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31. 发明申请

WO0201685A8 EXTREME REPETITION RATE GAS DISCHARGE LASER WITH IMPROVED BLOWER MOTOR 审中-公开
标题翻译：具有改进的鼓风机的极端重复速率排放激光器
公开(公告)号：WO0201685A8
公开(公告)日：2002-04-04
申请号：PCT/US0118691
申请日：2001-06-07
申请人： CYMER INC , OLIVER I ROGER , PARTLO WILLIAM N
发明人： OLIVER I ROGER , PARTLO WILLIAM N
IPC分类号： G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/134 , H01S3/22 , H01S3/225 , H03K3/57 , H03K17/80
CPC分类号： H01S3/225 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/22 , H01S3/2207 , H03K3/57 , H03K17/80
摘要： A gas discharge laser capable of operating at pulse rates in the range of 4,000 Hz to 6,000 Hz at pulse energies in the range of 5 mJ to 10 mJ or greater. Important improvements over the prior art designs include: (1) a squirrel cage type fan (46A) for producing gas velocities in the discharge region of more than 67 m/s, (2) a liquid cooled drive motor having a low loss sealing member separating the motor from the motor starter and protecting the motor from the laser and breach detection device for detecting any breach of the sealing member, (3) a heat exchanger system (58A) capable of removing in excess of 16 kW of heat energy from the laser gas and (4) a pulse power system capable of providing precisely controlled electrical pulses to the electrodes (18A, 20A) to produce laser pulses at the desired pulse energies in the range of 5 mJ to 10 mJ or greater at pulse repetition rates in the range of 4,000 Hz to 6,000 Hz.
摘要翻译：一种气体放电激光器，能够以5mJ至10mJ或更大的脉冲能量在4000Hz至6,000Hz的脉冲频率下工作。与现有技术设计相比，重要的改进包括：（1）用于在放电区域产生大于67m / s的气体速度的鼠笼式风扇（46A），（2）具有低损耗密封件将电动机与电动机起动器分离并保护电动机免受激光破裂，检测装置检测到任何泄漏密封件;（3）热交换器系统（58A）能够从激光气体和（4）能够向电极（18A，20A）提供精确控制的电脉冲以在脉冲重复频率为5mJ至10mJ或更大范围内的期望脉冲能量产生激光脉冲的脉冲电源系统范围4,000 Hz至6,000 Hz。

32. 发明申请

WO2006093783A3 LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源
公开(公告)号：WO2006093783A3
公开(公告)日：2007-11-01
申请号：PCT/US2006006410
申请日：2006-02-24
申请人： CYMER INC , ERSHOV ALEXANDER L , PARTLO WILLIAM N , BOWERING NORBERT N
发明人： ERSHOV ALEXANDER L , PARTLO WILLIAM N , BOWERING NORBERT N
IPC分类号： G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed that may include a laser source, e.g. CO 2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.
摘要翻译：公开了一种EUV光源，其可以包括例如激光源。 CO 2激光器，等离子体室和用于将激光束从激光源传递到等离子体室中的光束传送系统。公开了可以包括以下一个或多个的实施例; 可以提供旁路管线以建立等离子体室和辅助室之间的流体连通，聚焦光学器件，例如，用于将激光束聚焦到等离子体室中的焦点的反射镜，用于转向等离子体室中的激光束焦点的转向光学元件，以及用于调整焦度的光学装置。

