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21. 发明申请

WO2011082891A1 EUV RADIATION SOURCE COMPRISING A DROPLET ACCELERATOR AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：包含减速机加速器和平面设备的EUV辐射源
公开(公告)号：WO2011082891A1
公开(公告)日：2011-07-14
申请号：PCT/EP2010/068421
申请日：2010-11-29
申请人： ASML NETHERLANDS B.V. , MESTROM, Wilbert , LOOPSTRA, Erik , SWINKELS, Gerardus , BUURMAN, Erik
发明人： MESTROM, Wilbert , LOOPSTRA, Erik , SWINKELS, Gerardus , BUURMAN, Erik
IPC分类号： H05G2/00
CPC分类号： H05G2/001 , H05G2/006
摘要： An EUV radiation source includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a nozzle configured to eject droplets of fuel, and a droplet accelerator configured to accelerate the fuel droplets. The EUV radiation source includes a laser radiation source configured to irradiate the fuel supplied by the fuel supply at the plasma formation location.
摘要翻译： EUV辐射源包括配置成向等离子体形成位置供应燃料的燃料供应。燃料供给包括喷射燃料液滴的喷嘴，和配置成加速燃料液滴的液滴加速器。 EUV辐射源包括被配置为照射由等离子体形成位置处的燃料供应供应的燃料的激光辐射源。

22. 发明申请

WO2011018295A1 EUV RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译： EUV辐射系统和光刻设备
公开(公告)号：WO2011018295A1
公开(公告)日：2011-02-17
申请号：PCT/EP2010/060145
申请日：2010-07-14
申请人： ASML Netherlands B.V. , VAN DIJSSELDONK, Antonius , LOOPSTRA, Erik
发明人： VAN DIJSSELDONK, Antonius , LOOPSTRA, Erik
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70033 , H05G2/003
摘要： A lithographic projection apparatus is provided with a EUV radiation system that includes a source chamber, a supply constructed and arranged to supply a target material to a predetermined plasma formation position, an optical system formed by three or more mirrors arranged to establish a beam path extending to the target material when the target material is located at the predetermined plasma formation position, and a laser system constructed and arranged to provide a laser beam along the beam path for interaction with the target material to produce an EUV radiation-emitting plasma inside the chamber.
摘要翻译：光刻投影装置设置有EUV辐射系统，该EUV辐射系统包括源室，构造和布置成将目标材料供应到预定等离子体形成位置的供应源，由三个或更多个反射镜形成的光学系统，当目标材料位于预定的等离子体形成位置时，激光系统被构造和布置成沿着光束路径提供激光束以与靶材料相互作用以在腔室内产生EUV辐射发射等离子体。

23. 发明申请

WO2011082894A1 EUV RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译： EUV辐射源和光刻设备
公开(公告)号：WO2011082894A1
公开(公告)日：2011-07-14
申请号：PCT/EP2010/068461
申请日：2010-11-30
申请人： ASML NETHERLANDS B.V. , LOOPSTRA, Erik , SWINKELS, Gerardus , BUURMAN, Erik , MESTROM, Wilbert
发明人： LOOPSTRA, Erik , SWINKELS, Gerardus , BUURMAN, Erik , MESTROM, Wilbert
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： An EUV radiation source that includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a reservoir configured to hold fuel at a temperature that is sufficiently high to maintain the fuel in liquid form, and a pressure vessel configured to contain the reservoir, the pressure vessel being at least partially thermally isolated from the reservoir. The EUV radiation source also includes a laser radiation source configured to irradiate fuel supplied by the fuel supply at the plasma formation location.
摘要翻译： EUV辐射源，其包括配置成向等离子体形成位置供应燃料的燃料供应。燃料供应包括储存器，其构造成将燃料保持在足够高的温度以将燃料保持为液体形式;以及压力容器，其构造成容纳储存器，压力容器至少部分地与储存器热隔离。 EUV辐射源还包括被配置为照射由等离子体形成位置处的燃料供应供应的燃料的激光辐射源。

24. 发明申请

WO2010100078A1 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF FORMING AN ILLUMINATION MODE 审中-公开
标题翻译：照明系统，光刻设备和形成照明模式的方法
公开(公告)号：WO2010100078A1
公开(公告)日：2010-09-10
申请号：PCT/EP2010/052432
申请日：2010-02-25
申请人： ASML NETHERLANDS B.V. , LOOPSTRA, Erik , VAN INGEN SCHENAU, Koen , VAN SCHOOT, Jan , WAGNER, Christian , DE VRIES, Gosse
发明人： LOOPSTRA, Erik , VAN INGEN SCHENAU, Koen , VAN SCHOOT, Jan , WAGNER, Christian , DE VRIES, Gosse
IPC分类号： G03F7/20 , G02B7/18 , H01L21/00
CPC分类号： G03F7/70825 , G03F7/70075 , G03F7/70116
摘要： Provided is an illumination system of a lithographic apparatus, the illumination system having a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation which directs radiation towards a first location the pupil plane and a second orientation which directs radiation towards a second location in the pupil plane, the first orientation and the second orientation of the reflective element being defined by end stops.
摘要翻译：提供了一种光刻设备的照明系统，所述照明系统具有布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。在不同的取向中，反射元件将辐射引导到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动，反射元件的第一取向和第二取向由端部停止。

