号： H05G2/00 , G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre- pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.
摘要翻译：公开了一种EUV光源，其可以包括多个目标，例如锡液滴，以及产生预脉冲和主脉冲的系统，其具有用于照射目标以产生扩展目标的预脉冲。该系统还可以包括连续泵浦的激光器装置，其产生具有用于照射扩展目标的主脉冲以产生EUV光脉冲的脉冲的主脉冲。该系统还可以具有在EUV光脉冲的突发期间改变至少一个预脉冲参数的控制器。另外，EUV光源还可以包括测量EUV光脉冲脉冲串内的至少一个EUV光脉冲的强度的仪器，并且向控制器提供反馈信号以在脉冲串期间改变至少一个预脉冲参数 EUV光脉冲以产生具有预选剂量的EUV脉冲的突发。

48. 发明申请

WO2008048415A2 DRIVE LASER DELIVERY SYSTEMS FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的DRIVE LASER DELIVERY系统
公开(公告)号：WO2008048415A2
公开(公告)日：2008-04-24
申请号：PCT/US2007/020897
申请日：2007-09-27
申请人： CYMER, INC.(A NEVADA CORPORATION) , BYKANOV, Alexander, N. , FOMENKOV, Igor, V. , KHODYKIN, Oleh, V. , ERSHOV, Alexander, I.
发明人： BYKANOV, Alexander, N. , FOMENKOV, Igor, V. , KHODYKIN, Oleh, V. , ERSHOV, Alexander, I.
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , H01S3/0064 , H01S3/073 , H01S3/0805 , H01S3/08054 , H01S3/08059 , H01S3/083 , H01S3/10092 , H01S3/105 , H01S3/1066 , H01S3/115 , H01S3/121 , H01S3/127 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2383 , H05G2/008
摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.
摘要翻译：公开了一种LPP EUV光源，其具有位于等离子体腔室中用于反射其中产生的EUV光的光学器件和激光输入窗口。对于这个方面，EUV光源可以被配置为将光学器件暴露于气体蚀刻剂压力以用于光学清洁，同时窗口暴露于较低的气体蚀刻剂压力以避免窗口涂层劣化。在另一方面，EUV光源可以包括可沿着光束路径定位的目标材料，以参与与光束路径上的光的第一相互作用; 一个光放大器; 以及至少一个光学引导光子，其从第一相互作用中散射到光学放大器中，以在光束路径上产生激光束，用于随后与靶材料相互作用以产生EUV发光等离子体。

49. 发明申请

WO2009032054A1 GAS MANAGEMENT SYSTEM FOR A LASER-PRODUCED-PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：用于激光生产的等离子体光源的气体管理系统
公开(公告)号：WO2009032054A1
公开(公告)日：2009-03-12
申请号：PCT/US2008/009754
申请日：2008-08-15
申请人： CYMER, INC. , BYKANOV, Alexander, N. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , BRANDT, David, C.
发明人： BYKANOV, Alexander, N. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , BRANDT, David, C.
IPC分类号： G21G4/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and / or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

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