33. 发明申请

WO2005053893A3 LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM 审中-公开
标题翻译：激光薄膜聚硅氧烷退火光学系统
公开(公告)号：WO2005053893A3
公开(公告)日：2005-07-07
申请号：PCT/US2004037618
申请日：2004-11-12
申请人： CYMER INC , PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSEL , THOMAS MICHAEL
发明人： PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSEL , THOMAS MICHAEL
IPC分类号： B23K26/06 , B23K26/073 , C30B1/02 , C30B13/24 , H01L21/20 , H01S3/22 , H01S3/223 , B23K26/00
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/2026
摘要： A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 µm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam workpiece covering extent of the long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep side walls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level 2. The apparatus may also have a high average power in the laser output light pulse beam as delivered to the workpiece and a linebow correction mechanism in a short axis optical assembly. The linebow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The line width due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a linebow is correction mechanism within a field stop optical assembly correcting linebow at the field stop plane and within a workpiece projection optical assembly correcting linebow at the workpiece plane.
摘要翻译：公开了一种高能量，高重复率的工件表面加热方法和装置，其可以包括在4000Hz以上工作的脉冲XeF激光器，并在约351nm的中心波长处产生激光输出光脉冲光束; 将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20μm的光学系统，并且扩大激光输出光脉冲光束以形成长轴的光束工件覆盖范围的长轴 ; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍率来允许场停止在工件处保持足够陡峭的光束轮廓而不阻挡光束轮廓在太高的强度水平2.该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率，以及在短轴光学组件中具有弯管校正机构。弯管矫正机构可以包括多个弱交叉圆筒。该系统可以包括反折射投影系统。由激光衍射和发散引起的线宽可能小于几何限制。该系统可以投射标称XeF谱的相邻峰值，以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。系统可以包括在场停止光学组件中的弯头矫正机构，其在场停止平面处以及工件投影光学组件中在工件平面处校正弯头。

34. 发明申请

WO2007005512A3 GAS DISCHARGE LASER LINE NARROWING MODULE 审中-公开
标题翻译：气体放电激光线路延迟模块
公开(公告)号：WO2007005512A3
公开(公告)日：2007-11-22
申请号：PCT/US2006025350
申请日：2006-06-28
申请人： CYMER INC , CYBULSKI RAYMOND F , BERGSTEDT ROBERT A , PARTLO WILLIAM N , SANDSTROM RICHARD L , WANG GON
发明人： CYBULSKI RAYMOND F , BERGSTEDT ROBERT A , PARTLO WILLIAM N , SANDSTROM RICHARD L , WANG GON
IPC分类号： H01S3/22 , H01S3/03
CPC分类号： H01S3/03 , H01S3/034 , H01S3/036 , H01S3/1055 , H01S3/225
摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
摘要翻译：公开了一种窄气体放电激光系统及其操作方法，其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构，其定位折射元件中的至少一个，以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。色散元件可以包括光栅，并且光束扩展器可以包括多个棱镜。壳体可以包含分散中心波长选择元件和扩束器。壳体定位元件可以包括位置锁定机构。

35. 发明申请

WO2006060360A3 LINE NARROWING MODULE 审中-公开
标题翻译：线路延迟模块
公开(公告)号：WO2006060360A3
公开(公告)日：2006-10-26
申请号：PCT/US2005043056
申请日：2005-11-28
申请人： CYMER INC , ALGOTS MARTIN J , BERGSTEDT ROBERT A , GILLESPIE WALTER D , KULGEYKO VLADIMIR A , PARTLO WILLIAM N , RYLOV GERMAN E , SANDSTROM RICHARD L , STRATE BRIAN D , DYER TIMOTHY S
发明人： ALGOTS MARTIN J , BERGSTEDT ROBERT A , GILLESPIE WALTER D , KULGEYKO VLADIMIR A , PARTLO WILLIAM N , RYLOV GERMAN E , SANDSTROM RICHARD L , STRATE BRIAN D , DYER TIMOTHY S
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength.
摘要翻译：一种用于窄带DUV大功率高重复率气体放电激光器的线窄化方法和模块，其产生具有标称光路的脉冲串中的输出激光束脉冲束脉冲，其可以包括：分散中心波长选择光学器件可移动地安装在线路窄化模块的光路内，为至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定的每个脉冲选择至少一个中心波长; 第一调谐机构部分地通过选择包含脉冲朝向分散中心的激光束的透射角度来选择包含分散中心波长选择光学器件上的各个脉冲的激光束的入射角波长选择光学; 第二调谐机构部分地通过改变色散中心波长选择光学器件相对于线条变窄模块的标称光路的位置来选择包含相应脉冲的激光束的入射角; 其中第二调谐机构粗略地选择中心波长的值，并且第一调谐机构更精细地选择中心波长的值。