25. 发明申请

WO2005050323A1 OPTICAL ASSEMBLY FOR PHOTOLITHOGRAPHY 审中-公开
标题翻译：光学组件用于光刻技术
公开(公告)号：WO2005050323A1
公开(公告)日：2005-06-02
申请号：PCT/EP2003/014552
申请日：2003-12-18
申请人： CARL ZEISS SMT AG , ASML NETHERLANDS B.V. , KWAN, Yim-Bun, Patrick , LOOPSTRA, Erik
发明人： KWAN, Yim-Bun, Patrick , LOOPSTRA, Erik
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G02B5/005 , G02B13/143 , G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/709
摘要： The invention relates to an optical assembly (1) having a plurality of optical elements (2), at least one optical element (2, 2”) being connected to a structure (5) dynamically decoupled from the optical assembly (1), as a result of which it is substantially dynamically decoupled from the remaining optical elements (2) and the optical assembly (1).
摘要翻译：本发明涉及具有多个光学元件（2）的光学组件（1），至少一个光学元件（2,2“）连接到与光学组件（1）动态分离的结构（5），如其结果是与剩余的光学元件（2）和光学组件（1）基本上动态地分离。

26. 发明申请

WO2013029895A1 RADIATION SOURCE 审中-公开
标题翻译：辐射源
公开(公告)号：WO2013029895A1
公开(公告)日：2013-03-07
申请号：PCT/EP2012/064775
申请日：2012-07-27
申请人： ASML NETHERLANDS B.V. , WAGNER, Christian , LOOPSTRA, Erik
发明人： WAGNER, Christian , LOOPSTRA, Erik
IPC分类号： H01S3/00 , G03F7/20 , H05G2/00
CPC分类号： H05G2/008 , G02B27/283 , G03F7/70025 , G03F7/70033 , G03F7/70983 , H01S3/0064 , H01S3/2316 , H01S3/2333 , H05G2/003 , H05G2/005
摘要： According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam back toward the beam splitter.
摘要翻译：根据本发明的第一方面，提供了一种辐射源，包括：喷嘴，被配置为沿着轨迹朝着等离子体形成位置引导燃料液滴流（70）; 激光器，被配置为在等离子体形成位置处的燃料液滴处引导激光辐射，以在使用中产生辐射产生等离子体; 其中所述激光器包括：种子激光器（50），用于提供种子激光束（52）; 用于从种子激光器接收种子激光束的分束器（54）; 用于从分束器接收种子激光束并进行光放大的光放大器（58）位于所述光放大器下游的第一反射器（60），被配置为将所述种子激光束引导通过所述光放大器并且返回到所述分束器; 以及位于所述分束器的更下游的第二反射器（70），被配置为从所述分束器接收所述种子激光束并将所述种子激光束的至少一部分引导回所述分束器。

27. 发明申请

WO2015044182A2 BEAM DELIVERY APPARATUS AND METHOD 审中-公开
标题翻译：光束传输装置和方法
公开(公告)号：WO2015044182A2
公开(公告)日：2015-04-02
申请号：PCT/EP2014/070335
申请日：2014-09-24
申请人： ASML NETHERLANDS B.V.
发明人： BANINE, Vadim , BARTRAIJ, Petrus , VAN GORKOM, Ramon , AMENT, Lucas , DE JAGER, Pieter , DE VRIES, Gosse , DONKER, Rilpho , ENGELEN, Wouter , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , NIENHUYS, Han-Kwang , NIKIPELOV, Andrey , RENKENS, Michael , JANSSEN, Franciscus , KRUIZINGA, Borgert
IPC分类号： G03F7/20
CPC分类号： G21K1/067 , G01N2021/95676 , G02B5/1814 , G02B5/1823 , G02B5/1838 , G02B5/1861 , G02B27/0025 , G02B27/0938 , G02B27/10 , G02B27/1086 , G02B27/12 , G02B27/14 , G02B27/142 , G02B27/146 , G02B27/4272 , G03F1/84 , G03F7/70025 , G03F7/70208 , G03F7/70566 , G03F7/70891 , G03F7/70991 , G21K2201/065 , H01S3/0903 , H05H7/04
摘要： A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
摘要翻译：
在光刻系统内使用的传送系统。该光束输送系统包括光学元件，该光学元件被布置成接收来自辐射源的辐射束并沿一个或多个方向反射辐射的部分以形成一个或多个分支辐射束以提供给一个或多个工具。

