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    • 33. 发明申请
    • WARPAGE REDUCTION IN STRUCTURES WITH ELECTRICAL CIRCUITRY
    • 电路结构减小翘曲
    • WO2015084848A3
    • 2015-10-15
    • PCT/US2014068162
    • 2014-12-02
    • INVENSAS CORP
    • WOYCHIK CHARLES GUZOH CYPRIAN EMEKACAO ANDREWSITARAM ARKALGUD R
    • H01L23/00
    • H01L23/562H01L21/32051H01L21/78H01L22/12H01L24/03H01L24/05H01L24/06H01L2224/0345H01L2224/05124H01L2224/05181H01L2924/12042H01L2924/00
    • To reduce warpage in at least one area of a wafer, a stress/warpage management layer (810) is formed to over-balance and change the direction of the existing warpage. For example, if the middle of the area was bulging up relative to the area's boundary, the middle of the area may become bulging downward, or vice versa. Then the stress/warpage management layer is processed to reduce the over-balancing. For example, the stress/management layer can be debonded from the wafer at selected locations, or recesses can be formed in the layer, or phase changes can be induced in the layer. In other embodiments, this layer is tantalum-aluminum that may or may not over-balance the warpage; this layer is believed to reduce warpage due to crystal-phase-dependent stresses which dynamically adjust to temperature changes so as to reduce the warpage (possibly keeping the wafer flat through thermal cycling). Other features are also provided.
    • 为了减少晶片的至少一个区域中的翘曲,形成应力/翘曲管理层(810)以平衡和改变现有翘曲的方向。 例如,如果该区域的中部相对于该区域的边界凸起,该区域的中间可能会向下凸出,反之亦然。 然后处理压力/翘曲管理层以减少过度平衡。 例如,应力/管理层可以在选定的位置从晶片上解除键合,或者可以在层中形成凹陷,或者可以在层中引起相变。 在其他实施例中,该层是钽铝,其可以或不可以平衡翘曲; 据信该层可减少由晶体相相关应力引起的翘曲,该应力动态调节温度变化以减少翘曲(可能通过热循环保持晶片平坦)。 还提供其他功能。