36. 发明申请

WO2005104311A3 DUV LIGHT SOURCE OPTICAL ELEMENT IMPROVEMENTS 审中-公开
标题翻译： DUV光源光学元件的改进
公开(公告)号：WO2005104311A3
公开(公告)日：2007-03-22
申请号：PCT/US2005006932
申请日：2005-03-04
申请人： CYMER INC , SANDSTROM RICHARD L , ALGOTS J MARTIN , BROWN JOSHUA C , CYBULSKY RAYMOND F , DUNLOP JOHN , HOWEY JAMES K , MORTON RICHARD G , PAN XIAOJIANG J , PARTLO WILLIAM N , PUTRIS FIRAS F , WATSON TOM A , YAGER THOMAS A
发明人： SANDSTROM RICHARD L , ALGOTS J MARTIN , BROWN JOSHUA C , CYBULSKY RAYMOND F , DUNLOP JOHN , HOWEY JAMES K , MORTON RICHARD G , PAN XIAOJIANG J , PARTLO WILLIAM N , PUTRIS FIRAS F , WATSON TOM A , YAGER THOMAS A
IPC分类号： H01S3/22 , G01B9/02 , G01J1/42 , G01J9/02 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/10 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/02 , G01J1/429 , G01J9/02 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount framed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may prestress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto- sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
摘要翻译：公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其具有快速可角度定位的反射镜，其具有镜安装框架，具有与安装框架系数不同的系数的反射光学元件，至少一个弯曲安装座框架在柔性的安装框架中，挠性臂将挠性件连接到安装框架。该装置可以包括具有细长杆的挠曲力机构。力机构可以预应力挠曲。镜子可以是包括在基板上形成有金属层的基板的光栅，以及形成在反射金属层上的由二氧化硅形成的保护涂层。光栅可能会使用电磁感应元件或磁敏元件进行主动调谐。可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。

37. 发明申请

WO2006127891A3 SYSTEMS AND METHODS INTERACTING BETWEEN A LASER AND FILM DEPOSITED 审中-公开
标题翻译：激光和电影之间的相互影响的系统和方法
公开(公告)号：WO2006127891A3
公开(公告)日：2009-04-16
申请号：PCT/US2006020223
申请日：2006-05-25
申请人： CYMER INC , DAS PALASH P , HOFMANN THOMAS , DAVIS JESSE D , SMITH SCOT T , PARTLO WILLIAM N
发明人： DAS PALASH P , HOFMANN THOMAS , DAVIS JESSE D , SMITH SCOT T , PARTLO WILLIAM N
IPC分类号： H01L29/04 , H01S3/08
CPC分类号： B23K26/04 , B23K26/0622 , B23K26/0738
摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.
摘要翻译：公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

38. 发明申请

WO2007145792A2 CHAMBER FOR A HIGH ENERGY EXCIMER LASER SOURCE 审中-公开
标题翻译：高能激光激光源室
公开(公告)号：WO2007145792A2
公开(公告)日：2007-12-21
申请号：PCT/US2007012393
申请日：2007-05-22
申请人： CYMER INC , STEIGER THOMAS D , PARTLO WILLIAM N
发明人： STEIGER THOMAS D , PARTLO WILLIAM N
IPC分类号： H01S3/03 , H01S3/22 , H01S3/223
CPC分类号： H01S3/225 , H01S3/03 , H01S3/036 , H01S3/038
摘要： A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.
摘要翻译：公开了一种用于气体放电激光器的腔室，并且可以包括具有壁的腔室壳体，壁具有围绕室容积的内表面和外表面，壁还形成有孔口。对于腔室，至少一个电导体可以延伸通过孔口以将电流传递到腔体积中。构件可以设置在导体和壁之间，用于防止气体流过孔口，以允许室压力保持在容积中。腔室可以进一步包括邻近孔口设置的加压隔室，用于在壁的外表面的至少一部分上保持压力，以减小由于腔室压力而在孔口附近的壁的弯曲。