28. 发明申请

WO2015067467A1 FREE ELECTRON LASER 审中-公开
标题翻译：免费电子激光
公开(公告)号：WO2015067467A1
公开(公告)日：2015-05-14
申请号：PCT/EP2014/072588
申请日：2014-10-22
申请人： ASML NETHERLANDS B.V.
发明人： AKKERMANS, Johannes, , AMENT, Lucas , BANINE, Vadim , COENEN, Teis, Johan , DE JAGER, Pieter , DE VRIES, Gosse , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , LUITEN, Otger , NIKIPELOV, Andrey
IPC分类号： H01S3/09 , H05H9/00 , H01J25/12 , H01J23/027 , H05H7/12
CPC分类号： H01S3/0903 , G03F7/70208 , H01J23/027 , H01J25/10 , H05H9/00
摘要： A free electron laser comprising: an electron source (21), a linear accelerator (22), an undulator (26), electron beam optics and a deceleration unit (28'). The electron source is operable to produce a bunched electron beam. The linear accelerator arranged to impart energy to electrons in the bunched electron beam produced by the electron source. The undulator is operable to produce a periodic magnetic field and is arranged so as to guide the bunched electron beam along a periodic path about a central axis of the undulator such that they interact with radiation in the undulator, stimulating emission of coherent radiation. The electron beam optics is arranged to direct the bunched electron beam back into the linear accelerator after it leaves the undulator so as to extract energy from electrons in the bunched electron beam. The deceleration unit is arranged to extract energy from electrons in the bunched electron beam after it has left the undulator. The deceleration unit comprises one or more resonant cavities (33), and an energy dissipation mechanism. The bunched electron beam is directed through the one or more resonant cavities so as to excite one or more resonant standing wave modes therein.
摘要翻译：一种自由电子激光器，包括：电子源（21），线性加速器（22），波动器（26），电子束光学器件和减速单元（28'）。电子源可操作以产生聚束电子束。线性加速器被布置成赋予由电子源产生的聚束电子束中的电子能量。波动器可操作以产生周期性磁场，并且被布置成引导聚束电子束沿着围绕波动器的中心轴线的周期性路径，使得它们与波动器中的辐射相互作用，刺激相干辐射的发射。电子束光学器件被布置成在聚束束电子束离开波束器之后将聚束电子束引导回线性加速器，以便从束电子束中的电子提取能量。减速单元被布置成在束状电子束离开波动器之后从电子束中的电子提取能量。减速单元包括一个或多个谐振腔（33）和能量耗散机构。聚束电子束被引导通过一个或多个谐振腔，以激发其中的一个或多个共振驻波模式。

29. 发明申请

WO2013050243A1 CHUCK, LITHOGRAPHY APPARATUS AND METHOD OF USING A CHUCK 审中-公开
标题翻译： CHUCK，LITHOGRAPHY APPARATUS AND METHOD OF USING CHUCK
公开(公告)号：WO2013050243A1
公开(公告)日：2013-04-11
申请号：PCT/EP2012/068386
申请日：2012-09-19
申请人： ASML NETHERLANDS B.V.
发明人： GILISSEN, Noud , LOOPSTRA, Erik , SIJBEN, Anko , CORNELISSEN, Bas , VAN SCHOOT, Jan , NOTENBOOM, Arnoud , VAN DER WILK, Ronald
IPC分类号： G03F7/20
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70875 , G03F7/70908 , G10L15/08 , G10L2015/223 , H01L21/6831
摘要： A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.
摘要翻译：公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48）用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于减少或防止由于施加到驱动电极的电压而在温度调节流体通道中的温度调节流体的电场的发展，以便减少或防止流体中的电解。

30. 发明申请

WO2014202585A2 LITHOGRAPHIC METHOD 审中-公开
标题翻译：光刻方法
公开(公告)号：WO2014202585A2
公开(公告)日：2014-12-24
申请号：PCT/EP2014/062691
申请日：2014-06-17
申请人： ASML NETHERLANDS B.V.
发明人： NIKIPELOV, Andrey , FRIJNS, Olav , DE VRIES, Gosse , LOOPSTRA, Erik , BANINE, Vadim , DE JAGER, Pieter , DONKER, Rilpho , NIENHUYS, Han-Kwang , KRUIZINGA, Borgert , ENGELEN, Wouter , LUITEN, Otger , AKKERMANS, Johannes , GRIMMINCK, Leonardus , LITVINENKO, Vladimir
IPC分类号： H01S3/09
CPC分类号： G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
摘要： A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
摘要翻译：一种图案化平版印刷基板的方法，所述方法包括使用自由电子激光器产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备，其中所述方法还包括减少EUV辐射的功率波动通过使用基于反馈的控制回路来监测自由电子激光器并相应地调整自由电子激光器的操作而被传送到光刻基片。

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