39. 发明申请

WO2005054949A3 LASER THIN FILM POLY-SILICON ANNEALING SYSTEM 审中-公开
标题翻译：激光薄膜多晶硅退火系统
公开(公告)号：WO2005054949A3
公开(公告)日：2005-12-15
申请号：PCT/US2004037617
申请日：2004-11-12
申请人： CYMER INC , PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSELL , THOMAS MICHAEL
发明人： PARTLO WILLIAM N , DAS PALASH P , HUDYMA RUSSELL , THOMAS MICHAEL
IPC分类号： B23K26/06 , G03F20060101 , H01L21/20 , H01S3/081 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/0818 , B23K26/042 , B23K26/0622 , B23K26/0738 , B23K26/705 , H01L21/02532 , H01L21/02675 , H01S3/225 , H01S3/2255 , H01S3/2308 , H01S3/2366
摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.
摘要翻译：公开了一种气体放电激光结晶装置和方法，用于在工件上进行膜内晶体结构或取向的变换，其可包括主振荡器功率放大器MOPA或功率振荡器功率放大器配置的XeF激光系统，产生激光输出光脉冲束以高重复率和高功率以及脉冲到脉冲剂量控制; 光学系统从激光输出光脉冲束产生细长的薄脉冲工作光束。该设备可以进一步包括激光系统被配置为POPA激光系统并且还包括：中继光学器件，用于将来自第一激光PO单元的第一输出激光脉冲光束引导到第二激光PA单元中; 以及定时和控制模块，用于在第一和第二激光单元中产生正或负3ns内的气体放电，以产生作为第一激光输出光脉冲束的放大的第二激光输出光脉冲束。该系统可以包括振荡器激光器单元中的发散控制。发散控制可以包括不稳定的谐振器布置。该系统还可以包括位于激光器和工件之间的光束指向控制机构以及位于激光器和工件之间的光束位置控制机构。波束参数测量可以提供对波束指向机构的主动反馈控制和对波束位置控制机构的主动反馈控制。

40. 发明申请

WO0111733A9 HIGH PULSE RATE PULSE POWER SYSTEM WITH FAST RISE TIME AND LOW LEAKAGE CURRENT 审中-公开
标题翻译：具有快速上升时间和低漏电流的高脉冲速率脉冲电源系统
公开(公告)号：WO0111733A9
公开(公告)日：2002-09-06
申请号：PCT/US0020266
申请日：2000-07-25
申请人： CYMER INC , PARTLO WILLIAM N , NESS RICHARD M , ROTHWEIL DANIEL A , MELCHER PAUL C , SMITH BRETT D , BIRX DEBORAH L EM
发明人： PARTLO WILLIAM N , BIRX DANIEL L DI , NESS RICHARD M , ROTHWEIL DANIEL A , MELCHER PAUL C , SMITH BRETT D
IPC分类号： G03F7/20 , H01S3/097 , H01S3/225 , H02M3/00 , H02M9/04 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A high pulse rate pulse power source (20) for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source (20) includes a pulse generating circuit (50) including a charging capacitor (42), a solid state switch (46) and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer (56) increases peak voltage to at least 12,000 volts. A very fast regulated power supply (20) is provided for charging the charging capacitor (42) in less than 400 microseconds and a pulse control system including a programmed processor (102) controls the charging of the charging capacitor (42) to an accuracy of less than about one percent at a rate of at least 2000 charges per second.
摘要翻译：用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源（20）。源极（20）包括包括充电电容器（42），固态开关（46）和限流电感器的脉冲发生电路（50）。在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩，并且升压脉冲变压器（56）将峰值电压增加到至少12000伏特。提供了一种非常快速的调节电源（20），用于在小于400微秒内为充电电容器（42）充电，以及包括编程处理器（102）的脉冲控制系统，其将充电电容器（42）的充电控制到不到百分之一，每秒至少要2000次。

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